www.iop.org/journals/jpcm

ISSN 0953-8984

Journal of PhysicsCondensed Matter

SPECIAL SECTION CONTAINING PAPERS ON SURFACE NANOPATTERNS INDUCED BYION-BEAM SPUTTERING

FOREWORD

220301 Surface nanopatterns induced by ion-beam sputteringRodolfo Cuerno, Luis Vazquez, Raul Gago and Mario Castro

SPECIAL SECTION PAPERS

EXPERIMENTAL: NANOPATTERN MORPHOLOGIES

224001 Ion beam sputtering induced nanostructuring of polycrystalline metal filmsDebabrata Ghose

224002 Ion erosion induced nanogrooves: temporal evolution and azimuth dependenceHerbert Wormeester and Bene Poelsema

224003 Highly ordered nanopatterns on Ge and Si surfaces by ion beam sputteringB Ziberi, M Cornejo, F Frost and B Rauschenbach

224004 Ripple formation on silicon by medium energy ion bombardmentTapas Kumar Chini, Debi Prasad Datta and Satya Ranjan Bhattacharyya

224005 Ripple formation and smoothening on insulating surfacesRandall L Headrick and Hua Zhou

EXPERIMENTAL: ADVANCED CHARACTERIZATION

224006 Synchrotron x-ray scattering from metal surfaces nanostructured by IBSC Boragno and R Felici

224007 Ion-induced nanopatterns on semiconductor surfaces investigated by grazing incidence x-ray scatteringtechniquesD Carbone, A Biermanns, B Ziberi, F Frost, O Plantevin, U Pietsch and T H Metzger

EXPERIMENTAL: PATTERN FORMATION PROCESSES

224008 In situ x-ray studies of native and Mo-seeded surface nanostructuring during ion bombardment of Si(100)G Ozaydin-Ince and K F Ludwig Jr

224009 Production of nanohole/nanodot patterns on Si(001) by ion beam sputtering with simultaneous metalincorporationJ A Sanchez-Garcıa, R Gago, R Caillard, A Redondo-Cubero, J A Martin-Gago, F J Palomares, M Fernandezand L Vazquez

224010 Linear stability and instability patterns in ion-sputtered siliconCharbel S Madi, H Bola George and Michael J Aziz

EXPERIMENTAL: NOVEL CONFIGURATIONS

224011 Nanopatterning by multiple-ion-beam sputteringM Joe, J-H Kim, C Choi, B Kahng and J-S Kim

224012 Surface nanostructures by single highly charged ionsS Facsko, R Heller, A S El-Said, W Meissl and F Aumayr

M224013 Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during

ion–surface 3D interactions, from micromachining to self-organized picostructuresWarren J MoberlyChan

(Continued on inside back cover)

Bibliographic codes CODEN: JCOMEL 21 (22) 220301–225009 (2009) ISSN: 0953-8984

Journal of PhysicsCondensed MatterJournal of Physics

Volume 21 Number 22 3 June 2009

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Journal of Physics Condensed Matter

S Vol 21, No 22 220301–225009 3 June 2009

Volume 21 Number 22 3 June 2009

Journal of Physics

Featured in this issueSurface, Interface and Atomic-Scale Science

Special sectionSurface nanopatterns induced by ion-beam sputteringGuest Editors: Rodolfo Cuerno, Luis Vázquez, Raúl Gago and Mario Castro

CM21-22cover.indd 2-4 12/5/09 09:31:17