管理濃度管理濃度管理濃度管理濃度管管管管

理濃度理濃度理濃度理濃度管理濃度管理濃度管理濃度管理濃度

0.03(1)(

)

0.015(1)( )

5

TRGS901

0.06()0.03( )

TRK 8

(2001)

0 . 0 2 5 ( C a d m i u moxide fume(as Cd)),

0.03(Cadmium

sulphide andcadmium sulphidepigments(Respira bledust as Cd)) (MEL)

0.0051A1

Cd

0.01

0.002

1Cd

0.05

Cd

0.05mg/m3

0.50.5(MEL)1CA40.5CO.50.5ppm

7(MEL)11A1112.5

2ppm

0.3(4 )

0.6(10 )

0.2(4 )

0.6(10 )

(MEL)

0.11A1

0.1f/cc( 5 m

3:1)

1

0.15 /ml(10-3)

0.015 /ml10-4

0.03 /ml

10-3

0.003 /ml10-4

5 m3:1

2 /cm3(5

m

0.3(MEL)0.32Askin A30.032A0.30.3mg/m3

IOELV 9

(98/24/EC,2000/39/EC)

MAK 7

(2001)EH40/2001

29CFR1910.1000

(2001)TWA(2001)

(2001)

管理濃度新たな管理濃度

EU 6DFG 5

( )

HSE 4

( )

OSHA 3

( )IARC 2ACGIH 1

5C20skin,A415ppm

0.1(1)()

0.1(1)( 6)

0.05(1)( )

0.1(1)()

0.1(1)( 6)

0.05(1)( )

TRK 8

(2001)

0 . 0 2 5 ( C a d m i u moxide fume(as Cd),

0 . 03 ( C a d m i u ms ul p h i de a n dcadmiu m s ul ph i depigments (Respirabledust as Cd))

(MEL)

0 . 1(Cr03)

0.5(2 )1(

)

Chromium[ ]

compounds

A1(6 ),A4( 3

)

Cr

0.5()

0.05() 0.01(

( ) )

0 . 01 ( )0.001(

)

0.0005()

0.012( )

Pb 0.05()

61

Cr

0.5( )

0.5(3 )

0.05(6 )

0.01( 6)

Cr

0.05mg/m3

CN 2CN 55skinCN

C5( )

CN

C5 ( )

CN

5mg/m3

1.910(STEL,MEL)10skinCN C4.7(

C4.9)( )55ppm

CN 2CN 55skinCN

C5( )

CN

C5 ( )

CN

5mg/m3

Cr

0.05(6 )

0.5(2 3 )

(MEL)

0.1(Cr03) 0.5(2

) 1()

Chromium[ ]

compounds

A1(6 )A4( 3

)

Cr

0.5() 0.05(

)0.01( ( )

) 0.01( )0.001(

)

0.0005() 0.012(

)

Pb 0.05()

61

Cr

0.5( )

0.5(3 )

0.05(6 )

0.01( 6

Cr

0.05mg/m3

IOELV 9

(98/24/EC,2000/39/EC)

MAK 7

(2001)EH40/2001

29CFR1910.1000

(2001)TWA(2001)

(2001)

管理濃度新たな管理濃度

EU 6DFG 5

( )

HSE 4

( )

OSHA 3

( )IARC 2ACGIH 1

0.51

10( )

10()

C5

Mn

0.03()

0.2

Mn

0.3( )Mn 1mg/m3

2.5( ) 1()

3 ( 2 0 03 / 7 / 2 31ppm)

11skin,A10.51

1ppm(10-3)

0.1ppm(10-4)

10ppm

0.005(1)

()

0.002(1)

( )

TRK 8

(2001)

1010C205

10

5

1010ppm

0.002(MEL)0.0021A1

Be

0.0002()

0.002

2ABe 0.002Be 0.002mg/m3

1.82F

3(STEL)3

F

C3(HFC2.9)

C33ppm

11skin,A30.1ppm(

0.64mg/m3)0.64mg/m31mg/m3

0.025Hg

0.1skin,4

Hg

0.025()

0.1( )

0.025( )Hg 0.05mg/m3

IOELV 9

(98/24/EC,2000/39/EC)

MAK 7

(2001)EH40/2001

29CFR1910.1000

(2001)TWA(2001)

(2001)

管理濃度新たな管理濃度

EU 6DFG 5

( )

HSE 4

( )

OSHA 3

( )IARC 2ACGIH 1

50505010050100100ppm

100200(STEL)250100

( 250)250ppm

50100100100A410050

100100ppm

TRK 8

(2001)

400200400400200400ppm

20202550skin2025ppm

200400400200

( 400)C400400ppm

5005007501000A4500200750ppm

0.110.10.052BA3Pb

0.052B

Pb

0.1Pb 0.1mg/m3

IOELV 9

(98/24/EC,2000/39/EC)

MAK 7

(2001)EH40/2001

29CFR1910.1000

(2001)TWA(2001)

(2001)

管理濃度新たな管理濃度

EU 6DFG 5

( )

HSE 4

( )

OSHA 3

( )IARC 2ACGIH 1

10050(MEL)100skin20

C50

( )Ｃ５０25ppm

5020500skin５０( )４０50ppm

100(MEL)1002AA5５０２Ｂ２５50ppm

501002AA3２５( ) 2B50ppm

TRK 8

(2001)

0.1(MEL)1A10.01mg/m3

(As )

１3 g/m3(

10-3)

0.3 g/m3(10-)

なし

20100(MEL)1002BA4２０( ) 2B２０50ppm

100(MEL)252BA3５０( ) 2B５０100ppm

5050５０１００100ppm

100150150１５０１００150ppm

IOELV 9

(98/24/EC,2000/39/EC)

MAK 7

(2001)

EH40/200129CFR1910.1000

(2001)

TWA(2001)

(2001)

管理濃度新たな管理濃度

EU 6DFG 5

( )

HSE 4

( )

OSHA 3

( )

IARC 2ACGIH 1

TRK 8

(2001)

2Askin,A2C0.1ppmなし

IOELV 9

(98/24/EC,2000/39/EC)

MAK 7

(2001)

EH40/200129CFR1910.1000

(2001)

TWA(2001)

(2001)

管理濃度新たな管理濃度

EU 6DFG 5

( )

HSE 4

( )

OSHA 3

( )

IARC 2ACGIH 1

結晶質シリカ0.05 mg/m3

粉じん3 mg/m3

遊離けい酸含有率10％以上の粉じんM = 2.9/(0.22Q+1)

M:許容濃度mg/m3

Q:遊離けい酸含有率(%)

ACGIHTLV(2003)

日本産業衛生学会許容濃度(2002)

0.05

3.0

5.0

0.5

5 50

1.0

0.1

10 1001