skin care- soothing wet - tooska wet peel-off mask with... · skin care-soothing wet ... 2)...
TRANSCRIPT
covestro.com
Skin Care-
Soothing wet
peel-off mask
May 16 │ Proprietary & Confidential 1
Polyurethane film former for
peel-off mask
-
PCHI 2013 Innovation Award
• Bayer MaterialScience received an Innovative Award granted during the
PCHI 2013 trade show (Personal Care and Homecare Ingredients) in
March 13th, 2013, in Guangzhou, China, for the development of a
“Soothing wet peel-off mask” formulation containing Baycusan® C1001
• 24 products and 22 companies were granted for several categories
May 16 │ Proprietary & Confidential 2
Bayer received an innovation award
Xiaohui Xiong, Covestro Cosmetics BD APAC
(in the middle of the picture) receiving the award
“Soothing wet peel-off mask”
May 16 │ Proprietary & Confidential 3
Formulation of an innovative product concept
INCI Name %(W/W)
Acrylates/C10-30 Alkyl Acrylate Crosspolymer1) 0.40
Hydroxyethyl cellulose2) 0.40
Water 57.78
Polyurethane-34 30.00
Ethanol 5.00
Dipropylene glycol 5.00
Aminomethyl Propanol (to pH 6.0-7.0) 0.12
PEG-40 Castor Oil 0.50
Propyl Glycol (and) Diazolidinyl Urea (and)
Iodopropynyl Butylcarbamate 0.80
1) Carbopol 2) Natrosol TM 250 HHR, Ashland
• This formula represents RR 8062 and is very similar to the formula which won
the PCHI Innovation award.
“Soothing wet peel-off mask” concept
May 16 │ Proprietary & Confidential 4
Application
Test Application:
- 10 min after application, a clear film is formed
on skin,
- when applying water the film turns white again.
- the film can be easily peeled off
„Soothing wet peel-off mask”
• High wear comfort provided by a highly flexible and breathable film on skin
• Fast drying process forming a clear film on skin
• Good rub-off resistance
• Easily peeled off without any skin irritation
• Velvety smooth touch feeling of skin
• Possibility to incorporate various actives
• Facilitating longer-lasting retention of actives on the surface of skin
• Enhancing efficacy of active ingredients
May 16 │ Proprietary & Confidential 5
Key Features
Examples of face masks on the market
May 16 │ Proprietary & Confidential 6
Containing polyurethane-34
Dax Cosmetics, PO Dr. Barbor, DE
Nuriss Skincare, UK
Murad, USA
M&L, France
Face mask
with Polyurethane-34
Overnight mask
with Polyurethane-34
Overnight Mask
with Polyurethane-34
Overnight Soothing Gel
with Polyurethane-34
Night mask
with Polyurethane-34
Neo Khemikal LTd,
THAI
Fay Jardin, TW Sofnon, TW Aibi, JPN Formula 10.0.6,
US
Refining Mask
with polyurethane-34
Overnight Mask
with polyurethane-34
Peel-off Mask
with polyurethane-34
Peel-off Mask
with polyurethane-34
Skin calming mask
with polyurethane-34
Examples of face masks on the market
May 16 │ Proprietary & Confidential 7
Containing polyurethane-34
Neo Khemikal, THAI
Hanbul Cosmetics, KO LG, Korea
LG, Korea
Cosmecca, Korea
Refining Mask
with Polyurethane-32, 35
Refining Mask
with Polyurethane-32, 35
Peel off mask with
Polyurethane-34
Overnight mask
with Polyurethane-34
Overnight Mask „One Veil
Finisher with Polyurethane-34
VA’PIEU Korea VA’PIEU Korea
VA’PIEU Korea
Etude, Korea
LG, Korea
Wrapping Cream with
Polyurethane-34
Wrapping Cream with
Polyurethane-34
Wrapping Cream with
Polyurethane-34
Peel & wash off mask with
Polyurethane-34
Overnight Cream
with Polyurethane-34
covestro.com
Thank you!
May 16 8
Back-up 1
May 16 │ Proprietary & Confidential 9
RR 8062 Version for China
INCI Trade name Supplier % by wt.
Phase A Water N.a. n.a. To 100
Hydroxyethylcellulose Natrosol 250HHR Ashland 0.40
Phase B Ethanol Ethanol Local 5.00
Dipropylene glycol DPG Local 5.00
PEG-40 Hydrogenated castor Oil RH-40 Croda 0.50
Carbopol U21(2%) Carbopol U21 Carbomer 21.00
Phase C Polyurethane-35 Baycusan® C 1004 Bayer 23.50
Phase D Phenoxyethanol(and)
Ethylhexylglycerin Euxyl PE9010 Schulke&Mayr 0.80
Total 100.00
Back-up 2
• The increased amount of film former (30% of Baycusan® C 1001) used in the
formulation does significantly improve the film formation process.
• The use of Dipropylene Glycol in the formulation supports the film formation of
Baycusan® C 1001.
• The drying time of the mask is reduced.
• After applying water to the clear film the peel-off effect of the mask is
significantly improved.
May 16 │ Proprietary & Confidential 10
Main differences of RR 8062 compared to RR 8042