Supplementary Information:

Figure S1: Photograph of a PLD-500 System from DCA Instruments. This is an R&D

“laser MBE” system for epitaxial thin film growth. Features include a base pressure of 8

x 10-11 Torr, maximum 50-mm diameter substrate, oxygen resistant substrate heater

with optional X-Y Scan of substrate, HP RHEED, six 1-inch diameter targets with

scanning and indexing, particle reduction mask, and loadlock chamber. Photo Courtesy

of DCA Instruments, Inc.

Figure S2: Photo of a PLD system with the maximum substrate heater temperature of

1,200°C and utilizes either 1” or 2” diameter targets. The system features a load lock

for transferring substrates and targets. In-situ characterization such as RHEED and

deposition monitoring can also be added to the system. Photo courtesy of NBM Design,

Inc.

Figure S3: Photograph of a PLD 180 Laser MBE System. The system includes 2-inch

diameter capability with a base pressure of 5 x 10-9 Torr with loadlock. The substrate

temperature can range from 850 to 1,100°C depending on heater type. The system is

HP RHEED compatible. Photo courtesy of Neocera, LLC.

Figure S4: Photograph of a Laser MBE system. The system includes substrate heating

to 1,000°C via diode laser for small sample sizes, 2 motor-driven combinatorial masks,

six targets, RHEED, loadlock, base pressure of 5 x 10-9 Torr. Photo courtesy of Pascal

Co. Ltd.

Figure S5: Laser MBE module as a modular cluster tool. The system can be expanded

easily over time to increase the complexity of research as shown. Starting with the

Laser MBE module on the left, one can add other features such as transfer modules,

and/or additional deposition or analytical modules. This system includes laser heating,

high pressure RHEED, load lock with up to six substrate carriers and two transferable

five 25-mm target carousels. The system base pressure is 10-10mbar. Photo courtesy

of Surface Systems and Technology & Co.

Figure S6: Photo of a custom built PLD System from TSST. Includes HP RHEED, UHV

ion getter and TSP pump, plasma source, sample holder with 5 degrees of freedom,

both resistive and laser heating. The system is designed to be used in combination with

the attached XPS and STM Analysis equipment. Photo courtesy of Twente Solid State

Technology, BV.