development of the x-ray timing and polarization telescope...
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Institute of Precision Optical Engineering2014.12.11
Development of the X-ray Timing and
Polarization telescope optics
Zhanshan Wang, Xin Wang, Zhengxiang Shen, Baozhong Mu, Xinyan
Yang, Li Jiang, Runze Qi, Mingwu Wen, Zhong Zhang, Bin Ma
Institute of Precision Optical Engineering
School of Physics Science and Engineering
Tongji University, Shanghai 200092, China
Outline Fabrication procedure of telescope of XTP
Fabrication of ultrathin glass substrates
Alignment and Integration of telescope
Summary and outlook
Institute of Precision Optical Engineering2014.12.11
The X-ray Timing and Polarization (XTP) mission, proposed
by IHEP, is currently being developed in China to explore
some main physical problems by observing the Black Holes
and other compact objects.
1. X-ray Timing and Polarization(XTP) project
Institute of Precision Optical Engineering2014.12.11
Coat Glass Mount Glass X-ray CharacterizationSlump Glass
① Fabrication of ultrathin glass substrates
② Deposition of depth-graded multilayers
③ Alignment and Integration of telescope
④ X-ray characterization
Institute of Precision Optical Engineering
1. Fabrication procedure of telescope of XTP
2014.12.11
2. Fabrication of ultrathin glass substrates
Direct Slumping Glass Technique
• Internal size of Oven: 60cm×60cm
• Maximum temperature: 1287C
• Uniformity of temperature: ~1°C
Institute of Precision Optical Engineering2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt release layer Pt film was deposited by magnetron sputtering technique
Thickness of Pt film: 10nm, 15nm, 50nm
Thickness of Pt layer measured by XRD
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt release layer
After thermal cycle Pt film was peeled off from the mould
2014.12.11
0 1 2 3 4 5 6 7 8 9 10 11 12 130
100
200
300
400
500
600
500
Tem
pe
ratu
re(C
)
Time(hour)
SP
Thermal cycle for slumping glass
560
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt/Cr release layer Parameters of Pt/Cr film Pt: 50nm; Cr: 5nm
2014.12.11
0 1 2 3 4 5 6 7 8 9 10 11 12 130
100
200
300
400
500
600
500
Te
mpe
ratu
re(C
)
Time(hour)
SP
Thermal cycle for slumping glass
560
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt/Cr release layer
Parameters of Pt/Cr film
Pt: 50nm; Cr: 5nm
Before slumping-Mould After slumping-Mould
Before slumping-Glass After slumping-Glass
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt/Cr release layer Surface roughness of Pt/Cr mould
Rq/nm Sit1 Sit2 Sit3 Sit4 Sit5 Sit6 average
50×-before 0.65 0.60 0.68 0.57 0.67 0.64 0.64
50×-after 3.35 3.22 3.07 3.03 2.62 3.44 3.12
Before slumping-Mould After slumping-Mould
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt/Cr release layer Surface roughness of slumped glass
Before slumping-Glass After slumping-Glass
Rq/nm Sit1 Sit2 Sit3 Sit4 Sit5 Sit6 average
50×-before 0.48 0.47 0.49 0.49 0.48 0.48 0.48
50×-after 6.63 6.6 9.53 8.96 9.09 8.83 8.27
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt/Cr release layer Parameters of Pt/Cr film
Pt: 50nm; Cr: 3.5nm, 2.5nm, 1.5nm
Pictures of mould and glass
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Micrographs and roughness of glass after slumping
Cr: 3.5nm Cr: 2.5nm Cr: 1.5nm
Contaminants were reduced obviously by decreasing the thickness of Cr film
0.55nm1.53nm3.70nm
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Pt/Cr release layer
Thickness of thin films
Deposition parameters of thin films
Pt: 50nm; Cr: ~1nm
Working pressure: 6mTorr, 8mTorr, 12mTorr, 15mTorr, 20mTorr
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Interferometry test with CGH compensator
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
3D Coordinate Measuring Machine
The accuracy is less than 0.3+L/800 micronThe accuracy is less than 0.3+L/800 micron
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
New Magnetron Sputtering Coater for XTP
Substrate holder
target
Deposition on slumping glass, or deposition on cylindrical glass mandrel
2014.12.11
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
High quality multilayers + fast production
Small interface roughness High deposition rate/ uniformity
Opening width
Smaller opening width - smaller roughness
Sample plate
2014.12.11
4 6 8 10 12 14 16 183
4
5
6
7
8
9
10
Rou
ghness
(A
)
opening width (cm)
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Target mask: further reduce the sputtering width
Reasonable roughness with <6.5cm width
Sample positions
2014.12.11
0 1 2 3 4
100
101
102
103
104 Measured fitting
Ref
ectivi
ty
theta
dw=3.18nm, roughness=0.45nmdsi=3.71nm, roughness=0.38nm
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
5% thickness uniformity within 32cm area
Opening width (sample plate)<12cmdeposition speed drops dramatically
2014.12.11
4 6 8 10 12 14 16 18
0.5
0.6
0.7
0.8
0.9
1.0
1.1
1.2
depo
sitio
n (r
otat
ion)
spe
ed
opening width (cm)
0 40 80 120 160 200
0.70
0.75
0.80
0.85
0.90
0.95
1.00
norm
aliz
ed d
L(mm)
mask width 2.4cm 3.5cm 4.5cm 6.5cm 8.7cm
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
W/Si depth-graded multilayer, N=200150mm x ~70mm (opening angle 60d)
2014.12.11
0.0 0.5 1.0 1.5 2.010-4
10-3
10-2
10-1
100
R
theta
G0.4d 10keV design 10keVmeasured
0.0 0.5 1.0 1.5 2.0
10-4
10-3
10-2
10-1
100
R
theta
G0.4d 8keV design 8keVmeasured
0.0 0.2 0.4 0.6 0.8 1.0
10-3
10-2
10-1
100
R
theta
G0.4d 18keV design 18keV measured
2. Fabrication of ultrathin glass substrates
Institute of Precision Optical Engineering
Uniform coating for 30deg angular area
Chi=0d
Chi=15d
2014.12.11
0.0 0.2 0.4 0.6 0.8 1.0 1.2 1.410-5
10-4
10-3
10-2
10-1
100
Refec
tivity
theta
D2 18keV Chi-0 deg Chi-5 deg Chi-10 deg Chi-15 deg
3 Alignment and Integration of telescope
Integration method Integration machine
Institute of Precision Optical Engineering2014.12.11
1. Mandrel Fabrication and Test
1. Mandrel Fabrication and Test
2. Epoxy degassing and mixture
2. Epoxy degassing and mixture
3. Put the epoxy into a syringe
3. Put the epoxy into a syringe
4. Put the graphite rod into guiding shoes
4. Put the graphite rod into guiding shoes
5. Paste epoxy on the graphite rod
5. Paste epoxy on the graphite rod
6. Glue the graphite rod to slumping glass
6. Glue the graphite rod to slumping glass
7. Cure the epoxy7. Cure the epoxy 8. Machining the graphite rod
8. Machining the graphite rod
9. Paste epoxy on the graphite rod
9. Paste epoxy on the graphite rod
10. Put the slumping glass on the graphite rod
10. Put the slumping glass on the graphite rod11. Cure the epoxy11. Cure the epoxy12. Measure the
performance of the glass12. Measure the
performance of the glass
3 Alignment and Integration of telescope
The process of integration of telescope
Institute of Precision Optical Engineering2014.12.11
3 Alignment and Integration of telescope
Device of epoxy degassing and mixture
Pasting device of epoxy Glass rods with same thickness
Institute of Precision Optical Engineering2014.12.11
3 Alignment and Integration of telescope
Graphite rods with same thickness
Institute of Precision Optical Engineering2014.12.11
Institute of Precision Optical Engineering
4. Summary and outlook
Ultrathin glass substrates for XTP telescopes have been primarily fabricated.
Plane telescope has been assembled.
Depth graded multilayers has been made.
Improvement should be done for making ultrathin glass substrates, depth graded multilayers.
The prototype XTP telescope should be fabricated soon.
Characterization of substrates, multilayers and prototype telescope.
2014.12.11
Thanks for your attention!
• IPOE multilayer group, Tongji University, China• Zhang Shuannan, Lu Fangjun, Dong Yongwei in IHEP • BSRF, SSRF, NSRL
Acknowledgements
Natural Science Foundation of China
National 863 High Technology Program
Strategic Priority Research Program on Space Science, the Chinese Academy of Sciences
Institute of Precision Optical Engineering2014.12.11
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