native-conflict-aware wire perturbation for double patterning technology szu-yu chen, yao-wen chang...

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Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen , Yao-Wen Chang ICCAD 2010

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Page 1: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native-Conflict-Aware Wire Perturbation for Double Patterning Technology

Szu-Yu Chen , Yao-Wen ChangICCAD 2010

Page 2: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Outline

• Introduction• Preliminaries• Native conflict prediction• NC-Aware wire perturbation• Experimental result• Conclusion

Page 3: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Introduction

• Foundries have been systematically reducing the printed feature size (half pitch) for years.

• From Rayleigh criterion, the half pitch is limited to 36 nm, which cannot satisfy the desired sub-22nm technology nodes.

• The most popular solution for sub-22nm node is double patterning technology (DPT).

Page 4: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Introduction

• Two feature have to be assigned to different masks if the distance of them is less than the minimum double patterning spacing (DP-spacing).

Page 5: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Introduction

• Minimum pitch size = minimum width (Wmin) +minimum spacing

(Smin)• DP-Spacing = 2Pmin - Wmin

Page 6: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Introduction

• Not all the patterns can be directly decomposed into two masks.

Page 7: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Introduction

• Nevertheless, the stitch insertion might not be powerful enough doe resolving all the conflicts.

• A conflict that cannot be resolved by inserting stitches anywhere is called a native conflict (NC).

• In this paper, it deals with the NC issue by two stages:– (1) NC prediction.– (2) NC removal

Page 8: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Preliminaries

• NC conflict

Page 9: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Preliminaries

• DPT-Compliant Redesign– A native conflict can only be resolved by DPT-

compliant redesign.– DPT-compliant redesign should first predict the

occurrence and the locations of NCs, and then further correct them.

Page 10: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Problem Formulation

• Given a post-routing layout, the minimum spacing, and the double patterning spacing, the problem finds a perturbed layout so that the number of native conflicts is minimized, subject to minimum-spacing rule and the double-patterning constraint.

Page 11: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native Conflict Prediction

• An odd cycle in the conflict graph is not necessarily a NC because of the possible solution by stitch insertion.

Page 12: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native Conflict Prediction

• Pattern projection

Page 13: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native Conflict Prediction

• Segmentation

Page 14: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native Conflict Prediction

• Odd-Cycle Detection– The existence of odd cycles can be determined by a

DFS algorithm.– Finding all the odd cycles is time-consuming.

• Cycle basis– A cycle basis is a basis if we treat every cycle as a

vector represented by series of edges, and the linear combination of cycles is a ring sum operation of cycles. Then the basis form a linearly independent spanning set for all cycles.

Page 15: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native Conflict Prediction

• Ring sum operation– Let the edges in the cycles C1 and C2 be sets E1 and

E2, respectively. A ring sum operation on C1 and C2 is denoted as C1 C⊕ 2, which is a cycle with its edge being a set, (E1’∩E2) (E∪ 1∩E2’).

Page 16: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Native Conflict Prediction

• Cycle basis of a graph can be found by applying a modified DFS algorithm.

• For a connected graph G = (V,E), the result of DFS traversal forms a spanning tree T on V. Inserting any other edge e ϵ (E - T) causes a cycle.

• If there is no odd cycle in the cycle basis of a graph, then the graph contains no odd cycle.

Page 17: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

Page 18: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

• Symbolic Layout Representation– Every wire (via) is represented by two points.– By the symbolic representation, it can perform the

compaction across layers simultaneously.

Page 19: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

• DPT-Compliance Checking• Wire Perturbation– Add DPT constraints to remove odd cycles.– Perform a trial compaction to see whether the

level of DPT-compliance is improved.

Page 20: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

• Compaction– The compaction problem is modeled as a longest-

path problem on the constraint graph.

– (1) Wire Constraint Graph Construction• An edge (u,v) → wire u is on the left or bottom of v.• The transitive edges in the graph can be removed.

Page 21: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

• Compaction– (2) Point Constraint Graph Construction• An edge (u,v) with its weight w → point v should be on

the right of point u, and the distance between them should be at least w.• There are four constraints:

– (1) Design-rule constraint– (2) Wire shape constraint– (3) Fixed-pin constraint– (4) Layout-boundary constraint

Page 22: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

Page 23: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

NC-Aware Wire Perturbation

• DPT Constraint Generation– (1) Separating Wire Pairs Generation

Page 24: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Experimental Result

Page 25: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Experimental Result

Page 26: Native-Conflict-Aware Wire Perturbation for Double Patterning Technology Szu-Yu Chen, Yao-Wen Chang ICCAD 2010

Conclusion

• It presents a NC-prediction method based on geometry relation of features and a NC-aware wire perturbation algorithm to minimize as many NC’s in layout as possible.

• Perform an efficient method to find odd cycles.