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Optical performance of 5.5 sr LPP multilayer collectors
© Fraunhofer IOF
Solutions with light – meet challenges and offer opportunities
Optical performance of 5.5 sr LPP multilayer collectors
Optical performance of 5.5 sr LPP multilayer collectors
2011 International Symposium on EUV Lithography
Torsten Feigl, Hagen Pauer, Marco Perske, Sergiy Yulin,
Marcus Trost, Sven Schröder, Angela Duparré, Norbert Kaiser,
Andreas Tünnermann
Fraunhofer IOF
Angewandte Optik und Feinmechanik Jena, Germany
Miami, October 18, 2011
Optical performance of 5.5 sr LPP multilayer collectors
Contents
Introduction
Characterization of LPP collector substrates
Multilayer coating of LPP collectors
Summary and acknowledgement
Optical performance of 5.5 sr LPP multilayer collectors
Contents
Introduction
Characterization of LPP collector substrates
Multilayer coating of LPP collectors
Summary and acknowledgement
Optical performance of 5.5 sr LPP multilayer collectors
Coating and characterization of LPP collector optics
[Nature Photonics 4, 24-26 (2010)]
Optical performance of 5.5 sr LPP multilayer collectors
LPP collector coating challenges
R > 65 %
l = (13.5 ± 0.03) nm
Dd = 0.015 nm = 15 pm
Diameter: > 660 mm
Lens sag: > 150 mm
Tilt: > 45 deg
Weight: > 40 kg
Optical performance of 5.5 sr LPP multilayer collectors
LPP collector coating challenges
R > 65 %
l = (13.5 ± 0.03) nm
Dd = 0.015 nm = 15 pm
Diameter: > 660 mm
Lens sag: > 150 mm
Tilt: > 45 deg
Weight: > 40 kg
± 15 pm
> 660 mm
+ 25 %
Optical performance of 5.5 sr LPP multilayer collectors
Contents
Introduction
Characterization of LPP collector substrates
Multilayer coating of LPP collectors
Summary and acknowledgement
Optical performance of 5.5 sr LPP multilayer collectors
Surface characterization of EUV collector substrates
No reliable roughness
data available so far:
- complex geometry
- roughness < 0.2 nm
Development of new
surface characterization
based on light scattering
Light scattering:
- fast
- non-contact
- comprehensive
- high sensitivity
Optical performance of 5.5 sr LPP multilayer collectors
Surface characterization of EUV collector substrates
Measurement of ARS
Determination of PSD function
Calculation of roughness (442 nm)
Estimation of HSFR roughness
Optical performance of 5.5 sr LPP multilayer collectors
Measurement of ARS and determination of PSD function
0.01 0.1 1 10 10010-1100101102103104105106107108109
1010101110121013
PS
D (
nm
4)
s ( ° )
i = 0°
i = 45°
HSFR
0.01 0.1 1 10 10010-1100101102103104105106107108109
1010101110121013
PS
D (
nm
4)
s ( ° )
i = 0°
i = 45°
0.01 0.1 1 10 10010-1100101102103104105106107108109
1010101110121013
PS
D (
nm
4)
s ( ° )
i = 0°
i = 45°
-80 -60 -40 -20 0 20 40 6010-8
10-7
10-6
10-5
10-4
10-3
10-2
10-1
100
101
102
103
AR
S (
sr-1
)
s ( ° )
i = 0°
i = 45°
Optical performance of 5.5 sr LPP multilayer collectors
est.
HS
FR
(n
m)
sample 1 sample 2
0.7
0.5
0.3
0.1
0.6
0.4
0.2
0.1 1 10 10010
-1
101
103
105
107
PS
D(n
m4)
f (µm-1
)
position 1
position 2
extrapolation
HSFR=0.14 nm
HSFR=1.07 nm
sample 1sample 2extrapolation
HSFR mapping retrieved from ARS measurements
PSD analysis
Perfect fractal behavior at smooth and rough areas
Prediction of performance at 13.5 nm based on detailed
roughness information (PSD, HSFR)
Optical performance of 5.5 sr LPP multilayer collectors
sample 1 sample 2 sample 2
pre
d.
R (
%)
me
asure
d R
(%
)
65 65
55 55
45 45
35 35
60 60
50 50
40 40
sample 1
Prediction based on roughness data obtained from scattering (before coating)
Reflectance measurements at PTB, Berlin (after coating)
Good correlation between predicted and experimental data Accuracy of average predicted reflectance: DR < 1%
Reflectance drop > 45 %
Optical performance of 5.5 sr LPP multilayer collectors
est. HSFR (nm)
0.7
0.5
0.3
0.1
0.6
0.4
0.2
j=0°
j=20°
j=60°
j=100°
j=140°
j=180°
j=220°
j=40°
j=80°
j=120°
j=160°
j=200°
j=240°
j=280°
j=300°
j=260°
j=320°
j=340°
R=305 mm
Thorough characterization of collector substrate before coating
Check for homogeneity and defects
Fast data acquisition: mapping of entire sample surface (100% characterization)
High sensitivity to roughness (average HSFR = 0.1 nm)
Optical performance of 5.5 sr LPP multilayer collectors
Contents
Introduction
Characterization of LPP collector substrates
Multilayer coating of LPP collectors
Summary and acknowledgement
Optical performance of 5.5 sr LPP multilayer collectors
NESSY – ‚New‘ EUV Sputtering System
Design and realization of an EUV sputtering system
Conception:
magnetron sputtering
of rotating and fast
spinning substrates
up to Ø 665 mm
four deposition targets
deposition of graded
multilayers on curved
substrates
Optical performance of 5.5 sr LPP multilayer collectors
Maximum reflectance along
four lines within clear
aperture of collector mirror:
R ~ 65% @ r < 240 mm
R ~ 62% @ r = 250 … 320 mm
Measurements: PTB Berlin
j = 0°
j = 90°
j = 180°
j = 270°
Reflectivity of LPP collector mirror
Optical performance of 5.5 sr LPP multilayer collectors
Center wavelength along
four lines within clear
aperture of collector mirror:
l = (13.50 ± 0.03) nm
Measurements: PTB Berlin
j = 0°
j = 90°
j = 180°
j = 270°
Reflectivity of LPP collector mirror
Optical performance of 5.5 sr LPP multilayer collectors
Measurement of reflectance
along four lines within clear
aperture of collector mirror:
108 measurement curves
Measurements: PTB Berlin
j = 0°
j = 90°
j = 180°
j = 270°
Reflectivity of LPP collector mirror
Optical performance of 5.5 sr LPP multilayer collectors
52.2 % average area-
weighed reflectance
reached at 13.5 nm
Reflectivity of LPP collector mirrors … climbing the learning curve
Optical performance of 5.5 sr LPP multilayer collectors
Contents
Introduction
Characterization of LPP collector substrates
Multilayer coating of LPP collectors
Summary and acknowledgement
Optical performance of 5.5 sr LPP multilayer collectors
Summary
Characterization of EUV collector optics:
- light scattering technique for HSFR substrate characterization
Multilayer coating of EUV collector optics:
- R > 65 % and d-spacing accuracy of Dd < 15 pm
on world’s largest EUV multilayer mirror (Ø > 660 mm)
Optical performance of 5.5 sr LPP multilayer collectors
Acknowledgements
Cymer for LPP source development: Norbert Böwering, Kevin Cumming, Bruno La Fontaine, David Brandt,
Igor Fomenkov, Alex Ershov, Kay Hoffmann and many others
PTB Berlin team for EUV reflectivity measurements: Frank Scholze, Christian Laubis, Christian Buchholz, Annett Kampe
Jana Puls, Christian Stadelhoff, Martin Biel
EUV project team @ Fraunhofer IOF: Christoph Damm, Andreas Gebhardt, Tobias Herffurth,
Christina Hüttl, Robert Jende, Thomas Müller, Viatcheslav Nesterenko,
Michael Scheler, Thomas Peschel, Stefan Risse, Sebastian Scheiding,
Christoph Schenk, Ronald Schmidt, Mark Schürmann, Uwe Zeitner
Optical performance of 5.5 sr LPP multilayer collectors Thank you!