Download - GENCOA Key Company Facts
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GENCOA Key Company Facts
• GENCOA is a private limited company (Ltd)
• Founded 1995 by Dr Dermot Monaghan
• Located in Liverpool, UK
• Employs 34 people6 design (Pro E 3D CAD)4 process development & simulation14 assembly & test4 sales & tech support (2 Asia based)3 administration & accounts3 hardware & software (Speedflo)
• > 3000 magnetrons supported in the field
• > 600 speedflo systems supported in the field
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Other activities include on-site process implementation, training and tuning
GENCOA products cover 3 sputtering related areas
Magnetron Sputter Cathodes
planar & rotatable
Reactive gas controller
& endpoint detector
Linear ion sources
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GENCOA Key Company Advantages
• 8 types of magnetic systems for rotatable magnetrons• 10 types of planar magnetic designs• On-site process implementation• Unique PDF+ algorithm for reactive gas process control • In-situ and ex-situ* PEM, lambda sensor, target voltage• Key IPR covering dual rotatable magnetrons and magnetic anode assisted rotatable processes.
• GENCOA provide process solutions by supplying components and know-how that exceeds your expectations:
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Sales agents / distributors located around the world and 95% of output is exported from the UK
Main markets are USA, EU, Japan, Taiwan, Korea & China
Local Gencoa based staff for technical support in USA, EU & Asia
GENCOA worldwide company presence
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Key Advantages
• GENCOA have developed an inverted magnetron type linear ion source to provide the best process solution combined with highly robust components:
• Optimized magnetic fields to produce a collimated plasma beam at standard sputtering pressures.• Graphite anode and cathode to protect the substrate from contamination and provide long-life components.• RF standard electrical insulation on all ion sources.• In-direct cooling of anode and cathode – quick switching of parts. • Easy switching of cathode parts to provide multiple magnetic traps for lower voltage operation, or a focused beam.• Voltage regulated power supply with gas adjustment feedback to maintain same current at all times.
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Concept of operation based upon space
plasma thruster devices
• A plasma jet is generated by the combined closed magnetic trap, high voltage between anode and cathode, and correct pressure –gas flow through the magnetic trap.
+ VAnode
Cathode Cathode
Gas injected (P~ 10-2 Torr)
Vacuum side (P~10-4 Torr)
B
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Ion Gun
e.VA(VA =Anode Voltage)
No. ofions
Energy, eV
~ e.(VA/2)
Energy of the ions are an average of the discharge voltage / 2
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Power Modes
-100
0
100
200
300
400
500
600
700
800
900
1000
1100
1200
1300
1400
0 50 100 150 200
Time, a.u.
An
ode
Vol
tage
, V
DC
DC-Pulsed
semi-AC
Various power modes are possible, but DC is standard
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0.50
1.00
1.50
2.00
2.50
3.00
kV
100 500 1000
Normal operation area
Extended operation areaOperation range for the IM source
mA/metre
Low energy area
Gas consumption: ~ 100 sccm argon per metre length
Typically the sources operate at upt0 1 Amp per meter length and at upto 100 sccm
per meter length
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External mounting im300 with carbon cathode
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Internal mounting im400 with metal cathode and cantilever mounting
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Internal mounting im600 with carbon cathode and end support mounting
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Internal mounting im800 with metal cathode and end support mounting
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Internal mounting im800 with carbon cathode and rear support mounting
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Internal mounting im950 with metal cathode and end support mounting
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Internal mounting im1000 with carbon cathode and end support mounting
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External mounting im1500 with carbon cathode
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Adaptors available to convert to existing port designs – MRC / KDF shown
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Standard straight beam arrangement
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Standard straight beam arrangement
im1500 External
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External mounting im500 with optional focused beam arrangement
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IM800 - Ion Source - Anode Voltage vs Current # graphite on
0
0.5
1
1.5
2
2.5
3
0 100 200 300 400
Ion Source current, mA
An
ode
Vol
tage
, kV
Ar: 13.4 sccm
Ar: 27.8 sccm
Ar: 41.4 sccm
Ar: 48.4 sccm
Ar: 55.6 sccm
Typical operating parameters im800
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IM400 V vs I plot for Ar flow rate (%)
0.2
0.4
0.6
0.8
1
1.2
1.4
1.6
1.8
2
2.2
2.4
0 50 100 150 200 250
Ion Source current, mA
An
ode
Vol
tage
, kV
14.7 sccm
21 sccm
28 sccm
34.7 sccm
41 sccm
48.5 sccm
Typical operating parameters im400
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Oxide etch rates:Gas ArIM600, 300 mA beam @ +1.6 kVExample of oxide: SiOxEtching rate: 5 nm/min static (over 8 mm diameter substrate, total time 23 mins)
Polymer etch rates:Gas: O2IM400: 200 mA beam @ +1.5 kVSubstrate in rotation at equivalent 600mm/min linear speed (80 passes)Example of polymer: siliconeEtching rate ~ 20 A/passExample of polymer: acrylicEtching rate ~ 38 A/pass
Example of metal Ti:
Typical etch rates for different materials
Etching rates: 0.5-1 A/pass (170 mA @ +1.82 kV)
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Plasma surface treatment
Comparison of wetability of un-treated and treated PET film – 1 pass.
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Robust mechanical design, easy to access and connect
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Long operating lifetime, very easy to service and maintain
No water or vacuum seal broken during anode / cathode change, typically 2 hours for full conversion from straight beam to focused beam mode.
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Gencoa provide a unique customer built power supply that automatically regulates
the gas flow for ease of operation
Output voltage Up to 2500V ( 3000V ignition voltage ) Output current 2 A @ 2000V, short circuit 2.5A Output Power 4000W @ 2000V Output polarity Positive Regulation Mode Current 0-2.5A Output connector Fischer, type 105, 10kV rating for RG213 coax cable
Mains input 3x400Vac +/- 10% 50Hz ( L1,L2,L3 PE) Dimensions Standard Rack 19” 4U=177mm High Weight 12kg Cooling Forced air cooling Working temperature 15-35°C
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GENCOA
I M
MKSMFC
Pump
Chamber
IM-3000-BDS-VT
Power Supply
Power Cable
MFC cable (for MKS's MFC), D9-D15 Shielded
Gas
MFC Spec:MKS 1179A
Db15±15V
Schematic of the ion source with power supply and automatic gas regulation
Removes beam variation – I & V regulated
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Schematic of the ion source with power supply and automatic gas regulation
Of more than 1 gas type – needs speedflo mini
IM-3000-BDS-VT
Spe
edflo
Pump
Gas1
Gas2
Gas3
MKSMFC1
MKSMFC2
MKSMFC3
Chamber
IM Voltage Feedback
(0-10V)
GENCOA
I M
Gas Line
Speedflo Cable
High Power Cable
Voltage feedthru cable
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IM600 at 300mA - gas Ar - Example of voltage
tracking feature via auto control of gas
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Any length of plasma beam is available and a variety of mounting options
Thank you for your attention