pcb manufacture photoresist method

Operating Step:1, removing film, photosensitive film is sandwiched between two layers of film, tear up the side of the first little difficult to tear, try a few on the line2, then foil, copper clad laminates little cleaning can paste level, try not to bubble3, stickers, ready, irons a little heat, not too hot, fixed effect

4 printed circuit board film, it is recommended that the film can achieve the highest degree of fine, if not accuracy requirements with sulfuric acid paper print.5, exposure, circuit diagram printed on the photo plate (Note: The dry film is negative, so anti-white print, which is contrary to our usual plate) for about 30 minutes with ordinary energy-saving lamps, exposure machine 1 minute on the line, the sun never tried, it should be about 15 minutes, the exposure process obviously, because the photosensitive film will change color, from light-colored dark blue exposure. You will easily see the circuit diagram is shown in the board.6, developing, torn off another layer of protective film and put it into the developer (developer 1:100 watered, 10 grams against 1 liter of water), developing with a cotton swab and a little harder to wipe the board7, etching Needless to say8, after etching, stripping, mold release agent watered one sixty or 70, the board bulb within minutes7. Clamp the printed transparency film by the polymethyl methacrylate glass.

8. Fasten the printed transparency film.

9. Begin to exposure about 90-150 seconds.

10. The distance between the lamp and the glass is about 10cm. 

11. Preparing to develop. (20g photoresist dry film developer mixes with 800ml 30℃ water)

12. Put the plate into the develop solution and brush it gently.

13. After 5 seconds, it looks like the below photo.

14. After 15 seconds, it looks like the below photo.

15. The photo of finished developing.

16. Magnify the photo.

17. Preparing the materials of etching. (200g etching powder mixes with 800ml 100℃ water)

18. Begin to etching. Put the plate into the etching solution. The temperature of the solution had better in 50℃ above.

19. Preparing the materials of remove. (50g photoresist resist remover powder mixes with 1000ml water)

20. Begin to remove.

21. Finished the remove.

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