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1 Supporting Information On the correlation between gate dielectric, film growth, and charge transport in organic thin film transistors: the case of vacuum-sublimed tetracene thin films Julia Wünsche, a Giuseppe Tarabella, b Simone Bertolazzi, a Maimouna Bocoum, a Nicola Coppedè, b Luisa Barba, c Gianmichele Arrighetti, c Luca Lutterotti, d Salvatore Iannotta, b Fabio Cicoira e and Clara Santato* a a Département de génie physique, École Polytechnique de Montréal, CP 6079, Succursale Centre-Ville, Montréal, Québec H3C 3A7 (Canada); Tel: 514 340-4711 # 2586; E-mail: [email protected] b IMEM-CNR, Parco Area delle Scienze 37/A, 43100 Parma (Italy) c Institut of Crystallography, CNR, Strada Statale 14, Basovizza, Km 163,5 in AREA Science Park, 34149 Basovizza, Trieste, Italy d Dipartimento di Ingegneria dei Materiali, Università di Trento Via Mesiano, 77, 38123 Trento (Italy); E-mail: [email protected] e Département de génie chimique, École Polytechnique de Montréal, CP 6079, Succursale Centre-Ville, Montréal, Québec H3C 3A7 (Canada) Electronic Supplementary Material (ESI) for Journal of Materials Chemistry C This journal is © The Royal Society of Chemistry 2012

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Page 1: Supporting Information - Royal Society of Chemistry · Supporting Information On the correlation between gate dielectric, film growth, and charge transport in organic thin film transistors:

1

Supporting Information

On the correlation between gate dielectric, film growth, and charge transport in organic

thin film transistors: the case of vacuum-sublimed tetracene thin films

Julia Wünsche, a

Giuseppe Tarabella, b

Simone Bertolazzi, a

Maimouna Bocoum, a

Nicola Coppedè,

b Luisa Barba,

c Gianmichele Arrighetti,

c Luca Lutterotti,

d Salvatore Iannotta,

b

Fabio Cicoirae and Clara Santato*

a

a Département de génie physique, École Polytechnique de Montréal, CP 6079, Succursale Centre-Ville, Montréal, Québec H3C 3A7 (Canada); Tel: 514 340-4711 # 2586; E-mail: [email protected]

b IMEM-CNR, Parco Area delle Scienze 37/A, 43100 Parma (Italy)

c Institut of Crystallography, CNR, Strada Statale 14, Basovizza, Km 163,5 in AREA Science Park, 34149

Basovizza, Trieste, Italy

d Dipartimento di Ingegneria dei Materiali, Università di Trento Via Mesiano, 77, 38123 Trento (Italy); E-mail:

[email protected]

e Département de génie chimique, École Polytechnique de Montréal, CP 6079, Succursale Centre-Ville,

Montréal, Québec H3C 3A7 (Canada)

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2012

Page 2: Supporting Information - Royal Society of Chemistry · Supporting Information On the correlation between gate dielectric, film growth, and charge transport in organic thin film transistors:

2

Figure S1. Surface inclination for 3 µm 3 µm regions of 35 nm thick tetracene films on polystyrene

(PS), parylene C (PARY C), polymethylmethacrylate (PMMA), hexamethyldisilanzane (HMDS) and

untreated SiO2. Please note the different color scales. The plots were obtained by taking the first

derivative of the corresponding Atomic Force Microscopy height images. Tetracene films on HMDS

have the flattest island surface followed by PS, while the surface of tetracene islands is the most

curved on PARY C.

PS PARY C

PMMA HMDS

SiO2

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2012

Page 3: Supporting Information - Royal Society of Chemistry · Supporting Information On the correlation between gate dielectric, film growth, and charge transport in organic thin film transistors:

3

Figure S2. Fluorescence Microscopy images of 17 nm thick tetracene films deposited on the different

dielectric layers. The images were obtained on a Zeiss Axio Imager.M1 fluorescence microscope. The

insets show the corresponding Atomic Force Microscopy (AFM) images. While tetracene films on PS,

PARY C, and PMMA have reached full substrate coverage at 17 nm nominal thickness, the black

regions on the fluorescence images for tetracene on HMDS and SiO2 reveal the existence of voids

down to the substrate. We associate the bright spots on the fluorescence images to the higher islands,

visible on the AFM images.

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2012

Page 4: Supporting Information - Royal Society of Chemistry · Supporting Information On the correlation between gate dielectric, film growth, and charge transport in organic thin film transistors:

4

PS PARY C

PMMA HMDS

SiO2

Figure S3. Reconstructed pole figures for the (001) crystallographic plane of 50 nm thick tetracene

films deposited on different dielectric layers. The reconstruction is based on the Orientation

Distribution Function calculated in the extended Rietveld refinement. The center of the pole figure

corresponds to the sample normal. Tetracene grains on PS, HMDS, and SiO2 are aligned along the

sample normal. In contrast, most grains on PMMA and PARY C are aligned under a certain angle to

the sample normal. Tetracene films on PMMA and PARY C thus have an inclined texture.

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2012

Page 5: Supporting Information - Royal Society of Chemistry · Supporting Information On the correlation between gate dielectric, film growth, and charge transport in organic thin film transistors:

5

PMMA HMDS

Figure S4. Transfer characteristics at saturation for tetracene OTFTs with PMMA and HMDS (VDS = -

60 V). The linear fit of √| | vs VGS is used to extract the hole mobility and the threshold voltage.

OTFT geometry: W = 4 mm and L = 100 µm.

PMMA HMDS

Figure S5. Output characteristics (drain-source current, IDS, versus drain-source voltage, VDS) at

different gate-source voltages, VGS, for tetracene OTFT with PMMA and HMDS. Channel length

L=100 μm and channel width W = 4 mm.

0 -20 -40 -6010-11

10-10

10-9

10-8

10-7

10-6

10-5

10-4

VGS

[V]

0

3x10-3

6x10-3

|I

DS|

[A1/2

]

|I D

S| [A

]

0 -20 -40 -6010-11

10-10

10-9

10-8

10-7

10-6

10-5

10-4

|I

DS|

[A1/2

]

VGS

[V]

|I D

S| [A

]

0

3x10-3

6x10-3

0 -10 -20 -30 -40 -50 -60

0

-2x10-6

-4x10-6

-6x10-6

VGS

= -30 V

ID

S [A

]

VDS

[V]

VGS

= -60 V

VGS

= -45 V

0 -10 -20 -30 -40 -50 -600

-2x10-6

-4x10-6

VGS

= -30 V

ID

S [A

]

VDS

[V]

VGS

= -60 V

VGS

= -45 V

Electronic Supplementary Material (ESI) for Journal of Materials Chemistry CThis journal is © The Royal Society of Chemistry 2012