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THE AVS 65TH INTERNATIONAL SYMPOSIUM & EXHIBITION

On behalf of everyone at AVS, we invite you to submit an abstract to the AVS 65th International Symposium and Exhibition, which will be held October 21st – October 26th, 2018 in Long Beach, California. The AVS Symposium is one of the premier forums for the presentation and discussion of the science and technology of materials, interfaces, and processing.

The theme of this year's Symposium is “Materials, Interfaces and Process Technology for the IoT Era” based on the predicted explosion of IoT devices in the coming years and promises to be more exciting and forward-looking than ever. One of the key ingredients which will lead to the advancement of IoT technology will be the

novel ‘IoT device’ which provides sense and compute processing at the edge, with communication to a central

cloud infrastructure. As such, advances in materials, interface engineering, and process technology for each

element of the IoT platform that will be essential to enable the scaling of IoT devices and the adoption of low cost

future IoT technology will be highlighted.

A sampling of sessions that encompass this theme include:

ALD for energy conversion, storage and electrochemical processes Integration of thin films and nanostructures for sensing and energy harvesting Thin film flexible electronics – materials, processes and device patterning Vacuum System Automation and Control Control and feedback for automation Beyond Traditional Surface Analysis Industrial and practical applications of surface analysis Applied surface analysis of novel, complex or challenging materials Profiling, Imaging and other multidimensional pursuits New Challenges and Opportunities in Surface Engineering Organ Fabrication and Monitoring; BioImaging; DNA and Natural Algorithims; Bioanalytics, Biosensors and Diagnostics Enabling IoT Era Flexible Electronics CMOS, Beyond the Roadmap and Over the Cliff Surface Chemistry, Functionalization, Bio and Sensor Applications Challenges of Sensor Manufacturing for the IoT MEMS for IoT: Sensing, communication and Energy Scavenging Organ Fabrication and Monitoring; BioImaging; DNA and Natural Algorithims Solar/Energy Harvesting

Materials and Devices for the Information Society

In addition, we shall feature programming on cutting edge topical areas. Focus Topics featured at this meeting include 2D Materials; Actinides and Rare Earths; Fundamental Discoveries in Heterogeneous Catalysis; Advanced Ion Microscopy; Novel Trends in Synchrotron and FEL-Based Analysis; Plasma Biology, Agriculture, and Environment; Spectroscopic Ellipsometry; and Tribology. New Focus Topics including In-situ microscopy, spectroscopy and microfluidics; Processing and Characterization of Air-Liquid, Solid-Liquid and Air-Solid Interfaces; Extending Additive Manufacturing to the Atomic Scale; Reconfigurable Materials and Devices for Neuromorphic Computing; Advanced Nanophotonics Metrology, Materials and Processes for Quantum Computing and featuring the Industrial Physics Forum.

These topics will complement our traditional strong core on fundamental surface science and interfacial phenomena, applied surface science, surface engineering, micro- and nano-electronics, nanometer–scale science and technology, manufacturing science and technology, thin films, plasma science and technology, micro- and nano-electromechanical systems, electronic and photonic materials, biomaterials, and vacuum science and technology.

As you examine the Call for Abstracts, we are sure that you will find many sessions that interest you as well as Oral and Poster sessions that are the perfect fit to present your latest research. Poster presentations are a great way to promote your work and interact one-on-one with many scientists and engineers during an extended time. In addition, some Divisions plan to host Flash presentation sessions, in which poster presenters will each have 2-3

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minutes to give an oral presentation summarizing their poster. Awards for posters and oral presentations given by students are also offered by many divisions and groups.

As well as the technical program, there will be an extensive equipment exhibition, and many networking and career advancement and recruitment events for those launching their careers as well as for established researchers. If you are new to the AVS community, we hope that you will find the symposium to be a place to develop new colleagues and friends with whom to share ideas for years to come. We encourage you to participate in this year’s symposium by submitting an abstract before the deadline on Wednesday, May 2nd.

We look forward to seeing you at AVS 65 in Long Beach!

Eric A. Joseph Mariadriana Creatore 2018 Program Chair 2018 Program Vice-Chair

P R O G R A M C O M M I T T E E

PROGRAM CHAIR

Eric A. Joseph IBM, T.J. Watson Research Center eric_joseph@avs.org

PROGRAM VICE CHAIR

Mariadriana Creatore Eindhoven University of Technology, The Netherlands, mariadriana_creatore@avs.org

2D MATERIALS

Co-Chair: Gunlycke, Daniel, Naval Research Laboratory

Co-Chair: Oleynik, Ivan, University of South Florida

Batzill, Matthias, Univ. of South Florida Chuang, Tien-Ming, Academia Sinica, Taiwan

Jauho, Antti-Pekka, Technical University of Denmark, Denmark

Mo, Sung-Kwan, Lawrence Berkeley Lab, University of California, Berkeley

Qian, Xiaofeng, Texas A&M University Warner, Jamie, University of Oxford, UK Xiao, Kai, Oak Ridge National Laboratory

ACTINIDES AND RARE EARTHS

Co-Chair: Shuh, David, Lawrence Berkeley National Laboratory

Co-Chair: Tobin, James G., University of Wisconsin-Oshkosh

Bagus, Paul, University of North Texas Denecke, Melissa, University of Manchester, UK

Durakiewicz, Tomasz, Los Alamos National Laboratory

Geeson, David, AWE, UK Havela, Ladislav, Charles University, Prague, Czech Republic

Nelson, Art, Lawrence Livermore National Laboratory

Rosa, Priscila, Los Alamos National Lab. Vitova, Tonya, Karlsruhe Institute of Technology, Germany

ADVANCED ION MICROSCOPY

Chair: Livengood, Richard, Intel Corporation

Golzhauser, Armin, Bielefeld University, Germany

Hlawacek, Gregor, Helmholtz Zentrum Dresden-Rossendorf, Germany

Notte, John A., Carl Zeiss Microscopy, LLC Ogawa, Shinichi, National Institute of Advanced Industrial Science and Technology (AIST), Japan

Ovchinikova, Olga, Oak Ridge National Laboratory

ADVANCED NANOPHOTONICS

METROLOGY Chair: Klimov, Nikolai, National Institute of Standards and Technology

Ahmed, Zeeshan, National Institute of Standards and Technology

Goldsmith, Randall, University of Wisconsin-Madison

Ilic, Robert, NIST

ADVANCED SURFACE ENGINEERING

Chair: Franz, Robert, Montanuniversität Leoben, Austria

Klemberg-Sapieha, Jolanta, Ecole Polytechnique de Montreal, Canada

Kodambaka, Suneel, University of California at Los Angeles

Lin, Jianliang, Southwest Research Institute

Panjan, Matjaz, Jozef Stefan Institute, Slovenia

Voevodin, Andrey, Univ. of North Texas

APPLIED SURFACE SCIENCE

Chair: Pacholski, Michaeleen, The Dow Chemical Company

Co-Chair: Artyushkova, Kateryna, University of New Mexico

Brumbach, Michael, Sandia National Labs Fisher, Gregory L., Physical Electronics Gaskell, Karen, University of Maryland, College Park

Grehl, Thomas, IONTOF GmbH, Germany Lerach, Jordan, The Pennsylvania State Univ. Matthews, Tamlin, Two Pore Guys, Inc. Nunney, Tim, Thermo Fisher Scientific, UK Ohlhausen, James, Sandia National Labs Pylypenko, Svitlana, Colorado School of Mines Spool, Alan, Western Digital Corporation

BIOMATERIAL INTERFACES

Chair: Baio, Joe, Oregon State University Carroll, Nick, University of New Mexico Graham, Dan, University of Washington Howell, Caitlin, University of Maine Leggett, Graham, University of Sheffield, UK Rosenhahn, Axel, Ruhr-University Bochum, Germany

Theilacker, Bill, Medtronic Valtiner, Markus, Vienna University of

Technology, Austria

Weidner, Tobias, Aarhus University, Denmark

BIOMATERIALS PLENARY SESSION

Chair: Baio, Joe, Oregon State University

ELECTRONIC MATERIALS AND PHOTONICS

Chair: Myers-Ward, Rachael, U.S. Naval Research Laboratory

Abate, Yohannes, Georgia State University Antonelli, Andy, Nanometrics Biyikli, Necmi, University of Connecticut Dietz, Nikolaus, Georgia State University Douglas, Erica, Sandia National Laboratories Filler, Michael, Georgia Institute of Technology Gupta, Shalini, Northrop Grumman ES Han, Sang M., University of New Mexico Hanbicki, Aubrey, Naval Research Laboratory Hilton, Jessica, RHK Technology Kapadia, Rehan, Univ. of Southern California Kawasaki, Jason, University of Wisconsin - Madison

Kim, Hyun Jung, NASA Langley King, Sean, Intel Corporation King, Seth, Univ. of Wisconsin – La Crosse Kummel, Andrew, University of California at San Diego

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Paquette, Michelle, University of Missouri-Kansas City

Rockett, Angus, Colorado School of Mines Strandwitz, Nicholas, Lehigh University Tischler, Joseph, U.S. Naval Research Laboratory

Tsai, Wilman, Taiwan Semiconductor Manufacturing Company (TSMC)

EXHIBITOR TECHNOLOGY SPOTLIGHT

WORKSHOPS

Chair: DeGennaro, Jeannette, AVS

EXTENDING ADDITIVE

MANUFACTURING TO THE ATOMIC

SCALE

Co-Chair: Ballard, Joshua, Indiana University

Co-Chair: Dyckoe, Ondrej, Oak Ridge National Laboratory

Felts, Jonathan, Texas A&M University Namboodiri, Pradeep, National Institute of Standards and Technology

Rack, Philip, Univ. of Tennessee Knoxville Ramasse, Quentin, University of Leeds, UK, United Kingdom of Great Britain and Northern Ireland

Susi, Toma, University of Vienna, Austria

FUNDAMENTAL DISCOVERIES IN

HETEROGENEOUS CATALYSIS

Co-Chair: Baber, Ashleigh, James Madison University

Co-Chair: Killelea, Daniel, Loyola University Chicago

Chen, Donna, University of South Carolina Jackson, Bret, University of Massachusetts - Amherst

Kimmel, Greg, Pacific Northwest National Laboratory

Roy, Sharani, University of Tennessee Sykes, E. Charles, Tufts University Weaver, Jason, University of Florida

INDUSTRIAL PHYSICS FORUM

Co-Chair: Ludeke, Rudy, IBM Emeritus Co-Chair: McArthur, Sally, Swinburne University of Technology and CSIRO, Australia

Alexander, Morgan, University of Nottingham

Bardi, Jason, American Institute of Physics

Belu, Anna, Medtronic Bentley, William, University of Maryland College Park

Castner, David, Univerity of Washington Graham, Dan, University of Washington Hammer, Bo, American Institute of Physics

Hollenhorst, Jim, Agilent Technologies

IN-SITU MICROSCOPY,

SPECTROSCOPY, AND MICROFLUIDICS

Co-Chair: Guo, Hongxuan, National Institute of Standards and Technology

Co-Chair: Kolmakov, Andrei, NIST Center for Nanoscale Science and Technology

Co-Chair: Liddle, Alexander, National Institute of Standards and Technology

Damiano, John, Protochips Inc. Hitchcock, Adam, McMaster University Kelly, Deborah, Virginia Tech Carilion Research Institute

Mølhave, Kristian, Technical University of Denmark

Stach, Eric, University of Pennsylvania

MAGNETIC INTERFACES AND

NANOSTRUCTURES

Chair: Ohldag, Hendrik, SLAC National Accelerator Laboratory

Baio, Joe, Oregon State University Donath, Markus, Westfälische Wilhelms-Universität Münster, Germany

Enders, Axel, Univ. of Bayreuth, Germany Hanbicki, Aubrey, Naval Research Lab. Hoffmann, Axel, Argonne National Lab. Kukreja, Roopali, University of California at Davis

Lauter, Valeria, Oak Ridge National Lab. Lukaszew, Ale, College of William and Mary

Mueller, Martina, Forschungszentrum Juelich GmbH, Germany

Myers-Ward, Rachael, U.S. Naval Research Laboratory

Oleynik, Ivan, University of South Florida Woltersdorf, Georg, Martin Luther University Halle-Wittenberg, Germany

Wu, Ruqian, Univ. of California Irvine

MANUFACTURING SCIENCE AND

TECHNOLOGY

Chair: Rogers, Bridget, Vanderbilt University Diebold, Alain C., Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute

Lad, Robert, University of Maine Rubloff, Gary, University of Maryland, College Park

Seebauer, Edmund, University of Illinois at Urbana-Champaign

Smentkowski, Vincent, General Electric Global Research Center

Svedberg, Erik B., The National Academies

MATERIALS AND PROCESSES FOR

QUANTUM COMPUTING

Chair: Adiga, Vivekananda, IBM Research Division, T.J. Watson Research Center

Brink, Markus, IBM Research Division, T.J. Watson Research Center

Ilic, Bojan Robert, NIST Mutus, Josh, Google Inc Paik, Hanhee, IBM Research Division, T.J. Watson Research Center

Sandberg, Martin, IBM Research Division, T.J. Watson Research Center

Yoder, Jonilyn, MIT Lincoln Laboratory

MEMS AND NEMS

Chair: Kotru, Sushma, The University of Alabama

Co-Chair: Davis, Robert, Brigham Young Univ. Blain, Matthew, Sandia National Laboratory Burkett, Susan, The University of Alabama Dhayal, Marshal, CSIR Centre for Cellular and Molecular Biology (CCMB), India

Diao, Zhu, Halmstad University/Stockholm University, Sweden

Feng, Philip, Case Western Reserve University Ghodssi, Reza, University of Maryland, College Park

Gousev, Evgeni, Qualcomm MEMS Technologies, Inc.

Hanay, Selim, Bikent University, Turkey Hentz, Sébastien, Cea Leti, France Hiebert, Wayne, National Institute for Nanotechnology, Canada

Ilic, Robert, NIST Krylov, Slava, Tel Aviv University, Israel Maboudian, Roya, University of California at Berkeley

Metzler, Meredith, University of Pennsylvania Naik, Akshay, Indian Institute of Science, India

Ng, Tse Nga (Tina), University of California at San Diego

Sumant, Anirudha, Argonne National Lab. Thundat, Thomas, Univ. of Alberta, The National Institute for Nanotechnology, Canada

Tian, Wei-Cheng, National Taiwan University, Taiwan, Republic of China

Wang, Max Zenghui, Case Western Reserve University

Zorman, Christian, Case Western Reserve University

NANOMETER-SCALE SCIENCE AND

TECHNOLOGY

Chair: Ilic, Robert, NIST Chair: Kalinin, Sergei, Oak Ridge National Laboratory

Co-Chair: Cohen, Sidney, Weizmann Institute of Science, Israel

Ballard, Joshua, Zyvex Labs Borovsky, Brian, St. Olaf College Burnham, Nancy, Worcester Polytechnic Institute

Czaplewski, David, Center for Nanoscale Materials, Argonne National Lab.

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First, Phillip, Georgia Institute of Technology

Hanbicki, Aubrey, Naval Research Laboratory Kim, Tae-Hwan, Pohang University of Science and Technology, Republic of Korea

Li, An-Ping, Oak Ridge National Laboratory Seshadri, Indira, IBM Research Division, Albany, NY

Sharma, Renu, NIST Ventrice, Jr., Carl, SUNY Polytechnic Inst.

NOVEL TRENDS IN SYNCHROTRON AND

FEL-BASED ANALYSIS

Co-Chair: Hussain, Zahid, Advanced Light Source, Lawrence Berkeley National Laboratory

Co-Chair: Kiskinova, Maya, Elettra-Sincrotrone Trieste, Italy

Co-Chair: Renault, Olivier, CEA/LETI-University Grenoble Alpes, France

Carla, Francesco, ESRF Fadley, Charles, Univ. of California, Davis Liu, Zhi, ShanghaiTech University, China Molodtsov, Sergueï, XFEL, Germany Rossnagel, Kai, Kiel University, Germany Schneider, Claus Michael, Peter Gruenberg Institute, Forschungszentrum Juelich GmbH, Juelich, Germany

Ueda, Shigenori, NIMS

PLASMA BIOLOGY, AGRICULTURE,

AND ENVIRONMENT

Chair: O'Connell, Deborah, University of York, UK

Agarwal, Ankur, KLA-Tencor Graves, David, University of California at Berkeley

Hamaguchi, Satoshi, Osaka Univ., Japan Mededovic Thagard, Selma, Clarkson University

Park, Gyungsoon, Kwangwoon University, Republic of Korea

Reniers, Francois, Université Libre de Bruxelles

PLASMA SCIENCE AND TECHNOLOGY

Chair: Agarwal, Ankur, KLA-Tencor Agarwal, Sumit, Colorado School of Mines

Despiau-Pujo, Emilie, LTM, Univ. Grenoble Alpes, CEA-LETI, France

George, Steven, University of Colorado at Boulder

Gordon, Michael, University of California at Santa Barbara

Hayashi, Hisataka, Toshiba, Japan Johnson, Erik V., LPICM, Ecole Polytechnique, France

Koga, Kazunori, Kyushu University, Japan Lishan, David, Plasma-Therm LLC

Maeda, Kenji, Hitachi High Technologies America Inc.

O'Connell, Deborah, Univ. of York, UK Pargon, Erwine, CNRS-LTM, Université Grenoble Alpes, France

Ranjan, Alok, Tokyo Electron Miyagi Limited, Japan

Reniers, Francois, Université Libre de Bruxelles

Samukawa, Seiji, Tohoku Univeversity, AIST, Japan

Sankaran, Mohan, Case Western Reserve University

Shearer, Jeffrey, IBM Research Division, Albany, NY

Sriraman, Saravanapriyan, Lam Research Corporation

Tatsumi, Tetsuya, Sony Semiconductor Solutions Corporation, Japan

van de Sanden, Richard, DIFFER, Netherlands

Vitale, Steven, MIT Lincoln Laboratory Walton, Scott, Naval Research Laboratory Wang, Mingmei, TEL Technology Center, America, LLC

Yeom, GeunYoung, Sungkyunkwan University, Republic of Korea

PROCESSING AND CHARACTERIZATION

OF AIR-LIQUID, SOLID-LIQUID AND

AIR-SOLID INTERFACES

Co-Chair: Kolmakov, Andrei, NIST Center for Nanoscale Science and Technology

Co-Chair: Nonnenmann, Stephen, University of Massachusetts - Amherst

Co-Chair: Yu, Xiao-Ying, Pacific Northwest National Laboratory

Baer, Donald, Pacific Northwest National Laboratory

Pacholski, Michaeleen, The Dow Chemical Company

RECONFIGURABLE MATERIALS AND

DEVICES FOR NEUROMORPHIC

COMPUTING

Chair: Hoskins, Brian, NIST Center for Nanoscale Science and Technology

Adam, Gina, Institute for Microtechnologies, Romania

Ilic, Bojan Robert, NIST Madhavan, Advait, National Institute of Standards and Technology, Center for Nanoscale Science and Technology

Skowronski, Marek, Carnegie Mellon Univ.

SPECTROSCOPIC ELLIPSOMETRY

Chair: Hofmann, Tino, University of North Carolina at Charlotte

Co-Chair: Diebold, Alain C., Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute

Co-Chair: Zollner, Stefan, New Mexico State University

Aspnes, David, North Carolina State University Creatore, Mariadriana, Eindhoven University of Technology, The Netherlands

Hilfiker, James, J.A. Woollam Co., Inc. Hingerl, Kurt, University Linz, Austria Liu, Shiyuan, Huazhong University of Science and Technology, China

SURFACE SCIENCE

Chair: Sykes, Charles, Tufts University Arnadottir, Liney, Oregon State University Bartynski, Robert, Rutgers, the State University of New Jersey

Chen, Donna, University of South Carolina Juurlink, Ludo, Leiden Institute of Chemistry, The Netherlands

Kay, Bruce D., Pacific Northwest National Lab. Koel, Bruce, Princeton University Mullins, David, Oak Ridge National Laboratory Parkinson, Gareth, TU Wien, Austria Reinke, Petra, University of Virginia Tait, Steven, Indiana University Teplyakov, Andrew, University of Delaware Utz, Arthur, Tufts University

THIN FILM

Chair: Poodt, Paul, Holst Centre / TNO, Netherlands

Adams, David, Sandia National Laboratories Akyildiz, Halil, Uludag University, Turkey Allred, David, Brigham Young University Becker, Joe, Kurt J. Lesker Company Cansizoglu, Hilal, University of California, Davis

Cavanagh, Andrew, University of Colorado Boulder

Conley, John, Oregon State University Creatore, Mariadriana, Eindhoven University of Technology, The Netherlands

Fitz-Gerald, James, University of Virginia George, Steven, University of Colorado at Boulder

Grubbs, Robert, Micron Technology Guisinger, Nathan, Argonne National Lab. Gupta, Subhadra, University of Alabama Jur, Jesse, North Carolina State University Kachian, Jessica, Applied Materials Kalanyan, Berc, National Institute of Standards and Technology

Kessels, Erwin, Eindhoven University of Technology, The Netherlands, Netherlands

Kumah, Divine, North Carolina State University

Lewis, Jay, RTI International Linford, Matthew, Brigham Young University Losego, Mark, Georgia Institute of Technology Mei, Antonio, University of Illinois at Urbana-Champaign

Muscat, Anthony, University of Arizona Nejati, Siamak, Univ. of Nebraska-Lincoln

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Owen, Allen, University of Alabama Parsons, Gregory, North Carolina State University

Pedersen, Henrik, Linköping University, Sweden

Peng, Qing, University of Alabama Rieth, Loren, University of Utah Scarel, Giovanna, James Madison University Sobczak, Cathy, Sandia National Labs Stiff-Roberts, Adrienne, Duke University Vallee, Christophe, LTM, Univ. Grenoble Alpes, CEA-LETI, France

Vanfleet, Richard, Brigham Young Univ.

Wang, Xudong, University of Wisconsin-Madison

Wheeler, Virginia, U.S. Naval Research Laboratory

Yanguas-Gil, Angel, Argonne National Laboratory

Yu, Cunjiang, University of Houston Zuilhof, Han, Wageningen University, Netherlands

TRIBOLOGY

Co-Chair: Chandross, Michael, Sandia National Laboratories

Co-Chair: Schall, J. David, Oakland Univ.

VACUUM TECHNOLOGY

Chair: Brucker, Gerardo, MKS Instruments, Inc., Pressure and Vacuum Measurement Group

Co-Chair: Borichevsky, Steve, Applied Materials, Varian Semiconductor Equipment

Carter, Jason, Argonne National Laboratory Lanza, Giulia, SLAC National Accelerator Lab. Lushtak, Yevgeniy, SAES Getters USA Scherschligt, Julia, NIST Valente Feliciano, Anne Marie, Thomas Jefferson National Accelerator Facility

Van Drie, Alan, Tri Alpha Energy, Inc.

2D MATERIALS FOCUS TOPIC (2D): The 2D Materials focus topic will review the world-wide effort exploring 2D materials covering their synthesis, characterization, processing, properties, and applications. Papers are solicited in growth and fabrication; properties including electronic, magnetic, optical, mechanical, thermal properties; characterization including microscopy and spectroscopy; surface chemistry, functionalization, bio and sensor applications; dopants, defects, and interfaces; nanostructures including heterostructures; device physics and applications; novel 2D materials; and novel quantum phenomena in 2D materials. 2D1+EM+MI+NS+TF 2D Materials Growth and Fabrication

Stephan Hofmann, University of Cambridge, UK, "Crystal Growth of 2D Materials: From Model Systems to Integrated Manufacturing"

Sefaattin Tongay, Arizona State University, "2D Anisotropic Semiconductors: Competing Phases by Alloys Engineering" 2D2+EM+MI+NS Properties of 2D Materials including Electronic, Magnetic, Mechanical, Optical, and Thermal Properties

Eric Pop, Stanford University Jing Xia, UC Irvine, “Discovering and Visualizing Ferromagnetism in Intrinsic Two-dimensional Materials”

2D3+MI+NS 2D Materials Characterization including Microscopy and Spectroscopy Kazu Suenaga, AIST, Japan, "Polymorphic Structures and Diversified Properties of Low-dimensional Materials

Investigated by In situ Electron Microscopy" Sense Jan van der Molen, Leiden University, The Netherlands

2D4+MN+NS+SS Surface Chemistry, Functionalization, Bio and Sensor Applications Qiang Fu, CAS Dailan, China

2D5+AM+EM+NS Dopants, Defects, and Interfaces in 2D Materials Gwan-Hyong Lee, Yonsei University, Republic of Korea, Defect Engineering of 2D Materials for Advanced Electronic

Devices Young Hee Lee, Sungkyunkwan University, Republic of Korea, "Defects and Contact Resistance in Transition Metal

Dicholcogenides" 2D6+EM+MN+NS Nanostructures including Heterostructures and Patterning of 2D Materials

Klaus Ensslin, ETH Zürich, Switzerland, “Quantum Devices with 2D Materials” Humberto Rodriguez Gutierrez, University of South Florida, “Sequential Edge-epitaxy: Towards Two-dimensional

Multi-junctions Heterostructures and Superlattices” 2D7+EM+MI+MN+NS 2D Device Physics and Applications

Han Wang, University of Southern California, "Black Phosphorus: Fundamental Properties and Emerging Applications" 2D8+EM+MI+MN+NS+SS Novel 2D Materials

Hsin Lin, National University of Singapore, Singapore, "Topological Materials" Iwao Matsuda, University of Tokyo, Japan, “Novel 2D Dirac Fermions in Monatomic Layers on Surfaces”

2D9+EM+MN+NS Novel Quantum Phenomena in 2D Materials Roland Kawakami, Ohio State University, “Spintronics and Valleytronics with 2D Materials and Heterostructures” Xiang Zhang, UC Berkeley, “Recent Advances in the Emergent Two-dimensional Magnetic Crystals”

2D10 2D Materials Poster Session

ACTINIDES AND RARE EARTHS FOCUS TOPIC (AC): Actinides and rare earths exhibit many unique and diverse physical, chemical and magnetic properties resulting in large part to the complexity of their 5f and 4f electronic structure. The Actinide and Rare Earth Focus Topic Sessions focus on the chemistry, physics and materials science of f–electron materials. Emphasis will be placed upon the 4f/5f electronic and magnetic structure, surface science, thin film properties, and applications to energy–related issues. The role of fundamental f–electron science in resolving technical challenges posed by actinide materials will be stressed, particularly with regard to energy applications, including energy generation, novel nuclear fuels, and structural materials. Both basic and applied experimental approaches, including synchrotron–

radiation-based and neutron–based investigations, as well as theoretical modeling computational simulations, will be featured to reconcile the observed behavior in these complex materials. Of particular importance are the issues important to nuclear energy and security, including fuel synthesis, oxidation, corrosion, intermixing, stability in extreme environments, prediction of properties via bench-marked simulations, separation science, and forensics. Specific sessions will be devoted to a continued, focused emphasis on the advances in the theory and measurements of core-level spectroscopies for the study of actinides and rare earths. Focus Topic emphasis will address advances in chemistry/materials sciences for environmental management and the participation of early career scientists. The shared sessions will be with Applied Surface Science, Magnetic Interfaces/Nanostructures, and the Synchrotron Radiation and FEL Focus Area. AC1+MI+SA Magnetism, Complexity, and Superconductivity in the Actinides and Rare Earths

Corwin Booth, Lawrence Berkeley National Laboratory Peter Riseborough, Temple University, "Field Induced Lifshitz Transitions in URu2Si2" Evgeniya Tereshina-Chitrova, Institute of Physics ASCR, Czech Republic

AC2+AS+SA Chemistry and Physics of the Actinides and Rare Earths Eric Schelter, University of Pennsylvania Ben Stein, Los Alamos National Laboratory, “Spectroscopic Studies of +3 Actinide Chelation“

AC3+AS+SA Nuclear Power, Forensics, and Other Applications Edgar Buck, Pacific Northwest National Laboratory, "Electron Microscopy in Nuclear Forensics" Itzhak Halevy, NRCN Israel, Israel Jenifer Shafer, Colorado School of Mines, "Predictive Nuclear Forensics: Fundamental Frameworks to Fill Missing Pieces"

AC4+MI+SA Actinide and Rare Earth Theory Wibe de Jong, Lawrence Berkeley National Laboratory, “Understanding the Role of Oxidation States on the Chemistry of Actinides through Integration of Theory and Experiment” Nikolas Kaltsoyannis, University of Manchester, United Kingdom of Great Britain and Northern Ireland,

"Computational Studies of the Actinide Dioxides" AC5+SA Chemistry for Environmental Management/Remediation

Tsuyoshi Yaita, JAEA, "Ionic Radius Variation of Trivalent Actinide and Lanthanide Series and its Implication" Hans-Conrad zur Loye, University of South Carolina, "Salt Inclusion Materials and Related Framework Structures:

Potential Novel Hierarchical Wasteforms" AC6 Early Career Scientists

Samantha Cary, LANL, "Improving the Understanding Actinide Separations through Spectroscopy" Gauthier Deblonde, LBNL, "Solution Thermodynamics and Separation of the Lanthanides and Actinides: Shedding

Light to Subtle Differences within the f-element Series" Karah Knope, Georgetown University, "Template-directed Growth of Actinide(IV) Complexes and Clusters" Andrew Wray, New York University, "A Hund’s Metal Transition Coincident with Hidden Order in URu2Si2- Family Alloys"

AC7 Actinides and Rare Earths Poster Session

EXTENDING ADDITIVE MANUFACTURING TO THE ATOMIC SCALE FOCUS TOPIC (AM): As the cutting edge of manufacturing, exemplified by semiconductor processing, edges into sub ten-nanometer length scales, subtractive processes such as lithography will become inadequate for many applications, motivating nanoscale additive processes. Analogous to macroscopic Additive Manufacturing, micro- and nanoscale additive manufacturing is becoming commonplace with E-beam/ion-beam induced deposition (E/IBID) used routinely in dual beam systems as a miniaturized “welding” method for sample preparation. Additionally, scanned probe techniques have shown demonstrations of additive manufacturing by various methods. Controlled movement of single atoms and construction of materials/molecules atom-by-atom hold great promise for future nanotechnology and miniaturization, both with scanned probe as well as electron beam techniques. Four key areas will be covered: 1) Scanned probe processes, 2) charged particle processes including (S)TEM and E/IBID, 3) control and feedback for automation, and 4) applications and devices. Relevant topics will include, but are not limited to: nanoscale 3d synthesis, manipulating chemical bonds on the atomic scale, resolution enhancements, new precursors/materials, fundamental electron-solid-gas interactions, in-situ local electrodeposition processes, single atom surface manipulation, localized atomic layer deposition, methods for scaling these processes, current applications, and fundamental science of atomic-scale device metrology. This Focus Topic will provide a forum for researchers to push the boundaries of additive manufacturing to the ultimate precision at the atomic level. AM1+NS+SS SPM Probe Processes

Ricardo Garcia, CSIC, Spain, "Advanced Oxidation Scanning Probe Lithography: Nanopatterning and Nanoelectronics" AM2+HI Charged Particle Processes in Additive Fabrication

Jason Fowlkes, Oak Ridge National Laboratory, “3D Nano-Printing via Focused Electron Beams: Computer-Aided Design and Simulations”

Harald Plank, Institute for Electron Microscopy and Nanoanalysis, Graz University of Technology, “3D Nano-Printing via Focused Electron Beams: An Emerging Technology for Novel Applications”

AM3+2D+NS Atomic-scale E-beam Modification in STEM Demie Kepaptsoglou, University of York, UK, United Kingdom of Great Britain and Northern Ireland, “Single Atom

Modification of 2d Materials: Fabrication and Electronic Structure” AM4+NS Control and Feedback for Automation

Stephen Jesse, Oak Ridge National Laboratory, “Atomic Scale Assembly by Scanning Transmission Electron Microscopy Combined with Advanced Feedback and Controls”

Sander Otte, Technical University of Delft, Netherlands, “Kilobyte Scale Data Storage through Autonomous Atom Assembly”

AM5+MP+NS Applications and Devices Andreas Fuhrer, IBM Research - Zurich, Switzerland, "Extending the Capabilities of STM-based Dopant Device

Fabrication" Michael Huth, Goethe University, Frankfurt, Germany, 2D/3D Nano-printed Functional Structures for Application and

Device Development using Focused Electron Beams” AM6 Extending Additive Manufacturing to the Atomic Scale Poster Session

ADVANCED NANOPHOTONICS METROLOGY FOCUS TOPIC (AN): The newly emerged field of nanophotonics have recently brought considerable interest in developing photonics-based nanodevices for various metrology solutions, which have the potential to outperform and replace legacy based metrology. The “Advances in Nanophotonics Metrology” (AN) focus topic will highlight the challenges and the latest development in nanophotonics metrology. It will cover various sensing application such as metrology of physical, chemical and biological properties, frequency synthesis on a photonic chip, and cold-atom based nanophotonic sensors AN1 Quantum Nanophotonics Metrology at Nanoscale

Gregory Strouse, NIST AN2 Nanophotonics Metrology for Chemical and Biological Applications

Erik Horak, University of Wisconsin-Madison, “Explorations Employing Single-Particle Absorption Spectroscopy by Optical Microresonators”

AN3 Frequency Synthesis on a Photonic Chip Karen Grutter, Laboratory for Physical Sciences, “Optomechanical Interactions for Metrology and Signal Processing”

AN4 Cold-atom-based Nanophotonics Sensors Stephen Eckel, NIST

AN5 Advanced Nanophotonics Metrology Poster Session

APPLIED SURFACE SCIENCE DIVISION (AS): The Applied Surface Science Division (AS) provides a forum for research in the preparation, modification, characterization, and utilization of surfaces in practical applications. Areas of interest range from nanoscience, polymers, and semiconductor processing to forensic science and biotechnology. The Division has long been the premier gathering place for the global surface and near surface analysis community, with concentrations in techniques such as SIMS, XPS/Auger spectroscopies, Atom Probe Tomography and methods. Included are presentations representing a mixture of cutting-edge applications and the fundamentals supporting the measurement science. We also encourage contributions from nontraditional techniques such as Atom Probe Tomography. The Division is constantly striving to provide a forum for current and mature interests (with sessions such as Quantitative Surface Analysis and Practical Surface Analysis) while identifying key areas for future development. Several special sessions this year are designed to showcase our connection to the Internet of Things. Two sessions this year celebrate the impact of Nick Winograd and Barbara Garrison of the Pennsylvania State University, to this Division. Contributions are welcome from any research associated with the session titles. AS1 Quantitative Surface Analysis

Alexander Shard, National Physical Laboratory, UK, "A Fistful of Data: The Good, the Bad and the Ugly of Quantitative Surface Analysis"

AS2 Multitechnique Applications-When More techniques are Better than One José Cerrato, University of New Mexico, "Integration of Laboratory Experiments. Spectroscopy, and Microscopy to

Investigate the Reactivity of Metals in Mine Wastes" AS3+BI Applied Surface Science: From Electrochemistry to Cell Imaging, a celebration of the Career of Nicholas

Winograd Nicholas Lockyer, University of Manchester, UK, United Kingdom of Great Britain and Northern Ireland, "Surface

Analysis and Beyond, Using Ions Beams and Lasers"

Christopher Szakal, National Institute of Standards and Technology, "Pushing the Limits of Measurement Science with SIMS"

AS4 The Impact of Modeling (Ion, Electron) and Data Analysis on Applied Surface Science, a Celebration of the Career of Barbara Garrison Arnaud Delcorte, Université Catholique de Louvain, Belgium, "Collective Action, the Key to Soft Molecule Desorption

under Particle Bombardment" Zbigniew Postawa, Jagiellonian University, Krakow, Poland, "Computer Modeling of Cluster Projectile Impacts for

SIMS Applications" AS5+NS+SA Beyond Traditional Surface Analysis

Shelley Claridge, Purdue University, "Reenvisioning Amphiphilicity: Translating Cell Membrane Design Principles to Synthetic 2D Materials"

AS6+SE Industrial and Practical Applications of Surface Analysis Steven Pachuta, 3MTS, " Problem Solving with Valence Band Spectroscopy and SIMS MS/MS"

AS7+SE Applied Surface Analysis of Novel, Complex or Challenging Materials John Kilner, Imperial College London, UK, United Kingdom of Great Britain and Northern Ireland, “Understanding the

Surface of Complex Oxides used in High Temperature Electrochemical Devices" AS8+NS Profiling, Imaging and Other Multidimensional Pursuits

Austin Akey, Harvard University, "Atom Probe Tomography" AS9 Applied Surface Science Division Poster Session

BIOMATERIAL INTERFACES DIVISION (BI): The Biomaterials Interfaces Division program begins with the traditional Sunday afternoon Plenary Session with presentations by top scientists in biomaterials and bio-related research. The BI program will then continue with a series of sessions throughout the week to provide an interdisciplinary forum for the presentation and discussion of fundamental aspects of bio-interface science and engineering. The BI program brings together recent advances made in materials science and molecular biology with sophisticated surface and interface analysis methods, and theoretical and modeling approaches for biological systems. This year the BI division is cosponsoring the Industrial Physics Forum (IPF) with the American Institute of Physics. The IPF will showcase exciting, upcoming fields of interest related to biosciences including imaging, sensing, diagnostics, and biomaterial assembly. The IPF will complement our BI sessions with invited speakers representing the leaders in these fields. We invite you to take part in this exciting program by submitting your abstract to one of our BI sessions. Areas of interest are: Microbes and Fouling at Surfaces, including control of microbes and fouling, biofilms, biofouling, attachment and adhesion of microbes, assessment of antifouling and fouling release function, antifouling coatings, motility at interfaces, colonization analysis, biofilms and EPS; Biomolecules and Biophysics at Interfaces, including proteins at surfaces, nucleic acids, polysaccharides, adsorption, blood-contacting materials, bioadhesion, and infection and immunity; Characterization of Biological and Biomaterials Surfaces, including spectroscopy, imaging, microscopy, optical and mechanical methods of thin film analysis, characterization in biological media, quantification, chemometrics, microfluidics, time- and spatial resolution measurements, and scanning probe techniques; Bioanalytics, Biosensors and Diagnostics, including biological membranes, vesicles, membrane processes, forces, recognition, signaling, biosensors, microfluidics, point-of-care devices, paper based sensors, and electrochemistry; Biomaterials and Nanomaterials fabrication, including organic thin films, polymer coatings, hybrid coatings, biologically inspired materials, plasma produced biomaterials, patterning, nanofabrication, rapid prototyping, additive manufacturing, 3D structures, tissue formation, implant integration, artificial organs, 3D biofilm structures; Advanced 3D Imaging of Biological Materials, 3D chemical analysis, 3D tomographic analysis, microscopy, 3D tracking. The BI division is also hosting a special session to honor the contributions of Women in Bio-surface Science. We also invite submissions of Flash/Poster Presentations, to be made in a dedicated session with an accompanying Networking Session involving associated poster presentations. Joint BID/Biointerphases prizes will be awarded for the best student Flash/ Poster presentations. BI1+AS+IPF+NS Advanced Imaging and Structure Determination of Biomaterials Research BI2+IPF+MN Bioanalytics, Biosensors and Diagnostics BI3+IPF+MN+NS Biofabrication: from Tissue to Organ BI4+AS+NS Characterization of Biological and Biomaterial Surfaces

David Scurr, University of Nottingham, UK, United Kingdom of Great Britain and Northern Ireland, “Novel Insights into Skin Biology and Permeation of Actives using ToF-SIMS and 3D OrbiSIMS”

BI5 Biomolecules and Biophysics at Interfaces Ximin He, UCLA, “Bioinspired Adaptive Reconfigurable Material Systems based on Smart Hydrogels”

BI6 Microbes and Fouling at Surfaces Kenan Fears, US Naval Research Laboratory, "Unraveling Complexities at the Adhesive Interface of Acorn Barnacles"

BI7 Women in Bio-surface Science Kelly Nash, University of Texas at San Antonio

BI8 Biolubrication and Wear Xavier Banquy, University of Montreal, Canada, “Superlubricating Fluids: Bioinspired Solutions and Medical

Applications” BI9 Biomaterial Interfaces Division Flash Poster Session

BIOMATERIALS PLENARY SESSION (BP): The Biomaterials Interfaces and AIP's Industrial Physics Forum program kicks off with the now traditional Biomaterials Plenary Session. This year we are pleased to have presentations from three eminent scientists who have made significant contributions to the fields of Organ Fabrication and Monitoring, BioImaging, DNA and Natural Algorithms. BP1 The Biomaterials Interfaces Division and AIP Industrial Physics Forum Plenary Session

Wah Chiu, Stanford University, "CryoEM of Protein Complexes" Paul Rothemund, California Institute of Technology, "DNA and Natural Algorithms"

SPECTROSCOPIC ELLIPSOMETRY FOCUS TOPIC (EL): The Spectroscopic Ellipsometry Focus Topic integrates themes ranging from classical material science and thin film characterization to nanometer scale science and novel optical sensing concepts. We will host two oral sessions dedicated to traditional applications of spectroscopic ellipsometry in optical materials and thin film characterization as well as new and emerging topics. The first session will focus on classical research topics of ellipsometry as for instance optical coatings and inorganic thin films characterization. Furthermore, presentations on the ellipsometric investigation of novel optical and electronic materials and materials with subwavelength structures will be included. In the second oral session, we will host presentations on novel experimental and theoretical approaches including for instance imaging ellipsometry or optical critical dimension analysis techniques. As a highlight of our Spectroscopic Ellipsometry focus topic, the best student paper, which is selected based on the quality of the research, its presentation, and the discussion during the symposium, will be awarded with the Spectroscopic Ellipsometry Focus Topic student award. Spectroscopic Ellipsometry will also host a poster session. Past recipients of the award and rules for entering the competition can be found at http://www.avs.org/Awards-Recognition/Focus-Topic-Awards/Spectroscopic-Ellipsometry-Focus-Topic. EL1+AS+EM Application of SE for the Characterization of Thin Films and Nanostructures

Vanya Darakchieva, Linköping University, Sweden EL2+EM Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches

Mathias Schubert, University of Nebraska-Lincoln EL3 Spectroscopic Ellipsometry Focus Topic Poster Session

ELECTRONIC MATERIALS AND PHOTONICS DIVISION (EM): The Electronic Materials and Photonics Division (EM) encompasses the science and engineering of materials, interfaces, and processing that advance electronic, photonic or optoelectronic device technologies. The EMPD program for AVS 65 will include: (1) Flexible Electronics, (2) CMOS, Beyond the Roadmap and Over the Cliff, (3) Selective-Area Patterning (Assembly/Deposition/Etching), (4) Surface and Interface Challenges in Electronics and Photonics, including tailoring surfaces and characterization of surfaces and interfaces, (5) Wide and Ultra-Wide Band Gap Materials for Electronic Devices: Growth, Modeling, and Properties, (6) Nanostructures for Electronic and Photonic Devices, (7) Quantum Materials and Applications, including quantum sensing, communication and computing, (8) 2D Crystal Applications, including, but not limited to sensors, light and power sources, and (9) 3-2-1 Contacts, including, but not limited to, material and electrical characterization of contacts, non-traditional materials for contacts such as transparent conducting electrodes, contact stability and reliability, and contacts for challenging systems including 2D materials, wide band-gap semiconductors, and nanowires. EM1+2D+NS+PS+RM+TF Flexible Electronics

Jay Switzer, Missouri University of Science and Technology, "Epitaxial Electrodeposition of Electronic and Photonic Materials onto Wafer-size Single Crystal Gold Foils for Flexible Electronics"

EM2+MP+PS CMOS, Beyond the Roadmap and Over the Cliff Iuliana Radu, IMEC, Belgium

EM3+AM+NS+PS Selective-Area Patterning (Assembly/Deposition/Etching) Robert Clark, TEL Technology Center, America, LLC James Engstrom, Cornell University, “Competitive Adsorption as a Route to Area Selective Deposition”

EM4+AN+MI+SS Surface and Interface Challenges in Electronics and Photonics Parag Banerjee, Washington University in St. Louis

EM5+2D+SS Wide and Ultra-Wide Bandgap Materials for Electronic Devices: Growth, Modeling and Properties Srabanti Chowdhury, UC Davis

EM6+MI+MN+NS Nanostructures for Electronic and Photonic Devices Maiken Mikkelsen, Duke University

EM7+2D+AN+MI+MP+NS Quantum Materials and Applications Jelena Vuckovic, Stanford University

EM8+2D+NS+SS 2D Crystal Applications Dirk Englund, MIT

EM9+NS+PS 3-2-1 Contacts: Electronic Contacts and Related Issues in Device Fabrication Suzanne Mohney, The Pennsylvania State University, "The Effect of Metal Diffusion on Contacts to Semiconducting

Chalcogenides: Examples in 2D and 3D" EM10+TF Solar/Energy Harvesting

Deirdre O'Carroll, Rutgers, the State University of New Jersey, "Plasmonic Metasurface Electrodes for Excitonic Solar Cells"

EM11+2D+NS+SS Photonics in 2D Materials James Schuck, Columbia University, “Nano-optical Activation of Defect-bound Excitons in Monolayer WSe2 towards

Room-temperature 2D Single-photon Optoelectronics” EM12 Electronic Materials and Photonics Division Poster Session

FUNDAMENTAL DISCOVERIES IN HETEROGENEOUS CATALYSIS FOCUS TOPIC (HC): The “Fundamental Discoveries in Heterogeneous Catalysis” (HC) focus topic highlights recent advances in the understanding of the atomic and molecular basis for heterogeneously catalyzed reactions on solid surfaces. This will be the third time the HC focus topic has been organized, and is coordinated with the Surface Science Division (SSD). Emphasis this year will be on facilitating dialogue between surface science-based and more applied communities studying heterogeneously catalyzed systems. Session topics include theoretical models, nanoscale structures, gas-surface dynamics, and other novel studies of active surfaces. The symposium will highlight connections among theoretical and experimental approaches with the goal of revealing key details of the fundamental chemistry and physics underlying heterogeneous catalysis. Of particular interest are developments in chemical understanding, atomic-level details, and predictive models of reactions catalyzed by metal surfaces. HC1+SS Combined Experimental and Theoretical Explorations of the Dynamics of Heterogeneously Catalyzed Reactions

Charles T. Campbell, University of Washington Arthur Utz, Tufts University

HC2+SS Nanoscale Surface Structures in Heterogeneously-catalyzed Reactions Jan Ingo Flege, University of Bremen, Germany, "In situ Microscopy of Oxide Growth and Transformation under

Reaction Conditions" HC3+SS Mechanisms and Reaction Pathways in Heterogeneously-catalyzed Reactions

Johannes Lercher, Pacific Northwest National Laboratory, "Elementary Steps in Conversions of Polar Molecules at Liquid-solid Interfaces"

Swetlana Schauermann, Kiel University, Germany, "Model Studies on Ligand-assisted Heterogeneous Catalysis" HC4+SS Advances in Theoretical Models and Simulations of Heterogeneously-catalyzed Reactions

Henrik Grönbeck, Chalmers University of Technology, Sweden William Schneider, University of Notre Dame, "Operando Catalysis: A DFT Perspective"

HC5+SS Bridging Gaps in Heterogeneously-catalyzed Reactions Kersti Hermansson, Ångström Uppsala University, Sweden Beatriz Roldan Cuenya, Ruhr-University Bochum, Germany

HC6+SS A Tale of Two Scales: Catalytic Processes and Surface Science David.W. Flaherty, University of Illinois at Urbana-Champaign Peter Stair, Northwestern University, “The Molecular Surface Chemistry Approach to Heterogeneous Catalysts”

HC7 Fundamental Discoveries in Heterogeneous Catalysis Focus Topic Poster Session

ADVANCED ION MICROSCOPY FOCUS TOPIC (HI): AVS 65 will again be host to the Advanced Ion Microscopy focus topic targeting research in focused ion beam technology and applications. Historically, the AVS HI focus topic has been academia and industry's principal conference for the latest research using Helium Gas Field Ion Source (GFIS) technology and more recently the session has been expanded to comprehend advances in other focused ion beam technology such as: Cs+ and Li+ cold beams; Ne+, N2+, and H+ GIFS beams; Xe+ plasma cusp ion beams; and novel breakthroughs using Ga+ and Alloy Liquid Metal Ion Source (LMIS) beams. For this year’s conference we will continue with previous themes of advances in ion beam microscopy, metrology, nano-patterning/machining, and novel source/optics technology, and this year we will also be expanding the focus topic to include beam induced Nano-Engineering. HI1 Advanced Ion Microscopy & Surface Analysis

Frances Allen, University of California, Berkeley Alex Belianinov, Oak Ridge National Laboratory Ilari Maasilta, University of Jyvaskyla, Finland, “Helium and Neon Ion Microscopy and Milling for Microbiological

Applications”

HI2 Novel Beam Induced Material Engineering & Nano-Patterning Yuichi Naitou, AIST, Japan Shida Tan, Intel Corporation

HI3 Emerging Ion Sources, Optics, and Applications Shinichi Matsubara, Hitachi High-Technologies, Japan, “Development of GFIS which can Perform Both Sample

Observation and Processing” Greg Schwind, FEI Company

HI4 Advanced Ion Microcopy Focus Topic Poster Session

INDUSTRIAL PHYSICS FORUM (IPF): The IPFs, scientific gatherings sponsored by the American Institute of Physics and hosted by its member societies, are unique, topic-specific conferences addressing application-focused research in the physical sciences emerging from academia and the private sector. They consist solely of invited talks grouped around several subtopics. The present Forum, the seventh at AVS since 2006, focuses for the first time exclusively on the biophysical/medical sciences and is co-hosted by the Biomaterials Interfaces Division (BID). The program was designed to broaden the interest and perspective of the BID community through talks partially overlapping research areas of their interest, yet not routinely covered at prior AVS Symposia. The program focuses on innovations in three sub-topics of the biosciences: imaging and structural determination, bioanalytic sensing and diagnostics, and biomaterial assembly. Each topic is covered by five invited speakers in three consecutive morning sessions starting Monday October 22. The afternoons are set aside for contributed talks on topics related to the respective morning sessions. The event is preceded by the traditional BID Plenary session on Sunday afternoon October 21, with topics complementary to those of the IPF. The session on imaging and structural determination highlights diverse experimental approaches based on infrared, visible, X-ray and mass spectrometric technologies, and encompasses advanced nonlinear optical, fluorescence and Raman spectroscopy, as well as synchrotron and X-ray free electron laser (XFEL) studies for dynamic and 3D imaging of biomolecules and sub-cellular structures at nanoscale resolution. The bioanalytic, biosensor and diagnostic session covers diverse sensing approaches from activated surfaces to discreet nano-sized biomolecular and patterned structures. Topics include advances in in-vitro and in-vivo approaches to disease detection, nanoparticles for monitoring biomolecular functions in their biological environment, subcellular sensors to probe biological processes in live cells, and sensitized surfaces acting as pressure and tunable photo-responsive sensors. The biofabrication session encompasses a structured build-up from basic tissue assembly to the prospects of full organ fabrication. The intermediary steps of vascular co-assembly and its accompanying challenges of supplying life sustaining nutrients and oxygen to the living cells will be amply covered. In addition, the scaffolding required to maintain the integrity of the assembling organ will be discussed, as well as the different approaches and challenges in 3D printing. IPF1+BI Advanced Imaging and Structure Determination of Biomaterials

Alba Alfonso-Garcia, UC Davis, “Dynamic Fluorescence and Nonlinear Optical Imaging Methods for Biomedical Applications”

Rohit Bhargava, University of Illinois, "Chemical Imaging as a Tool to asses Molecular and Morphologic Content in Natural Tissues and Fabricated Models"

Josephine Bunch, National Physical Laboratory, UK, "Mass Spectrometry Imaging of Biomaterials" Katherina Gaus, University of New South Wales, Australia, "Super Resolution Microscopy" Tim Salditt, University Goettingen, Germany, "High Resolution Phase Contrast X-ray Imaging for Biomedical

Research" IPF2+BI Bioanalytics, Biosensors and Diagnostics

Michael Cima, MIT, "Novel Devices for Disease Detection and Monitoring and/or Nanotechnology-based Therapeutic Cancer Agents"

Simon Corrie, Monash Univ., Melbourne AU, "Nanoparticle-based Molecular Sensors for Monitoring Biological Molecules in Real Biological Environments"

Bianxiao Cui, Stanford, "Nano-optoelectronic Sensors for Biosensing" Aránzazu del Campo, MPI for Polymer Research, Mainz, Germany, "Bio-active Tunable Surfaces for Photoresponsive

Sensing" Stefan Zauscher, Duke University, "Harnessing Bacteria for Fabrication of Photoelectrodes and Pressure Sensors"

IPF3+BI Biofabrication: From Tissue to Organ Thomas Boland, University of Texas El Paso, "Biological Fabrication via 3D Printing" Buddy Ratner, University of Washington, "Strategic Thinking on the Architecture and Design of Regenerative

Medicine Scaffolds" Joachim Spatz, MPI for Intelligent Systems, Germany, "Sequential Bottom-up Assembly of Synthetic Cells and Tissue" James J. Yoo, Wake Forest University, "The Quest for Whole Organ Fabrication" Ying Zheng, University of Washington, "Challenges in Biofluidic and Vascular Implementation in Tissue Assembly"

MAGNETIC INTERFACES AND NANOSTRUCTURES DIVISION (MI): This years’ MI program will cover a wide area of topics ranging from chiral magnetism over magnetism and spin orbit effects at interfaces to magnetism in organic system. The focus of the program is to cover areas of magnetism that are fascinating from a fundamental point of view but which carry significance for future applications. In detail, the MI program will feature pioneering, controversial, introductory and emerging results in topical areas related to magnetic interfaces and nanostructures. In addition it highlights the synergy of our division with other groups within the AVS by featuring magnetic systems that rely on atomic control of surfaces and interfaces. Topics include: (1) Spin-orbit Coupling at Surfaces and Interfaces (2); Role of Chirality in Spin Transport and Magnetism; (3) Controlling Magnetism in Oxides and Multiferroics and (4) Novel Magnetic Phenomena at Interfaces and (5) Magnetic Nanoparticles in Life Sciences. In 2018 we would like to especially focus on the synergy between the research areas covered by MI and their role for the development of new materials and devices for the information society. For this reason the program will feature a special symposium. Also, the Magnetic Interfaces and Nanostructures Division will be selecting the best graduate student presentation from finalists for the Leo Falicov Award. MI will also offer an award for postdoctoral fellows who will be presenting papers at this International Symposium. The winners of both awards will be announced towards the end of the meeting. MI1+EM Spin-Orbit Coupling at Surfaces and Interfaces

Carlos Rojas-Sanchez, University of Lorraine, France, "Interfacial Spin-Orbitronics: Spin-Charge Conversion in Topological Insulators and Rashba Interfaces"

MI2+SA Controlling Magnetism in Oxides and Multiferroics Yayoi Takamura, University of California, Davis Evgeny Tsymbal, University of Nebraska-Lincoln, "Control of Magnetism at the Antiperovskite/Perovskite Interface"

MI3+2D Novel Magnetic Phenomena at Interfaces Dirk Sander, Max Planck Institute, Halle, "New Insights into Nanomagnetism by Spin-STM" Jiabao Yi, The University of New South Wales, Australia, "Ferromagnetism in 2D Materials"

MI4 Role of Chirality in Spin Transport and Magnetism Eric Fullerton, University of California at San Diego, "Materials Optimization to Form Skyrmions and Skyrmion Lattices" Ron Naamen, Weizmann Institute, Israel, "Chiral Induced Spin Selectivity"

MI5+BI Magnetic Nanoparticles in Life Sciences Kannan Krishnan University of Washington Elena Rozhkova, Argonne National Laboratory

MI6+2D+EM+NS Materials and Devices for the Information Society Andrew Kent, New York University/STT, "Physics and Applications of Spin-transfer Torques" Shriram Ramanathan, Purdue University, “Organismic Materials and Intelligence” Ivan Schuller, University of California, San Diego Roger Wood, Western Digital, “Magnetic Devices and the Story of "Factors of Ten"”

MI7 Magnetic Interfaces and Nanostructures Division Poster Session

IN-SITU MICROSCOPY, SPECTROSCOPY, AND MICROFLUIDICS FOCUS TOPIC (MM): Transmission electron, scanning electron, and X-ray microscopes provide exceptional spatial and spectroscopic resolution through many different signal channels and have resulted in countless advances in materials science, electrochemistry, biomedical and environmental research The MEMS and Microfluidics for In Situ TEM, SEM and X-ray Microscopy Focus Topic session will feature devices that allow the application of different stimuli during imaging- mechanical, electrical, etc. - under controlled environmental conditions - gaseous, liquid, high-temperature, high-pressure. The session will emphasize the design, fabrication and application of these devices, and will include liquid cells for TEM, SEM and X-ray microscopes, as well as mechanical and electrical test devices and their combinations. MM1+AS+NS+PC Liquid/Gas Environmental Cells for TEM

Frances Ross, IBM T.J. Watson Research Center, "Cantilever Samples for Growth Experiments in the Electron Microscope" MM2+AS+HI+NS+PC Fluidic and Flow Cells for In Operando SEM

Daan Hein Alsem, Hummingbird Scientific Inc., "Practical Liquid Cell Microscopy - Opportunities and Challenges" MM3+AS+NS+PC+SS X-ray Microscopy (Spectroscopy) in Liquids and Gases

Luca Gregoratti, Elettra-Sincrotrone Trieste, Italy, "Bridging the Materials and Pressure Gaps in Synchrotron-based Photoelectron in Situ/Operando Studies"

MM4+EM+MN+NS+SS Mechanical/Electrical/High-Temperature Systems Raymond Unocic, Oak Ridge National Laboratory, "Radiolytic Synthesis of Nanostructured Materials using in situ

Liquid Cell Microscopy" MM5 In-situ Microscopy, Spectroscopy, and Microfluidics Focus Topic Poster Session

MEMS AND NEMS GROUP (MN): The MEMS and NEMS Technology Group (MN) program will highlight recent advances in the broad areas of micro/nanoelectromechanical systems (MEMS/NEMS), especially latest fundamental studies of novel

materials, processes, devices, and emerging functions and applications of MEMS/NEMS, in various areas. This AVS65 MN program will include a focus on sensing, communication, and energy scavenging for internet of things(IoT). Another highlight will be multiscale manufacturing of systems including microfluidics systems and bioMEMS with applications to chemical analytics and healthcare. Our program will include resonant low-dimensional materials and parametric and nonlinear MEMS/NEMS resonators which create intriguing possibilities of integrating these devices with existing fluidic, electronic and optical on-chip networks. The program continues to embrace latest progresses in optical MEMS/ NEMS, micro/nanophotonics, optomechanics, quantum MEMS/ NEMS, resonant systems, CMOS-MEMS, mesoscopic dynamics and dissipation processes, inertial sensors, harsh-environment transducers, and MEMS/NEMS-enabled energy technologies, etc. It also aims to capture some of the latest advances in soft materials, flexible and implantable MEMS/NEMS for biosensing, bio-inspired microsystems, wearable and wireless healthcare. MN1+NS+PS Multiscale Manufacturing: Enabling Materials and Processes

Bernard Legrand, Centre National de la Recherche Scientifique (CNRS), France, “MEMS-based Atomic Force Microscopy Probes: From Electromechanical to Optomechanical Vibrating Sensors”

Greg Nordin, Brigham Young University, "Miniaturizing 3D Printed Microfluidics: State-of-the-Art and Outlook" MN2+2D+AN+MP+NS Information Processing and Optomechanics

John Davis, University of Alberta, Canada, “Towards Microwave to Telecom Wavelength Quantum Information Transfer using Cavity Optomechanics” Eva Weig, University of Konstanz, Germany, "Nonlinear Dynamics of Single and Strongly Coupled High Q Resonator

Modes" MN3+2D+AN+NS Nonlinear Effects and Devices

Eyal Buks, Israel institute of technology, Israel, "Back-reaction Effects in Opto-mechanical Cavities" Daniel Lopez, Argonne National Lab, "Embracing Nonlinear Dynamics in Micro and Nanomechanical Systems"

MN4+NS BioMEMS Canan Dagdeviren, MIT Yu-Chong Tai, California Institute of Technology, "BioMEMS for Eye Applications"

MN5+2D+AN+NS MEMS for IoT: Sensing, Communication, and Energy Scavenging Oliver Brand, Georgia Institute of Technology, "MEMS-based Resonant Sensors" Rob Candler, UCLA, "Magnetic Microsystems for Communications"

MN6+2D+AN+EM+MP+NS 2D NEMS Guang-Wei Deng, University of Science and Technology of China, China, "1D/2D NEMS Quantum Information

Processing" Yuehang Xu, University of Electronic Science and Technology of China, "Characterization and Modeling of a Radio

Frequency Graphene Resonant Channel Transistor" MN7 MEMS and NEMS Group Poster Session

MATERIALS AND PROCESSES FOR QUANTUM COMPUTING FOCUS TOPIC (MP): MP will highlight the recent advances and challenges in quantum computing. Sessions will cover all devices, materials and systems that enable quantum computing. These include single photon amplifiers, ion traps, multiplexers, advances in cryogenic systems, vacuum technology and microwave to optical conversion schemes etc. Topics will include technological advances in accessing topologically isolated qubits (TSV's, Airbridges, Bump bonds, Pogo pins etc) and materials, processes used to achieve high coherence devices. Apart from the oral sessions, we will have a poster session, which will provide an opportunity for researchers to interact with their peers in the field. MP1+EM+MN+NS Systems and Devices for Quantum Computing I

Jungsang Kim, Duke University, “Advances in Trapped Ion Quantum Computing” John Martinis, Google Inc.

MP2+AM+EM+NS Systems and Devices for Quantum Computing II Jerry Chow, IBM T.J. Watson Research Center

MP3+EM+NS High Coherence Qubits for Quantum Computing Eva Olsson, Chalmers University Dave Pappas, NIST

MP4+EM+NS Integration Schemes for Accessing Topologically Isolated Qubits Matteo Mariantoni, University of Waterloo, Canada Will Oliver, MIT Lincoln Laboratory, "Quantum Engineering of Superconducting Qubits"

MP5 Materials and Processes for Quantum Computing Focus Topic Poster Session

MANUFACTURING SCIENCE AND TECHNOLOGY GROUP (MS): This year's MS sessions listed below, are designed to highlight the challenges related to manufacturing for two cutting edge applications. Our session on working with government labs and user facilities enables representatives of these labs and user facilities to present the capabilities of their organizations and how the AVS attendees can work with them.

MS1+MI+RM Challenges of Neuromorphic Computing and Memristor Manufacturing Nate Cady, SUNY Polytechnic Institute, “Memristive Synapses – Tuning Memristors for Performance and CMOS

Integration” David Hughart, Sandia National Laboratories, “ReRAM – Fabrication, Characterization, and Radiation Effects” Hsinyu Tsai, IBM Almaden Research Center H.S. Philip Wong, Stanford University

MS2+MN Challenges of Sensor Manufacturing for the IoT Enid Kivuti, Multek Corp., "Enabling Smart and Connected Living through High Volume Roll to Roll Manufacturing" Scott Miller, NextFlex, " Manufacturing Strategies for Flexible Hybrid Electronics" Radislav Potyrailo, General Electric Global Research Center, " New Generation Chemical and Biological

Sensors: From New Ideas to Manufacturable Products" MS3 Working with Government Labs and other User Facilities MS4 Topics in Manufacturing Science and Technology Poster Session

NANOMETER-SCALE SCIENCE AND TECHNOLOGY DIVISION (NS): At the most inclusive level, nanotechnology is anything that involves materials that have structure 100 nm or smaller. Many of the most interesting areas of nanotechnology involve materials or systems whose properties change dramatically as they decrease in size from the bulk, or as surfaces become dominant. Nanoscience and Nanotechnology have become ubiquitous throughout the scientific community as can be attested by the multiple sessions addressing their different aspects at the AVS Symposium. At the NSTD sessions, researchers from around the globe will present their work on topics such as nanoscale devices and quantum systems, exploiting nanomaterials for applications in photonics, plasmonics, catalysis, surface chemistry, sensors, biomechanics, imaging, and energy, including nanoscale characterization and spectroscopy. This year the program will highlight the following: (a) A session focusing on the science and technology of oxides at the nanoscale; (b) Advances in fabrication and manufacturing at the nanoscale; (c) Recent developments in the characterization of materials at the nanometer scale, and recent advances in scanned probe microscopy; (d) Areas of convergence between nanotechnology and electrical, magnetic, mechanical, and optical devices and phenomena. (e) The program will also include a special session on the applications of nanotechnology in renewable energies. NS1+AN+EM+MN+MP+RM Experimental Nanoscale Optomechanical Quantum Systems

Krishna Balram, University of Bristol, UK, United Kingdom of Great Britain and Northern Ireland NS2+2D+AN+EM+MN+MP+PC+RM Nanostructured Devices and Sensors

Leonidas Ocola, IBM Research Division, T.J. Watson Research Center NS3+AM+EM+MN+MP+RM Nanophotonics, Plasmonics, and Metamaterials

Amit Agrawal, NIST Amy Foster, Johns Hopkins University

NS4+AM+AN+EM+MI+MN+MP+PS+RM Nanopatterning and Nanofabrication James Liddle, NIST

NS5+AN+MN+PC Nanoscale Biomedical Devices Yann Astier, Roche Sequencing Solutions

NS6 Nanoscale Polymer Physics Paul Nealy, University of Chicago, “Directed Self-assembly of Soft Materials on Chemically Nanopatterned Surfaces”

NS7+AN+MN+MP+TF+TR Nanodiamond: Thin Films and Applications Dean Ho, UCLA

NS8+2D+AN+MN+MP+SE Nanomechanics Hiroshi Yamaguchi, NTT, Japan, "Electron-Photon-Phonon Hybrid Systems Based on Compound Semiconductor

Mechanical Resonators" NS9+2D+AS+MN+PC SPM – Probing Electronic and Transport Properties

Katja Nowack, Cornell University, "Imaging Current in Two-dimensional Quantum Materials" NS10+2D+AS+PC SPM - New Imaging and Spectroscopy Methodologies

Marina Leite, University of Maryland College Park, “Advances in SPM Methods for Energy-relevant Materials” NS11+AS+MN+PC+PS+SS+TR SPM – Probing Chemical Reactions at the Nanoscale

Michael F. Crommie, University of California at Berkeley NS12+MM+SS+TR SPM – Probe Sample Interactions

Reza Moheimani, UT Dallas, “A Connection Between Stability of STM Control System and Local Barrier Height: Implications on Imaging and Lithography”

NS13+AM+MI+MN+SS+TR SPM – Probing and Manipulating Nanoscale Structures Sven Rogge, University of New South Wales, Australia, “Building Artificial Quantum Matter with Dopant Atoms”

NS14+SS SPM – Fast Scanning Techniques Georg Fantner, EPFL, Switzerland, “Low-Force, High-Speed Atomic Force Microscopy using Photothermal Off-

Resonance Tapping”

Chanmin Su, Bruker-Nano, Inc. NS15+MN+PC+SS SPM – Biological Applications of SPM

Uri Sivan, Technion Israel Institute of Technology, Israel NS16 Nanometer-scale Science and Technology Division Poster Session

PLASMA BIOLOGY, AGRICULTURE, AND ENVIRONMENT FOCUS TOPIC (PB): This Focus Topic will address the latest advances and innovations in plasma technology related to biological, agriculture and environment. Abstracts for oral and poster contributions are solicited in fundamental science and applications related to these fields. Topics that this program highlights include: Plasma medicine and therapeutics e.g. wound healing and cancer treatment, microbe inactivation, biomaterials, plasma fertilizer and ammonia production, nitrogen fixation, seed germination, plant and crop treatment, soil treatment, chemical degradation, environmental remediation, waste and water treatment, reduction of greenhouse gas emissions, air and exhaust cleaning, electrostatic precipitation, VOC removal, biofilm and bio-fouling treatments, plasma chemical reactors, hydrogen production, CO production, CO2 conversion and renewable energy applications. Abstracts on the underpinning methodologies including simulation and diagnostic techniques, and plasma source development are also invited. In addition to collaboration of this Focus Topic with the ‘Biointerfaces (BI)’ and ‘Plasma Science and Technology (PS)’ Division program, this AVS offers new links with the ‘Processing and Characterization of Air-Liquid, Solid-Liquid and Air-Solid Interfaces (PC)’ Focus Topic. PB1 Plasma Agriculture

Rune Ingels, N2 Applied AS, Norway, "Technology and Business Case for Nitrogen Fertilizer from Renewable Energy" Koichi Takaki, Iwate University, Japan, “Pulsed Power Applications for Farming and Food Processing” Douyan Wang, Kumamoto University, Japan, “Stimulus Control on Organisms Using Pulsed Power Technology”

PB2 Plasmas for Environmental Applications John Foster, University of Michigan, “Design Considerations for Plasma Water Reactor Scale up” Akira Mizuno, Toyohashi University of Technology, Japan

PB3 Plasmas for Biological, Agricultural and Environmental Applications PB4 Plasma Biology, Agriculture, and Environment Focus Topic Poster Session

PROCESSING AND CHARACTERIZATION OF AIR-LIQUID, SOLID-LIQUID AND AIR-SOLID INTERFACES FOCUS

TOPIC (PC): Chemical and physical processes occurring in the surface and interface including the gas-liquid, solid-liquid, and gas-solid interface are important in many applications yet represent grand scientific and engineering challenges. This symposium aims to promote the latest developments of emerging techniques and scientific understanding using in situ/ex situ/non situ/operando imaging, spectroscopy and microscopy to investigate challenging surfaces and interfaces with diverse applications in biology, catalysis, energy storage, environment, and material sciences. Contributions are invited including but not limited to fundamental research, industrial applications, novel approaches, and metrology of surface and interfacial phenomena. PC1+AS+BI+NS+PB+SS Gas-Liquid Interfacial Processes and Characterization

Musahid Ahmed, Lawrence Berkeley Lab, University of California, Berkeley, "Probing Cluster and Nanoparticle Growth Processes with X-Ray Spectroscopy and Mass Spectrometry"

Franz Geiger, Northwestern University, "Non-linear Surface Spectroscopy at the Aerosol Particle/Gas Interface" PC2+AS+BI+NS+PB+SS Solid-Liquid Interfacial Processes and Characterization

James De Yoreo, Pacific Northwest National Laboratory , "An in situ Molecular-scale View of Nucleation and Self-assembly at Solid-liquid Interfaces"

Shirley Meng, University of California, San Diego, "Optimizing Electrochemical Interfaces and Interphases for Next Generation Batteries"

PC3+AS+BI+EM+NS+PB+SS Gas-Solid Interfacial Processes and Characterization Axel Knop-Gericke, Fritz Haber Institute of the Max Planck Society, Germany, "Ambient Pressure X-Ray Photoelectron

Spectroscopy Studies of Catalytically Active Interfaces using Electron Transparent Graphene Membranes" Gabor A. Somorjai, Lawrence Berkeley National Laboratory (LBNL), “Characterization of Interface Materials. The

Influence of Density and Chemical Bonding on Atomic and Molecular Structures of Alcohols,Water and Oxides” PC4+AS+BI+EM+PB+SS Progress in Industrial Processes and Characterization of Interfaces

Andreas Thissen, SPECS Surface Nano Analysis GmbH, Germany PC5+AS+BI+EM+PB+SS Novel Approaches and Challenges of Interfaces

Miaofang Chi, Oak Ridge National Laboratory , "Towards Atomic-scale Functional Imaging of Interfaces in STEM via In Situ 4-D Imaging and Spectroscopy"

Ethan J. Crumlin, Lawrence Berkeley National Laboratory, "Probing Chemical Species and Potential Profiles of Electrified Interfaces"

PC6+AS+BI+EM+NS+PB+SS Processing and Characterization of Gas-Liquid, Solid-Liquid, and Gas-Solid Interfaces PC7 Processing and Characterization of Air-Liquid, Solid-Liquid and Air-Solid Interfaces Focus Topic Poster Session

PLASMA SCIENCE AND TECHNOLOGY DIVISION (PS): The Plasma Science & Technology Division program highlights state-of-the-art advances in plasma research, ranging from fundamental studies of plasma physics and chemistry to novel plasma processing applications to enable the IoT era. Abstracts describing novel research are solicited in areas of multi-patterning for microelectronics fabrication, plasma etching and deposition, plasma modeling, plasma surface interactions, plasma sources, and plasma diagnostics, sensors and control. We are also excited to announce, in collaboration with Thin Films Division, a new session track on Atomic Layer Processing (ALP), to highlight the synergy between ALD and ALE. Abstracts are solicited on topics ranging from atomic layer etching (plasma or thermal), area selective deposition, chemistry and surface reactions for ALP and integration of ALD and ALE. Other relevant ALP topics also include area selective patterning, plasma-enhanced ALD, emerging applications, diagnostics and high volume manufacturing of ALP. Other areas of interest are biomedical applications enabled by plasmas, atmospheric pressure plasmas and their applications (including discharges in liquids and/or multi-phase media.) Sessions on plasma processing of challenging materials, III-V, II-VI, nanomaterials, and nanoparticles are also planned to highlight exciting research for various applications including IoT which features notably our 2018 Plasma Prize winner, Dr. Meyya Meyyappan. In addition to the oral sessions, abstracts can be submitted to the poster session, which provides an excellent opportunity for one-on-one discussions of new results with colleagues. PS1+EM Advanced Patterning

Patricia Pimenta-Barros, CEA, LETI, MINATEC Campus, France, “Patterning Challenges and Solutions for Stacked-Nanowires Devices”

PS2+EM Advanced FEOL/Gate Etching Takeshi Ohmori, Hitachi, Ltd., Japan, “Etching Recipe Optimization Using Machine Learning”

PS3+EM Advanced BEOL/Interconnect Etching Xiang Hu, GLOBALFOUNDRIES, "BEOL Etch Patterning Challenges for 14nm and beyond High Volume Manufacturing" Ryukichi Shimizu, Tokyo Electron Limited, Japan, "Innovative Approach for Future Challenges in MOL/BEOL Etching"

PS4+EM+SE Plasma Processing of Challenging Materials Toshiaki Kato, Tohoku University, Japan, "Wafer-scale Fabrication and Growth Dynamics of Suspended Graphene

Nanoribbon Arrays" PS5+EM Plasma Processing of III-V or II-VI Materials

Necmi Biyikli, University of Connecticut, “Self-limiting Growth of III-nitride Materials via Hollow-cathode Plasma-ALD: Structural and Chemical Analysis”

PS6+EM+NS+SS Plasma Processing of Nanomaterials and Nanoparticles Meyya Meyyappan, NASA Ames Research Center, "Low Temperature Plasmas in Nanotechnology Applications"

PS7+AS+EM+SS Plasma-Surface Interactions Thomas Morgan, DIFFER, The Netherlands

PS8 Plasma Sources Hyo-Chang Lee, KRISS, Korea, Republic of Korea, “Hydrid Plasma Source with Inductive and Capacitive Fields:

Fundamental Understanding and Nano-applications” Gerard van Rooij, DIFFER, The Netherlands, "Microwave Plasma as Source for Vibrational Non-Equilibrium Flow

Enabling Efficient Power-To-X Conversion" PS9 Plasma Modeling

Tony Murphy, CSIRO, Australia PS10 Plasma Diagnostics, Sensors and Controls

Yi-Kang Pu, Tsinghua University, China, “The Surface Plasmon Energy and the Secondary Electron Emission on an Oxidized Aluminium Surface”

PS11+TF Plasma Deposition and Plasma-Enhanced ALD Luc Stafford, University of Montreal, Canada, “Deposition of Multifunctional, Nanostructured Coatings on

Lignocellulosic Materials using Cold, Atmospheric-Pressure Plasmas” PS12+PB+SE Atmospheric Pressure Plasmas

Sylvain Coulombe, McGill University, Canada, "Plasma Sources for Energy Applications: The Quest for Higher Pressures"

PS13+PB Plasma Medicine Vandana Miller, Drexel University, "Plasma Immunotherapy of Cancers"

PS14+MN Enabling IoT Era Subramanian Iyer, UCLA, "Moore's Law Ending? eAdvanced Packaging to the Rescue!" Michael Seddon, ON Semi, “Use of Plasma in Advanced Packaging”

PS15 Plasma Science and Technology Division Poster Session

PS16+EM+TF Atomic Layer Processing: Atomic Layer Etching David Boris, Naval Research Laboratory Noriaki Toyoda, University of Hyogo, Japan, "Irradiation Effects of Gas Cluster Ion Beams on Co–Fe Films" Charles Winter, Wayne State University

PS17+EM+TF Atomic Layer Processing: Integration of ALD and ALE Mike Cooke, Oxford Instruments Plasma Technology, UK Ben Rathsack, TEL Technology Center, America, LLC, “Selective Processing to Enable High Fidelity Control for the 5

nm Node”

RECONFIGURABLE MATERIALS AND DEVICES FOR NEUROMORPHIC COMPUTING FOCUS TOPIC (RM): Since traditional computing systems have begun to reach the theoretical limits of their performance, alternative, biologically inspired approaches to computing have become increasingly important. These neuromorphic computer systems often require new devices and materials beyond those typically available in traditional CMOS and semiconductor foundries and have both reconfigurable and continuously tunable properties. This Focus Topic will explore both the new materials used in these next generation systems as well as nanoscale, integrated demonstrations of next generation computing systems. RM1+EM+NS Materials Characterization for Reconfigurable Devices

Jennifer Rupp, Massachusetts Institute of Technology RM2+EM+NS Integrated Systems for Reconfigurable Computing

Qiangfei Xia, University of Massachusetts - Amherst RM3+NS Devices for Synapses

A. Alec Talin, Sandia National Laboratories RM4+NS Devices for Neurons

Alice Mizrahi, National Institute of Standards and Technology, Center for Nanoscale Science and Technology, "Stochastic Magnetic Tunnel Junctions as Neurons"

RM5+NS Reconfigurable Materials and Devices for Neuromorphic Computing Poster Session

NOVEL TRENDS IN SYNCHROTRON AND FEL-BASED ANALYSIS FOCUS TOPIC (SA): Scattering, diffraction, spectroscopy, and imaging techniques developed at electron accelerator based X-ray light sources during the last two decades have been highly effective in exploring the properties of various complex materials including a variety of interfaces at desired length, depth, time and energy scales. These methods have allowed to go beyond periodic systems and equilibrium structures and to obtain unprecedented insight into the relations between synthesis, processing, structure, and functional properties, especially by in situ studies during processing and/or under real working conditions of temperature, environment and magnetic or electric fields. At AVS 65th dedicated to processing and interfaces for the IoT era this topical session will provide a forum for communicating the latest research paradigm in exploration of complex interfacial systems to enable desired functionality and significant advances in efficiency. SA1+AS+MI Hard X-Ray Photoemission for probing buried interfaces

Alexander Gray, Temple University, "Angle-resolved Photoemission Measurements in the Hard X-ray Regime" Julia Maibach, KIT, Germany, "Interfaces in Cycled Battery Electrodes: Insights from HAXPES Studies" Yasumasa Takagi, JASRI, SPring8, Japan, "Development of Ambient Pressure HAXPES and Other HAXPES

Measurements at SPring-8 for Probing Buried Interfaces" SA2+MI Ultra-fast Dynamics for Magnetic and Quantum Systems

Hermann Dürr, Uppsala University, Sweden, "Ultrafast Spin-lattice Dynamics in Magnetic Materials" Laura Foglia, Elettra - Sincrotrone Trieste, Italy, "XUV-transient Grating: Probing Fundamental Excitations at the

Nanoscale" Wei-Sheng Lee, SLAC National Accelerator Laboratory, "Study of Photo-induced Dynamics in Quantum Materials

using Femtosecond Time-resolved X-ray Scattering" SA3+AS+HC+SS Multi-modal Characterization of Energy Materials

Klaus Attenkoffer, NSLS-II, "In-situ and Operando Studies at NSLS-2" Ruimin Qiao, Lawrence Berkeley National Laboratory (LBNL), "Soft X-ray Spectroscopy for High Pressure Liquid"

SA4+EM+MI Synchrotron Techniques Applied to Materials & Device Processing Yulin Chen, Oxford University, UK, United Kingdom of Great Britain and Northern Ireland, "Recent Advances and

Perspective of Photoemission Spectroscopy with Synchrotron and X-ray FEL" William Chueh, Stanford University

SA5 Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic Poster Session

ADVANCED SURFACE ENGINEERING DIVISION (SE): The program of the Advanced Surface Engineering Division (SE) focuses on all topics related to intentionally enhancing or changing the properties and functionalities of surfaces of all kinds. Both fundamental scientific and application-oriented contributions presenting results from experiments or from modelling or simulation are welcome. The session “Plasma-assisted Surface Modification and Deposition Processes”

invites contributions aiming for understanding or further developing techniques and processes to alter the appearance of surfaces or to synthesis thin films and coatings on surfaces of interest. Topics related to analysis and characterisation of such modified surfaces will be covered by the session “Nanostructured Thin Films and Coatings.” This includes also contributions on new and advanced characterisation techniques in order to gain further details. A frequent application of coatings is to protect the underlying surface from environmental influences. The session “Wear, Oxidation and Corrosion Protective Coatings” will deal with all different kinds of protective coatings in academic research, but also in industrial and ‘real-world’ applications. Last but not least the session “New Challenges and Opportunities in Surface Engineering” will serve as a forum to gather new ideas and developments in the field and to shows its broadness. The main focus will be on topics and contributions that show how surface engineering can assist to solve present-day and future problems. Invited lectures will review and highlight the state-of-the-art and latest findings in various topics. Academics, scientists, technicians and especially young students and Ph.D. students from various disciplines and all countries are invited to contribute to a technical program of big diversity, that will offer large benefits for everybody when joining friends and colleagues with outstanding expertise in many areas in a very family atmosphere at the occasion of AVS 65 in sunny Long Beach, California, in 2018. SE1+PS Plasma-assisted Surface Modification and Deposition Processes

Diederik Depla, Ghent University, Belgium, "Dedicated Experiments to Challenge a Model for Reactive Magnetron Sputtering"

SE2+NS+TF Nanostructured Thin Films and Coatings Hanna Kindlund, Lund University, Sweden, "Toughness Enhancement in Hard Single-crystal Transition-metal

Nitrides: V-Mo-N and V-W-N Alloys" SE3 Wear, Oxidation and Corrosion Protective Coatings

Ali Erdemir, Argonne National Laboratory, "In-Operando Formation of Carbon-based Tribofilms on Catalytically Active Nanocomposite Coatings"

Frederic Sanchette, Université de Technologie de Troyes, France, "Corrosion Resistance of Mechanically Reinforced Aluminium-based Coatings obtained by PVD Techniques"

SE4 New Challenges and Opportunities in Surface Engineering Jinn Chu, National Taiwan University of Science and Technology, Taiwan, Republic of China, "Metallic-Glass

Nanotube Arrays: A New and Novel Devices for Various Applications" Ludvik Martinu, Ecole Polytechnique de Montreal, Canada, "From Passive to Active Optical Coatings - Challenges and

Opportunities for Pulsed Plasma Deposition Processes" SE5 Advanced Surface Engineering Division Poster Session

SURFACE SCIENCE DIVISION (SS): The Surface Science Division provides a forum for cutting-edge and foundational research that involves solid surfaces and interfaces. Phenomena that take place at the gas-solid and liquid-solid interfaces are prominent within the SS division programs. Technical sessions address atomistic, structural, electronic, and chemical phenomena at surfaces and interfaces, their impact on materials properties, and their implication for technological and catalytic processes. Surface chemistry is an important divisional theme, encompassing the kinetics and dynamics of surface processes and chemical events from adsorption and reaction to catalysis from both a theoretical and experimental perspective. Film and 2D nanostructure growth is another key theme, explored from a fundamental perspective, through the development of new growth and processing methods for materials preparation and novel materials like 2D metal organic frameworks. Lively sessions are devoted to the surface science of metallic, semiconductor, oxide, and organic surfaces that support unique chemical activity and electronic properties. Surface science applications in high-impact areas, including energy science, microelectronics, 2D materials and nanotechnology, - are highlighted in the program with a focus on bridging pressure gaps. This Division's overarching goal is to provide the atomistic insights on solid surfaces and interfaces needed to advance our understanding of materials systems and benefit society. SS1+HC Catalytic Alloys: Understanding Heterogeneity

Will Medlin, University of Colorado, "Surface Science-informed Design of Multicomponent Catalysts for Deoxygenation of Biomass Derivatives"

SS2+HC Theory and Modeling of Surfaces and Reactions Jean Sabin McEwen, Washington State University, "Elucidating the Chemical Nature of Single-Site Catalysts from First

Principles" SS3+HC+MI Dynamical Processes at Surfaces

Wilson Ho, UC Irvine, University of California Irvine, "Light Driven Single Molecule Coherent Dynamics at Surfaces" SS4+HC+MI Oxides/Chalcogenides: Structures and Reactions

Melissa Hines, Cornell University , "New Eyes for Nanocatalysis: Atomic Scale Investigations of TiO2 Chemistry"

SS5+AS+EM Semiconducting Surfaces Stacey Bent, Stanford University, "Functionalizing Semiconductor Surfaces and Interfaces"

SS6+EM+NS Defects in and Functionalization of 2D Materials Thomas Michely, University of Cologne, "Holes, Pinning Sites and Metallic Wires in Monolayers of 2D Materials"

SS7+AS+HC Role of Water/Solvent on Surface Structure - Catalysis and Electrocatalysis Lars Grabow, University of Texas at Houston, "Using Water as a Co-catalyst in Heterogeneous Catalysis to Improve

Activity and Selectivity" SS8+EM+NS Photon Driven Processes at Surfaces

Piotr Piotrowiak, Rutgers University SS9+AS+BI+MI+NS Organic/Inorganic Surfaces, Interfaces and Nanostructures

Janice Reutt-Robey, University of Maryland, College Park, "Lithiation Dynamics at Nanobattery Interfaces" SS10+HC+TF Metal and Covalent Organic Frameworks (MOFs and COFs) on Surfaces

Christof Woll, Karlsruhe Institute of Technology, "Designer Solids via Multi-Heteroepitaxy : Layer-by-Layer Deposition of Molecular Frameworks"

SS11+HC Near/Ambient Pressure and Bridging Gaps between Surface Science and Catalysis John Hemminger, University of California Irvine, "Ambient Pressure Electron Spectroscopy (XPS, XAS) and Electron

Microscopy Studies of the Structure and Chemistry of Nanostructured Model Catalysts" SS12+EM+PS+TF Deposition, Etching and Growth at Surfaces

Gionvanni Costantini, Warwick University, UK, "Controlled Deposition and High-Resolution Analysis of Functional Macromolecules in Ultrahigh Vacuum"

SS13+HC+NS+PS Controlling Mechanisms of Surface Chemical Reactions Angelos Michaelides, University College London, UK, "Bond Making and Bond Breaking at Wet and Dry Surfaces"

SS14 Surface Science Division Poster Session

THIN FILMS DIVISION (TF): The Thin Film Division offers several core oral sessions and one poster session. A broad range of outstanding invited speakers will touch on topics across the breadth of thin film science, technology and applications. There are several sessions dedicated to thin film deposition and processing, including energy conversion and storage, electronics, photovoltaics, 3D and extreme geometries, precursors, surface reactions, memory, magnetics, organic-inorganic hybrid materials, manufacturing and up-scaling. These sessions highlight basic science and the pursuit of applications. Furthermore, we offer sessions on in-situ diagnostics for CVD and ALD processes, organic-inorganic interface engineering and modeling of thin film processes. There will also be new sessions around emerging applications, including thin film flexible electronics, and integration of thin films and nanostructures for sensing and energy harvesting. We are also excited to announce, in collaboration with the Plasma Science & Technology Division, a new session track on Atomic Layer Processing (ALP), to highlight the synergy between ALD and ALE. Abstracts are solicited on topics ranging from atomic layer etching (plasma or thermal), area selective deposition, chemistry and surface reactions for ALP and integration of ALD and ALE. Other relevant ALP topics also include area selective patterning, plasma-enhanced ALD, emerging applications, diagnostics and high volume manufacturing of ALP. Again this year, we will host a student-focused session to highlight the Harper Award candidates in which the student finalists will present their work in an interactive “TEDTalk” type of forum. Finally, we will host a special session in honor of Paul Holloway to celebrate his contributions to the AVS: Luminescent Materials Growth, Synthesis and Characterization TF1 ALD for Energy Conversion, Storage and Electrochemical Processes

Brecht Put, IMEC & KU Leuven, Belgium "Thin Films for Next Generation Batteries" TF2+EL+EM+NS+SS Integration of Thin Films and Nanostructures for Sensing and Energy Harvesting

Deji Akinwande, The University of Texas at Austin, "Applications of 2D flexible Nanoelectronics for Future Communications"

TF3+AS+EM+NS+PS+SS Thin Film Flexible Electronics – Materials, Processes and Device Patterning Tomoyuki Yokota, The University of Tokyo, Japan, "Ultraflexible Organic Electronics for Bio-medical Applications"

TF4+EM+MI Thin Film Processes for Electronics David Meyer, Naval Research Lab, “Crystalline Conductors: Transition Metal Nitride Materials and Device

Applications" TF5 ALD and CVD Precursors and Surface Reactions

Gregory Girolami, University of Illinois at Urbana-Champaign TF6 ALD and CVD Manufacturing and Up-scaling

Arrelaine Dameron, Forge Nano, USA, "ALD for Batteries" TF7 Emerging Applications for ALD

Junling Lu, University of Science and Technology of China, Hefei, China, "Applications of Atomic Layer Deposition on Catalysis"

TF8 Thin Films for Photovoltaics

Thomas Riedl, Bergische Universitaet Wuppertal, Germany, "Atomic Layer Deposition for Organic and Perovskite Solar Cells"

TF9+AS Modeling of Thin Film Processes Douglas Irving, North Carolina State University, “A First Principles Perspective of Defects in Thin Films” Adri van Duin, Pennsylvania State University

TF10+SS Organic/Inorganic Interface Engineering Naoto Shirahata, National Institute for Materials Science, Tsukuba, Japan, “Controlled Structure of Silicon

Nanocrystals: Multi-Color Emissions and their Applications” TF11+PS Deposition Processes for 3D and Extreme Geometries

Alex Martinson, Argonne National Laboratory, “ALD in Metal Organic Frameworks: Toward Single Site Synthesis and Sinter-Resistant Catalysts”

TF12 Thin Film Organic/Inorganic Hybrid Materials AnnaMaria Coclite, Graz University of Technology, Austria, "CVD of Thin Polymer Films for Engineered Material

Properties" TF13+2D+NS+SS Processing of Carbon-based Thin Films and Nanostructures

Robert Weatherup, University of Cambridge, Cambridge, UK, "Direct Observation of the Mechanisms of Graphene Growth during Chemical Vapor Deposition: Routes to Controlling Layer Number and Domain Size"

TF14+EM+MI+PS Thin Films for Advanced Memory Applications and Magnetics Chris Palmstrøm, University of California at Santa Barbara

TF15+EL+PS In-situ Diagnostics for CVD and ALD Processes Alessandra Quadrelli, CNRS, Lyon, France, “2D TMD Monolayer of MOS2 BY ALD and Insight in the Mechanism by

Surface Organmetallic Chemistry” TF16+AS Special Session in Honor of Paul Holloway: Luminescent Materials Growth, Synthesis and Characterization

Markku Leskela, University of Helsinki, Finland, “Atomic Layer Deposition of Optoelectronic Materials” Philip Rack, University of Tennessee Knoxville, “Nanoscale Focused Electron Beam Stimulated Processing” Olga Shenderova, Adamas Nanotechnologies, Inc., “Fluorescent Diamond Particles and Their Application” Hendrik Swart, University of the Free State, Republic of South Africa, “Luminescent Materials for Solid State Lighting”

TF17+AM+EM+PS Atomic Layer Processing: Area Selective Deposition Annelies Delabie, IMEC & KU Leuven, Belgium, "ASD of Metals and Metal Oxides" Adrie Mackus, Eindhoven University of Technology, The Netherlands, Netherlands

TF18+PS Atomic Layer Processing: Chemistry & Surface Reactions for Atomic Layer Processing Cathleen Crudden, Queen's University, Canada, "Self-assembled Monolayers (SAMs) on Gold (via N-heterocyclic

Carbenes)" Michael Morris, Trinity College Dublin, Ireland, "Area-selective Polymer Brush Deposition"

TF19 Thin Film Poster Session

TRIBOLOGY FOCUS TOPIC (TR): The Tribology Focus Topic will feature sessions on nanoscale wear with applications in nano-metrology and nano-manufacturing, molecular origins of friction, lubricants and coatings, and friction in biological systems. Sessions are jointly sponsored by the Applied Surface Science (ASSD) Division, Thin Films (TF), Nanometer-scale Science and Technology (NSTD), and Biointerfaces (BI). Our focus is on linking of nanoscale information (either simulations or experiments, but preferably both) to macroscale observations. Presentations will carry a materials focus in areas such as thin film deposition, solid lubricants, nanocomposites designed for tribological function, self-healing interfaces, wear-resistant polymers, and biomaterials. Contributions will consider advances in in-situ, molecularly specific, spatially resolved approaches to the quantitative characterization of tribological interfaces as well as accounts of numerical computation and molecular modeling of tribological materials and biomaterials. In addition to the four oral sessions, we will have a poster session, which will provide an opportunity for personal exchange and discussion of results with colleagues. TR1+AS+NS+SS Nanoscale Wear: Applications to Nano-Metrology and Manufacturing TR2+AS+NS+SS Molecular Origins of Friction

Mehmet Z. Baykara, University of California Merced, “Structural Superlubricity: History, Breakthroughs, and Challenges”

Jonathan Felts, Texas A&M University TR3+TF Lubricants and Coatings

Diana Berman, University of North Texas Judith Harrison, United States Naval Academy

TR4+BI Friction in Biological Systems Prathima Nalam, University of Buffalo, “Nanomechanics of Soft, Hierarchical Structures”

TR5 Tribology Focus Topic Poster Session

VACUUM TECHNOLOGY DIVISION (VT): The Vacuum Technology Division (VTD) provides a forum for research in achieving, maintaining, measuring, and analyzing vacuum across a wide range of pressures, gas compositions and applications. The 2018 VT oral program topics include: (1)Vacuum Measurement- special emphasis on the development of quantum based primary standards for total and partial pressure measurement,(2)Vacuum Pumping-special emphasis on UHV and XHV pumping systems,(3) Wall-Vacuum interactions-special focus on outgassing from additive manufacturing processes and surface science in accelerators,(4) Large Vacuum Systems-special emphasis on Lyophilization chambers, (5) Vacuum System Automation and Control, (6) Partial Pressure analysis, (7)Sample transfer under vacuum conditions. The VT Poster session Tuesday evening features the VT Student Poster Competition, with a first place award of up to $500, where students of any discipline are invited to share their innovative solutions to vacuum equipment challenges. Student presenter awards will also be given for the best oral presentations. To be eligible for a student prize, the presenter must be registered as a student and present the work in a VT poster or oral session. VT1 Vacuum Measurement - Focus: Vacuum and Quantum SI VT2 Pumping, UHV and XHV

Steve Greuel, Nor-Cal Products Evan Salim, ColdQuanta, “Compact Ultra High Vacuum Systems for Applications of Cold Matter”

VT3 Outgassing: Focus: Additive Manufacturing Matthew Hartings, American University

VT4 Large Vacuum Systems and Accelerators-Focus on Lyophilization Shweta Saraf, SLAC, “Vacuum Controls Design for LCLS-II” Evgenyi Shalaev, Allergan, “Pharmaceutical Freeze-Drying and Vacuum-Drying: Challenges and Opportunities”

VT5 Vacuum System Automation and Control Andy Sibley, Tri Alpha Energy, Inc., “Structured Software Design and Integration of the C-2W Fusion Vacuum System”

VT6 Surface Science for Accelerators Irit Ruach-Nir, AMAT- Applied Materials, Israel, “The Importance of Vacuum Cleanliness in Semiconductor Process

Control SEM Tools” VT7 Partial Pressure Analysis VT8 Vacuum Transfer/Vacuum Suitcase/Load Lock

Bevan Court, Kurt J. Lesker Ady Hershcovitch, Brookhaven National Lab, “Plasma Window as Vacuum Atmosphere Interface for Various

Applications” VT9 Vacuum for Semiconductor Manufacturing Svetland Radovanov, Applied Materials, Inc., “Beamline Technology and Current Modeling Capabilities for Ion

Implantation” VT10 Vacuum Component Manufacturing

Duane Bingaman, Kurt J. Lesker VT11 Vacuum Technology Division Poster Session

SPECIAL SESSIONS & EVENTS

EXHIBITOR TECHNOLOGY SPOTLIGHT (EW): AVS 65 Exhibitors are provided the opportunity to present commercial and/or scientific announcements relating to their products and services to symposium attendees during technical session breaks in the stage area of the exhibit hall. Papers submitted and material presented during the presentation must provide technical information and/or analysis using a specific exhibitor product, technique or service. The 20 minute presentations will be held in stage area of the exhibit hall and will take place during symposium session breaks to ensure maximum attendance. Cost is $600 ($500 for Corporate Members). For space availability, contact Jeannette DeGennaro: Jeannette@avs.org. EW1 Exhibitor Technology Spotlight Session

AVS VENDOR EXHIBIT: The Exhibit comprises an extensive display of tools, equipment and services for Surface Science; Biomaterial Interfaces; Electronic Materials & Photonics; Magnetic Interfaces; Manufacturing Science; MEMS/NEMS; Nanoscience; Thin Film; Plasma Science; Vacuum Technology, educational material, career services and professional literature, journals and publications. Each year, the technical symposium expands into new and exciting technical disciplines which bring new exhibitors showing new technology and research methods. The continuously expanding technical program consistently keeps our Symposium fresh and exciting for exhibitors and attendees alike. The exhibits will be open from Tuesday morning until Thursday afternoon (October 22-25, 2018). Please contact exhibits@avs.org for additional information. You may also review our website www.avs.org.

AVS PRESENTATIONS ON DEMAND: We will be inviting all Symposium presenters to submit their PowerPoint slides as a PDF for inclusion in the AVS Technical Library. All presenters will be contacted prior to the meeting with the instructions and deadlines. We hope you will consider participating in this exciting program!

AVS LATE BREAKING SESSION: There will be opportunities for presentation of post-deadline discoveries in all fields relevant to the AVS membership. Submissions that address topics in surfaces, interfaces, films, nanometer-scale phenomena, emerging technologies, or new innovations. Abstracts will be solicited starting in mid-July for either (1) an individual 20 minute oral presentation, or (2) a poster presentation. Late Breaking Abstracts will be used to fill holes in the program and they must be submitted via the AVS website by Monday, August 20, 2018. Notification of acceptance/rejection will be made soon thereafter. Please check the AVS 65 (www.avs.org) website for details and submission guidelines in mid-July. AVS SHORT COURSES: Short courses that offer specialized training in specific areas of vacuum science and related technologies will be offered all week, commencing on Monday, October 22, 2018. Registration and additional details will be posted on the AVS website in early July. AVS SPONSORSHIP PROGRAM: AVS is a not-for-profit Society that offers a myriad of services, programs and events related to science and technology in the fields of vacuum, materials, interfaces and processing to scientists and engineers from around the world. An extensive recognition and exposure program, which is active before and during the Symposium, is available to our Symposium Sponsors. As a Symposium Sponsor, your logo will appear on the AVS website, in the Technical/Exhibitor Program, on signage and slide shows at the Symposium. The earlier you commit to AVS Symposium Sponsorship, the greater exposure you will receive. To learn more about Sponsorship opportunities, please contact Jeannette DeGennaro at 212-248-0200 ext. 229 or jeannette@avs.org or Yvonne Towse at 212-248-0200 ext. 222 or yvonne@avs.org.

ONLINE ABSTRACT SUBMISSION ONLY: www.avsSymposium.org

Deadline: 11:00 p.m. ET, WEDNESDAY, May 2, 2018

Supplemental data (1-2 pages, 1MB) will also be accepted via the submission site. Instructions may be found at the web site above.

***Please Note: A presenter may present one (1) paper only (either ORAL or POSTER) at the Symposium***

ORAL Sessions: Rooms will be set up with projectors, screens, microphones, and laptops (PCs). POSTER Sessions: Each poster presenter will be allotted space that is 4 feet wide by 4 feet high. Please make your poster no larger than 46 inches wide by 46 inches high to ensure it fits nicely into the allotted space.

AVS AWARDS & TRAVEL GRANTS All award applications for AVS National and Division/Group awards may be found at the following link: (http://www.avs.org/Awards-Recognition). Please contact Angela Klink, Member Services Administrator, (angela@avs.org, 212-248-0200 ext. 221) for any additional information.

AVS PROFESSIONAL AWARDS Each year, the AVS solicits nominations for major national awards. These include the Medard W. Welch Award, the Gaede-Langmuir Award, the John A. Thornton Memorial Award and Lecture, the Peter Mark Award, Fellow of the Society and the George T. Hanyo Award. Nominations are due March 31, 2018 and should be submitted through the AVS online award submission site. Nomination information is available on www.avs.org or through Angela Klink (212-248-0200, ext. 221 or angela@avs.org).

NATIONAL STUDENT AWARDS Students may apply for one National Student Award and one Division/Group Award in a given year.

Each year, the AVS solicits nominations for eight graduate student awards. These are the Russell and Sigurd Varian Award,, the Nellie Yeoh Whetten Award, the Dorothy M. and Earl S. Hoffman Award, two Dorothy M. and Earl S. Hoffman Scholarships (N.B. the Hoffman Award and Scholarships are distinct from the Hoffman Travel Grants described below) and three Graduate Research Awards. The nomination procedures are on www.avs.org or through Angela Klink (212-248-0200, ext. 221 or angela@avs.org) Applicants should use the AVS online award submission site. The deadline is May 2, 2018

DOROTHY M. AND EARL S. HOFFMAN TRAVEL GRANTS

The Hoffman Travel Grants have been created in an effort to promote student involvement in AVS and encourage their participation in the annual AVS International Symposium. These travel grants will be given to any applying graduate students who meet the following criteria: 1) you must be the presenter of an accepted Symposium abstract, 2) you must be a full-time graduate student, 3) the grant is not transferable, 4) you must attend the Symposium to receive the grant and, 5) you are not eligible to receive the grant if you are receiving any other travel support from AVS. An invitation e-mail will be sent to eligible students (late June 2018) and the student should apply for the grant by return e-mail to the AVS National Office. The application deadline is Friday, August 19, 2018. Should your application be approved, you will receive an e-mail notification by Friday, September 21, 2018. Grants will be given on a random basis until the 2018 funds are depleted. Funds for the grant recipients will be available at the Symposium Registration Manager's desk, and you will also be asked to present a student I.D. Please note that all travel grants must be collected at the meeting.

DIVISION/GROUP STUDENT AWARDS Students may apply for one National Student Award and one Division/Group Award in a given year.

The Applied Surface Science Division is offering student awards. Students who would like to compete for the awards need to submit an abstract for a poster or talk to one of the ASSD or ASSD co-sponsored sessions. Presentation during an AVS Symposium session is required for eligibility. If the ASSD has more than three applicants for the student award, the ASSD Student Award Committee Chair may ask the student candidates to submit an extended abstract, which will be used to down select the number of finalists to three. The three award finalists will present a “capsule” (3-slide, 5-minute) presentation to the judges during the Tuesday night ASSD Business Meeting. The winner will be selected based upon presentation skills, scientific merit and originality of their work. The awards consist of three cash prizes totaling up to $1,000. The student that wins the best presentation award will be reimbursed for meeting registration at the student rate for the following year's AVS meeting and ASSD will ask the award winner to submit an abstract to an ASSD or ASSD co-sponsored session. Students wishing to participate in the competition should complete the application on the awards submission site and submit an abstract by May 2, 2018.

The Biomaterial Interfaces Division is offering student awards ($250, $150 and $100) for the best combined Flash and Poster Presentation based on their PhD research. These awards are sponsored by our AVS Biointerphases journal. All PhD students presenting at both sessions will be considered for the prizes automatically, and they will be judged on the scientific merit and originality of their research, as well as the quality of presentation. Individuals more than one year past the date when their PhD degree was awarded are not eligible to compete for the student prize. Inquiries may be addressed to Prof. Axel Rosenhahn, axel.rosenhahn@rub.de.

The Electronic Materials & Photonics Division (EMPD) Student Poster Award is given at the annual AVS International Symposium and Exhibition to encourage students to present their research in the EMPD poster session during the Symposium. To qualify for the award, the applicants must be a full-time student (graduate or undergraduate) at an accredited educational or/and research institute. Candidate students must submit an abstract for a poster presentation that meets all Symposium requirements and deadlines through the normal submission web portal. All poster presenters present at the EMPD poster session will be automatically considered for the EMPD Student Poster Awards and they will be judged on the scientific merit and originality of their research, their contribution to it, as well as the quality of their presentation. EMPD Student Poster Awards consist of a certificate and a $500 cash prize. Multiple awards are anticipated Inquires may be directed to Rachael Myers-Ward rachael.myers-ward@nrl.navy.mil.

Magnetic Interfaces & Nanostructures Division: Leo M. Falicov Student Award has been established in memory of Professor Leo M. Falicov to recognize outstanding research performed by a graduate student in areas of interest to the MIND. Finalists will be selected on the basis of abstract submission, and will receive a cash award upon attending the AVS International Symposium and presenting their paper in an oral session. The winner will be selected on the basis of the oral presentation, considering quality of research and clarity of presentation, and will receive a cash prize and a certificate. Interested applicants should complete the application on the awards submission site and a copy of the submitted AVS abstract and a letter of recommendation before the abstract deadline of May 2, 2018.

Manufacturing Science and Technology Group is pleased to announce and solicit applications to be competitively awarded to up to 2 graduate students who present papers in MSTG sponsored sessions. The purpose of the MSTG award is to both encourage participation of students in the MSTG program and to acknowledge the valuable contributions they make in advancing state-of-the-art in manufacturing science and technology. Full-time university graduate students with primary appointments at universities are eligible to apply. Preference will be given to those who give oral presentations of their papers. Students awarded the MSTG Award will receive a grant. Submission materials consist of: 1) Letter of application describing the student‘s research (1 pg. max.); 2) Letter of endorsement by the student‘s research advisor (1 pg. max.); 3) Copy of submitted abstract; 4) CV (2pg max.) 5) completed application materials should be submitted through the awards submission site by the deadline of May 2, 2018.

MEMS and NEMS Technical Group is pleased to announce a “Best Paper Award” competition at the AVS Symposium and Exhibition. The award includes a cash prize ($500) and a certificate to the well deserving student presenting his/her paper in an oral or poster session of the MN group. Both graduate and undergraduate students are eligible. The candidates will be judged on the quality, originality of his/her research and their skill in presentation (oral/poster). In addition, the MEMS/NEMS Group is supporting a Registration Waiver Award to the well deserving graduate/undergraduate student submitting an abstract to the MN session. This award will be solely based on the quality of work mentioned in the abstract. In order to qualify for the competition, interested candidates should submit a cover letter describing their intent to compete for any one of the above mentioned awards along with a copy of their AVS abstract, current CV and application through the awards submission site by May 2, 2018 The Nanometer-Scale Science and Technology Division Graduate Competition brings recognition to outstanding research by graduate students giving oral or poster presentations in NSTD sessions at AVS international symposia. Applications can be submitted by: 1) going to the awards submission site and selecting the appropriate box, 2) uploading a cover letter, resume, advisor support letter and your AVS abstract by May 2, 2018. The abstract must be submitted to an NSTD sponsored or co-sponsored session, and at least one of the co-authors on the abstract must be an AVS member at the time of submission; the AVS member co-author(s) and the symposium session should be mentioned in the cover letter. All finalists will be selected by the NSTD Awards Committee, and they will be informed by Sept. 2, 2018. All finalists must present a five minute talk (with additional time for questions) at the NSTD Awards Competition, which is tentatively planned for noon on Wednesday of the symposium week. The winner will be selected based on the quality of the talk, the responses to subsequent questions, and the level of the research. The graduate award winner will receive a certificate and a cash award of $500. This award is made possible by financial support from NSTD's sponsors, who in 2017 were Heidelberg Instruments, Oxford Instruments Asylum Research, and RHK Technology. John Coburn and Harold Winters Student Award in Plasma Science and Technology: Required Application Materials: 1) A curriculum vitae of the nominee, 2) A one-page letter of recommendation from the student's research advisor/mentor, 3) A copy of the nominee's submitted abstract for the AVS International Symposium. A maximum of six finalists will be selected on the basis of technical and scientific merit and originality of research. Each finalist will receive a cash award of $500 and an official certificate and must present their paper in a closed door session. This closed door presentation will be in addition to the regularly scheduled PSTD oral session at the AVS Symposium. The Coburn and Winters Award winner will be selected from the finalists on the basis of the oral presentations, the quality of research, the clarity of the presentations, and the potential for the research to advance the field of plasma science. The winner’s award consists of an additional cash prize of $500. The selection of finalists and the award winner is made by the PSTD Executive Committee. These awards are contingent upon acceptance of the abstract for presentation in a PSTD session at the AVS International Symposium. Submissions are limited to one application from a particular research group unless previously discussed with the Awards Coordinator. All materials should be sent to submitted through the AVS award site and must be received on or before May 2, 2018. The Surface Science Division solicits nominations for the Morton M. Traum Surface Science Student Award to be given to the best student presenter at the AVS International Symposium. This is the oldest student award in AVS, presented since 1981. A candidate for the award must be registered to give an oral or poster presentation at the AVS International Symposium and be either a current graduate student or have received the Ph.D. degree in the year of the Symposium. Up to a maximum of five finalists will be selected to compete with posters during the Surface Science poster session; these poster presentations are in addition to any different presentation they are registered for at the International Symposium. The main selection criteria include both scientific content and presentation skill. The winner will receive a cash prize of $1000 and a certificate. The winner's name will appear in the list of previous winners published yearly in the Symposium technical program and on the plaque that is on display at the Symposium. The other finalists will receive a cash award. Traum award applicants should submit 1) a copy of the abstract submitted to AVS that includes the abstract submission number; 2) an extended abstract that does not exceed two pages (including tables, figures, and references); 3) their expected graduation date, 4) two letters of recommendation, and 5) an AVS application form for student awards. Please use the online award submission site to complete your application. Deadline: May 2, 2018. Thin Film Division James Harper Award and Graduate Student Award: The Thin Film Division's premier, competitive graduate student award is in honor of James M.E. Harper, who was a pioneer in the thin film areas of interconnects and silicides, and was active in the AVS as a Trustee, Director, vice-program chair, Thin Film chair, and many other roles. Finalists for the award will be chosen based on the application packages below, and the Harper Award will be given for the best oral presentation during a special event at the Annual Symposium. The award will consist of a plaque and cash prize of $800. Runners-up will receive Thin Film Graduate Student Awards of $500. Interested applicants should send 1) their CV; 2) a copy of their submitted AVS abstract; and 3) a letter of recommendation from their research advisor. To be eligible for the Harper Award, the student must be the presenter of an oral presentation

in the Thin Film Division sessions at the AVS meeting and must be a currently registered graduate student on the date of the abstract submission deadline Application materials should be submitted through the awards submission site. Deadline: May 2, 2018. Vacuum Technology Division Student Poster Competition: Known as the “Student-Built Vacuum System Competition (alias - Junkyard Wars of Vacuum Technology)," this is a competition for student posters that describe the design, development, and/or use of “student-built vacuum systems.” Although these types of vacuum systems may not represent state-of-the-art technology, they often reflect ingenious designs that are guided by unique functionality, and/or are constrained by limited resources. Competitive submissions are expected to reveal inspired and/or cost-effective solutions to real-world issues encountered in typical vacuum system designs. The competition is open to any student who has built a vacuum system for any research purpose. The resulting research project, whether complete or not, should be presented along with the vacuum challenges that have been undertaken. The posters will be judged during the poster session, and cash prizes of up to $500 will be awarded to the winners of the competition. The application deadline for entering the competition is the same as the abstract deadline which is May 2, 2018. Students desiring to enter the competition should submit the poster abstract and application directly in the awards submission site and submit the abstract to the VTD poster abstracts call. Inquiry may be directed to the VTD Student Award Coordinator, Dr. James Fedchak (james.fedchak@nist.gov). Vacuum Technology Division Student Presenter Award is given at the annual AVS International Symposium to encourage students to present their research work in the VTD sessions during the Symposium. To qualify for the award, the applicants must be a full-time student (graduate or undergraduate) at an accredited educational or/and research institute. Candidate students shall submit an abstract the the annual AVS International Symposium & Exhibition for an oral presentation which meets requirements and deadlines, and must be the presenter (16-minute talk + 4-minute Q&A) at the AVS Symposium. A panel will judge the student presenters, and the awardee will be selected based on the quality of the presented works (with emphasis on his/her contribution to the presented works) and on the presentation, itself. The VTD Student Presenter award consists of a certificate and a cash prize. The application may be done by going to awards submission site. Inquiry may be directed to the VTD Student Coordinator, Dr. James Fedchak (james.fedchak@nist.gov). Deadline is May 2, 2018.

FOCUS TOPIC AWARDS The Focus Topic on Fundamental Discoveries in Heterogeneous Catalysis (HC) announces The Graduate Student Presentation Award (GSPA), supported by The Journal of Physical Chemistry, Hiden Analytical, and the Journal of Chemical Physics. These are competitive awards that will be given to the best graduate student (or PhD work) presentations in the Heterogeneous Catalysis Focus Topic sessions at the Annual Symposium. Awardees will be announced at the end of the final HC Focus Topic session and will receive an award certificate and cash prize. To Enter: In addition to submitting an abstract to the Annual Symposium, students should email a 1-paragraph statement of why they are excited about their PhD work to dkillelea@luc.edu, by May 15, 2018. 4-6 finalists will be selected from the submitted applicants. The student presentations will be judged based on the scientific merit of the presented work, and the post-presentation discussion. The award committee consists of members of the HC committee and other senior members of the community present during the meeting. The HC Focus Topic Committee gratefully acknowledges The Journal of Physical Chemistry, an ACS journal, Hiden Analytical, and The Journal of Chemical Physics, an AIP journal, for sponsoring the awards. This award will be offered for the second time at the 2018 meeting in Long Beach, CA.

SOCIETY/DIVISION/GROUP PROFESSIONAL AWARDS (NOT FOR STUDENTS)

The AVS Applied Surface Science Division (ASSD) Peter M. A. Sherwood Mid-Career Professional Award recognizes achievements leading to exceptional progress in research and development made by professionals in their mid-career in an area of interest to the ASSD. The award consists of a cash award plus a plaque. The nomination deadline is May 2, 2018. The nomination package must contain the nomination form, nominating letter, biographical materials and three supporting letters. The Awardee will give a featured talk at the AVS International Symposium where the award will be presented. Travel support is available to attend the Symposium. The Award will be made only if an appropriate candidate is identified. The AVS Biomaterial Interfaces Division (BID) invites applications for the Early Career Researcher (ECR) Award. Open to all authors submitting an abstract to a BID supported session at the Annual International Symposium, the prize consists of symposium registration and $250 towards travel costs as well as an honorary presentation in a relevant BI session. The nominee’s Ph.D. or equivalent degree must have been earned less than 10 years prior to January 1 of the award year. Required application materials: 1) a nominating letter and two supporting letters, 2) a biography and CV of the nominee, and 3) a copy of the nominee's abstract submitted to the AVS symposium. Application materials will be reviewed and the award winner chosen by the BID Executive Committee. Application materials should be sent by email to: Prof Axel Rosenhahn, axel.rosenhahn@rub.de. Deadline: May 1

The Electronic Materials & Photonics Division accepts applications for the EMPD Postdoctoral cash award for postdoctoral fellows who have an accepted abstract AND will be presenting an EMPD presentation at the International Symposium. The application consists of (i) a copy of the accepted abstract with Program Number, (ii) a recommendation letter from his/her advisor, and (iii) his/her vitae, plus (iv) a cover letter of request. Send to Prof. Leonard Brillson, brillson.1@osu.edu. Deadline: September 7, 2018.

Magnetic Interfaces and Nanostructures Division: The MIND Postdoctoral Award recognizes outstanding contributions to the areas of interest of MIND. The award comes with a certificate and a cash prize for the winner. Postdoctoral fellows who will be presenting MIND papers at this year's International Symposium are welcome to apply. The application consists of (i) a copy of the accepted abstract, (ii) a recommendation letter from his/her advisor, and (iii) his/her CV, plus (iv) a cover letter of request should be sent by the deadline: October 1 of the Symposium year to Markus Donath (markus.donath@uni-muenster.de)

The Nanometer-Scale Science and Technology Division Postdoctoral Competition brings recognition to outstanding research by postdoctoral scientists giving oral or poster presentations in NSTD sessions at AVS international symposia. Postdocs who are within five years of their PhD at the time of the 2018 National Symposium are eligible to apply, and should send a cover letter, resume, advisor support letter, and their AVS abstract to the NSTD Awards Coordinator: Sidney R. Cohen (sidney.cohen@weizmann.ac.il), in a single PDF file. The abstract must be accepted to an NSTD sponsored or co-sponsored session requiring submission by the abstract deadline (May 2, 2018), and at least one of the co-authors on the abstract must be an AVS member at the time of submission; the AVS member co-author(s) and the symposium session should be mentioned in the cover letter. The deadline is July 20, 2018. All postdoctoral award finalists will be selected by the NSTD Awards Committee, and they will be informed by Sept. 2, 2018. All finalists must present a five minute talk (with additional time for questions) at the NSTD Awards Competition, which is tentatively planned for noon on Wednesday of the symposium week. The winner will be selected based on the quality of the talk, the responses to subsequent questions, and the level of the research. The postdoc NSTD award winner will receive a certificate and a cash award of $500. Depending on the needs of the following year’s AVS Symposium, the winner will be considered for an invited talk. This award is made possible by financial support from NSTD's sponsors, who in 2017 were Heidelberg Instruments, Oxford Instruments Asylum Research, and RHK Technology. The Nanotechnology Recognition Award recognizes members of NSTD for outstanding scientific and technical contributions in the science of fabrication, characterization, and fundamental research employing nanometer-scale structures, scanning probe microscopy, technology transfer involving nanometer-scale structures, and/or the promotion and dissemination of knowledge and development in these areas. The award comprises a cash award plus a certificate. The nomination is for 2019, and the deadline is July 20, 2018. The nomination material should include a nominating letter, biographical material, and 3 supporting letters, which should be emailed as a single pdf file to: Sidney R. Cohen (sidney.cohen@weizmann.ac.il). The Award will be presented at the AVS International Symposium and conference registration will be waived for the award winner. This award is made possible by financial support from NSTD's sponsors, who in 2017 were Heidelberg Instruments, Oxford Instruments Asylum Research, and RHK Technology.

The Plasma Science & Technology Division is pleased to solicit nominations for the Plasma Prize, which is awarded annually for outstanding contributions to the field of plasma science and technology. Please submit ONLY the following required application materials: (1) A one-page description citing the reason for the nomination and (2) a biography and Curriculum Vitae of the nominee. Nominations must be submitted as a pdf file by email to: Steven Vitale (steven.vitale@ll.mit.edu) Nomination deadline: May 2, 2018.

The Thin Film Division is pleased to solicit nominations for a prestigious award, the Paul H. Holloway Young Investigator Award. This award is named after Professor Paul H. Holloway, who has a distinguished history of scholarship and services to AVS and is still very involved in the AVS. The nominee must be a young scientist or engineer who has contributed outstanding theoretical and experimental work in an area important to the Thin Film Division of AVS and a current member in AVS society. The nominee’s Ph.D. or equivalent degree must have been earned less than 7 years prior to January 1 of the award year. Required application materials: 1. a description citing the reason for nomination; 2. a nominating letter and two supporting letters and 3, a biography and CV of the nominee. It is expected that an applicant will also submit an Abstract to the Annual Symposium. Application materials will be reviewed and the award winner chosen by the TFD Executive Committee. The award consists of a cash prize, a certificate citing the accomplishments of the recipient, and an honorary lecture at one of the TFD oral sessions at the International Symposium. Application materials should be sent to Ginger Wheeler; virginia.wheeler@nrl.navy.mil . Deadline: May 2, 2018.

Thin Film Division Distinguished Technologist Award: The Thin Film Division is pleased to solicit nominations for a new award, the Distinguished Technologist Award. The Award serves to recognize individuals who have provided exceptional technical support of thin film research or related development activities. We are all indebted to the support provided at some point in our careers by outstanding technologists or technicians, and this award is meant to recognize the importance of that role in thin film research and development. Eligibility: There is no requirement that a nominee be an AVS member, however membership and/or an active role in the society at the national or local level is advantageous. The nominee must have provided outstanding technical support to a laboratory research or development program in an area of interest to the Thin Film Division, as evidenced by a nomination letter, and a letter of support. It is expected that the nomination come from an active AVS member. Nature of the Award: The award includes a plaque, a $500 cash award, and up to $500 in travel expenses to the AVS International Symposium. These will be presented to the awardee at the annual AVS Symposium & Exhibition by the Thin Film Division. The winner does not have to be present to receive the award but is encouraged to attend. The Distinguished Technologist Award will be granted to a maximum of one person per year. Establishment and Support: This award was created in 2015 by the New Mexico Chapter of AVS to honor its founders and their many contributions. The New Mexico Chapter of AVS provided the endowment for this Award. Nomination and Selection Procedure: Required application materials include 1) a nominating letter and one letter of support, and 2) a brief biography and CV of the nominee. Application materials will be reviewed and the award winner chosen by the TFD Executive Committee. Application materials should be sent by email to Virginia Wheeler virginia.wheeler@nrl.navy.mil by May 2, 2018

The VTD Early Career Award strives to recognize outstanding experimental and/or theoretical work related to vacuum science and technology by a scientist or engineer early in their career. The contributions can be directly in the field of vacuum science such as vacuum metrology and measurement, gas dynamics, or designing vacuum equipment, or to related fields such as gas analysis or surface science for accelerator applications. The nominee does not have to be a current member of the AVS. To be eligible, the nominee must meet AT LEAST ONE of the following three criteria: The nominee is not older than thirty-six (36) years of age during of the year in which the award is made; the nominee is within 10 years of their undergraduate degree or 5 years of their graduate degree during the year which the award is made; or the nominee holds an early career membership in the AVS. Final eligibility will be subject to the judgment of the VTD Early-Career sub-committee. The award consists of an $800 cash award and a certificate setting forth the reasons for the award. The awardee is expected to give an invited talk in one of the VTD sessions at the AVS National Symposium during the year in which the award is given. To be considered for this award please submit: 1) A nomination letter, not more than 2 pages long, that cites at least one major contribution or significant accomplishment, which should be summarized in three sentences or less and supported by publications, presentations, patents, or other evidence included in the nomination package; 2) A curriculum vitae including a short (one paragraph) biography; 3) at least (1) one letter of recommendation. A phone or web interview with candidates may also be requested. Self-nominations are acceptable. Application materials or questions should be sent by email to James Fedchak (james.fedchak@nist.gov). Deadline: April 2, 2018.

Theodore E. Madey Award: AVS, in cooperation with the Polish Vacuum Society (PVS), is pleased to solicit nominations for the 2019 Theodore E. Madey Award. In the spirit of its namesake, the Award fosters collaboration between Polish and North American scientists. The Awardee is sponsored to visit Poland, present a seminar at a university, and engage in scientific discussions. The Awardee will be selected on the bases of: (1) outstanding theoretical and/or experimental research in areas of interest to the AVS and PVS, including surface science; and (2) demonstrated leadership in international collaborative research. Nominations of mid-career scientists are especially encouraged. Required nomination materials include: 1) a letter from the nominator that describes the ways in which the applicant fits the criteria for this award; 2) two supporting recommendation letters; 3) CV (5 pages maximum) which should include education, employment history, professional recognitions (invited, appointed or elected positions), awards, and major invited talks; and 4) complete list of publications. Nomination documents must all be in PDF format. Nominations of more than one person will not be considered. Nomination materials will be reviewed, and the award winner will be selected, by a special committee consisting of both AVS and PVS members. Nominations are due in even-numbered years, and awards are given in odd-numbered years. Nominations are viable for two consecutive award cycles. Nomination materials for the 2019 award should be sent by email to: Angela Klink, AVS Member Services Administrator, angela@avs.org by March 31, 2018.