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Enhanced Photoreactivity of Riboflavin in Aqueous Solution in the Presence of Macromolecules
Enhanced Photoreactivity of Riboflavin in Aqueous Solution in the Presence of Macromolecules
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No relevance to Parkinson's
No relevance to Parkinson's
213 views
High-throughput kinase profiling as a platform for drug discovery
High-throughput kinase profiling as a platform for drug discovery
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Uniform Quantizers: Optimization and Universal Curves
Uniform Quantizers: Optimization and Universal Curves
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Ensemble-Averaged Shack–Hartmann Wave-Front Sensing for Imaging Through Turbid Media
Ensemble-Averaged Shack–Hartmann Wave-Front Sensing for Imaging Through Turbid Media
212 views
Verification of Point-Spread-Function-Based Modeling of an Extreme-Ultraviolet Photoresist
Verification of Point-Spread-Function-Based Modeling of an Extreme-Ultraviolet Photoresist
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Relevance of Mask-Roughness-Induced Printed Line-Edge Roughness in Recent and Future Extreme-Ultraviolet Lithography Tests
Relevance of Mask-Roughness-Induced Printed Line-Edge Roughness in Recent and Future Extreme-Ultraviolet Lithography Tests
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Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography
Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography
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Sensitivity study of two high-throughput resolution metrics for photoresists
Sensitivity study of two high-throughput resolution metrics for photoresists
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Tilt sensitivity of the two-grating interferometer
Tilt sensitivity of the two-grating interferometer
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Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
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Hartmann wave-front measurement at 13.4 nm with λ_EUV/120 accuracy
Hartmann wave-front measurement at 13.4 nm with λ_EUV/120 accuracy
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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Contamination concerns at the intermediate
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Contamination concerns at the intermediate
214 views
Recombinant Human Bone Morphogenetic Protein-2 Binding and Incorporation in PLGA Microsphere Delivery Systems
Recombinant Human Bone Morphogenetic Protein-2 Binding and Incorporation in PLGA Microsphere Delivery Systems
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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Overlay progress in EUV lithography towards
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Overlay progress in EUV lithography towards
262 views
SPIE Proceedings [SPIE SPIE Eco-Photonics - Strasbourg, France (Monday 28 March 2011)] SPIE Eco-Photonics 2011: Sustainable Design, Manufacturing, and Engineering Workforce Education
SPIE Proceedings [SPIE SPIE Eco-Photonics - Strasbourg, France (Monday 28 March 2011)] SPIE Eco-Photonics 2011: Sustainable Design, Manufacturing, and Engineering Workforce Education
216 views
The Evaluation of Lyophilized Polymer Matrices for Administering Recombinant Human Bone Morphogenetic Protein-2
The Evaluation of Lyophilized Polymer Matrices for Administering Recombinant Human Bone Morphogenetic Protein-2
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Electrophilic substitution in indoles. Part 12. Kinetic studies of the rearrangement of 3,3-disubstituted indolenines to 2,3-disubstituted indoles
Electrophilic substitution in indoles. Part 12. Kinetic studies of the rearrangement of 3,3-disubstituted indolenines to 2,3-disubstituted indoles
218 views
Combined Surgical Dislocation and Proximal Femoral Osteotomy for Correction of SCFE-Induced Femoroacetabular Impingement
Combined Surgical Dislocation and Proximal Femoral Osteotomy for Correction of SCFE-Induced Femoroacetabular Impingement
215 views
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Experimental verification of EUV
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Experimental verification of EUV
213 views