gencoa key company facts

GENCOA Key Company Facts

• GENCOA is a private limited company (Ltd)

• Founded 1995 by Dr Dermot Monaghan

• Located in Liverpool, UK

• Employs 34 people6 design (Pro E 3D CAD)4 process development & simulation14 assembly & test4 sales & tech support (2 Asia based)3 administration & accounts3 hardware & software (Speedflo)

• > 3000 magnetrons supported in the field

• > 600 speedflo systems supported in the field

Other activities include on-site process implementation, training and tuning

GENCOA products cover 3 sputtering related areas

Magnetron Sputter Cathodes

planar & rotatable

Reactive gas controller

& endpoint detector

Linear ion sources

GENCOA Key Company Advantages

• 8 types of magnetic systems for rotatable magnetrons• 10 types of planar magnetic designs• On-site process implementation• Unique PDF+ algorithm for reactive gas process control • In-situ and ex-situ* PEM, lambda sensor, target voltage• Key IPR covering dual rotatable magnetrons and magnetic anode assisted rotatable processes.

• GENCOA provide process solutions by supplying components and know-how that exceeds your expectations:

Sales agents / distributors located around the world and 95% of output is exported from the UK

Main markets are USA, EU, Japan, Taiwan, Korea & China

Local Gencoa based staff for technical support in USA, EU & Asia

GENCOA worldwide company presence

Key Advantages

• GENCOA have developed an inverted magnetron type linear ion source to provide the best process solution combined with highly robust components:

• Optimized magnetic fields to produce a collimated plasma beam at standard sputtering pressures.• Graphite anode and cathode to protect the substrate from contamination and provide long-life components.• RF standard electrical insulation on all ion sources.• In-direct cooling of anode and cathode – quick switching of parts. • Easy switching of cathode parts to provide multiple magnetic traps for lower voltage operation, or a focused beam.• Voltage regulated power supply with gas adjustment feedback to maintain same current at all times.

Concept of operation based upon space

plasma thruster devices

• A plasma jet is generated by the combined closed magnetic trap, high voltage between anode and cathode, and correct pressure –gas flow through the magnetic trap.

+ VAnode

Cathode Cathode

Gas injected (P~ 10-2 Torr)

Vacuum side (P~10-4 Torr)

B

Ion Gun

e.VA(VA =Anode Voltage)

No. ofions

Energy, eV

~ e.(VA/2)

Energy of the ions are an average of the discharge voltage / 2

Power Modes

-100

0

100

200

300

400

500

600

700

800

900

1000

1100

1200

1300

1400

0 50 100 150 200

Time, a.u.

An

ode

Vol

tage

, V

DC

DC-Pulsed

semi-AC

Various power modes are possible, but DC is standard

0.50

1.00

1.50

2.00

2.50

3.00

kV

100 500 1000

Normal operation area

Extended operation areaOperation range for the IM source

mA/metre

Low energy area

Gas consumption: ~ 100 sccm argon per metre length

Typically the sources operate at upt0 1 Amp per meter length and at upto 100 sccm

per meter length

External mounting im300 with carbon cathode

Internal mounting im400 with metal cathode and cantilever mounting

Internal mounting im600 with carbon cathode and end support mounting

Internal mounting im800 with metal cathode and end support mounting

Internal mounting im800 with carbon cathode and rear support mounting

Internal mounting im950 with metal cathode and end support mounting

Internal mounting im1000 with carbon cathode and end support mounting

External mounting im1500 with carbon cathode

Adaptors available to convert to existing port designs – MRC / KDF shown

Standard straight beam arrangement

Standard straight beam arrangement

im1500 External

External mounting im500 with optional focused beam arrangement

IM800 - Ion Source - Anode Voltage vs Current # graphite on

0

0.5

1

1.5

2

2.5

3

0 100 200 300 400

Ion Source current, mA

An

ode

Vol

tage

, kV

Ar: 13.4 sccm

Ar: 27.8 sccm

Ar: 41.4 sccm

Ar: 48.4 sccm

Ar: 55.6 sccm

Typical operating parameters im800

IM400 V vs I plot for Ar flow rate (%)

0.2

0.4

0.6

0.8

1

1.2

1.4

1.6

1.8

2

2.2

2.4

0 50 100 150 200 250

Ion Source current, mA

An

ode

Vol

tage

, kV

14.7 sccm

21 sccm

28 sccm

34.7 sccm

41 sccm

48.5 sccm

Typical operating parameters im400

Oxide etch rates:Gas ArIM600, 300 mA beam @ +1.6 kVExample of oxide: SiOxEtching rate: 5 nm/min static (over 8 mm diameter substrate, total time 23 mins)

Polymer etch rates:Gas: O2IM400: 200 mA beam @ +1.5 kVSubstrate in rotation at equivalent 600mm/min linear speed (80 passes)Example of polymer: siliconeEtching rate ~ 20 A/passExample of polymer: acrylicEtching rate ~ 38 A/pass

Example of metal Ti:

Typical etch rates for different materials

Etching rates: 0.5-1 A/pass (170 mA @ +1.82 kV)

Plasma surface treatment

Comparison of wetability of un-treated and treated PET film – 1 pass.

Robust mechanical design, easy to access and connect

Long operating lifetime, very easy to service and maintain

No water or vacuum seal broken during anode / cathode change, typically 2 hours for full conversion from straight beam to focused beam mode.

Gencoa provide a unique customer built power supply that automatically regulates

the gas flow for ease of operation

Output voltage Up to 2500V ( 3000V ignition voltage ) Output current 2 A @ 2000V, short circuit 2.5A Output Power 4000W @ 2000V Output polarity Positive Regulation Mode Current 0-2.5A Output connector Fischer, type 105, 10kV rating for RG213 coax cable

Mains input 3x400Vac +/- 10% 50Hz ( L1,L2,L3 PE) Dimensions Standard Rack 19” 4U=177mm High Weight 12kg Cooling Forced air cooling Working temperature 15-35°C

GENCOA

I M

MKSMFC

Pump

Chamber

IM-3000-BDS-VT

Power Supply

Power Cable

MFC cable (for MKS's MFC), D9-D15 Shielded

Gas

MFC Spec:MKS 1179A

Db15±15V

Schematic of the ion source with power supply and automatic gas regulation

Removes beam variation – I & V regulated

Schematic of the ion source with power supply and automatic gas regulation

Of more than 1 gas type – needs speedflo mini

IM-3000-BDS-VT

Spe

edflo

Pump

Gas1

Gas2

Gas3

MKSMFC1

MKSMFC2

MKSMFC3

Chamber

IM Voltage Feedback

(0-10V)

GENCOA

I M

Gas Line

Speedflo Cable

High Power Cable

Voltage feedthru cable

IM600 at 300mA - gas Ar - Example of voltage

tracking feature via auto control of gas

Any length of plasma beam is available and a variety of mounting options

Thank you for your attention