Gas discharge plasma and their applications

MYEONG YEOL CHOI (Sam Choi)

Electrical Engineering Ph.D. student Advisor: Dr. George J. Collins, Supervisor: Dr. Il Gyo Koo

11/29/2010

Introduction to Sam

• Born in South Korea in 1981 • Bachelor’s degree(2007):

– Electrical Engineering at Ajou University in South Korea

• Republic Of Korea Marine Corps (2001-2003)

• Master’s degree(2009): – Chemistry at Ajou University in

South Korea

• Ph.D. student(2009-present): – Electrical Engineering at

Colorado State University

Contents

1. Plasma definition

2. Introduction to variety of plasma applications

3. Why variety?

4. How to generate plasma?

5. What kind of parameters do we have?

6. How to control the parameters to optimize plasmas?

7. Conventional plasma applications

8. Emerging field - Plasma health care

9. Sam’s preliminary work

10. conclusion

Plasma – the 4th state of matter

http://www.nasa.gov/mission_pages/themis/auroras/sun_earth_connect.html

Variety of plasma applications

Fluorescent light

http://www.walyou.com/blog/2009/08/25/plasma-lamp-design/

Ozone generator

http://compucentro.info/blog/tmp/ozone-generator.html Plasma display panel

http://tv-plasma-reviews.blogspot.com/2009_02_01_archive.html

Laser

http://medgadget.com/archives/2009/12/frikkin_lasers.html

Plasma arc welding

http://www.flickr.com/photos/rmstringer/2911413043/sizes/l/in/photostream/

http://www3.ntu.edu.sg/mae/research/programmes/thinfilms/tfresearch.asp

Microelectronics

Wide Range of Temperature

Thermal-equilibrium

Te=Tg

<Arc welding>

10,000oC-100,000oC

Non-thermal equilibrium

Te>>Tg

<Skin sterilization>

Tg ≈ 25-1000oC

Te ≈ 10,000-100,000oC

http://www.svarka-rezka.com.ua/eng/documents/about.html Blood Coagulation and Living Tissue Sterilization by Floating-Electrode Dielectric Barrier Discharge in Air

Complexity of plasma reaction

Baldur Eliasson, Senior Member, IEEE, and Ulrich Kogelschatz, IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 19, NO. 6, DECEMBER 1991

Electrical generation of plasmas

<Deposition of SiH4 on solar cell, flat panel, or micro electronics>

1. Capacitively coupled plasma

10-3m < d < 10m

2. RF voltage source

3. SiH4 + H2 gas

4. Total gas flow rate: 50sccm

5. 0.5torr pressure

<Conditions>

J. Jolly and J.-P. Booth, J. Appl. Phys. 97, 103305 (2005)

H atom density vs. voltage, frequency, and pressure

J. Jolly and J.-P. Booth, J. Appl. Phys. 97, 103305 (2005)

Electrical voltage, frequency and chamber pressure are important to plasma characteristic.

Chemicals

Adding chemicals can improve desired chemical reactions.

A. Hammad, E. Amanatides, D. Mataras*, D. Rapakoulias, Thin Solid Films 451 –452 (2004) 255–258

<Deposition of SiH4 on silicon substrate>

How to design plasma?

• Plasma electrode type

– Capacitively coupled plasma: voltage source

– Inductively coupled plasma: current source

• Frequency: DC to microwave(GHz)

• Working gas and pressure: paschen curve

Plasma types

“C” Capacitively Coupled Plasma

“L” Inductively Coupled Plasma

𝑬(𝑽/𝒎) = −𝛻𝑉 𝛻 × 𝑬(𝑽/𝒎) = −𝜕𝑩

𝜕𝑡

Claire Tendero a,*, Christelle Tixier a, Pascal Tristant a, Jean Desmaison a, Philippe Leprince b, Spectrochimica Acta Part B 61 (2006) 2 – 30

Frequency

Claire Tendero a,*, Christelle Tixier a, Pascal Tristant a, Jean Desmaison a, Philippe Leprince b, Spectrochimica Acta Part B 61 (2006) 2 – 30

Operating gas and its pressure

The amplitude of breakdown voltage depends on operating gas and its pressure.

𝑉𝑏𝑟𝑒𝑎𝑘𝑑𝑜𝑤𝑛= F 𝑔𝑎𝑠, 𝑝𝑟𝑒𝑠𝑠𝑢𝑟𝑒

http://en.wikipedia.org/wiki/Paschen_curve

< Paschen curve >

Control of discharge parameters to optimize plasmas

• Voltage & current

– Impedance matching

• Addition of chemicals

• Operating gas and pressure

– vacuum plasma system for low pressure plasma

Control of voltage & current

Impedance matching for maximum power delivery

Γ =𝑅𝑎 − 𝑅𝑏𝑅𝑎 + 𝑅𝑏

<Example of RF capacitively coupled plasma system>

50Ω or 75Ω Industry standard

Addition of Chemicals

V. L. Bukhovets and I. G. Varshavskaya, Protection of Metals and Physical Chemistry of Surfaces, 2009, Vol. 45, No. 6, pp. 645–651.

Target electrode

Gas inlet

Substrate

<Diamond Like Carbon deposition> 1. Gas phase precursor

• organic gas : CH4, C5H12, C3H6O • H2, Ar

2. Liquid phase precursor • gas and vapor mixture: CH3OH,

C2H5OH, CH3COOCH3, etc 3. Solid phase precursor

• Target material: graphite • Target electrodes works as a

carbon source for diamond like carbon deposition.

Control of gas & pressure

http://www.azom.com/details.asp?ArticleID=912

<Typical vacuum plasma system>

Low pressure plasma 1. Vacuum chamber 2. Vacuum pump 3. High quality sealing

Atmospheric pressure plasma 1. No need to use expensive

vacuum equipment 1. Reduce cost 2. more samples available

(ex. biological samples) 2. Easy to build

Application of plasma

1. Light source – Fluorescent light, plasma display panel

2. Surface modification – Thin film processing: etching, sputtering

3. Chemical reaction – Generation of radicals: ozone water purification in Europe

4. Plasma health care – emerging field – Bloodless surgery: tissue cutting, coagulation

– Sterilization on surgical tools and hands

– Tissue texturing: joint

Light

<Fluorescent Light> <Plasma Display Panel>

Molecular excitation in the plasma -> UV emission -> absorption in phosphor -> emission of visible light

Annemie Bogaertsa,*, Erik Neytsa, Renaat Gijbelsa, Joost van der Mullenb, Spectrochimica Acta Part B 57 (2002) 609–658

http://escience.anu.edu.au/lecture/cg/Display/printCG.en.html

Surface modification

Jong Hoon Kim, Juhee Sohn, Jin Hoon Cho, Myeong Yeol Choi, Il Gyo Koo, Woong Moo Lee*, Plasma Process. Polym. 2008, 5, 377–385

(a) Schematics of the experimental setup and the electrodes configuration

(b) AFM images of the surface of the Nafion membrane: Plasma treated a) For 0 min, b) For 1 min, c) For 3 min, d) For 5 min, with a 400W rf powered He/H2 plasma.

(a)

(b) <Nafion surface treatment in cc rf discharge>

0

2

4

6

C-F C-C S-O C-O C-SCh

emic

al b

on

d e

ner

gy

(eV

)

Chemical reactions

• Ozone water purification in Europe

M. Kogoma, S. Okazaki, Raising of ozone formation efficiency in a homogeneous glow discharge plasma at atmospheric pressure, J. Phys. D: Appl. Phys. 27 (1994) 1985–1987.

(a) Ozonizer electrode

U. Kogelschatz, B. Eliasson, W. Egli, From ozone generators to flat television screens: history and future potential of dielectric-barrier discharges, Pure Appl.

Chem. 71 (1999) 1819–1828

(b) Large ozone generator producing 60 kg ozone/h (by courtesy of Ozonia Ltd).

in out

Emerging application of plasma - Plasma Health Care

• Plasma application to biomedical

1. Spatially selective: thermal spread control of electro-surgery

2. Low temperature: sterilization at low temperature

3. Reactive species: chemical coagulation for bloodless surgery

Spatially selective plasma

http://www.valleylab.com/education/poes/index.html

<Valleylab Electro-surgical system>

10-6m2 entry area 0.5m2 exit area

Vs.

Low temperature plasma

Fig. 1. SEM images of the Bacillus subtilis spores (a) before plasma treatment and (b) after plasma treatment for 5 min with a ruptured spore pointed.

Fig. 2. Fluorescence images of the propidium iodide stained Bacillus subtilis spores (a) before plasma treatment and (b) after plasma treatment for 5 min.

(Color version available online at http://ieeexplore.ieee.org.)

Xutao Deng, Jianjun Shi, and Michael G. Kong, IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 34, NO. 4, AUGUST 2006

Inactivation of Bacillus subtilis Spores Using Cold Atmospheric Plasmas

Reactive species plasma

Gregory Fridman, Marie Peddinghaus, HalimAyan, Plasma Chem Plasma Process (2006) 26:425–442

- Temperature of the cut remains at room temperature. - Wound remains wet.

<Chemical coagulation for bloodless surgery>

Equipment and analytical tools for Sam’s plasma research

Plasma generation

• Electrical – Signal generator

– Amplifier

• Gas – Mass flow meters:

gas flow rate

Measurement

• Electrical – Z-scan

– Oscilloscope

• Optical – Spectrometer

– ICCD camera

• Sample – High speed camera

– FT-IR

– Microscope

Sam’s preliminary work

• Plasma for tissue cutting

– Contact vs. non-contact mode plasma

– Plasma type: atmospheric pressure plasma jet

– Frequency: 13.56MHz

– Sample: chicken breast (muscle)

Experimental Setup

Motorized stage

Amplifier Matching Box

Function Generator MFC

Motion Controller

BNC Connector

Sample

He or

Ar

Plasma device

Contact vs. non-contact Plasma for tissue cutting

Contact mode plasma Non-contact mode plasma

Result

Contact mode cut Non-contact mode cut

13.56MHz, 50W, Ar 500sccm 13.56MHz, 50W, He 1000sccm

Conclusion

• Conventional plasma application

– Light

– Surface modification

– Chemical reaction

• Emerging plasma application

– Bloodless plasma surgery

– Sterilization

– Coagulation

• Sam’s future work

– Plasma application to tissue cutting

– Electrical and Chemical effect on tissue samples

– Plasma selectivity on different tissue

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