variability mitigation techniques in nanometer cmos

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Dídac Gómez, Joan Mauricio, Diego Mateo, Francesc Moll Variability mitigation techniques in nanometer CMOS technologies

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Page 1: Variability mitigation techniques in nanometer CMOS

Dídac Gómez, Joan Mauricio, Diego Mateo, Francesc Moll

Variability mitigation techniques in nanometer

CMOS technologies

Page 2: Variability mitigation techniques in nanometer CMOS

Research framework

ENIAC project MODERN (2009-2012) – 27 European institutions (Industry and Research) – 12M€ budget – ENIAC JU 120003 – MICINN PLE 2009-0024 (Spain institutions)

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 3: Variability mitigation techniques in nanometer CMOS

Outline

Introduction Variability in nanometer CMOS Adaptive digital circuits Thermal monitoring and control of RF blocks Conclusions

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 4: Variability mitigation techniques in nanometer CMOS

Nobody’s perfect…

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 5: Variability mitigation techniques in nanometer CMOS

The good news chart

Frank Schwierz - Nature Nanotechnology 5, 487–496 (2010)

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 6: Variability mitigation techniques in nanometer CMOS

Introduction: Sources of Variability

Proximity Spatial Temporal

Reversible Irreversible

Variation of chip mean

Parameter means (LG, VT, tox)

Environmental operating

temperature

Activity factor

Hot-electron effect

NBTI shift

Within-chip variation

Pattern-density

Layout-induced Variations

On-die hot spots

Hot-spot-enhanced NBTI

Device-to-device variation

Atomistic dopant Variation

Line-edge roughness

Parameter std. dev.

SOI body history

Self heating

rVT-NBTI

(NBTI-induced

VT distribution)

Source: Bernstein IBM R&D journal CEI UPM 5th Annual Meeting,

23rd March 2012

Page 7: Variability mitigation techniques in nanometer CMOS

M Bohr (Intel)

Technology evolution driven by variability

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 8: Variability mitigation techniques in nanometer CMOS

Lithography gap

45nm 32nm

193nm

20nm

Source: Mentor graphics

Since 0.35um technology the wavelength is larger than the critical dimension. Since 90nm node the wave length is stagnating.

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 9: Variability mitigation techniques in nanometer CMOS

Random dopant Line Edge Roughness (LER)

A. Asenov et al., “Simulation of Intrinsic Parameter Fluctuations in Decananometer and Nanometer-Scale MOSFETs”, TED, 2003.

Random fluctuations

Stochastic variations of physical parameters

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 10: Variability mitigation techniques in nanometer CMOS

Effect of PV

Source: Keith Bowman, Intel CEI UPM 5th Annual Meeting,

23rd March 2012

Page 11: Variability mitigation techniques in nanometer CMOS

Adaptive circuits

Variations are unavoidable or very expensive to minimize

Adaptive circuits try to correct deviations at runtime – Given a sensed magnitude of a circuit (delay or power), it

can be adjusted to its nominal value. – Digital circuits: Body Biasing (BB) and Voltage Scaling (VS)

can be used in order to control variability. – AMS&RF: voltage bias control.

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 12: Variability mitigation techniques in nanometer CMOS

Challenges for digital

Correlation between different magnitude variation – Reducing one may increase the other

Objective: – Study which sensing strategy gives the best overall

variability reduction. – Collateral effects between delay, leakage and dynamic

power variability reduction are studied.

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 13: Variability mitigation techniques in nanometer CMOS

Variability Analysis

Simultaneous Variation of Device Parameters: – 250 Monte Carlo simulations are done using an 8-Bit Ripple Carry

Adder as testbench (65nm) :

Value ±3σ

L ±20%

Tox ±10%

Wp, Wn

±5%, ±8.5%

Nsub ±10%

Temp 80ºC ±50%

Vdd ±10%

250 samples of static power, dynamic power

and delay are obtained.

Delay measure Dynamic power measure Leakage power measure

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 14: Variability mitigation techniques in nanometer CMOS

Variability Analysis

Corr. Coef. = 0.70 Corr. Coef. = 0.62

Corr. Coef. = 0.49

8-Bit Ripple-Carry Adder CDFs

Huge variability. 25% of samples with > 2x leakage.

Normal distribution. Samples ranged between 0.7x and 1.3x

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 15: Variability mitigation techniques in nanometer CMOS

Effect of Adaptive techniques (VS/BB) on

performance parameters

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 16: Variability mitigation techniques in nanometer CMOS

Variability reduction with different sensors

Four sensing strategies are proposed: – Single sensors:

Delay. Static Power (leakage current). Dynamic Power.

– Dual sensor: Delay + Dynamic Power.

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 17: Variability mitigation techniques in nanometer CMOS

Variability reduction with different sensors

Algorithm:

Measure

Sample

Estimate new VS , BB

BB , VS changed? No

VS = 1.2 VBB = 0 V

Yes

END

Apply VS , BB

Leakage Power Dyn. Power Delay Delay + Dyn. P.

Parameter Nominal Min. Max.

BB 0 V -0.9 V 0.5 V

VS 1.2 V 0.8 V 1.5 V CEI UPM 5th Annual Meeting,

23rd March 2012

Page 18: Variability mitigation techniques in nanometer CMOS

Variability reduction with different sensors

CEI UPM 5th Annual Meeting, 23rd March 2012

8-Bit Ripple-Carry Adder CDFs

No Sensor Leakage Dynamic Delay Dual

Delay variability has the highest correlation with leakage (62%) and dynamic power (70%). Using delay sensors, the overall variability is reduced.

Page 19: Variability mitigation techniques in nanometer CMOS

Thermal monitoring for AMS&RF

Thermal testing overview

Temperature is a low pass filtered version of electrical magnitudes. Joule effect behaves as an electrical mixer, downconverting information to DC or low frequencies.

Temperature couples through the common substrate-->non-invasive

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 20: Variability mitigation techniques in nanometer CMOS

Dynamic thermal testing

CEI UPM 5th Annual Meeting, 23rd March 2012

Requires single or multitone excitation. Exploits mixing properties of Joule effect

Page 21: Variability mitigation techniques in nanometer CMOS

Static thermal testing

Exploits correlation between transistor transconductance (DC) and figures of merit. It doesn’t need signal excitation.

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 22: Variability mitigation techniques in nanometer CMOS

Thermal feedback to correct deviations

• Exploits the capability of thermal measurements to Embed a CUT inside a negative feedback loop. •In this way, circuit variations can be compensated with temperature measurements.

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 23: Variability mitigation techniques in nanometer CMOS

Conclusions

In digital circuits, define proper adaptive strategy – Type of sensors – Knob (VS, BB) control algorithm – Granularity (core, IP block…)

In RF, thermal is a good option – Hi freq magnitudes downconverted to measurable

temperature – Natural analog control to adaptation

Experimental work in progress – “digital” (VCDL) circuits in 40nm – RF in 65nm

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 24: Variability mitigation techniques in nanometer CMOS

Papers

J. Mauricio, F. Moll, J. Altet, “Monitor strategies for variability reduction considering correlation between power and timing variability,” System on Chip Conference (SOCC), Taipei, September 2012.

J. Altet, D. Gómez, C. Dufis, J.L. González, D. Mateo, X. Aragonés, F. Moll, A. Rubio “On Evaluating Temperature as Observable for CMOS Technology Variability”, First European Workshops on CMOS Variability (VARI2010), 26-27 May,Montpellier (France).

M. Onabajo, D. Gómez, E. Aldrete-Vidrio, J. Altet, D. Mateo, and J. Silva-Martinez, “Survey of robustness enhancement techniques for wireless systems-on-a-chip and study of temperature as observable for process variations,” Springer J. Electronic Testing: Theory and Applications, vol. 27, no .3,pp.225-240,June 2011

D.Gomez, C. Dufis, J.Altet, D.Mateo, J. L. Gonzalez, “Electro-thermal coupling analysis methodology for RF circuits”,accepted for publication in Elsevier Microelectronics Journal, doi:10.1016/j.mejo.2011.04.011

D.Gómez,J.Altet,D.Mateo, “On the use of static temperature measurements as process variation observable”, accepted for publication in Springer J. Electronic Testing: Theory and Applications

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 25: Variability mitigation techniques in nanometer CMOS

Patents

Didac Gómez Salinas,Diego Mateo Peña,Josep Altet Sanahujes, “PROCEDIMIENTO PARA LA ESTIMACIÓN DE CARACTERÍSTICAS ELÉCTRICAS DE UN CIRCUITO ANALÓGICO MEDIANTE LA MEDICIÓN EN CONTINUA DE TEMPERATURA”, Spanish patent pending P201132099

Diego Mateo Peña ,Josep Altet Sanahujes,Didac Gómez Salinas, “CIRCUITO ELECTRÓNICO CON MAGNITUD ELÉCTRICA DE SALIDA DEPENDIENTE DE LA DIFERENCIA DE TENSIÓN DE DOS NODOS DE ENTRADA Y DE LA DIFERENCIA DE TEMPERATURA DE DOS DE SUS DISPOSITIVOS”, Spanish patent pending P201230276

Diego Mateo Peña ,Josep Altet Sanahujes,Didac Gómez Salinas, “PROCEDIMIENTO PARA LA MEDICIÓN DE LA EFICIENCIA DE AMPLIFICADORES DE POTENCIA INTEGRADOS LINEALES CLASE A UTILIZANDO MEDICIONES DE TEMPERATURA EN CONTINUA”, Spanish patent pending P201230234

CEI UPM 5th Annual Meeting, 23rd March 2012

Page 26: Variability mitigation techniques in nanometer CMOS

CEI UPM 5th Annual Meeting, 23rd March 2012

Thank you! Contact: http://hipics.upc.edu [email protected]