Vacuum Symposium is now in its 7th year (VS 7).

Although Vacuum Symposium UK is an independent body, we are grateful for the continued support from the IOP, BVC and our Industrial Sponsors. Over the last 7 years the aim of Vacuum Symposium UK has been exactly the same model as the RGA User Group Meetings, but embraces a wider cross-section of vacuum users: regular ‘free to attend’ meetings that allow interaction between academics, industrial users and manufacturers.

Vacuum Symposium continues to provide a series of Technical meetings, Poster Sessions, Vacuum Training and this year we are proud to be presenting the 2nd Harry Leck Memorial Medal.

We continue to grow our Technical Meetings through the support of Meeting Organisers who provide a full day of oral presentations covering various topics/applications. These presentations are delivered by leading scientists, invited speakers and users with practical and extensive knowledge. Our Training Courses, given by trainers chosen by the Vacuum Symposium Committee, are well attended, with all participants receiving a certificate of attendance.

The Poster Session has grown alongside our Technical Meetings. A Vacuum Poster Prize is awarded each day and is open to all attendees and exhibitors.

I would like to take this opportunity to welcome you all to VS 7 and to thank all the Sponsors and supporters of Vacuum Symposium. I also feel it is appropriate to thank all on the Vacuum Symposium Committee for their hard work and support over the year. I take great pleasure in working with them and seeing our shared vision going from strength to strength.

Vacuum Symposium - ChairmanRobin Hathaway

COMMITTEE

Robin Hathaway (SS Scientific Limited) - Chairman

Joe Herbert (ASTeC, STFC Daresbury Laboratory)

Sunil Patel (RAL, STFC)

Mark Pendleton (ASTeC, STFC Daresbury Laboratory)

Steve Shannon (SS Scientific Limited)

Sue Waller (ASTeC, STFC Daresbury Laboratory)

Vacuum Quality in Vacuum Process Engineering Lounge One North, Ricoh Arena Wednesday 12th October 2016 Meeting Agenda 1000 – 1010 Introduction. Dr Alan Webb 1010 – 1050 Vacuum Quality at Diamond; Examples of Why it

Matters. Dr Hugo Sheirs, Diamond

1050 – 1130 Semiconductor Etching – Quality Rather than Quantity. Dr Alan Webb, Consultant

1130 – 1210 Ion Beam Processing – the Role of Vacuum Quality. Dr David Pearson, Oxford Instruments 1210 – 1300 Extending the Limits of Detection into the PPT Range

with a QMS. Jonathan Leslie, Mass Spectrometry Solutions, MKS Instruments

1300 – 1305 Close – Posters and Exhibition.

Cryopumping Explained… “It’s a trap” Lounge One South, Ricoh Arena Wednesday 12th October 2016 Meeting Agenda 1000 – 1005 Introduction Richard Frost 1005 – 1045 How a Cryopump Works.

Dr Tamirisa Apparoa, Sumitomo (SHI) Cryogenics 1045 – 1105 Cryopumping in the Semiconductor Industry. Tony Garcia, SPTS Technologies Ltd 1105 – 1130 To be confirmed 1130 – 1205 ITER Cryogenic Pumping Systems for the Torus

Vacuum Vessel. Dr Matthias Dremel, ITER

1205 – 1210 Close – Posters and Exhibition

Functional Thin Films Lounge One North, Ricoh Arena Thursday 13th October 2016 Meeting Agenda 0830 – 0855 Registration and Coffee in the Atrium. 0855 – 0900 Welcome and Opening Remarks. Dr Mark Baker, University of Surrey 0900 – 0930 Session 1: Memristor Functionalities of Multiferroic Tunnel

Junctions. Prof. Marin Alexe, University of Warwick

0930 – 1000 Enhancing Thermochromic Thin Film Materials Through the Application of Multi-layered Structures. Michael Powell, UCL

1000 – 1030 Atomic Layer Deposition of Gate Dielectrics for Allium Nitrade Based Powder Electronics. Prof. Paul Chalker, University of Liverpool

1030 – 1050 Tea/Coffee Break. 1050 – 1120 Session 2: Emerging CVD Technology for Functional

Chalcogenide Materials. Dr Kevin Hung, University of Cambridge

1120 – 1150 Acoustic Resonator Gravimetric Sensors Based on Thin Film Materials. Prof. Andrew Flewitt, University of Cambridge

1150 –1250 Lunch Break. 1250 –1350 Poster Session in the Exhibition Hall. A Poster prize will be awarded at 1330 for best poster 1350 – 1420 Session 3: Sustainable Manufacturing of Functional Materials. Prof. Claire Carmalt, UCL 1420 – 1450 Modifying Surfaces with Cold Atmospheric Pressure

Plasmas. Dr Erik Wagenaars, University of York

1450 – 1500 Tea/Coffee Break.

1500 – 1530 Nano-engineering Ill-nitride Semiconductors for Light Emitting Diodes. Dr Philip Shields, University of Bath 1530 – 1600 Roll to Roll Vacuum Coating onto Fibres, Fabrics,

Non-Woven of Foams for Medical or Smart Clothing. Dr Charles Bishop, C.A Bishop Consulting Ltd

1600 – 1605 Closing Remarks.

Poster Sessions Wednesday 12th and Thursday 13th October 2016 Main Exhibition Area Poster sessions will take place on both days of VS7. Everyone attending this year’s event is invited to present a poster which may be on work related to any of this year’s meeting topics or any aspect of vacuum in general. This year the Vacuum Symposium Poster Prizes (£100 and certificate on both days) will be sponsored by the IOP Vacuum Group and Leybold.

Posters will be judged on the basis of scientific content, effectiveness of communication and overall appearance.

Poster prizes will be awarded in the main exhibition area at the following times: Day 1 – 4.30pm Day 2 – 1.30pm

Harry Leck Memorial Medal

Each year the organising committee of Vacuum Symposium UK seeks nominations for the Harry Leck Memorial Medal. The Medal is awarded for distinguished contributions to British scientific research and/or related scientific/technical communities, in the field of Vacuum Science and Technology. The medal has been established to honour the memory of Professor John Henry Leck, known to his friends as ‘Harry’. The Second Medal will be awarded in the Exhibition Hall on Wednesday 12th October 2016 at VS7.

Harry epitomised the ideals of Vacuum Symposium. His warm, friendly personality made vacuum accessible for everyone he met. We all gained knowledge and understanding from Harry at just the right level with him instinctively knowing the individual or audience he was addressing. This great, understated person reveals his background in an interesting interview (recorded 1991) that can be found on the AVS Science and Technology website providing a wonderful insight into the humour and knowledge of the man.

Training Courses

Wednesday 12th and Thursday 13th October 2016

Vacuum is a central commodity in the technology for manufacturing a host of products which are now part of everyday living, such as microelectronic and optoelectronic devices, TV screens, photovoltaic panels and pharmaceuticals, as well as in scientific research. Producing and maintaining a vacuum and knowing its properties therefore concerns a large number of people who work in these areas. Although these activities span a wide field there is a relatively small body of basic underlying knowledge that is common to all of them. This is an opportunity to attend a Vacuum Training Course at very low cost. VTC1 & VTC2 are aimed at newcomers to the field, or anyone wishing to brush-up on their knowledge, whereas VTC3 will address ultra-high vacuum in more detail. VTC5 is a specialist course on "The Design and Fabrication of UHV Chambers". Please note that places on this course are limited These courses are aimed at newcomers to the field, those who wish to refresh their knowledge, and those who wish to go further into UHV practicalities. They will be appropriate for new graduate students in physics, chemistry and engineering for whom vacuum techniques will be a working tool. After attending any of these courses participants should be able to analyse the behaviour of their own vacuum systems with increased understanding, and have the basis for evaluating the effectiveness of proposed designs. The material is presented in an informal/tutorial style with an effort to address participants’ needs. A copy of the Training Slides on a CD + a Certificate of Attendance will be provided. The trainers hand these out after the course. Delegates may choose to attend one course, two, or perhaps three; it is not possible to attend all due to overlap.

Vacuum Quality in Vacuum Process Engineering Lounge One North, Ricoh Arena Wednesday 12th October 2016 Meeting Agenda 1000 – 1010 Welcome and Introduction 1010– 1050 Vacuum Quality at Diamond 1050 – 1130 Semiconductor Etching 1130 – 1210 Lion Beam Processing 1210 – 1300 Extending the Limits of Detection 1300 – 1305 Close – Posters and Exhibition The vacuum environment is required for varied processes; these may include the study of specific particles or removal of unwanted species before admitting those that are required for study or use. The residual gases still present in the vacuum achieved may not always be regarded as important, but they can have a detrimental effect on the proceeding process. Before processing, by simply pumping to base pressure thereby achieving ultimate quantity, may not be sufficient, as what is in the residual gas, the quality, is really what is important. This meeting addresses these issues for very large-scale environments to the smaller scale process chambers for plasma processing.

Vacuum quality at Diamond; Examples of Why it Matters

Hugo Shiers Diamond Light Source Ltd.

Diamond is a “third generation” synchrotron radiation facility at the Rutherford Appleton Laboratory in Oxfordshire. It is supplying ultra-violet and X-ray beams of exceptional brightness to 30 pioneering beamlines carrying out novel experiments which probe deep into the basic structure of matter and materials. The facility comprises of a 3 GeV electron storage ring, injected from a 100 MeV Linac through a full energy booster synchrotron.

Beamline experiments will often rely on clean UHV conditions to produce clear data. Conversely poor vacuums will degrade experimental data. This talk will present some examples of beamline experiments at Diamond where vacuum quality is critical.

III-V Semiconductor Etching - Process Quality Rather than Quantity

Alan Webb Consultant

Dry process techniques are fundamental in being able to produce the desired architectures required for todays and future semiconductor devices. Economic considerations dictate large device densities on wafers, implying smaller and smaller chips. As device sizes shrink, the need to work in cleaner conditions becomes more apparent.

What is meant by cleaner conditions and to what level of cleanliness?

A process route from an as grown wafer to completed device chips, involves many process steps, which means the wafers are transported in and out of process equipment a considerable number of times. Many of these steps involve dry processes with reactive gases, be they material deposition or material removal.

Before admittance of these gases, ambient atmosphere – air, will be removed from the chamber, but to what level of vacuum and what residual gas remains?

Examples of III-V semiconductor etching will be described showing how important the identification of the residuals, rather than the level of vacuum is to producing the desired process requirements.

This reasoning can be extended to other dry processes, that, it is the quality of vacuum rather than the quantity that matters!

Ion Beam Processing – The Role of Vacuum Quality

Dr David I. C. Pearson

Oxford Instruments Plasma Technology

One of the many advantages of ion beam processing (sputter deposition, etching, surface treatment) is the fact that it operates at low processing pressures relative to other techniques (magnetron sputtering, RIE/ICP etch, etc.). However, as a result, many ion beam processes can be more or less sensitive to the initial background vacuum conditions (residual gases, etc.).

In this presentation, we consider general chamber preparation for ion beam processing, then look at some specific examples of both IB etch and IB deposition applications being used on some of OIPT’s customer systems. In particular, we consider the levels of vacuum that are needed or appropriate for various applications and the potential consequences of poor vacuum quality.

Exdending the Limits of Detection into the PPT Range with a QMS Jonathna Leslie IMass Sprectrometry Solutions, MKS Instruments Abstract unavailable at time of print.

Cryopumping Explained…”It’s a Trap” Lounge One South, Ricoh Arena Wednesday 12th October 2016 Meeting Agenda 1000 – 1005 Welcome and Introduction 1005– 1045 How a Cryopump works 1045 – 1105 Cryopumping in the Semiconductor Industry 1105 – 1130 To be confirmed 1130 – 1205 ITER Cryopumping Systems - Torus Vacuum Vessel 1205 – 1210 Close – Posters and Exhibition Application experts in cryopumping, two international and two from the UK, will present an overview of how a cryopump works and some diverse applications. This half-day meeting will be of interest to newcomers to cryopump technology, as well as experienced users. Delegates will learn how a cryopump works including an explanation of the Gifford McMahon cooling cycle and understand key features of cryopumping like UHV compatibility, high water pumping speeds and dry pumping. An overview of applications will be presented including Semiconductor, Industrial Coating, UHV, MBE, Space Simulation (large volumes) and R&D Laboratories. There are three application specific presentations that demonstrate how cryopumps are employed to benefit Forensic Science, the ITER Tokomak for fusion power, and the semiconductor industry.

How a Cryopump Works Dr Tamirisa Apporoa Sumitomo (SHI) Cryogenics Beginning with a brief introduction of the principles of basic vacuum, the presentation will highlight the different mechanisms of cryopumping. The key parameters influencing the performance of the cryopump will be highlighted. Details of closed loop refrigeration system employing Gifford-McMahon cycle for cryopumps will be presented. The presentation will discuss the two different designs of GM cryocoolers viz. mechanically and pneumatically driven. Examples of cryopump systems with multiple cryopumps operating on single and multiple compressors for different applications will be presented highlighting the current trend of lower power requirements to operate the system.

Cryopumping in the Semiconductor Industry Tony Garcia SPTS Technologies Ltd SPTS Is part of the Orbotech group and manufacturers wafer fabrication equipment to the semiconductor manufacturing industry. Our talk will explain the high volume production required by the Semiconductor industry and why cryopumps are well suited to the PVD application.

How Cryopumps Help to Catch the Bad Guy James Price West Technology Systems Ltd Abstract unavailable at time of print.

ITER Cryogenic Pumping System for the Torus Vacuum Vessel

Dr Matthias Dremel ITER

ITER is a large-scale scientific experiment that aims to demonstrate that it is possible to produce commercial energy from fusion of hydrogen isotopes. These gases are fuelled into the large 1330 m3 torus vacuum chamber where the plasma is produced. To pump the gases from the Torus, six large cryogenic pumps are integrated in the vacuum vessel, each having a diameter of 1.6 m and a custom designed 800 mm diameter inlet valve achieving a helium pumping speed of 60 m3/s. The pumps are cryogenic adsorption pumps using charcoal, cooled to a temperature of 4.6K.

Each of the Torus Cryopumps has a charcoal coated surface of 11 m2 to pump the hydrogen isotopes and helium from the plasma. To achieve plasma operations up to one hour, the six Torus Cryopumps need to be operated in a staggered mode to limit the hydrogen inventory within them. To do that, each cryopump has its own casing and valve assembly to isolate an individual pump from the plasma. While the valve is closed, the plasma operation can continue as the accumulated gases are released by heating the charcoal coated surfaces to 100K followed by roughing the gas to the ITER fuel cycle system.

The talk will give an overview of the main ITER vacuum systems and introduce the cryopump system of the plasma in the Torus vacuum vessel. The manufacturing status of the first Torus Cryopump will be presented.

Functional Thin Films Lounge North, Ricoh Arena Thursday 13th October 2016 Meeting Agenda 0855 – 0900 Welcome and Introduction 0900 – 1030 Session 1 1030 – 1050 Tea/Coffee Break and Exhibition 1050 – 1250 Session 2 1150 – 1350 Lunch Break and Poster Session 1350 – 1600 Session 3 This one -day meeting will bring together scientists and technologists with expertise in the design, development, characterisation and production of functional thin film materials and integrated devices for a broad spectrum of scientific and industrial applications. The aim being to share knowledge, ideas and experiences. The meeting comprises a programme of invited speakers, oral presentations and a poster session (which will be combined with other meetings for added interest). The programme will allow time for delegates to network with others and to visit the exhibition.

Memristor Functionalities of Multiferroic Tunnel Junctions Marin Alexe, Department of Physics, University of Warwick The paradigm of the future computing needs to be changed in order increase our ability to process massive amount of data. The present von-Neumann computer architecture, wherein data shuttles between storage and processing units, must be replaced with a more efficient brain-inspired, cognitive computing. This transition, which happens nowadays, is largely a trial & error process. One of the main tasks in achieving cognitive computing is developing of novel materials and devices to support data storage and processing in the same unit.

In analogy to the resistor, inductor, and capacitor the memristor (memory resistor) is the passive circuit element, which was until recently considered to be “the missing circuit element”. Memristance, the memristor’s main characteristic, which has the dimension of a resistance, should be tunable and history-dependent. Almost 40 years after the theoretical description, memristive behaviour was firstly demonstrated in nanoscale systems possessing ionic transport properties.

We show here programmable memristor properties of ferroelectric tunnel junctions (FTJ). These are simple capacitor devices in which ultrathin ferroelectric films are sandwiched between metal electrodes. Memristor properties are resulting from the combination between two genuine electronic effects, i.e. ferroelectric switching and direct tunnelling. We will also show that the resistance of a ferroelectric tunnel junction is indeed tunable, history-dependent and each memory state is fully programmable.

Enhancing Thermochromic Thin Film Materials Through the Application of Multi-layered Structures

Michael Powell UCL

Monoclinic vanadium (IV) oxide (VO2) has received much attention for applications as intelligent solar control coatings, with the potential to reduce the need for both heating and air conditioning loads within building infrastructure. However, thin films of VO2 suffer from poor adhesion and are chemically susceptible to attack. In addition, the VO2 films with optimum solar modulation are unfortunately translucent, restraining their commercial use in energy-efficient fenestration. In this talk, a multi-layered approach from an atmospheric-pressure chemical vapour deposition technique will be discussed. The VO2/SiO2/TiO2 thin films were designed to exhibit excellent solar modulation properties as well as high transparency and resistance to abrasion, compared to single VO2 films of the same thickness. The advantages of using modelling to determine the effect of the individual components on the properties of the overall material will also be discussed.

Atomic layer deposition of gate dielectrics for gallium nitride based power electronics Paul Chalker

School of Engineering, University of Liverpool

We experience power electronics in our everyday lives, for example, from improving the battery life of mobile phones to maximising the efficiency of engine management systems in automobiles. New material systems, such as gallium nitride are being developed as promising semiconductors in power electronic devices, due to their high critical breakdown field and high switching speeds. However new semiconductors require new functional thin film dielectrics to make insulated gate transistors. We shall consider how atomic layer deposition is being exploited to manufacture advanced gate dielectrics and how the thin film deposition processes can be used to tune the device performance.

Emerging CVD Technology for Functional Chalcogenide Materials Kevin Chung-Che Huang*, Ghadah A. Alzaidy, Nikolaos Aspiotis, Qingsong Cui, Ed Weatherby, Chris Craig, Katrina Morgan, Ioannis Zeimpekis and Daniel W. Hewak Optoelectronics Research Centre, University of Southampton Chalcogenide materials, formed from metallic alloys of S, Se, and Te, have received considerable attention for applications in optoelectronic devices over the past two decades in part due to their unique properties such as high infrared transparency, strong photosensitivity, large nonlinearity, capability of high rare-earth doping, and ability to readily change phase. Thin amorphous chalcogenide films are of particular interest because their diverse active properties are easily exploited in integrated planar optical circuits, as well as for memory and other optoelectronic applications. More recently, transition metal dichalcogenides (TMDCs), two-dimensional (2D) layered materials, such as MoS2, MoSe2, WS2, and WSe2 have become a noteworthy complimentary material to field. Sharing many of the properties of graphene they also offer properties that are unattainable in 2D graphene including a tunable bandgap; easily modified through both composition and the number of layers. This has led to use of TMDCs in applications such as transistors, photodetectors, electroluminescent and bio-sensing devices. In this talk we describe our development of functional chalcogenide materials by the chemical vapour deposition technology and discuss their potential applications.

Acoustic Resonator Gravimetric Sensors based on Thin Film Materials A. J. Flewitt, G. Rughoobur, M. de Miguel Ramos, I. Miele, L. Garcia-Gancedo, W. I. Milne Electrical Engineering Division, Cambridge University

T. Mirea, M. Clement, J. Olivares, J. Sangrador, B. Díaz-Dúran, E. Iborra GMME-CEMDATIC-ETSI de Telecomunicacíon, Universidad Politécnica de Madrid The advent of the smartphone and their use of accelerometer chips to detect motion has meant that MicroElectroMechanical Systems (MEMS) has become a mainstream technology. There is particular interest in the application of MEMS sensors to point-of-care medical diagnostics. The Film Bulk Acoustic Resonator (FBAR) is MEMS a gravimetric sensor which can be used to detect masses attached to a surface as small as 1 fg. How the FBAR is engineered so that it can address the healthcare market is described. Both control of the microstructure of the piezoelectric thin film material (which is the most important single element) and the design of the device so that it can address healthcare applications will be explained with data showing both gas sensing and the detection of anitgens.

Sustainable Manufacturing of Functional Materials Professor Claire J. Carmalt University College London Current research involves developing processes towards sustainable and inexpensive high quality transparent conducting oxide (TCO) films on float glass. In particular replacement materials for Indium Tin Oxide (ITO) are being developed. These materials are used in low-e window coatings (>£5B pa), computers, phones and photovoltaic devices. Indium is listed as a critical element- available in limited amounts often in unstable geopolitical areas. Tin metal has had the biggest rise in price of any metal consecutively in the last four years (valued at >£30K per ton) and indium is seen as one of the most difficult to source elements. We have been developing sustainable upscaled routes to TCO materials from precursors containing earth abundant elements (titanium, aluminium, zinc) with equivalent or better figures of merit to existing TCOs. Our method uses Aerosol assisted chemical vapour deposition to develop large scale coatings.

Modifying Surfaces with Cold Atmospheric Pressure Plasmas

Dr Erik Wagenaars, University of York

Over the last decade, cold atmospheric-pressure plasmas have been developed that are capable of modifying sensitive surfaces such as plastics, integrated circuits and even living tissue. Despite the success of these methods in several applications, there is still a lack of understanding of the underpinning science, hindering their efficient optimisation. I will discuss two case studies using atmospheric-pressure plasma devices operated in helium with oxygen admixtures; one on the increase of wettability of polypropylene films and another on the removal of photoresist. Both studies achieve commercially competitive performance, however the focus of the study is on understanding the plasma physics at play in these devices by combining several experimental diagnostic and modelling techniques, including Fourier Transform Infrared (FTIR) absorption and Two-Photon Absorption Laser Induced Fluorescence (TALIF). These studies highlight the importance of neutral radicals, especially atomic oxygen, for the observed surface modifications.

VS7 Posters Number Title Author(s)

1 Surface Activation of Rigid and Flexible Substrates for Thin Film Photovoltaics using Atmospheric Pressure Plasma

Fabiana Lisco

2 Thermally Assisted Desorption Atmospheric Pressure Chemical Ionisation Characterisation and Optimisation using Segmented Ion Detector and Mass Spectrometric Analysis

Barry Smith

3 A Novel Plasma Driven Microbubble Reactor Alexander Wright

4 Microbubble-enhanced plasma-driven advanced oxidation processes for wastewater treatment

J. Ren, A. Wright, A. Shaw, H. Bandulasena, G. Shama and F. Iza

5 Degradation of hydrophobic coatings deposited via atmospheric plasma jet on glass substrates

K. Isbilir, B. Maniscalco, F. Lisco, A. Shaw, A. Wright, J.M. Walls, F. Iza

6 Inactivation of bacteria in final sewage treatment work effluents

A. Wright, B. Uprety, M.Mach, F. Iza, G Shama, H. Bandulasena

7 DBD Plasma microbubble reactor for pretreatment of lignocellulosic biomass

Alexander Wright, Hemaka Bandulasena, Alex Shaw, Felipe Iza, David Leak

8 Characterisation of an Atm-Pressure Dielectric Barrier Discharge in Air and a Protocol for Comparing the Biocidal Properties of Plasma Devices

Alex Shaw, Paolo Seri, Carlo A. Borghi, Gilbert Shama, Felipe Iza

9 Reaching beyond the surface in plasma treatments A.H. Shaw, G. Shama, F. Iza

10 Chemical fluorescent probes for the characterisation of atmospheric-pressure plasmas

A. Wright, C. Castelló-Beltrán, B.R. Buckley, H. Bandulasena, Felipe Iza

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