co laser-produced sn-plasma source for high- volume...
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1 2008 EUVL Workshop, 11, June 2008
CO2 Laser-Produced Sn-plasma Source for High- volume Manufacturing EUV Lithography
Extreme Ultraviolet Lithography System Development AssociationGigaphoton Inc*
Akira Endo*
AcknowledgmentsThis work was supported by the New Energy and Industrial This work was supported by the New Energy and Industrial
Technology Development Organization Technology Development Organization --NEDONEDO-- Japan. Japan.
2008 EUVL Workshop11 June, 2008
Wailea Marriott Hotel, Hawaii
Ver. 1.0
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2 2008 EUVL Workshop, 11, June 2008
Introduction - LPP source roadmap and concept
Update of CO2 laser produced Sn plasma source - Laser output power- Sn droplet target- Sn plasma guiding by magnetic field
LPP/EUV future direction to HVM
Summary
OutlineOutline
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3 2008 EUVL Workshop, 11, June 2008
1st Mid term2004/9
2nd Mid term2006/3
EUVA Final2008/3
HVM source-12010
EUV Power (IF)Stability
Laser Laser freq.CE (source)
Target
5.7W 1)
---YAG:1.5kW
10kHz0.9%
Xe-Jet
10W 1)
s<±10%CO2 :2.6kW
100kHz0.9%
SnO2 choroid liquid jet
50W 2)
s <±5%CO2 : 7.5kW
100kHz2.5%
Sn-Droplet
110W 2) /140W 3)
3s<±0.3%CO2 : 10kW
100kHz4%
Sn-Droplet
LPP Source Roadmap
Technology for <10WTechnology for <10WNd:YAG Laser, Liquid Xe jet
Technology for 115Technology for 115--200W200WCO2 Laser, Sn droplet target
Magnetic field mitigationNote)Primary source to IF EUV transfer efficiency:1) 43% 2) 28% with SPF3) 36% without SPF
EUVA project Gigaphoton
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4 2008 EUVL Workshop, 11, June 2008
CO2laser + Sn LPP light source+ Magnetic field plasma guide
High EUV power >115 WEUV StabilityCollector mirror lifetime Low CoG / CoO
Requirement for EUV source for HVM
Light Source Concept
LPP: Laser-Produced Plasma
Sn target supply
Magnetic field plasma guiding
IFHigh power pulsed
CO2 Laser
Sn collector
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5 2008 EUVL Workshop, 11, June 2008
LPP Concept : HistoryLPP Concept : History
2001: Concept of CO2 laser based LPP source. (Patent applied in 2001)2001: Concept of MOPA CO2 laser based LPP source.
(Patent applied in 2001)2002 /09: EUVA light source project starts (with Gigaphoton, USHIO and
Komatsu)2003: Concept of Magnetic field ion mitigation (Patent applied in 2004)2004 /09: EUV 5.7 W IF was demonstrated (Nd:YAG and Xe jet)2006 /03: EUV 10 W IF was demonstrated (CO2 and SnO2 choroid liquid jet)2007 /02: EUV 40 W IF was demonstrated (CO2 and Sn target)2007 /10: EUV 60 W IF was demonstrated (CO2 and Sn target)
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6 2008 EUVL Workshop, 11, June 2008
Introduction - LPP source roadmap and concept
Update of CO2 laser produced Sn plasma source - Laser output power- Sn droplet target- Sn guiding by magnetic field
LPP/EUV future direction to HVM
Summary
OutlineOutline
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7 2008 EUVL Workshop, 11, June 2008
■ Laser System
Laser Power:
13 kWPulse Width:
20 nsRepetition Rate:
100 kHzBeam quality : M2 1.1Pulse energy stability : 2% (3s, 500 pulses)
Main-AmplifierRF-excited CO2 laser
Pre-AmplifierRF-excited CO2 laser
OscillatorWave length: 10.6umRep. rate :100kHz Pulse width :20 ns (FWHM)
13 kW60W 3 kW
High power CO2 laser MOPA system
Laser beam profile
100 W at I/F equivalent
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8 2008 EUVL Workshop, 11, June 2008
Main AmpPre-Amp
IF IF (intermediate focus)(intermediate focus)
Collector mirror 1sr (=3sr x 1/3)
Oscillator
Rotating Sn plate target
System configuration
EUV chamber
Amp laser
EUV output evaluation at intermediate focus
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9 2008 EUVL Workshop, 11, June 2008
EUV IF power : 16 W (measured by 1sr collector)60 W (4 sr collector, calculated)
Target :
Rotating Sn plateLaser irradiation power: 6 kW (100 kHz, 20 ns) EUV energy stability : 3.8% (3σ, 500 pulses)IF image size : 3.6 mm (H), 3.3 mm (V) at 1/e^2Etendue : 1.9 mm2sr (4 sr collector)
0
0.1
0.2
0.30.4
0.5
0.60.7
0.80.9
0 100 200 300 400 500 600 700 800
Number of pulses
EUV
ener
gy@
IF [m
J]
EUV pulse energy at intermediate focus point
EUV output evaluation at intermediate focus
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10 2008 EUVL Workshop, 11, June 2008
Freq. : 92kHz 112kHz 142kHz 320kHz 500kHz
Size : φ47um φ
44um φ41um φ28um φ19um
Spacing : 176um 146um 115um 65um 44um
Sn droplets observed at 50mm from the nozzle
Sn droplet target
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11 2008 EUVL Workshop, 11, June 2008
ChargingElectrode
Deflection Electrode
Dropletgenerator
Back light
CCD
Piezo. Driver
Syncro.
Piezo.
Charging controllerDC or Pulse
δ
E
Lo
L
ChargingElectrode
Deflection Electrode
Dropletgenerator
Back lightBack light
CCD
Piezo. Driver
Syncro.
Piezo.
Charging controllerDC or Pulse
δ
EE
Lo
L
Droplet generator and deviation system
Isolated 40-um Sn droplets
Sn droplet target
4mm
1mm
偏向電極Deflection electrode
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12 2008 EUVL Workshop, 11, June 2008
Emission from laser produced plasma
Distance0
Ele
ctro
n de
nsity
Laser
Laser plasma interaction region
X-ray emission
Hot dense plasma
nc
Distance0
Ele
ctro
n de
nsity
Laser
Laser plasma interaction region
X-ray emission
Hot dense plasma
nc
)m()cm/e(1011.1n 2
321
c μλ×
=
2
20
c emn ωε
=
Critical density nc(e/cm3) Frequency ωp/2π Wavelength λc Comments
2.5×1012 14 GHz Ku- band microwave1.0×1019 10.6 mm CO2 laser1.0×1021 1.06 mm Nd:YAG laser1.8×1022 248 nm KrF excimer laser
Electron density profile
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13 2008 EUVL Workshop, 11, June 2008
Double pulse laser irradiation onto Sn droplet
Experimental setup
Irradiation image
COCO22 LaserLaser20 mJ20 ns
FC II
DropletsDroplets
SpraySpray
SnSn--DropletDropletDiameter: 32um Diameter: 32um Spacing: 100umSpacing: 100um
CCD
YAG Laser (YAG Laser (λλ=1.06um)=1.06um)5 mJ10 ns
YA
GCO
2
The maximum conversion efficiency of 2.5 % is obtained at a YAG-CO2 delay time of about 5μs.
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14 2008 EUVL Workshop, 11, June 2008
Chamber diameter = 600mm
magnet diameter = 1500mm
magnet field flux (center) ~ 3.0T
magnet field flux (plasma) ~ 2.0T
1) Investigation of Tin ion flux in “Real” 3D-space2) Optimization of Tin debris evacuation.
Magnetic field plasma beaming
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15 2008 EUVL Workshop, 11, June 2008
Magnetic field plasma guiding
Superconducting magnet was installed for:1) Investigation of Tin ion flux in “Real” large space.2) Optimization of Tin debris evacuation.
Without magnetic field Magnetic flux density : 2T
Laser : CO2 laser, Target : Sn plate
Visible image of Sn plasma flow in magnetic field
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16 2008 EUVL Workshop, 11, June 2008
for laser Φ6mm
2TApprox. 6mm×40mm
Witness platefor EUV measurement
CO2 laser
0°
Sn plate
Witness plate
0T
Results on symmetry axis with & w/o B-field
Tin Tin iions are effectively confined and ons are effectively confined and guided by the magnetic field.guided by the magnetic field.
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17 2008 EUVL Workshop, 11, June 2008
37.5°
67.5°
52.5°
Magnetic field plasma guiding
No deposition
No deposition No deposition
Low Deposition
Erosion
Strong deposition
22.5°
7.5°
22.5°CO2 laser
0°
Sn plateEtching
Dendolite
Nanopowder
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18 2008 EUVL Workshop, 11, June 2008
Introduction - LPP source roadmap and concept
Update of CO2 laser produced Sn plasma source - Laser output power- Sn droplet target- Sn guiding by magnetic field
LPP/EUV future direction to HVM
Summary
OutlineOutline
![Page 19: CO Laser-Produced Sn-plasma Source for High- volume ...client.blueskybroadcast.com/SPIE/EUV08/content/pdf... · 2002 /09: EUVA light source project starts (with Gigaphoton, USHIO](https://reader033.vdocuments.site/reader033/viewer/2022042914/5f4dc82ec615d5042800eea1/html5/thumbnails/19.jpg)
19 2008 EUVL Workshop, 11, June 2008
デブリミティゲーション用マグネット①
デブリミティゲーション用マグネット②
中間集光点(IF)
Snドロップレット生成器
Sn回収装置
CO2レーザ
プラズマ
MagnetSn supply
Collector mirror
CO2 laser
Plasma
Sn collector
IF
Gigaphoton LPP Light Source
- Sn Droplet- High power pulsed CO2 laser - Magnetic-field Plasma Guiding
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20 2008 EUVL Workshop, 11, June 2008
ETS(Internal use only)
SD (1st Gen.)(proto/
integration possible)
HVM(2nd Gen.)(product)
Timing 2009/1Q 2009/4Q 2011/1Q
Power (Source to IF:34% (R=0.6, 4sr(0.64), T=0.9)
100W 140W 280W
Drive laser 10kW 10kW 20kW
CE 3.5% 4.0% 4.0%Target Tin droplet Tin droplet ←
Mitigation Single magnet& ionization
magnet& ionization
←
C1 Mirror Spec. 4sr60 Bi-layer
R>60%
TBDHeat Protected
TBD
Life 200Bpls TBD TBD
Tool interface (I/F) No Yes Yes
Duty >75% TBD TBD
EUV LPP light source roadmap
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21 2008 EUVL Workshop, 11, June 2008
280W
40W
140W
100W
0
100
200
300
400
500
07Q1 08Q1 09Q1 10Q1 11Q1 12Q1
Pow
er a
t IF
(W)
Power roadmap
(Today) (ETS)
(SD:1st generation)
(HVM:2nd generation)
Commercial system
140W will be available in 2010 & 280W in 2011
Today to SD Non commercial system
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22 2008 EUVL Workshop, 11, June 2008
Summary
LPP source at EUVA (non-integrated setup)■Further advance of component technology is reported
■13 kW drive laser output power; 100 W in-band EUV at I/F equivalent.scalable to 20 kW.
Sn droplet active control and 1.5% efficiency is achieved.EUV output evaluation at intermediate focus.
60 W at I/F achieved with 6kW CO2 driver laser power.Preliminary target: solid Sn disk and 2.5% efficiency is achieved.Magnetic field plasma guiding of CO2 laser produced Sn plasma.
Sn deposition reduced by magnetic field.Sn plasma is guided by magnetic field.
→ Basic technology for Sn evacuation is established.
Next step (integrated setup)Integrated system demonstration with advanced component technology and mirror lifetime evaluation.