introduction to thin film technology · pdf filelot chair of surface and materials technology...

LOT Chair of Surfaceand MaterialsTechnology

Introduction to Thin Film Technology

Introduction to Thin Film TechnologyIntroduction to Thin Film Technology

Verfahrenstechnik Verfahrenstechnik der der

OberflächenmodifikationenOberflächenmodifikationen

Prof. Dr. Xin JiangProf. Dr. Xin Jiang

LectureLectureInstitut für Werkstofftechnik der UniInstitut für Werkstofftechnik der Uni--SiegenSiegen

Sommersemester 2007Sommersemester 2007

Prof. Dr. X. Jiang, 23.06.2008


Introduction to Thin Film Technology FACHBEREICHMASCHINENBAU

Institut für Mechanik

Institut für Energietechnik

Institut für Mechanikund Regelungstechnik

- Mechatronik

Institut für Fertigungstechnik

Institut für Systemtechnik

Institut für Fluid-und Thermodynamik

Institut für Systemtechnik

y

Institut für Werkstofftechnik

Institut für Konstruktion




Institut für WerkstofftechnikInstitut für WerkstofftechnikInstitut für WerkstofftechnikInstitut für Werkstofftechnik

Lehrstuhl für Lehrstuhl fürLehrstuhl für Materialkunde undWerkstoffprüfung

Lehrstuhl fürOberflächen- und

Werkstofftechnologie

Prof. Dr.-Ing. H.-J. Christ Prof. Dr. rer. nat. X. Jiang




Forschungsschwerpunkte des LOTS hi ht tS hi ht tSuperharte SchichtenF kti hi htF kti hi ht

SchichtsystemeSchichtsysteme

FunktionsschichtenFunktionsschichtenKompositschichtenKompositschichten

NanomaterialienNanomaterialienKohlenstoffbasierte NanostrukturenKohlenstoffbasierte NanostrukturenNanokompositeNanokomposite

NanomaterialienNanomaterialien

a o o pos tea o o pos teGalvanische NanostrukturenGalvanische Nanostrukturen

WerkstoffanalytikWerkstoffanalytikStrukturuntersuchungenStrukturuntersuchungenBestimmung von Material/SystemeigenschaftenBestimmung von Material/Systemeigenschaften

WerkstoffanalytikWerkstoffanalytik




Stil der VorlesungStil der Vorlesung

- Skript: Kopie der Folien (Internet)Vorlesung mit PP Präsentation überwiegend auf Englisch- Vorlesung mit PP-Präsentation, überwiegend auf Englisch

--PrüfungPrüfung (mündlich)Zeit nd Ra m erden ereinbartZeit und Raum werden vereinbart




Contents

1. Introduction and Application Examples (2h)2. Vacuum Technique (1h)

2.1 Kinetics of Gases2 2 Transport and Pumping of Gases2.2 Transport and Pumping of Gases2.3 Pumping Systems

Preparation of Thin Films by PVD (Physical Vapor Deposition) (10h)2.2 Evaporation (3h)2 1 1 Thermal Evaporation2.1.1 Thermal Evaporation 2.1.2 Evaporation of alloy and compound films2.1.3 Reactive Evaporation2.1.4 Activated Reactive Evaporation2 1 5 Other modern Evaporation Techniques2.1.5 Other modern Evaporation Techniques

2.3 Sputtering (4h)2.2.1 Physical Principals of the Processes2.2.2 Further Processes in Film Growth by Sputtering2 2 3 Sputtering of Alloys2.2.3 Sputtering of Alloys2.2.4 Reactive Sputtering2.2.5 Technical Setups of Sputtering

2.4 Production of Thin Films by Ions and ionized Clusters (0,5h)2 5 Characteristic Data of the Particles and their Influences on the Growth of the thin films (1 5h)2.5 Characteristic Data of the Particles and their Influences on the Growth of the thin films (1,5h)

3 Preparation of Thin Films by CVD (Chemical Vapor Deposition) (4h)3.1 Conventional CVD Processes3.2 Plasma-Assisted CVD

Plasma Decomposition (a-C:H a-Si:H)


Plasma Decomposition (a C:H, a Si:H)Microwave-Plasma-Assisted Diamond Deposition

4 Important Film Systems (2h)



Literatures

1. M. Ohring, "The materials science of thin films" (Academic Press 1992).(Academic Press 1992).

2. R. Kern et al., „Basic Mechanisms in the early stages of epitaxy“ in Current Topics in Materials Science, vol 3, series Editor E. Kaldis, p.153-410.

3. 17. IFF-Ferienkurs „Dünne Schichten“, März 1986.

4. H. K. Pulker, Coatings on Glass, Thin Films Science and Technology, 6, Elsevier 1984.

5 K R i h l d X Ji Thi S lid Fil 191 91 126 5. K. Reichelt and X. Jiang, Thin Solid Films 191, 91-126 (1990).




Definition

•• How is the “Thin Film” defined? How is the “Thin Film” defined? How is the Thin Film defined? How is the Thin Film defined?

Whi h t i i l d d i th Whi h t i i l d d i th •• Which topics are included in the Which topics are included in the “Surface Technology”?“Surface Technology”?




The cleavage of a crystal:The cleavage of a crystal:creation of new surfaces

B k f th b d• Break of the bonds• Reconstruction of the surface atom


Section perpendicular to the line of cleavage



Surface reconstruction

The real crystal has broken (unoccupied) bonds on its surface which may lead

Surface reconstruction

to the surface reconstruction. (100) Si surface before reconstruction (rotated 4x4x2 and 6x6x2 lattices). White and blue balls show two FCC sublattices of Si. 2x1 reconstruction of (100) Si surface (RGBW colored and 6x6x2 lattices).




Real surface topography of metalsReal surface topography of metals

(V) Contamination layer (IV) Adsorption layer(III) Reaction layer

(II) Deformations layer

(I) Volume ( )




Scientific areas

Å to nm ► surface physics/chemistry/technique

nm to µm ► physics/chemistry/technique of thin films

Bulk material ► solid state physics/chemistry/technique

Bulk properties dominited




l f l iDevelopment of electronics1 00

1 0-2

1 0

V akuumelekt ron ik

1 0-4

1 0Fest körpere lekt ron ik

Mikroe lekt ron ik

1 0-6

Mikroe lekt ron ik

In t egrie rt eMikroe lekt ron ik

1 0-8

1 0-1 0

1 9 2 0 1 9 4 0 1 9 6 0 1 9 8 0 2 0 0 0 2 0 2 0 2 0 4 0

Moleku lare Elekt ron ik


9 0 9 0 9 6 0 9 8 0 0 0 0 0 0 0 0

J ahr



Introduction to Thin Film TechnologyIntroduction to Thin Film TechnologyIntroduction to Thin Film TechnologyIntroduction to Thin Film Technology• The course provides foundations in thin film deposition; emphases

the most used techniquesthe most used techniques.

• Modern thin film technology has evolved into a sophisticated set of techniques used to increase performance and aesthetic value of many products and make new functional systems and devices.

• There are following categories of thin film deposition

•• Physical vapor deposition (PVD)Physical vapor deposition (PVD)•• Physical vapor deposition (PVD)Physical vapor deposition (PVD)•• Chemical vapor deposition (CVD)Chemical vapor deposition (CVD)•• Chemical methodsChemical methods•• Electrochemical methodsElectrochemical methods

• Combinations of these methods gives a large number of deposition


Combinations of these methods gives a large number of deposition techniques with unique impact on the thin film formation.



Thin Films and DepositionThin Films and DepositionThin Films and DepositionThin Films and Deposition

Thin filmsThin films• Monolayer - several micrometers• Thin film properties may be different from those of bulkThin film properties may be different from those of bulk • Quantum confinement effect: quantum and size surface/area ratio

effects– quantum dots

Thin Film DepositionThin Film Depositionpp•• Thin films can be deposited under nonThin films can be deposited under non--equilibrium conditionsequilibrium conditions• Solid - Melting -Vaporization- Condensation-Solidification • Vapor Reaction Condensation Solidification• Vapor - Reaction -Condensation-Solidification• Gas/vapor- Plasma- Reaction-Condensation-Solidification




Application areas of thin films and surface engineering

ElectronicsFlexible Polymer Light Emitting Displays

Optical coatingsOptical coatingsAnti-reflex films for liens systems und umbrella glass

Supra-conductive filmsSQUIDSQUIDs

Magnetic filmsStorage & reading

Environment & energy techniquelow E window glass coating

Heat prevention & corrosion resistanceTurbine blade coating

Super hard coatingsWear resistance of machine parts and tools




Thin Film ApplicationsThin Film ApplicationsVariety of tool coatings: DLC / TiC / TiN, graphitic i-C, TiAlN, etc

Thin Film ApplicationsThin Film Applications

DLC / TiC / TiN, graphitic i C, TiAlN, etc

DryCoat IncDryCoat Inc




Thin Film ApplicationsThin Film ApplicationsThin Film ApplicationsThin Film Applications




Optical functional films – Anti-reflex filmsOptical functional films – Anti-reflex films

⎛ ⎞ 2

R =n0 − n2

n0 + n2

⎛

⎝ ⎜ ⎞

⎠ ⎟

R = I fl / Ii

0 2⎝ ⎠

R = Irefl./ Iinc.n2=1,52 refraction index for glassn2 = 1,0 refraction index for vacuum> 8% light lost by reflection. The reflection will be reduced by coating a selected film (MgF ) of certain fraction index (n = 1 38) and thickness:(MgF2 ) of certain fraction index (n1 = 1,38) and thickness:

n1 = n0 • n2 t =λ


n1 n0 n2 t4




PatinorPatinor




Thin Film ApplicationsThin Film Applicationspppp




Tools coated with a-C:H filma




Fil f h h iFilms for the energy techniqueGlass

Oxide block layerOxide block layerAg layer




ResearchResearch

•• Fundamental Fundamental

•• Development of new materialsDevelopment of new materials•• Development of new materialsDevelopment of new materials•• Material behaviorMaterial behavior

•• AppliedApplied

•• Development of new products Development of new products devices and systemsdevices and systems

•• Enhancement of the product performanceEnhancement of the product performance•• Enhancement of the product performanceEnhancement of the product performance•• Increase of product value including Increase of product value including

aesthetic valueaesthetic value




Films and surface technology in Films and surface technology in the research

Quanten Hall-Effekt




Band discontinuity of the Band discontinuity of the semiconductor


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