Examining  Crystalline  Structure  of  Pre-­‐Cast  Photoresist  Film  

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Electron microscopy in Field Emission Mode!

First  Layer  or  Lamella  

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Second  Layer  or  Lamella  

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PREPARATION  OF  SAMPLE  

•  Pre-­‐cast  photoresist  dry  film  is  etched  with  10%  w/v  NaOH  causing  more  soluble  component  to  dissolve,  leaving  behind  less  soluble  component  appearing  as  verMcal  cylinders.  

•  SeparaMon  of  film  is  arMfact  cause  by  heat  transfer  of  electron  beam.  

CLEAVAGE  MECHANISM  BETWEEN  LAMELLAE  DURING  STRIPPING  

•  SEM’s  reveal  that  the  dry  film  is  polycrystalline  and  that  lamellae  slide  over  each  other  during  thermal  stress.  

•  This  implies  the  forces  between  lamellae  are  weaker  than  the  forces  between  the  verMcally  oriented  polymer  molecules.  

Proposed  Mechanism  for  Ordered  Structure  

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