ALD functionalization of AAO microchannel plates

May 25 2010

Anil Mane, Qing Peng, Jeff Elam

ALD Research Program, Process Technology Research Group

Energy Systems Division.

Objective: To test AAO MCPs with ALD coatings

Received 4 AAO MCPs from Synkera

Functionalized with resistive coating by ALD – Al:ZnO 20:80% (Targeted thickness = 50)– ANL Chemistry 1 (Targeted thickness = 100A)

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Items \ AAO MPC # 4482 4483 4484 4486

1) AAO MCP diameter (mm) 33 33 33 25

2) Active area (mm) 25.4 25.4 25.4 25.4

3) AAO MCP Thickness (mm) 105 120 100 90

4) Spacing between pores(mm) 1 1 1 1

5) Pore diameter(mm) 0.5 0.5 0.5 0.5

Photographs of AAO discs as received and with ALD coating

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(AAO # 4482) (AAO # 4483)

As received AAO MCP

• Stains on one side

Coated with new chemistry 1

Coated with AZO

After resistive coating

Active area

After Cr electrode at CNM(Active area pop-up)

• Stains side shows non-uniformity and different appearance

I-V plot for AAO disc (# 4484) with ALD of “new chemistry-1”

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R= 43 Gohm

0.00E+00

2.00E-09

4.00E-09

6.00E-09

8.00E-09

1.00E-08

-100 -50 0 50 100

I(A

)

V(V)

in vacuum

• Resistance is higher than expected

I-V plot for AAO disc (# 4483) with ALD of “Al:ZnO (20:80)”

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2.6 Tohm

-5.00E-10

5.00E-10

1.50E-09

2.50E-09

3.50E-09

-100 -50 0 50 100

I(A

)

V(V)

in vacuum

• Resistance is higher than expected

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Summary

• As received AAO MCPs has stains on one side• Tested two AAO MCPs with resistive coating by ALD• Resistance is higher than expected (calculation check?)

Next plan

• Need clean AAO MCPs with both side similar opening• Coating penetration depth and uniformity (SEM)• Tuning workable resistance • Thermal coefficient • Workable pair for gain testing