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Applied Surface Science at AVS Symposia: 30+ Years of Progress

Cedric Powell

National Institute of Standards and Technology, Gaithersburg, Maryland 20899-8370

1. Introduction

I present an historical overview of events that led to the formation of the AVS Applied Surface

Science Division (ASSD) and comment on some of the major changes that have occurred over the

past 45 years. This summary is based on a talk I gave during the ASSD/ASTM E-42 Evening

Workshop as part of the ASSD’s 30th anniversary program at the 2015 AVS International

Symposium in San Jose, CA. Regular ASSD sessions at the 2015 Symposium highlighted the 30th

anniversary with invited speakers that celebrated historical milestones while also addressing

current characterization challenges.

While the ASSD was officially formed in 1985, the roots of the present ASSD go back to around

1970, shortly after the introduction of commercial instruments for surface analysis. Presentations

at the AVS National Symposia on surface science and what we now call applied surface science

often (but not always) occurred in sessions organized by the AVS Surface Science Division

(SSD) which was formed in 1968 (https://www.avs.org/About/History and

http://www2.avs.org/historybook/links/ssdhist.htm). I will focus on the early history of ASSD

topics at AVS National Symposia between 1970 and 1986 before making some observations on

the changes that occurred during this period.

2. Early History

Information on the technical programs of AVS National Symposia can be found in the Journal of

Vacuum Science and Technology (JVST). For the Symposia held between 1970 and 1974, JVST

published “Proceedings” in the January/February issues of the Journal following the Symposia

held in the fall of the previous years. In those early years, submission of an abstract or an extended

abstract for publication in JVST was often required before an abstract could be accepted for

presentation at the fall Symposium. For the Symposia held between 1975 and 1986, the

introductory pages of the September/October issues of JVST contained the preliminary programs

of the fall National Symposia.

I have examined the technical programs of AVS National Symposia held between 1970 and 1986

to highlight presentations on ASSD topics, to identify some of the speakers who either were

prominent scientists at the time or who became prominent in the AVS or ASSD, and to illustrate

trends in Symposium topics between 1970 and 1986. For papers with two or more authors, I have

chosen, for simplicity, to identify only the first-named author. I have also chosen to list only a

single presentation by a particular speaker. Many of the scientists identified below made multiple

presentations at AVS Symposia over many years, and in some cases over decades.

It is worth noting that AVS National Symposia in the 1970s were much smaller meetings than the

International Symposia of recent years. The National Symposia then generally lasted 3 ½ days,

and ran from Tuesday morning to Friday noon of the meeting week. At that time, there were only

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four AVS Divisions (Surface Science, Thin Films, Vacuum Metallurgy, and Vacuum Science and

Technology).

(a) 1970-1974

Table 1 shows selected presentations on ASSD topics at the AVS National Symposia held between

1970 and 1974. The example titles show presentations on a wide range of topics involving the use

of different techniques to characterize a variety of important materials. Auger-electron

spectroscopy (AES), however, was the most prominent technique in use at that time, particularly

in conjunction with ion sputtering for the characterization of thin-film samples. Other

characterization techniques in use at the time included x-ray photoelectron spectroscopy (XPS)

which was often then referred to as electron spectroscopy for surface analysis (ESCA), atom-probe

field ion microscopy, ion scattering spectroscopy (ISS), secondary-ion mass spectrometry (SIMS),

glow discharge optical emission spectroscopy (GDOES), and nuclear methods such as Rutherford

backscattering spectroscopy (RBS). The various techniques were applied to various types of

problems such as detection of surface contaminants, surface segregation, adhesion, catalysis,

surface photovoltage, and determination of composition versus depth in thin-film systems. Finally,

the sample presentations indicate advances in techniques, better understanding of chemical effects

on AES spectra, and observations of artifacts in ion sputtering.

(b) 1975-1978

Table 2 shows selected presentations on ASSD topics that were generally included in SSD sessions

of AVS National Symposia held between 1975 and 1978. These examples, like those in Table 1,

illustrate the use of multiple techniques to a variety of problems. In retrospect, it may seem

surprising that there were relatively few XPS presentations at AVS meetings in the early- and mid-

1970s. XPS was in common use at that time but its practitioners were perhaps slow to contribute

at AVS Symposia. It is noteworthy that Charles (Chuck) Wagner, one of the early pioneers of XPS

for practical applications, contributed to the 1977 AVS Symposium.

Surface science, as well as applied surface science, were regarded in the 1970s as an

interdisciplinary subject at the intersection of physics, chemistry, and materials science. It was not

obvious then that the AVS would emerge as one of the leading professional societies in this area.

Some interesting thoughts on how and why this occurred have been offered by Charlie Duke [1].

(c) 1979-1984

By 1979, there was increasing pressure of submissions on ASSD topics to SSD sessions. Some

SSD leaders believed that papers on applied topics were not as worthy as those that investigated

processes on cleaned single-crystal surfaces, and were thus of lower quality. Submitted abstracts

on ASSD topics were therefore more likely to be rejected during the summer meeting of the AVS

Program Committee or relegated to less favorable places on the program for the fall Symposium.

During the 1970s, there was considerable growth in the number of people using surface-analysis

tools such as AES, ISS, SIMS, and XPS for solving a wide variety of practical problems (as

illustrated by the presentation titles in Tables 1 and 2). While these techniques appeared to be

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relatively simple, there were few resources then available to guide users on how to acquire needed

data efficiently and reliably. The American Society for Testing and Materials, now known as

ASTM International, formed its Committee D-32 on Catalysts in 1975 and its Committee E-42 on

Surface Analysis in 1976. Both committees conducted round robins [2-4] to help determine the

degree of consistency of AES and XPS measurements of energies and intensities. At that time, the

ASTM E-42 Committee on Surface Analysis held one of its semi-annual meetings on the Monday

of the AVS National Symposium week that was often attended by ~75 people. These were

generally AVS members who contributed papers on ASSD topics in SSD sessions of the National

Symposium. This group lobbied the AVS to establish two ASTM E-42/AVS sessions in the 1979

AVS meeting program. Similar sessions were held in following years through 1984.

Table 3 shows selected presentations that were included in the ASTM E-42/AVS sessions at AVS

National Symposia between 1979 and 1984. There were two such sessions in the programs of the

AVS meetings in 1979, 1980, 1981, and 1982 but four sessions in 1983 and six sessions in 1984.

As for the topics shown in Tables 1 and 2, multiple techniques were utilized for a diverse array of

materials problems. Newer techniques (at least for surface applications) included surface-enhanced

Raman spectroscopy, neutron depth profiling, and sputtered neutral mass spectrometry (SNMS).

There was a greater focus on the derivation of chemical information, quantitative applications, and

possible artifacts.

(d) Formation of the AVS Applied Surface Science Division in 1985

In 1984, the six ASTM E-42/AVS sessions were a prominent part of the AVS National

Symposium. Questions were then raised as to why an apparently external group (the ASTM E-42

Committee) should organize a portion of the Symposium program and why this group should

receive AVS support (e.g., for meeting space and financial support for invited speakers). In reality,

the ASTM E-42/AVS sessions at AVS Symposia were organized by AVS members (many of

whom were also ASTM members) to provide a forum for the presentation and discussion of results

of interest to these members, as indicated by the presentations listed in Table 3. Nevertheless, it

was clear then that the ASTM E-42/AVS session designations were inappropriate and did not

adequately describe the scope and purpose of these sessions.

I was asked by the AVS Board of Directors in early 1985 to chair a small committee to examine

options for the future. The ASTM E-42/AVS group of AVS members had clearly been acting like

an AVS Division, and the committee recommended the formation of the AVS Applied Surface

Science Division. This recommendation was accepted by the AVS Board of Directors which

appointed an interim Executive Committee to prepare Division Bylaws and to organize ASSD

technical sessions at the National Symposia in 1985 and 1986.

(e) 1985 and 1986

Table 4 lists selected presentations that were included in the ASSD sessions of AVS National

Symposia in 1985 and 1986. There were six ASSD sessions in 1985 and eight ASSD sessions in

1986, continuing the growth and interest in ASSD topics from 1982 to 1984 (Table 3). As in earlier

years, the presentations in Table 4 involved a number of techniques that included nonresonant

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multiphoton ionization and electron energy-loss spectroscopy (EELS) as well as a variety of

applications.

3. Observations

By 1985, it was well established that surface and interface properties were crucial for the

fabrication and satisfactory performance of a wide range of materials. This trend has continued

with the development of many advanced materials (e.g., ceramics, composites, alloys, polymers,

superconductors, diamond-like thin films, biomaterials, and nanomaterials), semiconductor

devices, optoelectronic materials, magnetic-storage media, sensors, thin films, and coatings. Then,

as now, surface-analysis methods such as AES, SIMS, and XPS were utilized, often in combination

with other characterization methods. Surface-analysis instruments were often fitted with auxiliary

chambers for sample fabrication and processing. Sputter depth profiling was commonly required

to determine composition profiles. Technique improvement and quantification were central themes

of ASSD sessions at AVS National Symposia. While surface-analysis methods were often used in

papers presented in sessions of other AVS Divisions, ASSD sessions were generally the focus for

papers on technique improvement and quantification.

Figure 1 shows a photograph of a Physical Electronics Model 550 XPS system that was marketed

between 1977 and 1980 [5]. This photograph illustrates the typical appearance of a surface-

analysis instrument in the 1970s. There were many knobs on the front panels of the electronics

units to control instrumental functions and spectra were recorded on X-Y recorders. In contrast,

instruments marketed in the 1980s and later years had computers with digital control of

instrumental functions and software to assist instrumental setup and processing of recorded

spectra. It is also interesting to note that there were an additional seven companies marketing XPS

instruments in the USA during the 1970s: AEI (now Kratos), DuPont, Hewlett Packard, Leybold-

Heraeus (now Omicron), McPherson, Vacuum Generators (now Thermo Scientific), and Varian.

Tables 1 to 4 list over 100 scientists who presented talks on ASSD topics at AVS National

Symposia between 1970 and 1986. Many of these scientists were frequent contributors to AVS

Symposia over many years and some became AVS and ASSD officers. It is nevertheless

disappointing and disturbing to recognize now that almost all of the listed scientists were white

males. Fortunately, female scientists are now much more prominent at AVS Symposia and the

ASSD’s 30th anniversary program featured several notable female scientists as invited speakers,

but there is still a need for increased diversity. In a recent development, the National Science

Foundation recently launched a new INCLUDES initiative to foster the creation of a more diverse

scientific and technical community [6].

During 2014, Kathryn Lloyd as ASSD Chair conducted a survey of previous ASSD chairs to

identify major trends since the formation of the ASSD in 1985. Her survey helped guide

preparation of the ASSD program for the 2015 AVS International Symposium in San Jose during

which the 30th anniversary of the formation of ASSD was celebrated. This survey identified the

following major changes:

• Computer control of instruments and analysis of large data sets

• Wide diversity of specimen materials

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• Growing complexity of sample morphologies and shrinking of device dimensions

• Improved methods for specimen preparation, handling, and treatments

• Novel and improved instrumentation (X-ray monochromators, electron energy analyzers,

detectors, ion sources, time-of-flight mass analyzers, spatial resolution)

• Improved methods of charge control

• Improved methods for thin-film analysis (sputtering, angle-resolved XPS, high-energy XPS)

• Improved software for instrument setup, data acquisition, and data analysis

• Improved reliability of analyses (resulting from instrumental calibrations, stability checks,

improved procedures, physical data, information on specimen morphology, documentary

standards from the ASTM E-42 Committee and from Technical Committee 201 on Surface

Chemical Analysis of the International Organization for Standardization, quantifications)

• Imaging of chemical/molecular species (laterally and as a function of depth)

• “Ambient-pressure” XPS, ambient mass spectrometry

• Nanoscience and nanotechnology (including nano-bio)

Figure 2 shows the numbers of published AES, SIMS, and XPS papers published per year from

1991 through 2015 based on a Web of Science search using their acronyms and key phrases. Two

sets of AES publication data are included in Fig. 2: one based on the use of ‘AES’ in the search

and the other without this term. The former data set is an overcount (because AES is also an

abbreviation for atomic emission spectroscopy), while the latter data set is an undercount (since

some Auger papers with AES in the title or abstract would be missed). Nevertheless, it appears

from Fig. 2 that the number of Auger papers published per year is roughly constant or slowly

decreasing while the corresponding number of SIMS papers is increasing. Figure 2 clearly

indicates that there has been a much larger growth in the number of XPS publications per year than

for AES or SIMS. The publication plots in Fig. 2 cannot, of course, represent the many unpublished

practical applications of each technique (e.g., from industrial laboratories) or the economic impacts

of these applications. Nevertheless, Fig. 2 shows that XPS and its applications are of growing

significance and are a major component of the growth in surface analysis.

After the establishment of the ASSD by the AVS in 1985, I proposed the formation of a similar

Applied Surface Science Division by the International Union of Vacuum Science, Technique, and

Applications (IUVSTA) in 1986. At that time, there were increased submissions on ASSD topics

in the sessions organized by the IUVSTA Surface Science Division for the triennial International

Vacuum Congresses (IVCs). I was able to point out that AVS had successfully formed its ASSD

in 1985 in response to growth on applied surface science topics, and that a similar ASSD for

IUVSTA would be similarly helpful. There was one argument against my proposal (that other

IUVSTA Divisions might be similarly bifurcated), but the proposal was accepted formally in 1986

at the IVC in Baltimore. The IUVSTA ASSD [7] has also been successful.

4. Summary

Although the ASSD was officially formed in 1985, papers on ASSD topics were presented at AVS

Symposia as early as 1970. The AVS ASSD has been successful in providing a forum for research

and education in the preparation, characterization, modification, and utilization of surfaces and

interfaces in practical applications [8].

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Acknowledgments

The author appreciates useful comments and suggestions from Don Baer, Dick Brundle, John

Grant, and Kathy Lloyd.

March 31, 2016

References

1. C. B. Duke, “The birth and evolution of surface science: Child of the union of science and

technology,” Proc. Nat. Acad. Sciences 100, 3858 (2003); doi: 10.1073.pnas.0730358100.

2. T. E. Madey, C. D. Wagner, and A. Joshi, “Surface characterization of catalysts using

electron spectroscopies – Results of a round-robin sponsored by ASTM Committee D-32 on

Catalysts,” J. Electron Spectrosc. Relat. Phenom. 10, 359 (1977); doi: 10.1016/0368-

2048(77)85033-0.

3. C. J. Powell, N. E. Erickson, and T. E. Madey, “Results of a joint Auger/ESCA round robin

sponsored by ASTM Committee E-42 on Surface Analysis. Part I. ESCA results,” J. Electron

Spectrosc. Relat. Phenom. 17, 361 (1979); doi: 10.1016/0368-2048(79)80001-8.

4. C. J. Powell, N. E. Erickson, and T. E. Madey, “Results of a joint Auger/ESCA round robin

sponsored by ASTM Committee E-42 on Surface Analysis. Part II. Auger results,” J.

Electron Spectrosc. Relat. Phenom. 25, 87 (1982); doi: 10.1016/0368-2048(82)85010-X.

5. Courtesy of John Moulder and John Hammond of Physical Electronics, Inc.

6. J. Mervis, Science 351, 1017 (2016).

7. http://iuvsta-us.org/iuvsta2/index.php?id=17.

8. http://www.avs.org/Divisions/assd.

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Table 1. Selected presentations on ASSD topics at AVS National Symposia that were held

between 1970 and 1974.

______________________________________________________________________________

(a) Examples of 1970 presentations

G. K. Wehner Cone Formation on Metal Targets during Sputtering

M. L. Tarng Alloy Sputtering Studies with in situ Auger Electron Spectroscopy

E. W. Müller Atom-Probe Field Ion Microscopy

W. M. Mularie Deconvolution techniques in Auger Electron Spectroscopy

(b) Examples of 1971 presentations

W. S. Lassiter Detection of Contaminants on Polycrystalline Silver by Auger Electron

Spectroscopy and Work Function Measurements

G. J. Dooley Surface Segregation Studies in Alloys using Auger Electron Spectroscopy

P. W. Palmberg Use of Auger Electron Spectroscopy and Inert Gas Sputtering for

Obtaining Chemical Profiles

R. C. Sundahl Relationship between Substrate Surface Chemistry and Adhesion of Thin

Films

(c) Examples of 1972 presentations

E. N. Sickafus Auger Line Shape Comparison of N and S in Two Different Chemical

Environments

J. R. Arthur The Use of Scanning Auger Microscopy in Molecular Beam Epitaxy of

GaAs and GaP

J. F. Ziegler Thin Film Characterization by Nuclear Microanalysis

N. C. MacDonald High Spatial Resolution, Auger Electron Spectroscopy

J. E. Rowe High-Energy Fine Structure in the Auger Spectra of Silicon and Silicon

Carbide

J. M. Morabito In-Depth Profiles by Auger Spectroscopy and Secondary Ion Emission

(d) Examples of 1973 presentations

L. A. Harris Miscellaneous Topics in Auger Electron Spectroscopy

J. T. Grant Quantitative Comparison of Ti and TiO Surfaces using Auger Electron and

Soft X-ray Appearance Potential Spectroscopies

C. R. Brundle The Application of Electron Spectroscopy to Surface Studies

C. J. Powell Attenuation Lengths of Low-Energy Electrons in Solids

T. E. Fischer Catalysis and Surfaces

T. M. Buck Ion Scattering for Analysis of Surfaces and Surface Layers

(e) Examples of 1974 presentations

L. J. Brillson Surface Photovoltage and Auger Spectroscopy Studies of )0211( CdS

Surface

D. F. Stein Applications of Auger Spectroscopy to Materials Research

R. Z. Bachrach Photoelectron Spectroscopy by Time-of-Flight Technique using

Synchrotron Radiation

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M. P. Hooker Chemical Effects in the M4,5NN Auger Spectrum of Mo(100) due to

Adsorption of O2 and CO

W. Heiland Surface Analytical Studies using Ion Scattering Spectrometry, Auger

Electron Spectroscopy, and Secondary Ion Mass Spectrometry

J. E. Greene Glow Discharge Optical Spectroscopy as an Analytical Depth Profiling

Technique

D. J. Pocker High-Spatial Resolution Auger Spectroscopy and Auger Integration

Applications

J. S. Solomon Digitizing Auger Data – A Threefold Approach to Enhance Analytical

Capabilities

D. M. Holloway Applications of Depth Profiling by Auger/Sputter Techniques

J. W. Coburn Composition Profiling – A Comparison of Surface Analysis Techniques vs

Methods Involving the Detection of Sputtered Species

______________________________________________________________________________

Table 2. Selected presentations on ASSD topics that were generally included in the Surface

Science Division sessions of AVS National Symposia held between 1975 and 1978.

______________________________________________________________________________

(a) Examples of 1975 presentations

L. A. West Relative Sputtering Yields and Quantitative Surface Analysis by Auger

Spectroscopy

A. van Oostrom Application of AES to the Study of Selective Sputtering of Thin Films

T. W. Rusch Energy Dependence of Scattered Ion Intensities in ISS

A. C. Miller Redeposition of Sputtered Species during Ion Etching of Copper, Silver,

and Gold

A. W. Czanderna Depth Profiles of Gold Overlayers on Silver Films

Y. E. Strausser Auger Electron Spectroscopy Characterization of Oxidized Films of Mg,

Al, and Si

W. E. Spicer Photoelectron Studies of Surface and Interface States on III-V

Semiconductors

R. Ludeke Low-Energy Electron Loss Spectroscopy on Polar and Nonpolar Faces of

GaAs

(b) Examples of 1976 presentations

P. H. Holloway Factors in Quantitative Auger Electron Spectroscopy

H. F. Dylla Surface Analysis Measurements in the Princeton Large Torus

J. A. Panitz Deuterium Depth Profiles in Metals using Imaging Field Desorption

T. L. Barr ESCA Studies of Naturally Passivated Foils

W. E. O’Grady Electrode Surface Studies by LEED/Auger

P. S. Ho Auger Study of Preferred Sputtering on Ag-Au Alloy Surfaces

R. L. Gerlach Semiquantitative Analysis of Alloys with SIMS

P. M. Hall Relative Sensitivity Factors for Quantitative Auger Analysis of Binary

Alloys

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(c) Examples of 1977 presentations

C. D. Wagner X-ray Photoelectron Spectroscopy with X-Ray Photons of Higher Energy

A. Benninghoven Quasi-Simultaneous SIMS, AES, and XPS Investigations of the Oxidation

of Ti, Mo, and Co in the Monolayer Range

C. J. McMahon Interfacial Segregation of Impurities in Steels and its Effect on Mechanical

Behavior

J. M. Burkstrand Electron Spectroscopic Study of Oxygen-Plasma-Treated Polymer Surfaces

(d) Examples of 1978 presentations

H. G. Tompkins Preferential Sputtering in Gold-Nickel and Gold-Copper Alloys

B. J. Garrison Ejection of Molecular Clusters from Ion Bombarded Surfaces

T. J. Chuang An XPS Study of the Chemical Changes in Oxide and hydroxide Surfaces

Induces by Ar+ Bombardment

R. J. Colton Static SIMS of Amino Acid Overlayers

F. Ohuchi Effect of Electron Beam on Glass Surface Analysis by AES

R. R. Olson Study of Composition Changes under Ion Bombardment in the Scanning

Auger Microprobe

______________________________________________________________________________

Table 3. Selected presentations on ASSD topics that were included in the ASTM E-42/AVS

sessions of AVS National Symposia held between 1979 and 1984.

(a) Examples of 1979 presentations (2 sessions)

M. P. Seah Chemistry of Solid-Solid Interfaces: A Review of the Characterization,

Theory, and Relevance

M. T. Thomas Sulfur and Oxygen Chemistry at Free Surfaces and Grain Boundaries

D. W. Hoffman Analytic Correction of Edge Effects in Ion-Beam Sputtered Depth Profiles

L. L. Kasmerski Electrical and Compositional Properties of Grain Boundaries in Multigrained

Silicon using Surface Analysis Techniques

R. P. Van Duyne Surface-Enhanced Raman Spectroscopy

A. T. Hubbard Electrochemistry of Well-Defined Surfaces

(b) Examples of 1980 presentations (2 sessions)

H. H. Madden Chemical Information from Auger Electron Spectroscopy

D. F. Mitchell Quantitative Auger Analysis (in Conjunction with Ion Sputtering) of Iron

Oxides

R. C. McCune Chemical Effects in Ion Scattering Spectroscopy

N. S. McIntyre Chemical Information from XPS

D. R. Baer Chemistry of Corrosion Layers on Amorphous FeCrNiPb Alloys

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(c) Examples of 1981 presentations (2 sessions)

A. J. Bevolo Auger and Electron Loss Studies of the Oxidation of Solid and Liquid Tin

J. Lumsden Properties of Passive Films on Metals

G. C. Nelson Surface Composition of a Tin-Lead Alloy

C. R. Helms A Review of Surface Spectroscopies for Semiconductor Characterization

P. Sheldon Evaluation of ITO-MBE-GaAs Solar cells

(d) Examples of 1982 presentations (2 sessions)

J. M. Poate Interfacial Analysis of Semiconductor Structures

J. E. Houston Auger Lineshape Study of Carbon Species on Rh and Ni Surfaces

J. E. Castle Simultaneous Electron and X-ray Analysis and its Application in Corrosion

Science

(e) Examples of 1983 presentations (4 sessions)

H. W. Werner Beam techniques for the Analysis of Non-Conducting Materials

W. L. Baun Surface Preparation and Corrosion of Aluminum and Titanium Alloys

D. Briggs Surface and Interface Characterization in the Investigation of Materials

Problems involving Polymers

G. D. Davis Use of XPS Surface Behavior Diagrams to Study Hydration inhibition of

Aluminum Oxide Surfaces

J. A. Taylor An XPS Study of the Oxidation of Lead

R. P. Frankenthal Effect of Sputter Ion Mass and Energy on the Surface of Two Tin-lead Alloys

D. E. Ramaker Understanding Localized Behavior in the Auger Spectra of Covalent Systems

such as Graphite

(f) Examples of 1984 presentations (6 sessions)

R. L. Opila Role of Grain Boundaries in the Surface Segregation of Tin in Tin-Lead

Alloys

M. L. Yu Origin of Oxidation-Induced Enhancement of Si+ Sputter Yield in SIMS

W. F. Egelhoff Determination of the heat of Chemisorption of H and O on CuNi Alloy

Surfaces from Core-Level Binding Energy Shifts

W. Vandervorst High-Resolution SIMS and Neutron Depth Profiling of B through Oxide-

Silicon Interfaces

P. Staib Microspot Elemental and Chemical Analysis using Combined High

Resolution AES and XPS

M. Koenig Monochromator versus Deconvolution for XPS Studies using a Kratos ES300

System

K. Wittmaack Optimization Criteria in SIMS Depth Profiling

B. L. Doyle High Energy Microbeam Analysis of Fusion Reactor Components

H. Oechsner High Resolution Sputter Depth Profiling of Implantation Structures in Si by

Low Energy SNMS

J. Fine Characterization of NBS Standard Reference Material 2135 for Sputter Depth

Profile Analysis

______________________________________________________________________________

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Table 4. Selected presentations that were included in the ASSD sessions of AVS National

Symposia held in 1985 and 1986.

(a) Examples of 1985 presentations (six sessions)

N. H. Turner Multi-Component Quantitative Analysis by Auger-Electron Spectroscopy

R. R. Rye Chemical Effects in Materials Studies using Auger Analysis

A. J. Nelson Auger Analysis of Si-H Bonding and Hydrogen Concentration in

Hydrogenated Amorphous Silicon

S. W. Gaarenstroom Characterization of Cam Lobe and Valve Lifter Antiwear Films by a

High-Resolution Auger Microprobe

I. L. Singer Characterization of Surface Modified Materials

J. W. Rogers, Jr. Thermal Diffusion of Oxygen in Titanium and Titanium Oxide Films

(b) Examples of 1986 presentations (eight sessions)

C. A. Evans Characterization of Semiconductor Materials and Devices

W. F. Stickle Investigation of the Chemistry of the Dielectric/FeCoTb Interface by

XPS and AES

R. J. Baird High temperature Oxidation of Pd15Rh in Air: XPS and Raman Results

C. H. Becker On the Use of Nonresonant Multiphoton Ionization of Desorbed Species

for Surface Analysis

Y. Sakai Observation of Auger Electron Channeling Pattern and New technique

Eliminating Crystal orientation Dependency in Quantitative Auger

Electron Spectroscopy

D. E. Peebles Passivation of Metals in Thionyl-Chloride Electrolytes for Lithium

Batteries

N. A. Burnham EELS Study of Hydrogenated Amorphous Silicon

A. Zalar Superposition of Depth Profiles Obtained on Samples with Different

Roughnesses

S. Tougaard Inelastic Background Removal in XPS

J. Ferrante Applications of Surface Science in Tribology

E. Taglauer Surface Analysis in Fusion Devices

B. D. Sartwell In Situ Characterization of the Effect of Residual Gases and Temperature

on the Properties of Iron Implanted with Transition Metal Ions

______________________________________________________________________________

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Fig. 1. Photograph of a Physical Electronics Model 550 XPS system [5].

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0

2000

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1990 1995 2000 2005 2010 2015

Num

be

r o

f P

ublic

atio

ns/Y

ear

Year

XPS

Auger (with 'AES' in search)

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SIMS

Fig. 2. Plot of numbers of papers published per year on AES, SIMS, and XPS from 1991 through

2015 based on a Web of Science search using acronyms and key phrases for these techniques.