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WSM: Characterization of transistor WSM: Characterization of transistor drain supply terminal impedance at i l l f i signal envelope frequencies Zoya Popovic Scott Schafer Zoya Popovic, Scott Schafer , David Sardin, Tibault Reveyrand * Ui it fC l d B ld UniversityofColorado, Boulder *XLIM, Limoges, France WMC: The Importance of Low-frequency Measurements on High-frequency Characterization on High frequency Characterization

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Page 1: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

WSM: Characterization of transistorWSM: Characterization of transistor drain supply terminal impedance at

i l l f isignal envelope frequencies

Zoya Popovic Scott SchaferZoya Popovic, Scott Schafer,

David Sardin, Tibault Reveyrand *

U i it f C l d B ldUniversity of Colorado, Boulder

*XLIM, Limoges, France

WMC: The Importance of Low-frequency Measurements on High-frequency Characterizationon High frequency Characterization

Page 2: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Outline and Topics

S li ti th t i l fSome applications that require low-frequency characterization of microwave components or devicesdevices

Supply modulated PAs and drain supply characterizationcharacterization

“Time reversal” of PAs – transistor rectifier characterizationcharacterization

What has not been done but would be useful

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 2

Page 3: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Bias and signalsDC+LF(signal)

in outDC

RF+LF(signal)

RF+LF(signal)in

out

out

in(in)

RF( LF) RF( LF)

DC

out RF(+LF) RF(+LF)

Amplifier with Supply Modulation

Rectifier (with modulation to vary DC level)

Applications: Efficient power amplifications of increasingly difficult signals Wi l i b i f t d d i Wireless powering, power beaming, fast dc-dc conversion

Supply dynamically modulated at signal (LF) bandwidth to improve PA efficiency – requires modeling at very different time scales

M d l ti RF i i l ll f i d i

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 3

Modulating a RF powering signal allows for improved conversion efficiency or variable DC power level

Page 4: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Motivation: high efficiency for high PAR signalsg y g g

• PA consumes most power– 1.4W required for cooling, power

distribution etc for each 1W

30% Efficiency

50% Efficiency

RF Output Power 50W 50Wdistribution, etc, for each 1W dissipated

• Traditional high-PAR PA efficiency

Dissipated in PA 117W 50W

Dissipated by cooling, distribution, etc.

165W 71W

Total Input Power 332W 171W– Efficiency degrades with reduced output power

– Average efficiency is low for high-PAR signals

Total Input Power 332W 171W

StandardWCDMA i l

• Techniques in this work– Raise PA efficiency at PEP with

harmonic-tuned PA design toTraditionalEfficiency

TargetEfficiency

WCDMA signal

harmonic tuned PA design to >80%

– Extend high-efficiency PA operation to average power level

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 4

Page 5: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Supply-modulated PAs• Most of the envelope

modulates the supplyA portion of the envelope

DC+LF(signal)

• A portion of the envelope modulates the drive

• The trajectory optimizes efficiency

RF+LF(signal)

efficiency RF+LF(signal)

• Measured GaN PA at 2.14GHz• Three example trajectories

perform tradeoff between PA efficiency and supply modulator req irements

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 5

requirements

Page 6: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Example low-bandwidth high PAR signal

LTE-type signal PAR = 9.7 dB

Supply tracking

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 6

Page 7: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Result with high efficiency supply modulator 4500

2500

3000

3500

3000

3500

4000

4500

Integrated S-band PA with DSM1

Input pdf

Output pdf, dynamic Vdd

1000

1500

2000

2500

1500

2000

2500

S band PA with DSM1PAE~50%CPAE 40-45%

*PAE ~ 56% for higher

-50 -40 -30 -20 -10 0 10 20 300

500

1000

Input Power (dBm) -40 -30 -20 -10 0 10 20 30 400

500

1000

PAE 56% for higher input powers

2500

3000

3500

4000

Vdd = 28V, PAE 36 9%

Output pdf, Vdd constant

0.6

0.7

0.8

0.9

elop

e Volta

ge

Supply ModulatedInputVdd = 30 V

1000

1500

2000

PAE=36.9%

Vdd = 30V, PAE=39.5%

0.2

0.3

0.4

0.5

Nor

malized

Out

put E

nve

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 7

-40 -30 -20 -10 0 10 20 30 400

500

Output Power (dBm)

80 100 120 140 160 180 200 220 240 2600

0.1

Sample

Page 8: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Increased bandwidth high PAR signal

OFDM signal

PAR = 9.1 dB

Supply trackingNeed better:-Supply designpp y g-Includes knowing load (PA supply terminal)

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 8

Page 9: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Dynamic resistance• Trajectory T1 clearly has amore dynamic

drain impedance than T3p• Can we quantify and how does it impact PA

design?

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 9

Page 10: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Simulated drain resistance

At higher bandwidth, cannot be assumedcannot be assumed to be purely real

• Rdd not directly related to PA load line; made constant over RF cycle by RFC• the output impedance of the SM should be kept low over a wide frequency range to

limit Vsupply error due to voltage division between the supply modulator output i d d l d PA i d

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 10

impedance and load PA impedance• Rdd and Idd both vary a lot more for T3 than for T2

Page 11: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

PA dynamic impedance measurement

• Bias tee is no longer a DC path

• Can the bias tee and output of the

P f th d i bi t i

• Can the bias tee and output of the PA be optimized for drain modulation?

• Purpose of the drain bias tee is to direct the modulation signal to the transistorD i d bi t S t• Desired bias tee S-parameters:

Frequency at baseband

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 11

Page 12: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Complex drain impedance measurement

• Determine complex impedance by voltage waveforms with oscilloscope (V1, V2)

Calibration allows measurement plane to be• Calibration allows measurement plane to be moved to transistor

d l b kTraditional bias network‐ Bypass caps‐ Source large dynamic currents‐ Reject ripple at high frequencyj pp g q y

SMPA bias network‐ EM+interconnect‐ Low large‐signal output impedance

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 12

Low large signal output impedance required over wide frequency range

Page 13: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Calibration for drain impedance measurement

• A reflection coefficient (MA,B,C) can be found from the two complex voltages V Vvoltages V1, V2

• Use 3 known standards A11, B11, C11– Similar to Short-Open-Load

calibrationcalibration• Can find S-parameters of Error Box

[L]:

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 13

Page 14: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Design of a LF/RF bias Tee• Simulated Bias Tee

– RF-Low Frequency Isolation > 30 dB– 0 8 GHz RF match (-20 dB)– 0.8 GHz RF match (-20 dB)– Low frequency and RF through loss

< 0.25 dB

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 14

Page 15: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Drain impedance: calibration validation

• To verify theTo verify the calibration and setup, a few arbitrary lumped impedances were measured

• Measuring waveforms with low amplitudes is difficult (short, open)

• Accuracy of ZL ± 5%

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 15

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Drain impedance measurements: transistor vs. PA, no RF drive

• Measurement setup is insetup is in progress

• Determine lcomplex

impedance by voltage waveforms with oscilloscope (V V )(V1, V2)

• Calibration allows measurement plane to be moved pto transistor

(Measurements taken on different devices biased with a

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 16

(Measurements taken on different devices biased with a similar drain current. No RF power was applied.)

Page 17: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Difference between PAs

4-GHz PA• Id = 50 mA• Vdpk-pk = 5 V• Pin = 15 dBm

2-GHz PA • Id = 160 mA

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 17

Id = 160 mA• Vdpk-pk = 5 V

Page 18: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

X-band GaN MMIC PASingle stage PA, two devices combined with a reactive combiner, devices are 10 fingers gx100um Total die size: 2.0mmx2.3mm TriQuint 0.15um GaN process

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 18

Page 19: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Drain Impedance Simulations

• Increasing bias decreases real and imaginary impedance (pinchoff to active)

• Increasing input power increases real impedance until

t ti(pinchoff to active) saturation

f=15MHz

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 19

Page 20: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Drain Impedance Simulations• While regions near top at high input power

indicate negative real impedanceg p• Potential low-frequency oscillations,

measurement needs to be done carefullymeasurement needs to be done carefully

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 20

Page 21: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Single-ended X-band MMIC PA

Si l t i l d dSingle stage single-ended, 10fingers x100um

3.8mmx2.3mm3.8mmx2.3mm

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 21

Page 22: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

MMIC PA drain impedance measurements

• Impedance increases before saturation• Imaginary impedance approximately 0

f= 5 MHz

• High initial impedance in pinch-off• Gain expansion visible in impedance

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 22

Page 23: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Conclusions about drain impedance measurementsp

• Variation of impedance at high modulation frequency is not negligiblenot negligible – Requires accurate characterization of transistor or accurate

modeling.

A f d l t l f i ith t t• Accuracy of model at low frequencies with output saturation is debatable

• Calibration at low frequency is criticalCalibration at low frequency is critical• Good measured results and correlation with nonlinear

device model can help design PA for SM/ET• A linear very broadband supply modulator might be the

best way to measure the dynamic drain impedance• A low-frequency network analyzer is also an option

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 23

• A low-frequency network analyzer is also an option

Page 24: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Supply issues:Current Slew-Rate in an SMPSCurrent Slew Rate in an SMPS

Current Ramping Up Current Ramping DownV VVs+

Control

+ΔILsw

L ΔI

Vs+

Control

Lsw

Vs-

ller VoutLsw -ΔILsw

Vs-ller Vout

I V V I V V Lsw S out

sw

I V Vt L

Lsw out S

sw

I V Vt L

Slew rate determined by:• inductance Lsw

• positive Vs+ and negative Vs

- DC supply rails

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 24

p s g s pp y

Page 25: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Connection between SM and PA importantp

• For a given envelope• For a given envelope waveform, required current slew rate is shown as a function of drain supply voltage

• Vs+ , Vs

- and the largest inductance Lsw that meets the worst-case slew-rate requirement

• Example: 2-carrier WCDMA, 6.8 dB PAR, 200W peak, 65V RFPA

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 25

Lsw = very small for high slew rate operation

Page 26: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Conclusions about SMPA low-frequency measurementsfrequency measurements

• Low-frequency important at input/outputLow frequency important at input/output, but that can be characterized at baseband

• Non standard measurements needed to• Non-standard measurements needed to characterize dynamic supply port impedanceimpedance

• Good measurements and ultimate l ti ith ( ) d l ill ll fcorrelation with (new) models will allow for

improved PA/SM co-design

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 26

Page 27: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Motivation for rectifier measurements

Wireless power beaming

• Wireless beaming vs. harvestingWireless beaming vs. harvesting• Modulate RF with LF to improve

rectification efficiency• Schottky diodes cannot handle

hi h

Rectifier

Far-field directional

Rectenna or rectenna array

RDC

Load

Fast switching dc-dc converters

high power• Use transistors as rectifiers

transmitter

PA RectifierDC1 DC2

Fast switching dc dc converters

• Wireless beaming vs. harvesting• Modulate RF with LF to improve

M1

RFout/G RFout RFout

RFinM2 M2 M1T

rectification efficiency• Schottky diodes cannot handle

high power• Use transistors as rectifiers

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 27

RFinUse transistors as rectifiers

Page 28: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Rectifier-PA duality

High power conversion efficiency of a power amplifier (DC to RF) and aHigh power conversion efficiency of a power amplifier (DC to RF) and a rectifier obtained by operating the amplifier in reverse (RF to DC) is achieved with time-reversal duality of the transistor’s main current source. The power amplifier (PA) and rectifier (R) drain terminal voltage and current p p ( ) ( ) gare related by

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 28

Hamill, D.C.: ‘Time Reversal Duality and the synthesis of a double class E DC-DCconverter’, 21st Annual IEEE Power Electronics Specialists Conference, 1990, pp. 512-521

Page 29: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Class-F PA and Rectifier Simulations• Simulations performed with a 8x75um GaN HEMT model at 2.14GHz• The nonlinear model includes:

– Nonlinear Cgs Cgd CdsNonlinear Cgs, Cgd, Cds– Gate-source and gate-drain diodes– Breakdown modeling– Trapping effect modelingpp g g

• Model reproduces nonlinear behavior for positive and negative drain voltages• For PA, consider drain efficiency as metric

• In class-F, 5 harmonics terminated• Vds=28V, Vgs=-4.9V, obtained efficiency of 72%

Ob I V d l d li d V I f d t tifi

Callet, G., Faraj, J., Jardel, O., Charbonniaud, C., Jacquet, J.C., Reveyrand, T., Morvan, E., Piotrowicz,S Teyssier J P and Quéré R : ‘A new nonlinear HEMT model for AlGaN/GaN switch applications’

• Observe I-V curves and load-line, and V,I waveforms and compare to rectifier

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 29

S., Teyssier, J.P. and Quéré R.: A new nonlinear HEMT model for AlGaN/GaN switch applications ,Intern. Journal of Microwave and Wireless Techn., 2010, 2, (3-4), pp. 283-291

Page 30: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Class-F PA and Rectifier Simulations• Simulations performed for rectifier mode with the same 8x75um GaN

HEMT model at 2.14GHz• Drain supply replaced by Rdc• Drain supply replaced by Rdc• The input is now RF power PinRF=PoutRF of the amplifier, injected in

drain port• Assuming DC gate current is negligible the RF-DC conversionAssuming DC gate current is negligible, the RF DC conversion

efficiency given by

• In class-F, 5 harmonics terminated• Pin=, Vgs=-4.9V, obtained efficiency of 80% with Rdc=120• Observe I-V curves and load-line, and V,I waveforms and compare to

rectifier

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 30

Page 31: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

PA-rectifier time reversal

Simulated GaN transistor I-V curves(gray), dynamic load lines (red) anddrain DC voltage and current (black)

Simulated GaN transistor I-V curves(gray), dynamic load lines (red) anddrain DC voltage and current (black)drain DC voltage and current (black)

for the PAThe blue line is the Vgs=-4.9Vtransistor characteristic (the gate bias

drain DC voltage and current (black)for the rectifierThe blue line is the Vgs=-4.9Vtransistor characteristic (the gate bias

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 31

point value)Vdd=28V, Power swept from 0-40dBm

point value) Time-reversal duality isseen at 2.14 GHz.

Page 32: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Simulated time domain waveforms

Simulated GaN transistortime domain intrinsic drainvoltage (blue) and currentfor the power amplifier withVds=28V, as the outputpower is swept from 0-40dBm

Simulated GaN transistortime domain intrinsic drainvoltage (blue) and currentvoltage (blue) and currentfor the rectifier as the poweris swept from 0-40dBm

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 32

Page 33: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Simulated load pull Simulated Class-F GaN transistor rectifier gate-port load-pull contours• Optimal impedance for conversion efficiency at 2.14GHz shown• Related to dynamic load-line with minimal enclosed area• Related to dynamic load-line with minimal enclosed area• Close to the I-V characteristic at constant Vgs

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 33

Reveyrand, T., Ramos, Popovic, Z. “Time-reversal duality of high-efficiency RF power amplifiers,” IETElectronics Letters, Dec.6 2012

Page 34: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Rectifier efficiencyRectifier performance measured at the coaxial reference planes at f=2.14GHz.

RF load impedances used formeasurements (black dots), where thecontours correspond to max efficiencyfor the complete power sweep applied

VDC and efficiency measured forRDC =98 and Zload = (229 + j0.9).

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 34

for the complete power sweep appliedto the RF drain port.

Page 35: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Measurements: Class F-1

Class-F-1 power amplifier based on TriQuint TGF2012 GaN 12-W diePout=7W at f=2.14GHz PAE=84.6% at Vdd=31V with G=19dB(published)

Roberg, M., Hoversten, J., and Popovi´c, Z.: ‘GaN HEMT PA withover 84% power added efficiency’, Electronics Letters, 2010, 46,(23), pp. 1553-1554

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 35

Page 36: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

PA measured as rectifier• An RF power sweep is performed at the input drain port for each RF

impedance provided by the tuner at the gate port• The output DC power delivered to the load RDC is calculated from the• The output DC power delivered to the load RDC is calculated from the

DC voltage as measured by a voltmeter• Time-domain measurements

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 36

Rectifier load-pull measurement setup

Page 37: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Measured time-domain waveforms

There is a gate signal with no gate input:Self-synchronous operation

Vgs= -4.4 VRdc= 98.5 ΩZg(f0)= 230 +j0.1Ω

V2 and I2 areV2 and I2 are signals coupled to the gate matching network th h C dthrough Cgd.

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 37

Page 38: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Measured efficiency and output voltage

• Efficiency greatlygreatly influenced by gate impedance p

• max = 85 % • Pin = 42 dBm• Vdc = 36 V• Low gate

impedance causes gate di d tdiode to conduct earlier

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 38

Page 39: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Rectifier conversion efficiency measurements

• Efficiency is greatly• Efficiency is greatly influenced by DC load

• High efficiency achieved at high input power and high output voltage

Vg= -4.4 V, Zg(f0)= 230+ j10 Ωmax = 85 % with Pin = 40 dBm and Rdc = 98 Ω

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 39

Roberg, M., et al., “High-Efficiency Harmonically-Termindated Diode and Transistor Rectifier," Microwave Theory and Techniques, IEEE Transactions on , (Accepted)

Page 40: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

LF modulation of input RF for rectifiers

Modulate input frequency or PWM to control output DC voltage in DC-DC

t

Modulate input frequency (multi-tone excitation) in order to improve conversion efficiencyconverter conversion efficiency

“A UHF Class E2 DC/DC Converter using GaNHEMTs ” R Marante N Ruiz L Rizo L Cabria J A

J.A Hagerty, F.B. Helmbrecht, W. McCalpin, R. Zane Z Popovic “Recycling ambient microwave

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 40

HEMTs, R. Marante, N. Ruiz, L. Rizo, L. Cabria, J. A. García, IEEE T-MTT, Dec. 2012

Zane, Z. Popovic, Recycling ambient microwave energy with broadband rectenna arrays,” 2004.

Page 41: WSM: Characterization of transistor - Tibault Reveyrand · Normalized Output Env 0.5 WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June

Conclusions

Low-frequency measurements for microwave circuits are not well established or understood

Currently very expensive microwave oscilloscopes or specialized nonlinear Currently, very expensive microwave oscilloscopes, or specialized nonlinear network analyzers are the only option

There is a need for time-domain measurements that can handle very different time scales

Simultaneous low and high-frequency measurements allow for new circuit approaches and designs

In this talk, we showed some challenges in envelope-frequency transistor and PA measurements for high efficiency transmitters and rectifierand PA measurements for high efficiency transmitters and rectifier measurements for power applications

0.8

0.9

tage

Supply ModulatedInputVdd = 30 V

Thank you !0.1

0.2

0.3

0.4

0.5

0.6

0.7

Nor

malized

Out

put E

nvelop

e Vol

t

WMC: The Importance of Low-Frequency Measurements for RF Characterization IMS2013, Seattle, June 2-7, 2013 41

80 100 120 140 160 180 200 220 240 2600

Sample