quantum dots continuous flow purification of …supporting information continuous flow purification...
TRANSCRIPT
Supporting Information
Continuous flow purification of nanocrystal
quantum dots
Duckjong Kim,* †, §, Hye Kyung Park†, Hyekyoung Choi†,§, Jaehong Noh†, Kyungnam Kim†,
and Sohee Jeong,* †,§
†Department of Nano Mechanics, Korea Institute of Machinery and Materials (KIMM),
Daejeon 305-343, South Korea.
§Korea University of Science and Technology (UST), 206 Gajeong-ro, Daejeon 305-350,
South Korea.
* To whom correspondence should be addressed, [email protected], [email protected]
Electronic Supplementary Material (ESI) for Nanoscale.This journal is © The Royal Society of Chemistry 2014
Microfluidic Chip Fabrication
Si wafer dry etching
Si-Si direct bonding
/ Thermal bonding
Electrode patterning
on glass wafer
Glass wafer sand
blasting
Si-glass anodic
bonding
A A’
A A’
glass
glass
Si
Si
electrode (Cr/Au)
electrode (Cr/Au)
cross-sectional view
Figure S1: Fabrication process and fabricated microfluidic chip.
QD size analysis
Before electrophoretic purification After electrophoretic purification
A B
Figure S2. TEM micrographs of the CdSe QDs before (A) and after (B) electrophoretic purification at 50 V. CdSe QDs before and after our process are 5.10±0.64 nm and
5.10±0.61 nm in diameter respectively.
The effect of the solution environment (dilution) on removal of ligands
Figure S3. ATR-FTIR spectra of CdSe QDs capped with oleate before (blue line) and after
(red line) 100 fold dilution by hexane.