particle detection system pr-pd series - horiba€¦ · types of detectors are available, as...

■Related ProductsWet Process

Along with the evolution of 65 nm and 45 nm devices, the chemical solutions conventionally used in RCA cleaning are requiring greater and greater low-concentration control. The HF-960M uses sen-sors that offer outstanding corro-sion resistance for high-precision, high-speed measurement of low concentrations of hydrofluoric acid, hydrochloric acid and ammonia, and is thus perfect for single-bath and wafer cleaning.

Wet Process Thin Film Control / Analysis

Low ConcentrationHF/HCL/NH3 MonitorHF-960M

This monitor has a 2048Ch CCD detection element that can simul-taneously measure a wide range of wavelengths (200 - 800 nm) with a minimum retrieval time of 20 msec and a maximum resolu-tion of 2 nm. The use of a pro-grammable endpoint algorithm with a broad range of application makes it possible to control end-points that cannot be detected with conventional systems. Ad-vanced analysis software is in-cluded as a standard item.

OES (Optical Emission Spectroscopy)

Etching End-point MonitorEV-140C

As part of the final process for cleaning silicon wafers, ever-stricter monitoring of the purity of the ultra-pure water used in the final rinse process is being demanded. The HE-480R has a built-in microprocessor and measures ultra-pure water at high precision during that process.

Resistivity MeterHE-480R

From the consideration of reduc-ing costs and reducing the burden on the environment through chemical-less processes, the use of ozone water is ex-pected to be more and more ef-fective. The HZ-960 measures ozone water concentrations and supports process controls. Two types of detectors are available, as sampling type and inline type, a selectable as appropriate to the equipment environment.

Dissolved Ozone MonitorHZ-960

IPA (IsoPropyl Alcohol) is widely used in the drying processes re-quired for effective wet cleaning during semiconductor manufac-turing. The IPA gas concentra-tion monitor can be combined with a mass flow controller or vaporizer, and is perfect for use in combination with a vaporizer or bubbler as a secondary gas concentration monitor.

IPA Gas ConcentrationMonitorIR-150AS

The lightweight, compact design of this monitor ensures easy in-stallation in hydrofluoric acid dilution and wafer cleaning equipment. Two sensor versions may be selected: the dipped type, added directly to the solu-tion, and the distribution type, integrated in the process piping (standard and high flow rate types).

Hydrofluoric AcidMonitorCM-200A/210AThis monitor measures in real

time the concentration of H2SO4, H2O2 and H2O in SPM solution and indicates the timing of automatic chemical spiking by an alarm. The quick response and short measuring period allow changes in concentration, while its compact design en-sures easy installation in clean-ing equipment.

SPM MonitorCS-150

This monitor measures in real time the concentration of NH3, H2O2 and H2O in SC-1 solution and indicates the timing of auto-matic chemical spiking by an alarm. The quick response and short measuring period allow changes in concentration, while its compact design ensures easy installation in cleaning equip-ment.

SC-1 MonitorCS-131

This monitor is used to calculate variations in film thickness with great precision during the depo-sition and etching processes.It detects endpoints by setting the desired film thickness. It can accommodate complex multi-layer films and helps to ensure highly stable control.

Real TimeInterferometric FilmThickness MonitorDM-1000 Series

Gas Measurement /Gas Control

The FG-100A is a highly ad-vanced FTIR gas analyzer for the analysis of PFCs and other gases in semiconductor process. It in-cludes a dedicated sampling unit for gas analysis and more than 260 gas spectral library. The FG-100A can respond to a variety of applications, such as optimization of the CVD chamber cleaning and dry-etching processes, perfor-mance checks on abatement sys-tems, and monitoring of the ambi-ent gases in clean rooms.

FTIR Gas AnalyzerFG-100A Series

PARTICLE DETECTIONSYSTEMPD Series

Semiconductor / FPD

Please read the operation manual before using this product to assure safe and proper handling of the product.

●The contents of this catalog are subject to change without prior notice, and without any subsequent liability to this company.●The color of the actual products may differ from the color pictured in this catalog due to printing limitations.● It is strictly forbidden to copy the content of this catalog in part or in full. ●All brand names, product names and service names in this catalog are trademarks or registered trademarks of their respective companies.

●HORIBA, Ltd.Head Office2 Miyanohigashi, KisshoinMinami-ku, Kyoto, JapanPhone: 81-75-313-8123Fax: 81-75-321-5725

Tokyo Sales Office1-7-8 Higashi-KandaChiyoda-ku, Tokyo, JapanPhone: 81-3-3861-8231Fax: 81-3-3861-8259

●HORIBA KOREA L t d .112-6 Sogong-DongChoong-ku, Seoul, KoreaPhone: 82-2-753-7911Fax: 82-2-756-4972

●HORIBA INSTRUMENTS INCORPORATED

Irvine Facility17671 Armstrong AvenueIrvine, CA 92614, U.S.A.Phone: 1-949-250-4811Fax: 1-949-250-0924

●HORIBA INSTRUMENTS LIMITEDKyoto CloseSummerhouse RoadMoulton Park, NorthamptonNN3 6FL, U.K.Phone: 44-1604-542600Fax: 44-1604-542696e-mail: [email protected]

●HORIBA INSTRUMENTS Pte. LTD.10 Ubi Crescent#05-11/12, Ubi TechparkSingapore 408564Phone: 65-6745-8300Fax: 65-6745-8155

●HORIBA GmbHKaplanstrasse 5A-3430 Tulln, AustriaPhone: 43-2272-65225Fax: 43-2272-65230

HORIBA CZECHIAOrganizachi slozka PrahaPetrohradska 13CZ-101 00 Praha 10, Czech RepublicPhone: 420-2-717-464-80Fax: 420-2-717-470-64

Bulletin:HRE-3676B Printed in Japan TH-H(SK)23

●HORIBA / STEC INCORPORATEDHORIBA Technology Center3265 Scott Boulevard Santa Clara, CA 95054U.S.A.Phone: 1-408-730-4772Fax: 1-408-730-8975

Austin Office9701 Dessau RoadSuite 605, AustinTexas 78754, U.S.A.Phone: 1-512-836-9560Fax: 1-512-836-8054

Grenoble OfficeBURO club Gieres, 2 Avenue de Vignate 38610 Gieres, FrancePhone: 33-4-76-63-4915Fax: 33-4-76-54-0399

Netherlands OfficeBijsterhuizen 11-58, 6546 AS Nijmegen, The NetherlandsPhone: 31-24-366-0985Fax: 31-24-366-0987

Portland Office10240, SW Nimbus Ave.Suite L-5, Portland, OR 97223, U.S.A.Phone: 1-503-624-9767Fax: 1-503-968-3236

http://www.semi.horiba.com e-mail: [email protected]

TAIWAN Representative Office3F, NO.18 Lane 676, ChungHua Rd, Chupei City,Hsinchu Hsien, 302,TaiwanPhone: 886 (3) 656-1012Fax: 886 (3) 656-8231

●HORIBA TRADING (SHANGHAI) CO., Ltd.Shanghai OfficeRoom 1701, United Plaza,1468 Nanjing Rd. West, Shanghai, 200040, ChinaPhone: 21-6289-6060Fax: 21-6289-5553

Beijing OfficeRoom 1801, Capital Tower,Beijing, Tower 1 No.6Jia, Jianguomenwai Ave., Chaoyang District, Beijing, 100022 ChinaPhone: 10-8567-9966Fax: 10-8567-9066

Leichlingen FacilityJulius-kronenberg StrasseD-42799 LeichlingenGermanyPhone: 49 (2175) 8978-0Fax: 49 (2175) 8978-50

●HORIBA EUROPE GmbHHead OfficeHans-Mess-Str.6D-61440 Oberursel/Ts.GermanyPhone: 49 (6172) 1396-0 Fax: 49 (6172) 137385

●HORIBA FRANCE12, Avenue des Tropiques91955 LES ULISFrancePhone: 33 (1) 69-29-96-23Fax: 33 (1) 69-29-95-77

HORIBA SWEDENSydhamnsvägen 55-57,SE-151 38 Södertälje, SwedenPhone: 46 (8) 550-80701Fax: 46 (8) 550-80567

●HORIBA Jobin Yvon SRL Torino OfficeEuropalaceCorso Torino 43/4510043 Orbassano,TorinoItalyPhone: 39 (011) 9040601Fax: 39 (011) 9000448

HORIBA continues contributing to the preservation of the global environment through analysis and measuring technology.

QuartzGlass Spattering

BlanksCleaning

Resist Coating

EB Process

Developing

Descum

EtchingResist

StrippingFinal

CleaningPellicleAttach

Completed

IncommingQA

ReticleStocker

Lithography

Cleaning

Mask Production ProcessLithography Process

●SC-1 MonitorCS-131

●SPM MonitorCS-150

●IPA Gas Concentration MonitorIR-150AS

●Low ConcentrationHF/HCl/NH3 MonitorHF-960M

●Dissolved Ozone MonitorHZ-960

●Resistivity MeterHE-480R

Chemical Solution Concentration Measurement●FTIR Gas Analyzer

FG-100A Series

●OES (Optical Emission Spectroscopy) Etching End-point MonitorEV-140C

●Real Time Interferometric Process MonitorDM-1000 Series

Chamber Gas Measurement Process End Point

●Hydrofluoric Acid MonitorCM-200A/210A


Chemical SolutionConcentration Measurement

Particle Inspection(Scratches and Glass Defect)

Particle Inspection (Film Defect)

Particle Inspection

●Reticle/Mask ParticleDetection SystemPR-PD2HRPR-PD2PR-PD3

●Reticle/Mask ParticleDetection System (Desktop/Embedded type)PR-PD5

Foreign Particles & HAZE

Particle Inspection



●Trace Ammonia Gas MonitorCG-1000


Particle Inspection



Particle Inspection (Scratches, etc.)



Particle Removal

●Automatic Particle BlowerRP-1

●SC-1 MonitorCS-131

●Hydrofluoric Acid MonitorCM-200A/210A

●IPA Gas Concentration MonitorIR-150AS


●Resistivity MeterHE-480R

Chemical SolutionConcentration Measurement



The HORIBA PD Series: Comprehensive Particle Detection for Semiconductor and FPD Manufacturing ProcessesHORIBA's PD Series is focused toward providing the particle detection support required for next-generation semiconductor and FPD manufacturing processes. The PD Series' great versatility, based on its outstanding detection capabilities, makes it ideal for handling mask production as well as exposure and wafer manufacturing processes. Complementing HORIBA's HAZE-resistant monitors, the PD line-up offers models specifically for leading-edge masking processes plus compact, low-cost models. In addition, the range has now been enhanced with the introduction of new particle removal systems. The PD Series truly meets the needs of current semiconductor and FPD manufacturing operations.

Particle Detection (PD Series)

Particle Removal


Support of advanced masking processes thanks to an improved S/N ratioReticle/Mask Particle Detection System

PR-PD2HR

• 0.35 µm sensitivity • Multi-stage case capability • Multi-size compatibility

The PR-PD2HR offers a three-fold improvement in the S/N ratio over the PR-PD2. This has significantly increased operational sensitivity and thus decreased false detection. In addition to the high functionality inherited from the PR-PD2, this model provides finer pattern measurement, allowing it to effectively handle advanced masking processes.

Efficient particle detection/measurement based on 0.35 µm high sensitivity and high throughputReticle/Mask Particle Detection System

PR-PD2

• 0.35 µm sensitivity • Multi-stage case capability • Multi-size compatibility

The PR-PD2 enables fine particle detection down to 0.35 μm and also boasts a multi-stage sorter plus full range of communication functions. High-throughput measurement is possible on all surfaces from basic reticle and mask to glass and pellicle.

Low running costs thanks to a compact design, plus remarkable versatilityReticle/Mask Particle Detection System

PR-PD3

• 0.5 µm sensitivity • Single stage/single size • Small footprint

The high-performance PR-PD3 offers excellent throughput, a dependable optical system, and functions that reduce false detections. These features are bundled in a compact package that is designed to minimize running costs. The PR-PD3 also demonstrates great versatility thanks to its 0.5 μm detection sensitivity.

Low-cost inspection with enhanced versatility and compactnessReticle/Mask Particle Detection System (Desktop/Embedded type)

PR-PD5

• Reticle inversion mechanism • 0.5 to 50 µm selectability• Single detection system • Built-in and combination types

As well as inheriting the PD series' high efficiency, the PR-PD5 offers outstanding cost performance thanks to its space-saving design. This model can also be integrated with reticle stockers/steppers and cleaning equipment, etc.

The first step in preventing HAZE and foreign particle generationTrace Ammonia Gas Monitor

CG-1000

• Ultra-high sensitivity of 0.1 ppb • Real-time measurement (every 5 sec.)• Straightforward operation

The CG-1000 uses the CRDS method to provide ultra-sensitive, real-time measurement of trace ammonia gas at 0.1 ppb. This model delivers excellent stability over extended periods with straightforward operation that reduces running costs. It is also highly effective in preventing hazing during the mask production and exposure processes.

Removal of particles using blow and vacuum suctionAutomatic Particle Blower

RP-1• Removal of particles from the pellicle and glass surfaces on pattern sides• Use of N2 blow and vacuum suction to prevent the escape of removed particles

1 2

NH3

NH3

NH3

Our versatile devices lower costs, improve efficiency and accommodate a variety of target sizes in inspections. What's more, they can be used in combination with other devices. In addition to offering compatibility with mask production/exposure processes, the PD Series demonstrates its versatility in FPD process and in numerous other applications.

For Mask Production/Exposure Processes

Reticle/Mask ParticleDetection SystemPR-PD2HR

Reticle/Mask ParticleDetection System(Desktop/Embedded type)PR-PD5

Reticle/Mask ParticleDetection SystemPR-PD2

Reticle/Mask ParticleDetection SystemPR-PD3

AutomaticParticle BlowerRP-1



Particle Detection

Can be used jointly with defect detecting equipment.

Adapts to chrome surface inspection by means of pattern masking.

Capable of inspecting relatively rough patterns only.

Allows wall proximity inspection in pellicle frame.

Suitable for inspection of pellicle surfaces/glass surfaces only.

Particle Removal

Particle Detection

Particle Detection

● Bare wafer measurement. ● Glass substrate measurement.● Measurement of particles on various flat surfaces.

● Reticle/mask stocker (pellicle/glass surface). ● Reticle/mask exchanger (pellicle/glass surface). ● Reticle/mask cleaner (pattern surface).

For Other Processes

For Use in Combination withManufacturing Devices

Particle Generation and HAZE Countermeasures

Measuring Targets: Particles, scratches, etc.

The PR-PD2HR covers patterns for which a defect inspection system would not previously have even been thought necessary. This allows the usage frequency of the defect inspection system to be decreased and enables cost reductions and increases in detection speed to be targeted. The high S/N ratio likewise facilitates the measurement of even comparatively fine patterns, with a wide range of applications possible. It is also possible to mask and measure individual areas on a pattern surface. In addition, the PR-PD2HR demonstrates exceptional ability in the inspection of clear areas, such as those close to walls in pellicle frames.

The RP-1 automatic particle blower system enables particles to be removed. The system does not require an operator, which helps it to prevent the various errors that can occur during manual operation. It also contributes to improved efficiency with its ability to automatically remove particles while performing inspection.

Following the introduction of the RP-1 automatic particle blower system, when there are no pellicles, performing blow after each inspection run enables the removal of particles. This allows the number of cleaning cycles to be reduced and the mask life to be extended.

The PR-PD2 and PR-PD3 are able to handle all the different sizes and thicknesses for reticles/masks and also bare wafers, plus they are compatible with the stepper cases available from each manufacturer. Their broad range of measuring sensitivities also allows them to meet a wide variety of application requirements.

The PR-PD5 is a desktop model with a compact design that also allows it to be incorporated with another system. This feature plus the PR-PD5's low cost means the introduction of a particle detection system is now easier than ever before. Production lines that previously relied on visual inspection can also be automated, allowing inspection records to be maintained and enabling numeric control.

The compact and low-cost PR-PD5 is an easy-to-use system that facilitates straightfor-ward measurement. In addition to being optimal for specialized small-format devices such as 2- to 4-inch bare wafers, the PR-PD5 is able to perform measurement of blank masks. If holders are used, it is also possible to measure film shapes and various other flat surfaces. Please contact your HORIBA representative regarding this feature.

The PR-PD5 has been designed so that it can be integrated with any other system as a space-saving measure. Installing the PR-PD5 to the conveyor, or the reticle stocker, allows the performance of simultaneous inspection, while combining it with the cleaning device enables inspection during the cleaning process. These and other possible configura-tions mean that inspection can be completed within the main system.

The CG-1000 uses the CRDS method to provide ultra-sensitive, real-time (every 5 sec.) measurement of trace ammonia gas at 0.1 ppb. This system offers effective control of trace ammonia gas, which has been identified as one of the causes of hazing.

Trace Ammonia Gas MonitorCG -1000



● Monitors atmosphere in the exposure process area.● Monitors the atmospheres of various manufacturing devices. ● Monitors failure of chemical filters.

EQUAL-SIZE EXPOSURE PROCESS

Measuring Targets: Particles, HAZE, ESD

GENERAL PROCESSES

Measuring Targets: Particles, HAZE, ESD

ADVANCED PROCESSES

Leading-edge Technology that Drives Innovation across the Broad Range of Applications

●

Automatic particle blower.(For pellicle/glass surface, applicable to SMIF POD)

●

Particle Removal

Automatic particle blower.(Capable of extending cleaning cycles)

●

Facilitates the shift from visualinspection to automated inspection.

●

Particle Removal

Automatic particle blower●

●

●

●

●

Capable of detection on surfaces(pattern/glass/pellicle). Accommodates a variety of stepper cases.

Offers a broad range of measuringsensitivities (0.35 - 5 µm).

●

●

●

3 4

Laser beam

Feed

Incident beam A

Detectors (R)

Laser beam

Incident beam BDetectors (L)

Foreign particle observation screenSwitch

Magnification of x440 (on screen) on the upper surface

■Upper/lower surface particle review function (In case of PR-PD3)

Auto-zoom

Magnification:Any 4-point setting can be made between approx. x220 and x2200

The PR-PD3 uses the laser scattering method to detect particles. When a laser beam is directed at the microcontaminant, the beam scatters. The particle is detected by measuring the strength of this scattering. The entire inspection surface is scanned by the laser beam using a galvanometer mirror. Although the pattern on the reticle and mask also causes the laser beam to scatter, since the polarization characteristics of the particles and pattern differ, the PR-PD3 is able to distinguish these by using a polarizing element inserted into the optical system. Taking advantage of the fact that the particle and pattern signals differ, HORIBA developed a unique low-pass filter to increase the ability to distinguish between the two. Furthermore, the well-proven He-Ne laser (633 nm) is used because of its stable operation. These technical improvements make the PR-PD3 able to handle a wide range of masks, from the cutting edge to the multi-purpose.

Along with patterns with attached pellicles, particle inspection can also be performed on surfaces without pellicles. Similarly, particle measurement can also be conducted on individual pellicles before they are applied (option).

Measurement results are mapped according to the size of the particles and can be displayed in real-time during the detection operation using a matrix. These inspection results are saved to a database server, from where DMS (data management software) can be used to perform data management and output various types of report, etc. Connecting the server to a LAN also enables bidirectional communication, facilitating shared use of the database by other system components.

Handling of patterns with/without pellicles

If holders or cases are used for reticles and masks, a wide range of sizes from 3.5- to 9-inch can be accommodated. Likewise, bare wafers up to 5-inch can be handled using holders. This also provides flexibility in processing different thicknesses.Note: Consult your HORIBA representative regarding special sizes.

Compatibility with all types of sample size and thickness

A single objective microscope lens is installed for inspecting the upper surfaces of reticles and masks, while four are mounted for the lower surfaces. A function that enables direct observation of particles on the upper and lower surfaces is also available. While the magnification for the upper surfaces is fixed at x440, the view for the lower surfaces can be switched between x220, x440, x880, and x2200.

Incorporation of an upper/lowersurface particle review function

As well as the stepper cases available from each manufacturer, SMIF-PODs can also be processed. This enables various combinations of stepper case sizes from different manufacturers to be used.

Compatibility with all types of stepper case (excluding PR-PD5)

Ability to jointly access a database

Microscopes: x440 for the upper surface;Up to x2200 for the lower surface

A function for measuring pellicle permeability enables particle inspection to be conducted at an appropriate sensitivity. By switching the light path, measurement can be performed within the pellicle frame without creating shadowed areas, which also allows regular inspections to be run after pellicles have been applied.

Detection capabilities

Detection of particles on patterns with attached pellicles

The introduction of a proprietary signal processing system enables false detections to be avoided. A pattern discrimination function that uses a low-pass filter also helps to reduce pseudo-detections to a minimum. This function represents an effective countermeasure against false detections even on dense patterns.

Incorporation of functions for preventing false detections

Outstanding Detection Capabilities Plus a Full Range of FunctionsThe multi-purpose PD Series delivers flexible, top-level performance.

■PR-PD3 functions for preventing false detectionsThe PR-PD3 is equipped with both a polarized differential function for coarse patterns and a low-pass difference function for fine patterns. Utilizing these two methods, erroneous detection can be effectively countered in OPC patterns, etc., that possess both characteristics.

Standard specifications

Optional specifications

■Typical connectivity (In case of PR-PD2)

GEM transmission data software(GEM: HORIBA standard specification)

Ethernet cable❋

Please install the necessary infrastructure.

❋Customer must provide Ethernet cabling when terminal PCs (installed with data management software) are installed in an office or elsewhere.

Host PC

Hub

Internal PC (control functions)

PR-PD2Data

transmission port

Printer output

port

PD external PC database server(inspection data, recipe storage)

PD external terminal PC

Color printer

▲Mapping screen ▲Historical data

▲Inspection results 1 ▲Inspection results 2

Course pattern

Polarized differential method

is effective

Fine patterns

Low-pass difference method

is effective

Using both methods together

is effective

OPC patterns, etc., that possess both

characteristics

Low-pass difference

Foreign particle signal

Pattern signal

Original signal Low-pass signal Differential signal

Foreign particle signals

+

–Amplifier

Low-pass filter

S-polarized beam

Detector(PMT)

Polarizer

Particle

Reticle

Polarized differential

■ Measurement principle (In case of PR-PD3)

5 6

■Related ProductsWet Process

Along with the evolution of 65 nm and 45 nm devices, the chemical solutions conventionally used in RCA cleaning are requiring greater and greater low-concentration control. The HF-960M uses sen-sors that offer outstanding corro-sion resistance for high-precision, high-speed measurement of low concentrations of hydrofluoric acid, hydrochloric acid and ammonia, and is thus perfect for single-bath and wafer cleaning.

Wet Process Thin Film Control / Analysis

Low ConcentrationHF/HCL/NH3 MonitorHF-960M

This monitor has a 2048Ch CCD detection element that can simul-taneously measure a wide range of wavelengths (200 - 800 nm) with a minimum retrieval time of 20 msec and a maximum resolu-tion of 2 nm. The use of a pro-grammable endpoint algorithm with a broad range of application makes it possible to control end-points that cannot be detected with conventional systems. Ad-vanced analysis software is in-cluded as a standard item.

OES (Optical Emission Spectroscopy)

Etching End-point MonitorEV-140C

As part of the final process for cleaning silicon wafers, ever-stricter monitoring of the purity of the ultra-pure water used in the final rinse process is being demanded. The HE-480R has a built-in microprocessor and measures ultra-pure water at high precision during that process.

Resistivity MeterHE-480R

From the consideration of reduc-ing costs and reducing the burden on the environment through chemical-less processes, the use of ozone water is ex-pected to be more and more ef-fective. The HZ-960 measures ozone water concentrations and supports process controls. Two types of detectors are available, as sampling type and inline type, a selectable as appropriate to the equipment environment.

Dissolved Ozone MonitorHZ-960

IPA (IsoPropyl Alcohol) is widely used in the drying processes re-quired for effective wet cleaning during semiconductor manufac-turing. The IPA gas concentra-tion monitor can be combined with a mass flow controller or vaporizer, and is perfect for use in combination with a vaporizer or bubbler as a secondary gas concentration monitor.

IPA Gas ConcentrationMonitorIR-150AS

The lightweight, compact design of this monitor ensures easy in-stallation in hydrofluoric acid dilution and wafer cleaning equipment. Two sensor versions may be selected: the dipped type, added directly to the solu-tion, and the distribution type, integrated in the process piping (standard and high flow rate types).

Hydrofluoric AcidMonitorCM-200A/210AThis monitor measures in real

time the concentration of H2SO4, H2O2 and H2O in SPM solution and indicates the timing of automatic chemical spiking by an alarm. The quick response and short measuring period allow changes in concentration, while its compact design en-sures easy installation in clean-ing equipment.

SPM MonitorCS-150

This monitor measures in real time the concentration of NH3, H2O2 and H2O in SC-1 solution and indicates the timing of auto-matic chemical spiking by an alarm. The quick response and short measuring period allow changes in concentration, while its compact design ensures easy installation in cleaning equip-ment.

SC-1 MonitorCS-131

This monitor is used to calculate variations in film thickness with great precision during the depo-sition and etching processes.It detects endpoints by setting the desired film thickness. It can accommodate complex multi-layer films and helps to ensure highly stable control.

Real TimeInterferometric FilmThickness MonitorDM-1000 Series

Gas Measurement /Gas Control

The FG-100A is a highly ad-vanced FTIR gas analyzer for the analysis of PFCs and other gases in semiconductor process. It in-cludes a dedicated sampling unit for gas analysis and more than 260 gas spectral library. The FG-100A can respond to a variety of applications, such as optimization of the CVD chamber cleaning and dry-etching processes, perfor-mance checks on abatement sys-tems, and monitoring of the ambi-ent gases in clean rooms.

FTIR Gas AnalyzerFG-100A Series

PARTICLE DETECTIONSYSTEMPD Series

Semiconductor / FPD

Please read the operation manual before using this product to assure safe and proper handling of the product.

●The contents of this catalog are subject to change without prior notice, and without any subsequent liability to this company.●The color of the actual products may differ from the color pictured in this catalog due to printing limitations.● It is strictly forbidden to copy the content of this catalog in part or in full. ●All brand names, product names and service names in this catalog are trademarks or registered trademarks of their respective companies.

●HORIBA, Ltd.Head Office2 Miyanohigashi, KisshoinMinami-ku, Kyoto, JapanPhone: 81-75-313-8123Fax: 81-75-321-5725

Tokyo Sales Office1-7-8 Higashi-KandaChiyoda-ku, Tokyo, JapanPhone: 81-3-3861-8231Fax: 81-3-3861-8259

●HORIBA KOREA L t d .112-6 Sogong-DongChoong-ku, Seoul, KoreaPhone: 82-2-753-7911Fax: 82-2-756-4972

●HORIBA INSTRUMENTS INCORPORATED

Irvine Facility17671 Armstrong AvenueIrvine, CA 92614, U.S.A.Phone: 1-949-250-4811Fax: 1-949-250-0924

●HORIBA INSTRUMENTS LIMITEDKyoto CloseSummerhouse RoadMoulton Park, NorthamptonNN3 6FL, U.K.Phone: 44-1604-542600Fax: 44-1604-542696e-mail: [email protected]

●HORIBA INSTRUMENTS Pte. LTD.10 Ubi Crescent#05-11/12, Ubi TechparkSingapore 408564Phone: 65-6745-8300Fax: 65-6745-8155

●HORIBA GmbHKaplanstrasse 5A-3430 Tulln, AustriaPhone: 43-2272-65225Fax: 43-2272-65230

HORIBA CZECHIAOrganizachi slozka PrahaPetrohradska 13CZ-101 00 Praha 10, Czech RepublicPhone: 420-2-717-464-80Fax: 420-2-717-470-64

Bulletin:HRE-3676B Printed in Japan TH-H(SK)23

●HORIBA / STEC INCORPORATEDHORIBA Technology Center3265 Scott Boulevard Santa Clara, CA 95054U.S.A.Phone: 1-408-730-4772Fax: 1-408-730-8975

Austin Office9701 Dessau RoadSuite 605, AustinTexas 78754, U.S.A.Phone: 1-512-836-9560Fax: 1-512-836-8054

Grenoble OfficeBURO club Gieres, 2 Avenue de Vignate 38610 Gieres, FrancePhone: 33-4-76-63-4915Fax: 33-4-76-54-0399

Netherlands OfficeBijsterhuizen 11-58, 6546 AS Nijmegen, The NetherlandsPhone: 31-24-366-0985Fax: 31-24-366-0987

Portland Office10240, SW Nimbus Ave.Suite L-5, Portland, OR 97223, U.S.A.Phone: 1-503-624-9767Fax: 1-503-968-3236

http://www.semi.horiba.com e-mail: [email protected]

TAIWAN Representative Office3F, NO.18 Lane 676, ChungHua Rd, Chupei City,Hsinchu Hsien, 302,TaiwanPhone: 886 (3) 656-1012Fax: 886 (3) 656-8231

●HORIBA TRADING (SHANGHAI) CO., Ltd.Shanghai OfficeRoom 1701, United Plaza,1468 Nanjing Rd. West, Shanghai, 200040, ChinaPhone: 21-6289-6060Fax: 21-6289-5553

Beijing OfficeRoom 1801, Capital Tower,Beijing, Tower 1 No.6Jia, Jianguomenwai Ave., Chaoyang District, Beijing, 100022 ChinaPhone: 10-8567-9966Fax: 10-8567-9066

Leichlingen FacilityJulius-kronenberg StrasseD-42799 LeichlingenGermanyPhone: 49 (2175) 8978-0Fax: 49 (2175) 8978-50

●HORIBA EUROPE GmbHHead OfficeHans-Mess-Str.6D-61440 Oberursel/Ts.GermanyPhone: 49 (6172) 1396-0 Fax: 49 (6172) 137385

●HORIBA FRANCE12, Avenue des Tropiques91955 LES ULISFrancePhone: 33 (1) 69-29-96-23Fax: 33 (1) 69-29-95-77

HORIBA SWEDENSydhamnsvägen 55-57,SE-151 38 Södertälje, SwedenPhone: 46 (8) 550-80701Fax: 46 (8) 550-80567

●HORIBA Jobin Yvon SRL Torino OfficeEuropalaceCorso Torino 43/4510043 Orbassano,TorinoItalyPhone: 39 (011) 9040601Fax: 39 (011) 9000448

HORIBA continues contributing to the preservation of the global environment through analysis and measuring technology.

particle detection system pr-pd series - horiba€¦ · types of detectors are available, as...

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