microwave induced plasma (mip) decapsulation - jiaco instruments

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Email: [email protected] Website: www.jiaco-instruments.com Phone: +31 6 2526 1648 Address: Feldmannweg 17, 2628 CT, Delft, The Netherlands DECAPSULATION TECHNOLOGY FOR QUALITY CONTROL AND FAILURE ANALYSIS MICROWAVE INDUCED PLASMA (MIP) DECAPSULATION SYSTEM Copper wire IC package decapsulation JIACO Instruments MIP decapsulation system is a breakthrough innovation: Automated atmospheric pressure Microwave-Induced- Plasma (MIP) decapsulation utilizing O2-only recipes. The system has been proven for Cu, PdCu, Ag, Au bond wires and for advanced package types like 3D, SiP, WLCSP, BOAC; all without process induced damage for reliable failure analysis and quality control. MIP applications in failure analysis MIP decapsulation + No process induced damage + Preservation of surface features + Preservation of original contaminants and failure sites Acid decapsulation - Reduced wire diameter - Reduced mechanical strength - Corrosion damage on copper wire and aluminium bond pad I. Challenge due to wire: Ag wire (new) Cu, PdCu, Au wire packages after thermal stress II. Challenge due to no wire: WLCSP (new) In-FO (new) PBO removal to expose RDL III. Challenge due to chip: BOAC (new) GaAs GaN VI. Challenge due to encapsulant: High Tg mold compound (new) FOW (new) Underfill Transparent mold compound V. Challenge due to package: 1x1mm package Chip on Board (new) SiP (new) 3D stacked-die IV. Challenge due to failure type: EOS Contamination Localized decapsulation Before decapsulation After MIP

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Page 1: Microwave Induced Plasma (MIP) decapsulation - JIACO Instruments

Email: [email protected] Website: www.jiaco-instruments.com

Phone: +31 6 2526 1648 Address: Feldmannweg 17, 2628 CT, Delft, The Netherlands

DECAPSULATION TECHNOLOGY FOR QUALITY CONTROL AND FAILURE ANALYSIS

MICROWAVE INDUCED PLASMA (MIP)DECAPSULATION SYSTEM

Copper wire IC package decapsulationJIACO Instruments MIP decapsulation system is a breakthrough innovation: Automated atmospheric pressure Microwave-Induced-Plasma (MIP) decapsulation utilizing O2-only recipes. The system has been proven for Cu, PdCu, Ag, Au bond wires and for advanced package types like 3D, SiP, WLCSP, BOAC; all without process induced damage for reliable failure analysis and quality control.

MIP applications in failure analysis

MIP decapsulation+ No process induced damage+ Preservation of surface features+ Preservation of original

contaminants and failure sites

Acid decapsulation- Reduced wire diameter- Reduced mechanical strength- Corrosion damage on copper

wire and aluminium bond pad

I. Challenge due to wire:• Ag wire (new)• Cu, PdCu, Au wire packages

after thermal stress

II. Challenge due to no wire:• WLCSP (new)• In-FO (new)• PBO removal to expose RDL

III. Challenge due to chip:• BOAC (new)• GaAs • GaN

VI. Challenge due to encapsulant:• High Tg mold compound (new)• FOW (new)• Underfill• Transparent mold compound

V. Challenge due to package:• 1x1mm package • Chip on Board (new)• SiP (new)• 3D stacked-die

IV. Challenge due to failure type:• EOS • Contamination• Localized decapsulation

Before decapsulation

After MIP

Page 2: Microwave Induced Plasma (MIP) decapsulation - JIACO Instruments

DECAPSULATION TECHNOLOGY FOR QUALITY CONTROL AND FAILURE ANALYSIS

MICROWAVE INDUCED PLASMA (MIP)DECAPSULATION SYSTEM

Silver wire IC package MIP decapsulationNo damage to Ag wires, Ag ball bonds, bond pads, passivation and die.

Conventional plasma- CF4 etching damage to passivation and die- Long processing time even with CF4 addition

into plasma- Manual filler removal between etching cycles- Removal of original surface contamination- Vacuum system, higher maintenance and repair

MIP decapsulation+ O2 only, no damage to passivation and die+ 70% reduction in processing time compared to

conventional plasma+ Fully automated processing+ Preservation of original contaminants & failures+ Atmospheric, reducing maintenance and repair

Email: [email protected] Website: www.jiaco-instruments.com

Phone: +31 6 2526 1648 Address: Feldmannweg 17, 2628 CT, Delft, The Netherlands