may 9, 2007 bjt far - mit opencourseware...• bjt with two base contacts: p n+ b e se l e ib 2 ib 2...
TRANSCRIPT
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-1
Lecture 38 - Bipolar Junction Transistor(cont.)
May 9, 2007
Contents:
1. Non-ideal effects in BJT in FAR
Reading material:
del Alamo, Ch. 11, §11.5 (§§11.5.1, 11.5.3, 11.5.4, 11.5.5 but only qualitatively)
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-2
Key questions
• Why are the output characteristics of a BJT in FAR not perfectly flat?
• What is the maximum voltage that the collector of a BJT can sustain in FAR? What are the key design issues for the break
down voltage?
• Why does the performance of a BJT degrade at high collector current?
• How does one model the base resistance in a BJT?
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-3
1. Non-ideal effects in BJT
� Base-width modulation
VBE and VBC affect xBE and xBC, respectively ⇒ WB = f (VBE, VBC).
log N log N
NE NE
NB
NC
xBE xBC x
thermal equilibrium (VBE=VBC=0) forward active (VBE>0, VBC<0)
NB
NC
xBE xBC
• Early effect: impact of VBC on WB
|VBC| ↑⇒ xBC ↑⇒ WB ↓⇒ IC ↑, IB unchanged
• Reverse Early effect: impact of VBE on WB
VBE ↑⇒ xBE ↓⇒ WB ↑⇒ smaller IC than ideal ⇒ βF ↓, IB unchanged
x
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-4
� Early effect: impact of VBC on WB ⇒ IC = f (VBC) n
WB(VBC)
nB(0)
nB(x)
IC
nB(WB)=0ni2
NB
0 x
VBC more negative ⇒ WB(VBC) ↓⇒ IC(VBC) ↑
To capture first-order impact, linearize WB(VBC):
VBCWB(VBC) � WB(VBC = 0)(1 + )
VA
VA is Early voltage:
qNBWBoVA =
Cjco
Impact on IC:
IC(VBC = 0) VBCIC(VBC) � � IC(VBC = 0)(1 − )
1 + VBC VAVA
Also, since IB unchanged:
βF (VBC = 0) VBCβF (VBC) = � βF (VBC = 0)(1 − )
1 + VBC VAVA
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-5
Manifestation of Early effect in output characteristics:
VCE-VA
IC
IB
IB=0
0
Main consequence of Early effect: finite slope in output characteris
tics in FAR: output conductance.
Cjc CB
+
vbe gmvbegπ go
-
Cπ+Cje
E
with go given by:
IC go =
VA
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-6
� Avalanche breakdown
Sudden rise in IC for large reverse VCB.
Key issue: breakdown voltage depends on terminal configuration:
IC
0 BVCEO BVCBO VCE
IE=0
0
IB=0
VCE VCB
Experimental observation:
BVCEO < BVCBO
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-7
• Common-base configuration: breakdown as in isolated p-n junction
n-Emitter p-Base n-Collector
IE=0 IC
VBC < 0 ⇒ breakdown when M → ∞
• Common-emitter configuration: BE and BC junctions interact in a positive feedback loop
n-Emitter p-Base n-Collector
IB=0
IC
VCE
With IB = 0 (or fixed), holes generated in B-C junction must be injected into E ⇒ B-E goes into forward bias ⇒ IC ↑.
Breakdown occurs at finite M and enhanced by high βF :
1 Mcrit � 1 +
βF
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-8
Key dependencies:
• NC ↑⇒ BVCEO ↓, BVCBO ↓
• βF ↑⇒ BVCEO ↓ but BVCBO unchanged ⇒don’t want more βF than necessary!.
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
Yamaguchi, T., et. al. "Process and Device Characterization for a 30-GHz fT Submicrometer Double Poly-Si Bipolar Technology Using BF2 -implanted Base with Rapid Thermal Process." IEEE Transactions on Electron Devices 40, no. 8 (1993): 1484-1495. Copyright 1993 IEEE. Used with permission.
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-9
� High collector current effects
As IC ↑, electron velocity in collector ↑. But, there is a limit: vsat.
Then, as IC approaches:
ICK = qAENCvsat
the electrostatics of the collector are profoundly modified ⇒ transis
tor performance degrades:
log fTβF
ideal 1βFo 2πτF
fTpk
actual
IC2 log IC ICpk log IC
1
ideal
actual
To first order:
IC2 � ICpk � ICK
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-10
Main origin: formation of current-induced base inside collector SCR ⇒ effective quasi-neutral base width ↑ ⇒ βF ↓ ⇒ new delay com
ponent ⇒ fTpk ↓
Key design issue: NC
NC ↑ ⇒ ICK ↑ ⇒ fTpk ↑
Experiments [Crabbe IEDM 1993]:
SiGe base Si base
Key trade-off:
NC ↑ ⇒ BV ↓
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
Crabbe, E.F., et. al. "Vertical Profile Optimization of Very High Frequency Epitaxial Si and SiGe-base Bipolar Transistors." Technical Digest of the International Electron Devices Meeting, Washington, DC, December 5-8, 1993. Piscataway, NJ: Institute of Electrical and Electronics Engineers, 1993, pp. 83-86. ISBN: 9780780314504. Copyright 1993 IEEE. Used with permission.
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-11
� Base resistance
Very important parasitic for digital and analog applications.
n+ p
B E B
SE LE
RBext
RBint
n
C
Two components to RB:
• external: associated with ohmic contact to base and lateral flow through extrinsic base
• internal: associated with intrinsic base
RB = RBext + RBint
Important issues:
1. RBint is distributed: how does it scale?
2. Non-linear behavior of RBint for high IB
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-12
1. Low-current resistance (in absence of debiasing)
Define lateral resistance of intrinsic base:
SERblat = Rshb
LE
With:
1 Rshb =
qμBNBWB
Clearly,
RBint < Rblat
because not all IB flows across entire intrinsic base.
But, what is proportionality constant?
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-13
• BJT with one base contact:
n+p
B E
SE
IB
LE
IB
JhE(y)
0
AE
0 SEy
SE
IB
iB(y)
y0 0
Assume small ohmic drop along base ⇒ iB(x) uniformly distributed:
x iB(x) = IB(1 − )
SE
RBint obtained by examining power dissipation in base:
pB = IB2 RBint =
�0
SE i2 B(x)
Rshbdx = IB
2 1 Rshb
SE
LE 3 LE
Then: 1 SE 1
RBint = Rshb = Rblat 3 LE 3
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-14
• BJT with two base contacts:
n+p
B E
SE LE
IB 2
IB 2
IB
JhE(y)
0
AE
0 SEy
SESE
IB
iB(y)
y0 0
2
2
Now:
IB 2x SEiB(x) = (1 − ) for 0 ≤ x ≤
2 SE 2 IB 2x SE
iB(x) = ( − 1) for ≤ x ≤ SE2 SE 2
Intrinsic base resistance:
1 RBint = Rblat
12
This is a quarter of the design with one-base contact.
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-15
Total base resistance is:
RB = RBext + RBint
To get small RB :
• minimize RBext ⇒ self-aligned process
• minimize RBint ⇒
– use two base contacts ⇒ takes more space
– increase WB ⇒ degrades frequency response
– increase NB ⇒ hard, costly, Cje ↑, BVEBO ↓
– decrease SE (scaling!) ⇒ costly
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
[from Tang TED 27, 563 (1980)]
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-16
Useful observation: trade-off between RB and IC
Remember:
qVBE qAEni 2DB qVBE
IC = IS exp = expkT NBWB kT
Then:
JC 2 2 qVBE = q niDBμB exp
Rshb kT
rather independent of NB or doping profile.
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
Tang, D. D. "Heavy Doping Effects in p-n-p Bipolar Transistors." IEEE Transactions onElectron Devices 27, no. 3 (1980): 563-570. Copyright 1980 IEEE. Used with permission.
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-17
2) Non-linear behavior of RB
More accurate equivalent circuit model of distributed RB:
n+ p
B E B
SE
LE
RBext
RBint
jB(x)
IB AE
0 0 SE
x
iB(x)
IB 2
0 0 SE SE
x
2
Non-linear B-E diode current ⇒ non-uniform current distribution across base:
• base resistance ”debiases” center of base
• current ”crowds” at edges of base
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-18
Analytical model possible (but not pretty).
General behavior of RBint: RBint
1 Rblat 12
0 log IB
For negligible debiasing to occur:
kT IBRblat < 0.2
q
RBin drops by 50% at:
kT IBRblat � 6
q
Overall behavior of RB:
RB
1 Rblat+RBext 12
RBext
0 log IB
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-19
Consequences of base debiasing:
• RB depends on IB ⇒ RB depends on VBE and IC
• For high current,
RBint → 0 ⇒ RB � RBext and independent of SE.
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
Weng, J., J. Holz, and T. F. Meister. "New Method to Determine the Base Resistance of Bipolar Transistors." IEEE Electron Device Letters 13, no. 3 (1992): 158-160. Copyright 1992 IEEE. Used with permission.
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-20
• Non-linear behavior of RBint:
small-signal resistance = large-signal resistance
Ohmic drop in RB:
VB = RBIB
Then, small-signal base resistance:
dVB dRB rB = = RB + IB
dIB dIB
Since IB ↑⇒ RB ↓:
rB ≤ RB
RBint, rBint
RBint rBint
Rblat 1
12
0 log IB
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6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-21
Consequences of RB:
• RB has no direct impact on fT , but has indirect impact through constraint in base design.
Actually, fT,pk does not appear correlated to RB
(fT,pk dominated by NC):
• rB crucially important to noise
• rBCjc important time constant in high-frequency operation of BJT
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-22
Key conclusions
• Early effect: modulation of WB by VBC ⇒ output conductance in output characteristics.
IC go =
VA
• Base-width modulation effects affect IS and βF , but not IB.
• In avalanche breakdown in a BJT:
BVCEO < BVCBO
because of transistor current gain.
• βF ↑⇒ BVCEO ↓ w/o affecting BVCBO.
• Key device design issue in avalanche breakdown:
NC ↑⇒ BV ′ s ↓
• At high collector current, velocity saturation of electrons in col
lector ⇒ performance degrades: βF ↓, fT ↓
• Maximum current:
ICpk � qAENCvsat
• Two components in RB:
– RBext: associated with ohmic contact and transport through extrinsic base
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].
6.720J/3.43J - Integrated Microelectronic Devices - Spring 2007 Lecture 38-23
– RBint: associated with intrinsic base
• RBint is a distributed resistance ⇒
– RBint < Rblat
– RBint is non linear in IB.
• Consequence of non-linearity of RBint at high IB: small-signal resistance different from large-signal resistance.
• Three technological approaches to reduce RB:
– use two base contacts
– use self-aligned process
– decrease SE
• Fundamental trade-off between IC and Rshb.
Cite as: Jesús del Alamo, course materials for 6.720J Integrated Microelectronic Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY].