wafer handling wet processing cmp · immersion heaters sps offers a broad line of immersion heaters...

2015/04-RE

V1

Wafer Handling

Wet Processing

CMP

SPS - Asia Technology Pte Ltd.10 Ubi Crescent, Ubi TechparkLobby B, #06-18 Singapore 408564Tel.: +65 6593 4318E-Mail: [email protected]

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DI Water Heating Systems ............ 04 Fluid Heaters ............ 05 Immersion Heaters ............ 06 Process Baths ............ 07 Chemical Concentration Measurement ............ 08 Ultrasonic Flow Meters ............ 09 Spray Guns ............ 10

Slurry Injection Systems ............ 11 Megasonic Upgrades ............ 12 Concentration Measurement ............ 13 Portable Thin Film Measurement System ............ 14

Spin Process Stations ............ 15 Spin Processor & Coaters ............ 16 Spin Processor Options ............ 17 Hotplates ............ 18 Wafer Sorting ............ 19 Wafer Transfer ............ 20 Backgrind, Dicing & Die Expanding ............ 21 UV Curing ............ 22 Service & Consultancy ............ 23

Index

For Heating DI water with purity and temperature stability,Heateflex has the answer with Aquarius®I and Aquarius®II

Meeting Your Process RequirementsThe Aquarius® heating system is engineered to deliverhigh flows of continuous, at temperature, hot DI water.With models from 30 kW to 200 kW available, Heateflexoffers the flexibility to meet exact flow and temperatureprocess requirements. The larger kW systems providecost savings by reducing the need for multiple heaters.

Benefits:

Ultra Pure Fluid Path Precise Temperature Controls Ease of Installation N2 Not Required

Aquarius® Series Features:

Programmable Logic Controller (PLC) with Power-To-Flow Control® Plus for Constant, Accurate DI Water Temperatures

Completely Self Contained and Factory Tested Service Made Easy with the Modular Heater Design

Instantaneous Hot DIThe Aquarius®II features built-in recirculation to providehot DI at temperature, on-demand. This patented designreduces heat up time by implementing controlled heating when the unit goes into stand-by mode. Once demand is needed, the system returns to single pass mode with DI water already at temperature, saving process time and DI water usage.

Reduced Water UsageThe ability of the Aquarius®II to provide an instant supply of heated DI water negates the requirement for a trickle flow. Trickle flows of DI water are commonly used by DI water heaters in order to maintain pre-demand water tempera-ture. A slow stream of costly DI water is heated and sent to drain, wasting water and energy. The Aquarius®II elimi-nates this expenditure, thereby reducing the overall cost of operation for water heaters.

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0

25

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15

35.0030.0025.0020.00

Time (min)

Flow-5+5

15.0010.005.000.00

10

5

0

Output Process Temp

Aquarius® II Temperature Performance

DI Water Heating Systems

Tel.: +65 6593 4318www.sps-asia.cominfo@sps - asia.com

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Fluid Heaters

Stainless Steel Heating

Ultra-Pure PFA/PVDF In-Line Fluid HeatersHeateflex Corporation’s series of Ultra-Pure In-Line Heaters are designed for use in industrial fluid heating applications such as semiconductor, solar cell wafer manufacturing, and other applications which require the most exacting standards of purity. Constructed of the highest-quality fluoropolymer materials, these heaters are custom designed and built for use with deionized water, acids, and other diverse process chemistries.

Maximum Heating EfficiencyHeateflex heating technology provides the most efficient thermal response of any ultra-pure fluoropolymer heater on the market. At the core of Heateflex heaters is our low mass, specialized heating coil with all PFA wetted surfaces. These heaters deliver maximum power in the smallest possible space. Built with all PFA or PFA/PVDF wetted surfaces, Heateflex heaters are made to endure the rav-ages of aggressive chemical environments. This patented heat-ing element allows for a rapid response to process demands. Because of the low mass of the Heateflex® heating element, In-Line Heaters are able to reach temperature set points in the shortest possible amount of time with a more even heat distribution.

High-Purity Stainless Steel HeatingN2 Heating use these modules for heating Nitrogen or other inert gases. Its compact design allows for easy installation. Heateflex offers a variety of wattages to meet your requirement.

Benefits

Heated chemicals at the point of use High efficiency and purity High reliability and low maintenance Compact size for ease of installation No nitrogen purge required

Benefits

All-fluoropolymer wetted surfaces Microprocessor-based temperature controller

available with Power-To-Flow® Plus for single-pass applications

Heater sizes ranging from 1 to 12 kilowatts Most voltages available

Benefits

High Purity Heating for N2 or Fluids Compact Designs for space savings Easy Installation

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Immersion Heaters

SPS offers a broad line of immersion heaters for constant temperature baths and other processes that require the direct application of clean heat. Heateflex immersion heaters are compact and highly customizable, allowing for maximum work area to reduce the amount of process chemicals consumed. Heateflex immersion heaters heat efficiently and evenly for better temperature results.

Features All PFA Wetted Surfaces Ambient to 200°C Temperature Range

Safety Interlocks to Heater Power Over-Temperature Thermocouple

Note: The Heateflex Immersion Heater is designed for use with tanks of PVDF, PFA, or quartz. Please check with Heat-eflex Corporation on compatibility with tanks of other construction materials.

Benefits Heats Harsh Chemicals Compact and Flexible in Design Easily Customizable No Nitrogen Purge Required


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Process Baths

PTFE-Process tank

Seamless Isostatically compressed Maximum temperature limit is 180°C The Process Tank is manufactured as a single piece The optional drain or chemical fill ports are

implemented into the tank Normally drain connections are centered and 3/4”

FNPT or flare, other sizes or locations at reques

Recirculation Tanks optional Frame Heater:

PFA Wetted Surfaces Platinum Tipped Ground Wire O/T Thermocouple, Type J 10’ Lead Wire Lengh Extra Support Bar Stock for End Support Top Perforated Floor Grid

Megasonic Arrays with Impulse RF controller

Operating frequencies from 400 kHz to 3 MHz Power densities up to 2 Watts/cm 2 Process fluid temperatures to 60°C Single wafer to dual 200mm Available for use with own tank or as complete

quartz direct -megasonic cleaning stationd

Heated Quartz Bath also available in recirculation:

Rotomolded enclosure in PVDF, Machined Quartz Drain

1 O/T T/C, 1 O/T Snap Switch, both interfaced to O/T controller (option)

2 O/T Snap Switches directly connected “in-line” to the heaters

PTFE-Process tank

Megasonic Arrays

Recirculation Tanks

Heated Quartz Bath

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Chemical Concentration Measurement

PR-33-S

PR-23-MS

Refractometer PR-23-MSMeasures real time concentration of heated etching solutions in temperatures up to 160 °C. The concentra-tion of dissolved solids is determined by making an optical measurement of a solution’s refractive index. The PR-23-MS provides a continuous 4-20 mA or an Ethernet signal. This ensures immediate feedback to the control system if the chemical is out of specification.

Refractometer PR-33-S Measures real time chemical concentrations in the cleanroom environments and integrated process tools. Applications in the bulk chemical dispensing, and in point-of-use blending, spiking and monitoring applications. Simple OEM integration.

Typical uses

Indicates bathlife and hot KOH concentration in silicon etch.

Indicates bathlife and hot H3PO4 concentration in silicon nitride etch.

Typical uses

Prevents wrong chemicals or wrong chemical concentrations from being dispensed onto wafers.

Indicates bathlife and timing for spiking in the BEOL wafer cleaning, e.g. for water in EKC.

Monitors the H2O2 concentration in the blending and dispensing of CMP slurries.

Monitors blending of SC-1 Monitors TMAH concentration.


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Ultrasonic Flow Meters

The ESPRO flow meters are designed for contact-free precision flow measurement of high purity fluids. The ul-tra-pure PFA body contains no moving parts, eliminating any possibility for particle generation.

The ESPRO flowmeter uses a non-contact ultrasonic sensor method, that detects the Karman vortex in your fluid. Light weight and compact, the ESPRO flow meters compact design allows fitting on closely-spaced parallel piping. D-series are equipped with a small monitor and provide analog output, pulse output as well as high & low boundary output.

Key features Because PFA Flowmeters measure Karman

Vortices using a non contact ultrasonic sensor method, they contain no moving parts such as flippers & floats, thus eliminating particle generation.

High and Low alarm boundaries can be set to any level using selector keys.

Light weight and compact, ESPRO flowmeters are simple to install.

Monitor attached series (V-xxD) and monitor unattachedseries (V-xx) are available depending on application.

Principle of operationIf a fluid flows past a shedder body, a regular pattern of vortices called Karman Vortex street alternately trails aft in the wake. The ultrasonic wave oscillating time varies proportional to the vortex shedding frequency. We can obtain the measured flow by detecting any changes in ultrasonic wave oscillating time.

The number of generated vortices is depending on the flow speed only and independent on other parameters as viscosity or specific gravity of the fluid.

Dimensions

Receiver

Ultrasonic Waves

TransmitterKarman VortexShedder Body

Flow

Housing

Red: DC24V Power SupplyBlack: 0V Power SupplyWhite: 4-20mA Output (+)Blue: 4-20mA Output (-)Yellow: Pulse Output (+)Gray: High/Low Boundary Output (+)

See ‘’ Instructions on wiring’’

Low Alarm Selector Mode/Down key

A - Model V-10 - V-10D | 3/8 inch PFA tube (Ø9.53xØ6,35)B - Model V-15 - V-15D | 1/2 inch PFA tube (Ø12.7xØ9,53)C - Model V-20 - V-20D | 3/4 inch PFA tube (Ø19.05xØ15,9)D - Model V-25 - V-25D | 1 inch PFA tube (Ø25.4xØ22,2)

High Alarm Selector Mode/Down key

High Output Alarm Indicator Lamp

High Output Alarm Indicator Lamp

Indicating flow rate

A B C DA

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Spray Guns

Spray Guns (SG)Our spray guns are constructed of virgin PTFE and Polypropylene to provide them with a long life span in harsh acid corrosive environments. Due to their design and comfortable grip Spray Guns are quickly becoming the industry standard in semiconductor fab plants, wet benches and work processing stations. All the Spray Guns may be purchased individually or with a variety of fittings and hoses.

DI Spray/ Rinsing Guns(Max. operating pressure 75 PSI)(Media Temperature Range: 40ºF - 130ºF)

Nitrogen Guns (Nitro)Our PTFE Nitrogen Guns (Nitro) can deliver maximum anti-corrosion protection wherever extreme chemical environments are used in the vicinity of nitrogen dispensing or drying. Like its companion, the DI Water Spray, Nitro is manufactured of the same durable materials to resist acid attacks.

Nitrogen Guns / Drying Guns(Max. operating pressure 75 PSI) (Media Temperature Range: 40ºF - 130ºF)

Note: add - FT for Front Trigger Option.

Note: add - FT for Front Trigger Option (NITRO - 4 and NITRO - 4T only).

Part No.

SG -103SG -102SG -101

Description

Standard Spray Gun with 1/2 FNPT inlet thread.Spray Gun with 3/8” FNPT inlet thread.SG -101 Spray Gun with 1/4” FNPT inlet thread.

Description

Standard nitrogen hand spray with 1/4”FNPT inlet thread, filter housing with disposable filter.

Same as Nitro 1 only using a standard spray gun body configuration.

Part No.

Nitro -1

Nitro -2

SourcePart No.

NITRO-3NITRO-3TNITRO-4NITRO-4T

Hose Assy.

C4-PUC4-FEPC4-PUC4-FEP

Fitting

J44MC-F-44J44MC-F-44

Fitting

J44MC-F-44J44MC-F-44

Gun

NITRO-1NITRO-1NITRO-2NITRO-2


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Slurry Injection System

The innovative high efficiency Slurry Injection System now supports both 200mm and 300mm platforms on most high volume manufacturing CMP polishers including Mirra®, Reflexion®, IPEC, Ebara, and others systems. The non-invasive kit consists of an Injector, an Injector Mount and a Mounting Clamp.

As more metal levels and CMP steps are added to devices, the associated consumable costs, (slurry, pads and conditioners) are climbing exponentially. The slurry delivery system reduces slurry usage dramatically. Test results have shown cost savings between 20-60%, depending on which pad/slurry combination was used.

This slurry delivery system is now being used at multiple SEMATECH member company sites. It offers a simple and non-intrusive system, that can easily be integrated with an HMV (High Volume Manufacturing) polisher. The SIS will show substantial slurry savings (based on volume) below the POR flow rate while maintaining the POR re-moval rate, as well as an equivalent or better within-wa-fer non-uniformity as compared to the POR.

The SIS is sold to customers as a kit that can be installed, used and un-installed with maximum ease and efficiency.

Installed on AMAT Mirra® Polisher

One thumb screw toremove for pad change;

takes 1 to 2 minutes.

Uses existing slurry plumbing. Does not require the removal of the slurry

applicator or injector that comes with the polisher.

Requires no process changes except slurry flow rate or polish time reduction.

Can be installed and removed rapidly (in less than 2 minutes) for pad changes.

Requires no power. Does not require changes in the polisher

software. Does not require physical modification of the

polisher. Polisher interlocks do not have to be disabled.

Injector Unit

Slurry Injection PointsFinal configuration depends on the particular of the process

Injector Mount

MountingClamp

Mirra® and Reflexion® are registered trademarks of Applied Materials.

Suitable for installation on:

Applied Materials Mirra®, Reflexion® and Reflexion LK®

SpeedFam IPEC 372 and 472 Also available for EBARA

Kit for AMAT Mirra® Polisher

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200mm Sapphire MegPie Integration Kit with Manifold including:

Extension ARM Assy. (hard Anodized Aluminum) MegPie Mounting and Adjustment Assy.(316 SS) 200mm Sapphire MegPie transducer with

integrated RTDs. WashPod Assy (PP Natural). Process Fluid Delivery Manifold (PTFE). Optional 2nd dispense arm.

Upgrade Provides:

Non-Contact Clean No Consumables Zero Particle Adders Proven Documented PRE Elimination of Cross

Contamination Process Control Alarms SPC Data via Fab Network

Upgrade Provides:

New Direct Megasonic Technology Improved Uniformity & Cleans Exceptional MTBF (no glue bonds or solder joints to fail) Feedback loop for real-time monitoring Process Control Alarms SPC Data via Fab Network

Brush Replacement Cleaning SystemDNS Scrubber Brush Replacement kit featuring theproven 200mm Sapphire MegPie and IMPulse 200electronics suite.

Megasonic Upgrades

Single Wafer Cleaning - DNS / OnTrak ScrubbersUpgrade your scrubbers from brush/nozzle to single wafer megasonic for enhanced wafer cleaning, improved uniformity, and zero maintenance or downtime.

OEM Replacement for Akrion Phaser / Gama benches, FSI Dolphin, PCT, Mirra Mesa etc.

Direct Upgrade for old indirect tanks. We can upgrade almost all older indirect technology to the new Direct technology systems, with the same substantial process benefits and costs savings - all offering a quick ROI.


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Concentration Measurement

Ultrasonic Cleaning Tank Hydrophone and Display MeterDespite the wide adoption of ultrasonic and megasonic cleaning, the acoustic characteristics are not well understood. The HCT hydrophone with MCT acoustic meter bridges this gap, offering a reliable solution to characterize and monitor the acoustic properties of ultrasonic and megasonic cleaners. Its unique single point sensing design allows measure-ments with high spatial resolution to offer true 3-dimensional mapping of the cleaning tank. The rugged construction allows routine mapping of the acoustic pressure and ultimately determination of the cleaning efficiency of the tank.

Frequency Range: 30 kHz - 300 kHz Probe Length: 35 cm (including handle) Calibration Cerificate Acoustic Meter, MCT-1010 (units in Prms) Compatible with standard oscilloscopes

Optional:High Frequency Acoustic Calibration 0.3 to 1.2 MHz

HCT Hydrophone withMCT Acoustic Meter

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Portable Thin Film Measurement System

FR-pOrtable unique features

Powered through USB, no-power cable is required. Really portable, probe sites over the sample. Materials are ideally suited for in field applications. Its small footprint brings film characterization in the

office. The lowest price in the market.

Accurate & USB-powered Film Characterization for Point-of-Need applications FR-pOrtable is a unique turn-key solution for accurate & precise optical characterization of transparent and semi-transparent single films or stack of films. With FR-pOrtable the user can perform reflectance measure-ments for films in the 350-1000nm spectral range.

Get rid of power cables and large lab space requirements. Thanks to its unique design, FR-pOrtable draws power from the USB cable that is used for its control from the computer.

FR-pOrtable is built around a miniature 3648 pixel 16 bit resolution spectrometer and a high stability hybrid light source that combines incandescent lamps and LEDs. The average light source life time is 20000h, and all its features, such as optical power, emission spectrum, stability etc., are controlled through the embedded μcontroller. The compact design of FR-pOrtable and the custom designed reflection probe, guarantee high accuracy and repeatability of the performed measurements.

FR-pOrtable, can be either mounted on the supplied stage or can easily be transformed to a handheld thickness measurement tool to be placed over the sample under characterization. This way, FR-pOrtable is the optical characterization tool for in the field applications.

* Specifications are subject to change without any notice.** Without the reflectance holder.

15nm – 90μm360-1050nm3648 pixels Si CCD array, 16Bit A/D resolution1nm>0.5mm Hybrid light source, combining LEDs and incandescent bulb (360nm - 1050nm) 10 - 150mm, irregular shapePC with Windows XP/Vista/7/8 32/64bit and a USB port availableUSB-powered300mm x 110mm x 40mm**600gr

Specifications*

ThicknessWavelength rangeDetectorAccuracySpot sizeLight sourceSample sizeComputer requirementsPower requirementsDimensions (WxLxH)Weight


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Spin Process Stations

An extremely versatile platform for a wide range of processes. Based on the proven high quality POLOS Single Substrate Spin Processor, the modular design Spin Process Station provides excellent value for money: full plastic construction, with high-end components, compatible with any chemical environment in a modular set-up, suitable for your specific requirement.

The seamless integration of polypropylene (optional PTFE) spin processor in the base station allows you to work with all kinds of chemicals. In the station housing various mod-ules can be incorporated and centrally controlled for supply of chemicals and gases.

Standard configurations are available for cleaning substrates as well as photomasks, photoresist coat-ing,developing, etching and lift-off processes.

Value for moneyFully automatic, accurate and repeatable processing:

Automatic Linear Dispense Arm:

Freely programmable static, dynamic or oscillating chemical dispense.

High pressure and/or megasonic cleaning directly to any point on the substrate. Static chemical dispense through a range of adjustable nozzles in the domed lid. Adjustable back-side spray arm. Heavy duty motor: programmable for 1 to 12.000 rpm. CW & CCW Rotation allowing puddle mode.

Freely programmable process:

Sequentially programmable multiple dispense lines. Stepless programming of various flows within

a process step from 150 up to 2500 ml/min (depending on dispense line thickness). For optional integrated mixing systems, the mixing rates of the various chemicals can be programmed per step.

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SPIN Processor & Coaters

Polos SPIN150i and SPIN200iThe versatile, high-quality Natural Polypro POLOS SPIN150i and SPIN200i single substrate spin processors are spe-cifically designed for R&D and low volume production. Suitable for all typical spin processes: cleaning, rinse/dry, coating, developing and etching. Systems are also avail-able in all-PTFE construction for specialist applications.

These well-proven models are ideal for processing a wide range of substrates from small fragments with a diameter of 5mm up to 160mm/260mm or square samples with dimen-sions 100x100mm or 150x150mm. Systems capable of up to 1000mm diameter are available.

System Benefits:

High speed acceleration up to 0 - 12.000rpm in 0.3 sec.*

A detachable touch screen control panel for use outside a glove box. (uses CAT5 cable)

Programmable CW & CCW rotation enables specialist processes such as ‘puddle’ develop and/or etch.

Engineering plastics, high quality seamless fabrication.

Lid and Bowl liner sets in anti- static PET. * depending on substrate size and chuck type

The units are operated via an easy to use, detachable colour touch-screen that offers intuitive programming and recipe storage. A variety of nozzles, megasonic clean-ing and dispense lines can be added as options.


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Systems also available for upto 450 mm wafers or 600 - 1000 mm substrates.

Spinner Options

Features:

Post-CMP cleaning. LIGA processes. TSV processing. Mask cleaning. Pre-SOIC bond cleaning. Etch assist. SU-8 develop. Plating pre-cleaning. Lift off. Pre-plating bubble removal. Resist strip. Post-laser cleaning.

Features:

Dispense a set volume from a reservoir. Dispensing and withdrawal pumping Additional pumping heads available for quick change Time saving Learn and RepeatTM mode Slow down and anti-drip modes improve

dispensing accuracy Calibration mode improves instrument repeatability Fully programmable with computer interface for

more advanced applications Store and select from up to 40 dispenses Easy-to-use keypad interface Compact design - 7 3/4” L x 5 1/4” W x 5 3/4” H

MegPie Megasonic Transducer

The Sapphire MegPie is a single-wafer Megasonictransducer for cleaning and sonochemical processing.It applies a uniform dose of acoustic energy to a rotatingsubstrate. The MegPie will improve process efficiencyand lower process time.

Peristaltic Pump

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Polos Hotplate

HL150S

12 kg

450x320x135mm450x320x200mm

500S

60 kg

700x700x370mm

HL200S

12 kg

Measurement and Weight

Weight:

Dimensionswith Hinged Lid:

Operational EnvironmentsThe system is designed for an ambient temperature of 10°C - 40°C.

Options:

Hinged lid. Proximity pins. Lifting pins. Vacuum bake.

The Modular setup of this new Table Top Hotplate enables easy plate (chuck) exchange and upgradeable options, making this a versatile and affordable tool for R&D and Pilot Lines. The POLOS Hotplate is available for processing single or double substrates. A precision digital temperature controller enables adjustable temperature steps of 1°C up to 230°C. It is suitable for soft bake as well as hard bake processes, and curing of photo resist or epoxy or any other work requiring precise temperature control.

Standard models for substrate sizes 150mm, 200mm and 500mm.


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Wafer Sorting

SPS Provides On-Site Preventive Maintenance and Train-ing on TBP and Faith Sorters and Transfer systems.

Four Cassette & Compact Two-Cassette SorterThe FCS 2015 is designed for automatic sorting based on waferID’s. The system consists of four load ports for 150 & 200mm. The CTS 2015 system consists of two load-ports for, both of them have optical wafer notch/flat-aligner and a linear-robot. With this system it is pos-sible to split, merge, sort, compress wafer-lots, or create individual wafer-mix as desired.

Lot and Wafer Identification SystemThe WMS-Series is designed to read the WaferID’s of a Waferlot. With this system all 25 wafers or individual wafers can be read for wafer tracking. The system is equipped with a wafer notch/flat-aligner, a wafer pres-ence/absence sensor, two linear-axis and waferID Read-er. The Mapdata can be sent over the GEM-Interface or via ASCII-File to the host.

On request the WMS is able to read also the front and the backside of a wafer. Models available for 100, 125, 150 and 200mm wafers.

Identification of Lot & Wafer Improve wafer monitoring efficiency. One system for Barcode,OCR and data matrix codes. Automatic mode upon loading the cassette including

cassette scanning and scribe reading. Flat or notch alignment +/- 1° Recipes can be stored and accessed via touchscreen. User friendly windowsTM interface

FCS 2015

CTS 2015

Lot and Wafer Identification System

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Wafer Transfer

Rapitran 3

Rapitran 50X2B

Rapitran 3 Wafer Transfer The Rapitran 3 is the latest major re-design in the long history of the Rapitran line of Wafer Transfer Systems. This third generation Rapitran improves upon what is already the world’s most trusted wafer transfer product. A result of many years of customer feedback and real-world experience, it incorporates the most beneficial upgrades and improvements while keeping all of the best features and reliability that our customers have come to expect.

VersatileThe Rapitran performs four standard transfers: 50 wafer load/unload, 25 wafer load/unload, Boat-to-Boat transfer and Cassette-to-Cassette transfer. It is compatible with most Quartz, Silicon Carbide or Metal boats.

Optional FeaturesFlatfinders, Heat Sensors, and Ionizer Bars can be installed on the system. Special wafer contact materials such as Ul-tem, Peek or Vespel are available and a SECSI/II RS-232 interface can be used for automated applications.

Rapitran 50X2B Back to Back Wafer Transfer The Rapitran 50X2B transfers 25 wafers from a cassette to a quartz boat, placing the wafers into a proximity back to back configuration. The cassette turntable makes this difficult transfer cycle completely automatic.

VersatileThe Rapitran 50X2B is compatible with most Quartz, Sili-con Carbide or Metal boats.

Optional FeaturesHeat Sensors and Ionizer Bars can be installed on the system. Special wafer contact materials such as Ultem®, PEEK or Vespel® are available and a SECSI/II RS-232 interface can be used for automated applications.


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Model UH108 Wafer Film Applicators are the ideal benchtop solution for your frontside protection tape application requirements. They offer a high degree of repeatable accuracy and are capable of cutting the film to the edge of the wafer, including the alignment flats, within 0.005 inches in less than 20 seconds.The standard Model UH108 can accommodate 3, 4, 5, and 6-inch 8” & 12” models are also available..

Model UH115 film frame film applicator features a semi-automatic one-pass lamination which provides an extra margin of safety when mounting particularly fragile wafers/substrates. Most mounters laminate the film in two passes, i.e. one pass as the film is laminat-ed to the film frame and wafer/substrate and a second relaminating pass as the roller returns to its home position. The Model UH115, however, laminates on the first pass only; the second pass is contact-free.

Model UH130 Die-Matrix Expander accommodates up to 300mm wafers/ film frames and features a 3-inch stroke with speed control and adjustable ram height. The heated wafer ram is regulated by a digital tem-perature controller and stops at a user preset height, resulting in consistent repeatability of expansion. The unit features a compact tabletop form factor and is extremely easy to operate.

Backgrind, Dicing & Die Expanding

Model UH108

Model UH115

Model UH130

Features

Static Ionization Bar w/power safety interlock. Motor-assisted film feed. Take-up roller assembly. Single-pass lamination. Adjustable motorized roller speed and pressure. Workstage height adjustable from top of unit. Accommodates film/protective layer wound

on the outside or inside.

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UV Curing systems


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UV Curing systemsThe Model UH104 UV Curings Systems are the most cost effective UV tape exposure solutions on the market. Despite their low cost, these units offer the same uniformity of UV exposure and fast UV curing times as other semiautomatic and automatic highend UV curing systems. In addition they feature a new environmentally safe, ozonefree UV lamp array with a cool, low-tem-perature UV-C 365nm curing process.

Features

Compact, desktop profile accommodates up to 300mm frame-mounted wafer

Environmentally safe, ozone-free UV lamp with fast curing time.

Easily programmable microprocessor-based controller

Repeatable, reliable, single-frame, manual operation

Exceptional cost/performance value Cool, low temperature UVA 365nm curing

process Highly energy-efficient Optional motorized, rotating workstage

Specifications UH104-8 UH104-12

HeightWidthDepth

9-5/8”20-3/16” 21-1/8”

11-1/8”25-1/8”25-3/16”

Service & Consultancy

Our products and services enable engineers to “make more with less” using “tomorrows technology with todays tools” with proven ROI - in some cases just a few months. Part of that includes offering specialist services including on-site upgrade installations, servicing and consultancy

ConsultancyWith over 25 years of collective experience solving different kinds of process and production problems in every kind of fab - we have seen and solved many issues.

Talk to us - we may already have the solution +65 6593 4318.

Service & Upgrades

Wafer AutomationOn-site servicing across the entire range of TB Ploner wafer sorters, ID mapppers, and transfer systems.

Customised in-house training on both operation and mainte-nance.

Wet Bench AutomationOn-site upgrade for old Akrion robot wet benches - replacing the old automation with a modern, high reliability long-life unit.

CMP Flow ControlOn-site upgrading of peristaltic pumps to high precision flow controllers for major slurry cost savings, increased yield and zero maintenance downtime. Rapid ROI.

On-site process development, customisation and installation of a CMP Slurry Injection System - the extra margins for slurry savings and process yield improvement. Rapid ROI.

Wet Clean UpgradesOn-site upgrading of DNS scrubber nozzle or brush to the latest technology single-wafer megasonic cleaner.

Replacement of Mirra® Mesa megasonic cleaning tank with a high reliability long-life unit.

Direct Megasonic Tank UpgradesReplacement of old indirect tanks with modern Direct mega-sonic process tanks. Major improvement in process technol-ogy with far greater uniformity and efficiency. Modern direct megasonic tanks do not consume N2 or cooling DI, and use only a fraction of the power the old indirect baths use. Rapid ROI.

Chiller RefurbishmentOff-site - a comprehensive repair and refurbishment service covering most industry standard wafer fab chillers.

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For over 25 years SPS - Europe has offered quality products and services as a one-stop shopping point for front-end semiconductor manufacturers and related industries. We supply a range of industry leading products used worldwide for Wafer Handling, Wet Processing, Photoli-thography and OEM Replacement parts. Dedication towards our customers and flexibility in finding the right solution, combined with solid application knowledge and fast supply logistics, are the keywords of our service. SPS-Asia Technology Pte Ltd. is subsidiary of SPS-Europe B.V. We operate as a full-service distributor offering full-time service engineer support for the systems we supply.

25 years of Quality Service and Products

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wafer handling wet processing cmp · immersion heaters sps offers a broad line of immersion heaters...

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