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The top documents of jonas-sundqvist
Potential of an ALD compatible ferroelectric
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HIGH-K DEVICES BY ALD FOR SEMICONDUCTOR APPLICATIONS
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SiGe epitaxy on a 300 mm batch furnace
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High-k für Alle - Beyond DRAM capacitors and HKMG
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CVD of Epitaxial SnO2 Films by the SnI4/O2 Precursor Combination
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Growth of SnO2 thin films by atomic layer deposition and chemical vapour deposition: A comparative study
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