table of contents of parts in 3d at a glance enhanced

IBM United States Software Announcement208-219, dated September 23, 2008

IBM United States Software Announcement208-219

IBM is a registered trademark of International Business Machines Corporation 1

ENOVIA VPLM V5.19 enables intense design collaboration withenhanced component lock management and immediate previewof parts in 3D

Table of contents

2 Key prerequisites 10 Additional information 2 Planned availability date 24 Education support 2 Description 25 Technical information 5 Product positioning 52 Ordering information 7 Reference information 54 Terms and conditions 7 Program number 59 Prices

At a glance

ENOVIA VPLM V5.19 offers the following benefits:

• Optimizes 3D collaborative design and fast iteration by flexibly managing componentmodification rights, enabling concurrent designers to work closely on design conceptsinvolving one or very few shared assemblies

• Increases readily available information to designers through enhancements that capture andstore design context, illustrate key attributes during the modification and save routine, andmodify certain data values on-demand

• Provides virtual collaboration/extended enterprise for faster exchange of design details withsuppliers, improving repeatable processes that ensure accurate data exchange and othercapabilities

• Allows faster direct interference detection and resolution by using new methods to find andretrieve interference context, improving access and management in VPM Navigator andadding clash server support of powerful 64-bit computing technology

• Delivers full compatibility with the Microsoft® Windows® Vista operating system

Overview

ENOVIA VPLM V5.19 enhancements strengthen collaborative engineering within small, localizedteams and large global supplier partnerships. Beyond collaborative design, V5.19 managesengineering knowledge in the early work-in-process stage of product development. This releaseof ENOVIA VPLM ensures that product development teams can design, develop, and deliver thevirtual product definition right the first time, on time. Highlights include:

• Bold improvements to the component lock/unlock mechanism logic, an improved activesession refresh, and the ability to discard individual unwanted modifications before a designsave means VPM Navigator in V5.19 further improves work-in-process collaboration whenmultiple designers work on the same assembly at the same time.

• Beyond concurrent design, V5.19 VPM improvements streamline formal design changes andinformal iterations with support of customized actions and individual action modifications uponsave, improved clash issue management, the ability to lock/unlock instances and referencesdirectly from the save panel, and vastly improved error messages. These messages helpdesigners resolve data management issues immediately at the desktop, which reducesdesigner delay and help desk overhead.

• Capture of engineering knowledge is more robust in V5.19 with the ability to nest product viewresults to build larger knowledge contexts and accomplish more advanced CATIA applicativedata management.



• ENOVIA V5.19 improves supplier exchange with updates that include better management ofexposed publications and making the exchanges more repeatable when designers use newtools to store, test and send supplier work.

• Real-time rendering solutions in V5.19 Digital Mock-Up (DMU) improve the designer's abilityto 'see' designs with new control of the 3D environment in a single panel, pre-set materialrendering configurations, more realistic shadowing, and various off-line tools and libraries thatspeed rendering performance to shorten design iteration cycles.

• Continuous improvement of ENOVIA 3d com offers designers using ENOVIAVPM applicationson Microsoft Windows additional capabilities to customize toolbars and contextual menusfor higher productivity, filter, navigate, and print the Product Structure Navigator, and modifytechnical and multi-model links embedded in designs.

• Significant performance improvements have been made in ENOVIA VPLM V5.19 as well asbeing the first ENOVIA VPLM release to fully support Microsoft Windows Vista.

ENOVIA VPLM V5.19 drives innovation and helps companies get the most out of their productdevelopment programs. ENOVIA VPLM breakthroughs in concurrent engineering, supplierexchange, clash management, and overall system performance and Microsoft Windows Vistasupport bring the entire enterprise closer together during the product development process andinto the world of life-like 3D.

Key prerequisites

ENOVIA VPLM runs on selected system levels of:

• Microsoft Windows

• AIX®

• Hewlett Packard HP-UX

• Sun Solaris

ENOVIA VPLM requires a properly sized database that uses either DB2® or Oracle.

Planned availability date

• October 3, 2008, ENOVIA VPLM V5.19

• October 24, 2008, ENOVIA VPLM Web-based Learning Solutions® V5.19

Description

ENOVIA 3d com

• The administrator can tell the server to convert a CATProduct file to 3D XML when a userrequests the file to be opened. This allows the viewer to properly create the CATProductschematics, specialized geometry and 3D representation used when a large number of similarparts are organized in a complex fashion.

• The ENOVIA - Multi-PDM - CDM/VPM Plug-in (VPL) product enhancements improveergonomics and usability, environment customization, customer process integration,installation and scalability, and allow ENOVIA 3d com to better mimic the VPM V4 UNIX®functionality. Refer to the ENOVIA - MultiPDM - CDM/VPM Plug-in (VPL) section forinformation about the V5.19 enhancements.

Enhancements to the use of the PSN allow the user to select the parent node of the currentlyselected node, preview a JPEG image, resource file management, integrate an Assemblynode and added support for filtering and printing the PSN. Customizations for icon toolbars,contextual menus, user exits and node labels add to the flexibility of this plug-in. Additionalsupport for multi-model links (MML), Technical link management, SAP study, editing P & Odata, starting CATIA V5 and use of SpaceMouse has also been added.



ENOVIA DMU

• Penetration management enables users to retrieve the two catalogs and the KnowledgeWareRule Base file (CATProduct) that are defined as resources in the project resourcemanagement (PRM) project file. Users can then load the related design data and update thepenetration information.

• Clash knowledgeRule CATProduct management within ENOVIA V5 VPM allows you to set theoptions panel to allow you to load Clash rules from CATProduct files saved on the ENOVIA V5database as well as files saved locally. This will save time because you do not have to ensurethe file containing the clash rules are saved on your local drive.

• Clash report contains workpackage name and product paths when connected to ENOVIA V5.

• The user can save sectioning results to VPM Navigator and search clashes directly from VPMNavigator.

• Newly exported sectioning model is improved to save the section outline as one polyline,instead of many connected lines. This saves in file size and processing time, as well asallowing you to select the section with one click of the mouse.

• A section can be opened directly into its editor - A cross-section can also be opened directlyinto a new VPM session, allowing the user to use the cross-section immediately, with theoption to save the section using the save command from the menu.

• The copy/paste function of a mechanism is enhanced to include the duplication of Dressup,the full form of the model as opposed to the skeletal form, in addition to the joints and theassociated commands and parameters. This gives you a more complete simulation, showingthe entire volume of space through which the model moves.

• Performance is improved by increasing the number of joints (wrist flexion-extension andradial-ulnar deviation) that can be analyzed and providing the capability to define the loadon more segments (hands, forearm, shoulder and back) of the manikin. The biomechanicalresults are more clearly displayed using 3D rendering of the results by showing the results fora chosen segment, rather than all results for all segments everytime.

• The user can more conveniently review and edit the variable that controls the 3D environmentin a single panel and can choose reflection maps with one-click convenience. A newcommand allows the user to switch between pre-selected materials for comparing differentlooks. Shadows have been made more realistic with the addition of multiple light sources andfull compatability with CgFX. The user can compute and store light maps offline, and thenload them so a scene can be rendered in real time without waiting on calculations to be made.More materials have been added to the materials library (such as CarPaint), and you canimport external shaders for even more effects.

• To improve the realism of computed images, Photo Studio 2 now includes the architecturaland design shader. This enables realistic looks such as brushed metal, frosted glass,translucent material, and so on. For ease of use, a list of presets for the many parameters isprovided to let the user choose the closest effect for their material, but APIs are also providedto allow new rendering engines to define their own presets.

ENOVIA V5 VPM

• Major efficiency gains are provided with a new optimistic lock behavior available throughcustomizable settings. You can insert, move, replace or delete a child part without locking thepart within the parent reference assembly or peer instances.

• Refreshing documents in session has been improved by allowing you to refresh based oniterations or modification dates, or to ignore both of these options. Refreshing modifieddocuments under control allows you to maintain CATIA session integrity.

• Search and navigation has been improved by providing 3D preview integrated in the edit andproperties windows. It is available for documents, part references, part instances, and productroot classes (PRC), and provides multi-selection and positioning.

• Sending GCOs to a new VPM Navigator window allows you to maintain consistency betweendifferent projects and products. This will facilitate search, browse, and working across theGCO structure from the VPM Navigator and reduces design lead time, since less time hasbeen spent searching for data.

• Part instance search results allow you to add parent instance and parent PRC to instancemasks. This provides easier identification of peer instances and corresponding assemblies.

• Filtering and product view specification (PVS) allows you to capture specific instances within afilter by direct selection in VPM Navigator or CATIA feature tree. You can also edit a PVS andmodify its definition and open a PVS directly from a search into the authoring workbench.



• Most recently used PVS and documents are directly accessible from the ENOVIA V5 menu,providing one-click shortcuts to your favorite working environments.

• Reuse parts are already stored in ENOVIA and may be replaced from an existing ENOVIA.

• Partial save improvements allow you to discard or save each part or document as analternative design.

• Modification Chooser on Save / Synchronize allows the use of actions with multiplemodifications in VPM Navigator by giving a choice of which modification under an action touse when saving or synchronizing a version.

• Custom action support extends the change management capabilities in VPM Navigator byallowing you to create action types other than design actions, including custom action types.

• Non-CATIA documents can be revised from search results or the VPM Navigator tree view.

• Maturity check of a document can be forced before revisioning, allowing the revision only at acertain maturity level.

• Document information is available in the Documents tab in Properties panel and in a tooltipwindow when the mouse pointer hovers over the document name.

• ENOVIA Send To File command offers simple incremental data exchange.

• ENOVIA Send To ENOVIA command has been added to quickly copy an existing workpackage assembly directly in ENOVIA V5 VPM. It is not limited by CATIA client memory.

• Cost of attribute retrieval has been drastically reduced by reducing the number of server callsto two instead of the calls being based on the number of objects to open.

• UI has been improved by simplifying the toolbars and menus, creating more consistentwording and improved error list window with size memory and better search and filtercapabilities.

• Change management capabilities in VPM Navigator have been extended such that you cancreate action types other than design actions, including custom action types.

• User can now replace a component with a stored stand-alone part version, replacing themultiple steps needed to perform the equivalent operation.

• ENOVIA send to file command resolves broken and multiple links, improving the efficiencyof the transfer of documents from the ENOVIA database to a file-based storage system. Thecopying of large work packages from one ENOVIA database to another no longer requiresmemory resources from the requesting client because the work package is not loaded tothe client first, but is sent directly to the new ENOVIA system. The user can also customizethe document information shown for the selected documents in the ENOVIA to ENOVIAUI. Additional user scenarios are supported in VPM Navigator by allowing new revisionsof non-CATIA documents to be created from search results or the VPM Navigator treeview. Additional control of the document revision process is provided by validating that thedocument is in a revisable state before allowing a new revision to be created.

• User has the option to force part versioning when performing document revisioning, as bestfits the user work processes. The maturity level of the current document is shown in thedashboard, giving the user a quicker view of the document status. The user is also given awarning when saving if the maturity level affects the ability to save the document.

• PVR solution has been improved by enabling PVR creation without automatic save, extendingattribute mapping in PVR to item instance, and adding the option to create a PVR withoutsynchronization. A PVR can also be created at each level of the product structure, allowingnested PVRs. The user can reuse information from a previous PVR to create a new drawing,analysis, or alternative design. A batch process allows file migration to a PVR in ENOVIA V5,which moves data from a file to a structure exposed CATProduct.

• Improvements have been made to the reconciliation process to enable user to moreaccurately integrate publications and CATShape documents and use the PVS to filter theproduct structure when using a batch reconciliation.

• User can create a replication package in the VPM Navigator workbench and simulate thecreation process to ensure the package intended to be created is the one that is created.

• Security processes have been improved to prevent unauthorized modifications and versioningand give enhanced permission control for change objects

• Visualization of links is improved for documents,and parts, allowing easier selection andmanagement of objects.

• Overall system improvement in memory management allows you to load more objects and letthe system recover without loss of data by warning of low memory situations and guiding theuser through the recovery process.

• User can select a single instance geometrically impacted by the currently selected instance tofacilitate sending a design context to CATIA.



• User can customize the parent lock policy on the move, add, replace, and delete commands.If the user changes the position of a CATPart, then refreshes the view, the position ismaintained instead of being lost and requiring the position change to be repeated. If the useris prevented from saving an object because it is locked by another user, the error messageshows the lock owner name to help resolve the conflict. The user can also perform searchesand lock operations directly from the error list to help resolve the errors.

Accessibility by people with disabilities

Owing to the graphics-intensive nature of its engineering design applications, this product hasbeen granted a deviation.

Product positioning

ENOVIA VPLM addresses the management and exploitation of IP accumulated during thecomplete product development process, from product specification and definition throughmanufacturing process and resource definition and simulation. The development of allproducts is based on observed industry best practices such as widespread use of 3D,interference management, relational design, early manufacturing involvement, and target-baseddevelopment.

The best practices are based on Dassault Systemes' V5 architecture and make extensive use ofrich product, process and resource (PPR) information.

There are four product lines available.

ENOVIA V5 VPM

• Offers manufacturing organizations a comprehensive, streamlined approach to managing thecreation and maturation of the virtual product definition during engineering development ofnew and innovative products.

• Manages the complexity of product definition from the highest level of product hierarchy(product lines) to the lowest level of feature usage (geometric substitutes and alternatives)throughout the product's entire life cycle - from concept to obsolescence. Exposing thefull breadth of granularity in the virtual product model enables users to evaluate changesand improve decision making by leveraging real-time knowledge of the cause and effectrelationships needed to optimize product quality, cost, and performance.

• Delivers a unique set of integrated applications spanning engineering and manufacturingthat supports the management of the PPR definition in ENOVIA V5 VPM and DELMIA V5.The integrated development and validation of the virtual product and virtual factory helpsmanufacturing companies reduce design rework and costs, while significantly improving time-to-market.

• Engages, via globally dispersed teams using ENOVIA V5 VPM, in intense multidisciplineengineering collaboration 24/7, producing more designs in less time that are optimized forboth manufacturability and market acceptance. ENOVIA V5 VPM provides a single sourceof up-to-date, work-in-process data, allowing development teams everywhere to extend thepower of CATIA V5 knowledgeware and relational design with the assembly or entire portfolioin mind. This eliminates part interference and increasing commonality across product linesand variants.

• Integrates data and processes across PLM using ENOVIA V5 VPM when detailed designinformation is ready for release into the extended enterprise. Flexible process-modelingmiddleware is used to connect to existing enterprise resource planning (ERP), legacy, andother critical enterprise systems. With so many unique and changing business requirementsin global manufacturing organizations, the consolidated view ENOVIA V5 VPM provides iscrucial to increasing business agility and optimizing production schedules and developmentresources.

• Allows development organizations to load the design and validate all possible productconfigurations from the top down, using ENOVIA V5 VPM, to increase the likelihood of marketsuccess. If necessary, the development organizations will withhold critical go-to-marketdecisions until late in the life cycle to deliver precisely the product the market expects and themargins the company requires.



ENOVIA V5 VPM extends the virtual product definition across the entire enterprise and intothe value chain using a single collaborative environment accessible via the Web. This ensuresthe business of innovative product development is always open and ready to capture themarket share it deserves.

ENOVIA DMU

• Enables digital product simulation, analysis and validation. It improves product qualityand accelerating decision making by providing real-time insight into real world productperformance.

• Enables real-time visualization and review of the 3D product as it evolves, streamliningcollaborative review and decision-making. It allows design teams to digitally build the productmock-up and its environment, and then analyze it to gain early insight into key factorsdetermining design quality, product performance, and ultimate market success.

• Includes testing and analysis tools that let engineers reduce and even eliminate the time andcost invested in build it and break it scenarios requiring multiple physical prototypes. Moreimportantly, it allows them to spend more time innovating.

• Facilitates digital mock-up validation and simulation from detailed design to maintenancebecause of the seamlessly integration within Dassault Systemes Product LifecycleManagement (PLM) solutions and that it is designed for multiCAD environments. It deliversextensive support for engineering processes such as interference detection and analysis,hybrid mock-up review, packaging and product synthesis, human ergonomics analysis,engineering data visualization, and technical publication.

• Helps to increase benefits and savings exponentially when used in conjunction with ENOVIAV5 VPM. It enables global organizations - from marketing to design to maintenance - tocollaborate in real time using configurable 3D mock-ups, and to rapidly validate productvariants during testing of design alternatives.

With ENOVIA DMU, development teams can transform product information into businessintelligence, improving decision making and product quality across the enterprise value chain.

ENOVIA 3d com

• Delivers an ideal solution by leveraging both Web and 3D technologies

• Gives anyone in a company a single point of access federating all extended enterpriseinformation to facilitate decision making, collaboration and access to the product life cyclepipeline.

• Targets an extended enterprise-wide deployment level including those who are nonCAx users.

Alongside CATIA and DELMIA, ENOVIA VPLM delivers an integrated and open PLM visionthat is the cornerstone of product development for innovators throughout the world. ENOVIAcustomers are comprised of global leaders across an array of industry segments includingaerospace, automotive, heavy machinery, industrial products, shipbuilding and petroleum, andplant and chemical.

ENOVIA CES

ENOVIA Collaborative Enterprise Sourcing (CES) manages sourcing information in a 3D contextthat combines key component management functions in a single unified desktop for both theengineering and sourcing communities. This application connects all relevant enterprise usersto key sourcing data needed during the product development process to choose, introduce andmanage components/suppliers/manufacturers. With ENOVIA CES as the integrated sourcingsystem for the enterprise, organizations can build better products at reduced cost, managecompliance and regulatory issues, leverage offshore sourcing capabilities, and respond quicklyand effectively to competitive challenges, which provides a unique competitive advantage.

ENOVIA CES targets three specific user profiles.

3D engineers

Engineers and designers fully leverage CES from within ENOVIA VPM Navigator and gainaccess to the enterprise catalog and component reuse capabilities directly from within an



advanced CATIA user interface that provides sourcing properties for parts in 3D context. Someof the key functions leveraged by this set of users include:

• Search and browse

• Find similar parts / compare parts

• Instantiate components from the enterprise catalog

Web users

Non-CAD users access CES using an advanced Web user interface. This profile targets userswho need to access and navigate the enterprise catalog, which contains parts with engineeringand sourcing data, suppliers, and manufacturers. These non-CAD users typically use CES to:

• Search and browse

• Generate sourcing reports

• View sourcing data

Component managers/Administrators/Sourcing controllers

This group of users requires additional functions that provide administration for the CES platformto manage the sourcing information in the enterprise catalog:

• Updates to the classification structure and reclassification of items

• Cross-reference management administration - Mapping items to sites/suppliers/manufacturers

• Defining part relationships - similar parts, spares, upgrade/downgrade

• Approval process management

Hardware and software support services

SmoothStart/installation services

IBM® SmoothStart™ and Installation Services are not provided.

Reference information

For information about CATIA Solutions V5.19, refer to Software Announcement 208-218, datedSeptember 23, 2008.

For information about CAA RADE V5.19, refer to Software Announcement 208-220, datedSeptember 23, 2008.

For information about ENOVIA SmarTeam V5.19, refer to Software Announcement208-217,dated September 23, 2008.

Program number

ENOVIA VPLM

Program Programnumber name 5628-EP5 ENOVIA DMU Navigator SPO ENOVIA DMU configurations 5671-DM1 ENOVIA - DMU Review 15671-DM2 ENOVIA - DMU Review 25671-DPS ENOVIA - DMU Digital Product Synthesis 25671-DH2 ENOVIA - DMU Human Simulation 25671-DM3 ENOVIA - DMU Immersive Review 35671-DV1 ENOVIA - DMU Viewer 1

http://www.ibm.com/common/ssi/cgi-bin/ssialias?infotype=an&subtype=ca&appname=gpateam&supplier=897&letternum=ENUS208-218





ENOVIA 3d com configurations 5671-N3G ENOVIA - 3d com Navigator5671-C3V ENOVIA - 3d com CAD Viewing5671-V3C ENOVIA - 3d com VPM Web Client ENOVIA 3d com products 5671-S3P ENOVIA - 3d com Space Analysis ENOVIA PPR Hub MultiPDM product 5671-OGL ENOVIA - MultiPDM - OP Plug-In ENOVIA add-on products (AOPs) 5673-PR1 ENOVIA - DMU Digital Plant & Ship Review 15673-WPE ENOVIA - VPM Supply Chain Engineering Exchange5673-ECV ENOVIA - VPM Electrical Cable Route Management ENOVIA LCA V5 softcopy publications 5671-NL4 ENOVIA LCA NLV Softcopy Collection Kit Common products -- Can be ordered with CATIA and/orENOVIA VPLM configuration orders. 5671-FIT DMU Fitting Simulator 25671-KIN DMU Kinematics Simulator 25671-DMO DMU Optimizer 25671-ANR DMU Engineering Analysis Review 25671-FAR DMU Fastening Review 25671-CPR DMU Composites Review 25671-PHS Photo Studio 25671-PSO Photo Studio Optimizer 25671-HBR Human Builder 25671-HME Human Measurements Editor 25671-HPA Human Posture Analysis 25671-HAA Human Activity Analysis 25671-HTC Human Anthropometry Catalog 25671-HPC Human Posture Catalog 25671-HAC Human Preferred Angles Catalog 25671-RTR Real Time Rendering 25671-VOA Vehicle Occupant Accommodation 25671-IDL MultiCAx - ID Plug-In5671-UDL MultiCAx - UD Plug-In5671-DSL MultiCAx - SolidWorks Plug-In5671-DEL MultiCAx - SE Plug-In5671-DAL MultiCAx - AD Plug-In5671-PDL MultiCAx - PD Plug-In5671-DTL MultiCAx - STEP Plug-In5671-DGL MultiCAx - IGES Plug-In Common add-on products -- Can be ordered with CATIA and/orENOVIA VPLM configuration orders. 5673-SP1 DMU Space Analysis 15673-FIT DMU Fitting Simulator 25673-KIN DMU Kinematics Simulator 25673-DMO DMU Optimizer 25673-ANR DMU Engineering Analysis Review 25673-FAR DMU Fastening Review 25673-DT1 DMU Dimensioning & Tolerancing Review 15673-CPR DMU Composites Review 25673-PH1 Photo Studio 15673-PHS Photo Studio 25673-PSO Photo Studio Optimizer 25673-HBR Human Builder 25673-HME Human Measurements Editor 25673-HPA Human Posture Analysis 25673-HAA Human Activity Analysis 25673-HTC Human Anthropometry Catalog 25673-HPC Human Posture Catalog 25673-HAC Human Preferred Angles Catalog 2



5673-RTR Real Time Rendering 25673-VOA Vehicle Occupant Accommodation 25673-RM1 Digital Product Rights Manager 1 ENOVIA DMU V5 softcopy publications 5671-NL5 ENOVIA DMU NLV Softcopy Collection Kit 5628-EL5 ENOVIA V5 VPM SPO ENOVIA V5 VPM configurations 5671-CUR ENOVIA - Casual User5671-MGR ENOVIA - Professional User5671-RVR ENOVIA - System & Data Administrator Cfg5671-ADR ENOVIA - Security Administrator5671-VER ENOVIA - VPM Engineer Cfg5671-DER ENOVIA - VPM Product Design Cfg5671-VAR ENOVIA - Vault Administrator Cfg5671-VDM ENOVIA - VPM DMU Review Cfg5671-LCR ENOVIA - VPM Lifecycle Review Cfg5671-LCM ENOVIA - VPM Lifecycle Management Web Cfg5671-LCP ENOVIA - Enterprise Process Management Web Cfg5671-SUA ENOVIA - System & Users Administration Web Cfg ENOVIA V5 VPM shareable products 5671-ECM ENOVIA - Engineering Change Management5671-PAS ENOVIA - EBOM Detailing and Configuration5671-PDC ENOVIA - Product Definition5671-PGT ENOVIA - Program Management5671-PIM ENOVIA - Product Interference Management5671-PVM ENOVIA - Product Variant Management5671-SPT ENOVIA - Structures Penetration Management5671-AED ENOVIA - Action Editor5671-DMT ENOVIA - Document Management5671-WDF ENOVIA - Workflow Definition5671-SCE ENOVIA - Supply Chain Exchange5671-PGW ENOVIA - PPR Hub Gateway5671-STH ENOVIA - PPR Hub STEP Part 21 Adapter5671-WPE ENOVIA - VPM Supply Chain Engineering Exchange5671-EPD ENOVIA - Enterprise Process Definition Web5671-ECV ENOVIA - VPM Electrical Cable Route Management

ENOVIA VPLM Web-based Learning Solutions

Program Programnumber name 5671-VMC ENOVIA User Companion for VPM V1.6 for use with ENOVIAVPM V1.6 5672-VMC ENOVIA User Companion for VPM V1.6 - Enterprise Option - for use with ENOVIAVPM V1.6 5671-DNC User Companion for DMU 5672-DNC User Companion for DMU - Enterprise Option 5671-VNC ENOVIA User Companion for V5 VPM 5672-VNC ENOVIA User Companion for V5 VPM - Enterprise Option



ENOVIA CES shareable products 5628-CS5 ENOVIA CES SPO 5672-SCA ENOVIA - CES Enterprise Catalog Administration Product5672-SCI ENOVIA - CES Component Introduction Management Product5672-SEC ENOVIA - CES Engineering Catalog Navigator Product5672-SCG ENOVIA - CES Enterprise Catalog Management Product5672-SLC ENOVIA - CES Enterprise Catalog Navigator Product5672-SLR ENOVIA - CES Component Reuse Product5672-SRU ENOVIA - CES Engineering Component Reuse Product5672-SSG ENOVIA - CES Component Sourcing Product ENOVIA CES V5 softcopy publications 5671-NL8 ENOVIA CES NLV Softcopy Collection Kit

Additional information

This section describes the new products and enhancements to previously announced productsdelivered in this release. Refer to the ENOVIA VPLM product matrices section for details. Forfull descriptions of new and previously announced ENOVIA products, visit

http://www.ibm.com/solutions/plm

To get to the ENOVIA page, select ENOVIA Products. On the ENOVIA page, select an ENOVIAproduct set.

Enhanced ENOVIA VPLM products

Refer to the Software requirements section for additional support highlights for V5.19.

ENOVIA - 3d com Viewer (PVR)

The administrator can tell the server to convert a CATProduct file to 3D XML when a userrequests the file to be opened. This allows the viewer to properly create the CATProductSchematics, specialized geometry and 3D representation used when a large number of similarparts are organized in a complex fashion.

ENOVIA - MultiPDM - CDM/VPM Plug-in (VPL)

The ENOVIA - Multi-PDM - CDM/VPM Plug-in (VPL) product enhancements improveergonomics and usability, environment customization, customer process integration, installationand scalability, and allow ENOVIA 3d com to better mimic the VPM V4 UNIX functionality.

Enhancements to the use of the PSN allow the user to select the parent node of the currentlyselected node, preview a JPEG image, resource file management, integrate an assembly nodeand added support for filtering and printing the PSN. Customizations for icon toolbars, contextualmenus, user exits and node labels add to the flexibility of this plug-in. Additional support formulti-model links (MML), technical link management, SAP study, editing P & O data, startingCATIA V5 and use of SpaceMouse has also been added.

ENOVIA - VPM Navigator (VPN)

Major enhancements include:

• Improved concurrent engineering

– Major efficiency gains are provided with a new optimistic lock behavior available throughcustomizable settings. User can insert, move, replace or delete a child part without lockingthe part within the parent reference assembly or peer instances.




• Navigation, product view specification (PVS), and session building

– Search and navigation has been improved by providing 3D preview integrated in the editand properties windows. It is available for documents, part references, part instances, andproduct root classes (PRC), and provides multi-selection and positioning.

– You can send GCOs to a new VPM Navigator window to maintain consistency betweendifferent projects and products. This will facilitate search, browsing and working across theGCO structure from VPM Navigator and reduce design lead time, because you have spentless time searching for data.

– Part instance search results have been improved allowing you to add parent instance andparent PRC to instance masks. This provides easier identification of peer instances andtheir corresponding assemblies.

– Filtering and PVS have been enhanced by allowing user to capture specific instanceswithin a filter by direct selection in VPM Navigator or CATIA feature tree. User can alsoedit a PVS, modify its definition, and open a PVS directly from a search into the authoringworkbench.

– Most recently used PVS and documents are directly accessible from the ENOVIA V5 menu,providing one-click shortcuts to favorite working environments.

• Product authoring and life cycle

– Reuse parts are already stored in ENOVIA and may be replaced from an existing ENOVIA.

– Revisioning and maturity management has been improved by displaying maturity in adashboard and coupling PV-DR revisioning.

– Partial save improvements allow you to choose to discard each part or document or save itas an alternative design.

– Modification Chooser on Save / Synchronize allows the use of actions with multiplemodifications in VPM Navigator by allowing the user to choose which modification under anaction to use when saving or synchronizing a version.

– Custom action support extends the change management capabilities in VPM Navigatorby delivering capability to create action types other than design actions, including customaction types.

– User can revision Non-CATIA Documents from search results or the VPM Nav tree view.

– User can force a maturity check of a document before revisioning, allowing the revision onlyat a certain maturity level.

– Document information is now available in the Documents tab in Properties panel and in atooltip window when the mouse pointer hovers over the document name.

• Application integration

– Assembly design improvements include:

-- Hide / Show attribute mapping

-- Color attribute mapping

-- Associative product to part integration in structure exposed mode

– Drafting generation delivers:

-- Display in BOM attribute mapping

-- Projected in Drafting view attribute mapping

– Full access is provided to interferences from a single DMU desktop and clashes saved inENOVIA V5 can be searched in VPM Navigator

– Most operations can be performed on the clash from VPM Navigator:

-- Open clashes in CATIA or DMU

-- Explore clashes in VPM Navigator

-- Transfer ownership of clashes

-- Preview clash in VPM Navigator in context before opening

-- Delete clashes from VPM Navigator

• Assembly exchange and design reuse

– ENOVIA Send To File command now has simple incremental data exchange.

– ENOVIA Send To ENOVIA command has been added to quickly copy an existing workpackage assembly directly in ENOVIA V5 VPM. It is not limited by CATIA client memory.



• PCS and robustness improvements

– The cost of attribute retrieval has been drastically reduced by reducing the number of servercalls to two instead of the calls being based on the number of objects to open.

– Memory Size is controlled to prevent crashes for large data exchange during:

-- Open from ENOVIA V5 VPLM

-- Save in ENOVIA V5 VPLM

– When performing a warm start, the user is warned that automatic backup is not active forstructure-exposed data.

• Usability improvements - The user interface has been improved by simplifying the toolbarsand menus, creating more consistent wording and improved error list window with sizememory. Search and filter capabilities have also been improved.

ENOVIA - VPM Configured Product Design (CGP)

VPM Configured Product Design delivers many improvements in efficiency and data control:

• Custom action support - Extends the change management capabilities in VPM Navigator byallowing user to create action types other than design actions, including custom action types.

• Product management - Allows replacing a component with a stored stand alone part version,no longer needing multiple steps to perform the equivalent operation.

• Document management - The command ENOVIA send to file now resolves broken andmultiple links, improving the efficiency of the transfer of documents from the ENOVIAdatabase to a file-based storage system. The copying of large work packages from oneENOVIA database to another no longer requires memory resources from the requestingclient because the workpackage is not loaded to the client first, but is sent directly to thenew ENOVIA system. The user can also customize the document information shown for theselected documents in the ENOVIA to ENOVIA user interface. Additional user scenarios aresupported in VPM Navigator by allowing new revisions of non-CATIA documents to be createdfrom search results or the VPM Nav tree view. Additional control of the document revisionprocess is provided by validating that the document is in a revisable state before allowing anew revision to be created.

• Life-cycle management - The user has the option to force part versioning when performingdocument revisioning, as best fits the user work processes. The maturity levels of the currentdocument are shown in the dashboard, giving the user a quicker view of the document status.The user is also given a warning when saving if the maturity level affects the ability to save thedocument.

• Product view results (PVR) - The PVR solution has been improved by enabling PVR creationwithout automatic save, extending attribute mapping in PVR to item instance, and addingthe option to create a PVR without synchronization. A PVR can also be created at eachlevel of the product structure, allowing nested PVRs. The user can reuse information from aprevious PVR to create a new drawing, analysis, or alternative design. A batch process allowsfile migration to a PVR in ENOVIA V5, which moves data from a file to a structure exposedCATProduct.

• Saving and locking - The save process has been streamlined by giving the user options andreminders during the save process. The user can select the specific data to save for morerefined control of the data. Design reuse is used to minimize cost and leverage a company'sknowledge, so the ability to save as an alternative design allows the user to shorten designcycles and enrich final quality. The user will find it easier to locate and identify instances in thesave window to ensure proper use and efficiency. While saving, the user can choose to unlockjust instances, or both instances and references. The user can customize the default in thelock window to choose lock references.

• Modification chooser on save / synchronize - Allows the use of actions with multiplemodifications in VPM Navigator by giving the user a choice of which modification under anaction to use when saving or synchronizing a version.

ENOVIA - VPM Supply Chain Engineering Exchange (WPE)

Improvements have been made to the reconciliation process to enable the user to moreaccurately integrate file-based CATIA data into ENOVIA V5. Characteristics, which are usedas the basis of comparison for publications, are added to the ENOVIA V5 context to enablethe proper reconciliation of publications. In addition, the reconciled publications are not deletedand recreated, but are now identified and overwritten. This will maintain the Impact Graphrelationships done through publication. The reconciliator now recognizes the CATShape



document type. The user has the option to choose to reconcile the data based on only the latestversion of a part or document.

In the batch reconciliation process, the user can use an expand capture (PVS) to filter theproduct structure used in the reconciliator. The user can also choose not to update parts andproduct owned by the supplier and to use an external XML file containing file naming rules tocontrol the file names created during the batch process.

The interactive reconciliation user interface has been improved with more visible lock informationand ability to memorize the window size and position. The session can now be saved andrestored using the same XML structure used in the batch process.

The user can create a replication package in the VPM Navigator workbench and can simulatethe creation process to ensure the intended package is the one created.

ENOVIA - EBOM Detailing & Configuration (PAS)

• Security process for extend effectivity operation prevents unauthorized modifications toeffectivity byline and enterprise. The enterprise defines roles with permission to perform andextend operation on an instance.

• Security process for engineering change order (ECO) versioning prevents unauthorizedversioning of the ECOs by allowing an enterprise to define roles that have permission toperform a new version on an ECO.

• User can select and delete multiple configuration handlers with a single click from the Searchresults window.

• Document link visibility allows the user to easily distinguish between documents linked to aparty as representation and documentation from the document tab of the part reference.

• Part instance and parent PRC visibility gives the user visibility to the parent object of aninstance in the search results to enable easier selection of the correct instance in the case of amultiple use part.

• User can select a single instance geometrically impacted by the currently selected instance tofacilitate sending a design context to CATIA.

• Wide cut provides a more user friendly cut functionality by allowing an instance to be cut foran effectivity range larger than or outside the system effectivity .

• Operations panel removal of keep column simplifies the user interface of the operations panelby removing the keep column default

• System capacity is increased by reducing the number of objects loaded in memory whenworking with a configuration filter.

• Add change modification based on change management allows operations to be performedon instances with modifications with no effectivities assigned, allowing actions whosemodifications have no effectivity to be completed.

ENOVIA - Product Interference Management (PIM)

• The following batch options have blackbox support:

– Check resolves the status of valid clashes

– Clean removes invalid clashes

– Fullclean removes invalid and solved clashes

– Delete removes all clashes

• Clash computation between groups is supported in PIM batches - Clash computation issupported between two GCO groups or two LCA context groups.

• Performance has been improved regarding clash computation in knowledge rule mode, onshipbuilding scenario (all against all), in stand-alone mode by a factor of 32. Performance hasbeen doubled on clash computation in CATIA Space Analysis using knowledge rules whenconnected to ENOVIA V5.

• ENOVIA clash server support - 32-bit clash server is supported on 64-bit clients runnningITFCheck 64-bits (64 on 64 bits).



ENOVIA - Engineering Hub (EPI)

• User productivity has been increased by saving more attribute settings, so the user does nothave to repeat the same selections everytime a session is started. The new persistent settingsare:

– Show/Hide attribute of Instances

– Color attribute on exploded Part Instances

– Visualize in bills of material (BOM)

– Do not use in Visualization

– Window size of the error list

The user can customize the parent lock policy on the move, add, replace, and deletecommands. If the user changes the position of a CATPart, then refreshes the view, theposition is maintained instead of being lost and requiring the position change to be repeated.If the user is prevented from saving an object because it is locked by another user, the errormessage now shows the lock owner name to help the user to resolve the conflict. The usercan also perform searches and lock operations directly from the error list to help resolve theerrors.

• User is protected from catastrophic failure due to low memory situations because the memoryallocation is monitored during the open and save processes. User is warned if there is notenough memory, and the operation is reversed safely to protect the data.

ENOVIA - VPM Lifecycle Navigator Web (LCN)

• Supports additional products structure, extended enterprise scenarios, and the ENOVIA VPLMWeb Navigator client:

– Edit product and Metadata in ENOVIA VPLM Web Navigator

– Transfer ownership of product structure objects

– Promote/demote product structure objects

– View lock status of product structure objects

– Attach folders to parts

• Lock status management allows user to perform modifications on objects by making the lockstatus of products truck sure objects visible in VPLM Web Navigator and providing lock andunlock commands.

Refer to the Software requirements section for support highlights.

ENOVIA - Document Management (DMT)

The user is prevented from deleting templates and queries used to generate work packagereports when they are linked to an existing report. This ensures the integrity of the work history.

ENOVIA - Engineering Change Management (ECM)

• Change Order process has been made more secure for the user by allowing the creation ofnew versions of a change order only by authorized users.

• A new state has been added to the change order process. The new state is 'Not Incorporated'and is designed to help insure the proper synchronization of associated change orders.



ENOVIA - System & Data Administration (SAN)

Improvements have been made to the replication process to enhance control and security ofthe replication packages. The user has a new capture mode that allows the sharing of completeCATIA designs stored in an ENOVIA V5 repository, including all documents attached to all partsin the assembly structure. The user can choose to transfer only an instance and the parent part(the part that defines the usage of the instance). This allows this one usage of the child part to beedited at the remote site without exposing the child part itself.

The management of the replication packages has been improved by controlling access to thepackage editing capability and providing more information about the transfer of ownership andthe target site of the package. Access to the replication functions has been provided throughthe VPM Navigator environment and through a batch operation. Further control has been addedafter the package transfer by providing a batch utility to ensure the proper old documents areremoved and replaced with the new versions.

ENOVIA - CES Enterprise Catalog Navigator Product ( SLC)

The user can add, remove or view attachments associated with manufacturers or manufactureritems that are linked to internal or supplier items directly from the properties page of the linkeditems.

Enhanced common products

DMU Space Analysis 1 (SP1)

• Penetration management - Enables users to retrieve the two catalogs and theKnowledgeWare Rule Base file (CATProduct) that are defined as resources in the ProjectResource Management (PRM) project file. Users can then load the related design data andupdate the penetration information.

• Clash knowledgeRule CATProduct management within ENOVIA V5 VPM - Allows user toset the options panel to load clash rules from CATProduct files saved on the ENOVIA V5database as well as files saved locally. This saves time because it is not necssary to ensurethe files containing the clash rules are saved on local drive.

• Clash report contains workpackage name and product paths when connected to ENOVIA V5.

• Save sectioning result to VPM Navigator - Clashes can be searched directly from VPMNavigator.

• Clash XML export is supported on Firefox 3.0.

• New exported sectioning model - Exporting a cross-section has been improved to save thesection outline as one polyline, instead of many connected lines. This saves in file size andprocessing time, as well as allowing user to select the section with one click of the mouse.

• Directly open a section into its editor - A cross-section can also be opened directly into a newVPM session, allowing the user to use the cross-section immediately, with the option to savethe section using the save command from the menu.

DMU Kinematics Simulator 2 (KIN)

The copy/paste function of a mechanism is enhanced to include the duplication of Dressup, thefull form of the model as opposed to the skeletal form, in addition to the joints and the associatedcommands and parameters. This provides a more complete simulation, showing the entirevolume of space through which the model moves.

Human Builder 2 (HBR)

Improvements have been made to help the user in manipulating the manikin. The user canchange the color of the referential axis to improve its visibility; the support polygon will changefrom green to red when the manikin is moved in such a way that it becomes out of balance. Theuser can also manipulate the offsets that control the grasp position of the manikin's hand. Theseoffsets can also be saved and reloaded to save time in future work sessions.



Human Activity Analysis 2 (HAA)

Performance has been improved by increasing the number of joints (wrist flexion-extension andradial-ulnar deviation) that can be analyzed and providing the capability to define the load onmore segments (hands, forearm, shoulder and back) of the manikin. The biomechanical resultsare more clearly displayed using 3D rendering of the results by showing the results for a chosensegment, rather than all results for all segments everytime.

Real Time Rendering 2 (RTR)

• Users can more conveniently review and edit the variable that controls the 3D environment ina single panel and can choose reflection maps with a single click.

• A new command allows users to switch between pre-selected materials for comparingdifferent looks.

• Shadows have been made more realistic with the addition of multiple light sources and fullcompatibility with CgFX.

• Users can compute and store light maps offline, and then load them so a scene can berendered in real time without waiting on calculations to be made. More materials have beenadded to the materials library, such as CarPaint. Users can import external shaders foradditional effects.

Photo Studio 1 (PH1)

A new rendering toolbar is available that allows photo realistic images to be produced from 3Drepresentations seen on screen. The image computation takes into account material, sticker,light, and environments that have been defined in real time rendering.

Photo Studio 2 (PHS)

To improve the realism of computed images, Photo Studio 2 now includes the Architectural andDesign Shader. This provides realistic looks such as brushed metal, frosted glass, translucentmaterial, and so on. For ease of use, a list of presets for the many parameters enables users tochoose the closest effect for their material, but APIs are also provided to allow new renderingengines to define their own presets.

ENOVIA V5 VPM configurations

Note: Product licensing matrix is available on product CDs.

• ENOVIA - Casual User Configuration (CUR)

This configuration targets users whose main interest is to view data stored in ENOVIA VPLM.Some of the activities that the users can perform:

– Viewing any data (part, document, or engineering change) and navigating any structure orrelationship associated with it

– Applying filters and saved contexts for quick retrieval of product structures

– Staying updated on the events of interest, such as product releases

ENOVIA 3d com C3V may be added to this configuration for CAD model visualization using2D/3D viewers.

• ENOVIA - Professional User Configuration (MGR)

This configuration targets managers, team leaders, and reviewers whose activities include:

– Managing, distributing, and reviewing work assignments

– Taking advantage of document management facilities such as template management

– Visualizing digital mock-up in CATIA and ENOVIA DMU

Shareable products from ENOVIA VPM Product Editor Products and domains can bepurchased separately. For instance, EBOM Detailing and Configuration (PAS) may be addedfor product structures editing.



• ENOVIA - VPM Engineer Configuration (VER)

This configuration targets engineers and design managers whose activities include:

– Managing engineering bills of material (EBOMs)

– Associating CAD models to parts and product structures, taking advantage of full ENOVIAVPLM - CATIA interoperability

– Performing digital mock-up reviews including product interference analysis

– Exchanging data with suppliers using SMARTBOM briefcase

– Sending data to DELMIA IPD

– Managing work assignments related to the above activities

Shareable products from ENOVIA VPM Product Editor Products can be purchased separately.For example,

– ENOVIA - Product Variant Management (PVM) for product lines and options planning

– ENOVIA - Program Management (PGT) for managing programs, milestones and object life-cycle definition

• ENOVIA - Security Administrator Configuration (ADR)

This configuration targets corporate or departmental administrators whose main activitiesconsist of setting up:

– Databases and P&O profiles

– Access privileges and default environments for departments and end-users

• ENOVIA - System and Data Administrator Configuration (RVR)

This configuration targets chief system and data administrators who are in charge of ENOVIAVPLM implementation. In addition to the products dedicated for system setup, most productsfrom ENOVIA V5 VPM and ENOVIA VPM Lifecycle products are included for user support andcustomization purposes.

• ENOVIA - VPM Product Design Configuration (DER)

VPM design engineers design parts, assemblies, and products. These users normallydesign directly in CATIA V5 and save the design work in ENOVIA VPLM (Engineering Hub)afterwards. These users include design managers with additional responsibilities such asmanaging work assignments (actions) related to the design activities, performing clashanalysis, and exchanging data with suppliers.

This is the same group of users targeted by the VPM Engineer configuration. The difference isthat all applications provided within this configuration are available through the CATIA V5 userinterface. Designers can access both design and life-cycle management functions from withinCATIA V5 to facilitate easy adoption of ENOVIA V5 VPM functions among CATIA users.

This configuration targets design engineers and design managers whose activities include:

– Creating and managing EBOMs structure

– Designing CAD models and associating them to parts and products

– Performing advanced part design

– Performing relational design and changing impact analysis

– Performing digital mock-up reviews including product interference analysis

– Sending data to DELMIA IPD

– Managing work assignments (actions) related to the above activities

• ENOVIA - Vault Administrator Configuration (VAR)

This configuration targets systems administrator whose main activities include:

– Creating and managing the vaults

– Performing data backup and restore

– Managing remote and local vaults



– Storing ENOVIA VPLM using the V5 architecture/vaulting system. This product ispurchased stand-alone on top of ENOVIA VPLM configurations.

• ENOVIA - VPM DMU Review Configuration (VDM)

This configuration targets users who participate in product design reviews, but do notrequire the full product design capabilities delivered by the ENOVIA - VPM Product DesignConfiguration.

• ENOVIA - VPM LifeCycle Review Configuration (LCR)

This entry configuration is used for the Web-based, light client ENOVIA VPM Lifecycleproducts. It targets enterprise users whose main activities include:

– Searching and navigating on product and project information stored in an ENOVIA VPLMdatabase

– Performing visualization and annotation on 2D/3D documents using 2D/3D viewers

– Collaborating with other enterprise users (ENOVIA - Instant Collaboration can be added ontop of this configuration)

– Performing limited authoring function such as transferring ownership and changing life-cyclestatus (promote, demote)

• ENOVIA - VPM LifeCycle Management Web Configuration (LCM)

This configuration offers project and change management capabilities. All products includedin this configuration operate within the Web-based, light-client environment of ENOVIA VPMLifecycle products.

This configuration targets managers and supervisors whose main activities include:

– Search and navigate on product and project information stored in an ENOVIA VPLMdatabase

– Perform™ visualization and annotation on 2D/3D documents using 2D/3D viewers

– Manage changes to product data and documents

– Use workflow to manage changes and automate corporate processes

– Use Microsoft Project to manage project in ENOVIA VPM Lifecycle products

– Collaborate with other enterprise users (ENOVIA - Instant Collaboration can be added ontop of this configuration.)

• ENOVIA - Enterprise Process Management Web Configuration (LCP)

This configuration targets people who are involved in enterprise process administration,management and participation.

There are two types of workflow users who use this configuration:

– Process administrators

– Process users (initiators and participants)

• ENOVIA - System & Users Administration Web Configuration (SUA)

This configuration targets corporate or departmental administrators whose main activitiesinclude:

– Performing ENOVIA VPLM system installation

– Setting up database

– Setting up people and organization profiles



ENOVIA VPLM product matrices

There are three matrices for the ENOVIA VPLM product sets: ENOVIA 3d com, ENOVIA DMU,and ENOVIA V5 VPM.

ENOVIA 3d com product matrix

I = Product included in a configurationA = Product available as an add-on to a configurationS = Product available as a shareable product on top of a configurationN = Not applicable

Configurations C3V N3G(1) V3C ENOVIA 3d com Classic Products PNR ENOVIA - 3d com Navigator I I IPVR ENOVIA - 3d com Viewer I I NP3B ENOVIA - 3d com Publish N I NS3P ENOVIA - 3d com Space Analysis S S NN35 ENOVIA - 3d com Navigator V5 I I N Plug-InOGL ENOVIA - MultiPDM - OP Plug-In N S NPML ENOVIA - MultiPDM - PM Plug-In N I NVPL ENOVIA - MultiPDM - CDM/VPM N I I Plug-In

Configurations C3V N3G(1) V3C ENOVIA MultiCAx Products DCL ENOVIA - MultiCAx - CATIA I I N Plug-InDDL ENOVIA - MultiCAx - DELMIA N I N Plug-InDSL MultiCAx - SolidWorks Plug-In S S NDEL MultiCAx - SE Plug-In S S NDAL MultiCAx - AD Plug-In S S NDTL MultiCAx - Step Plug-In S S NPDL MultiCAx - PD Plug-In S S NIDL MultiCAx - ID Plug-In S S NUDL MultiCAx - UD Plug-In S S N (1) N3G configuration allows user to query, navigate, and access product information stored in ENOVIA VPLM ENOVIAVPM and/or ENOVIA V5 VPM.



ENOVIA DMU product matrix


Configurations DV1 DM1 DM2 DPS DH2 DM3 ENOVIA DMU DU1 ENOVIA - DMU Navigator 1 I I N N N NSP1 DMU Space Analysis 1 A A N N N NPR1 ENOVIA - DMU Digital Plant A A A A A A & Ship Review 1DT1 DMU Dimensioning A I I I A A & Tolerancing Review 1RT1 Real Time Rendering 1 N I I I I NPH1 Photo Studio 1 A A A A A ARM1 Digital Product Rights A A A A A A Manager 1DMU ENOVIA - DMU Navigator 2 N N I I I NSPA DMU Space Analysis 2 N N I I I IFIT DMU Fitting Simulator 2 N N A/S I A/S A/SKIN DMU Kinematics Simulator 2 N N A/S I A/S A/SDMO DMU Optimizer 2 N N A/S A/S A/S A/S CPR DMU Composites Review 2 N N A/S A/S A/S A/SPHS Photo Studio 2 N N A/S A/S A/S A/SPSO Photo Studio Optimizer 2 N N A/S A/S A/S A/SRTR Real Time Rendering 2 N N A/S A/S A/S I DU3 ENOVIA - DMU Navigator 3 N N N N N IANR DMU Engineering Analysis N N A/S A/S A/S A/S Review 2HBR Human Builder 2 N N A/S A/S I A/SHME Human Measurements Editor 2 N N A/S A/S I A/SHPA Human Posture Analysis 2 N N A/S A/S I A/SHAA Human Activity Analysis 2 N N A/S A/S I A/SHTC Human Anthropometry N N A/S A/S A/S A/S Catalog 2HPC Human Posture Catalog 2 N N A/S A/S A/S A/SHAC Human Preferred Angles N N A/S A/S A/S A/S Catalog 2VOA Vehicle Occupant N N A/S A/S A/S A/S Accommodation 2FAR DMU Fastening Review 2 N N A/S A/S A/S A/S

Configurations DV1 DM1 DM2 DPS DH2 DM3 ENOVIA MultiCAx Products DCL ENOVIA - MultiCAx - CATIA I I I I I I Plug-InDDL ENOVIA - MultiCAx - DELMIA I I I I I I Plug-InDSL MultiCAx - SolidWorks S S S S S S Plug-InDEL MultiCAx - SE Plug-In S S S S S SDAL MultiCAx - AD Plug-In S S S S S SDTL MultiCAx - Step Plug-In S S S S S SPDL MultiCAx - PD Plug-In S S S S S SIDL MultiCAx - ID Plug-In S S S S S SUDL MultiCAx - UD Plug-In S S S S S SDGL MultiCAx - IGES Plug-In S S S S S S



ENOVIA V5 VPM product matrix


Configurations DER VDM ENOVIA VPM Navigator Products VPN ENOVIA - VPM Navigator I IRLD ENOVIA - VPM Relational Design I NCGP ENOVIA - VPM Configured Product Design I IWPE ENOVIA - VPM Supply Chain Engineering A/S A/S ExchangeECV ENOVIA - VPM Electrical Cable Route A/S A/S Management

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM Product Editor Products ADK ENOVIA - Applications I I I I I N N N N N DesktopAED ENOVIA - Action Editor N I I I N N N N N NPDC ENOVIA - Product N N I I N N N N N N DefinitionPAS ENOVIA - EBOM Detailing N N I I N N N N N N & ConfigurationPIM ENOVIA - Product N N I I N N N N N N Interference ManagementSPT ENOVIA - Structure N N S S N N N N N N Penetration ManagementEPI ENOVIA - Engineering Hub I I I I I N N N N NT3A ENOVIA - Multi-Tier I I I I I N N N N N Enterprise ArchitectureDMT ENOVIA - Document S I N I S N N N N N ManagementPGT ENOVIA - Program S S N I S N N N N N ManagementECM ENOVIA - Engineering S S N I S N N N N N Change ManagementSCE ENOVIA - Supply Chain S S N S S N N N N N ExchangePVM ENOVIA - Product Variant S S N I S N N N N N Management



Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM Lifecycle Products LCN ENOVIA - VPM Lifecycle N N N I N N I I I I Navigator WebW3V ENOVIA - Web Viewer N N N I N N I I I NDCM ENOVIA - Document N N N I N N N I I N Management WebCGM ENOVIA - Engineering N N N I N N N I N N Change Management WebWDF ENOVIA - LCA Workflow N N N I N N N S N N DefinitionWFM ENOVIA - Workflow N N N I N N N I N N Management WebEPM ENOVIA - Enterprise N N N I N N N I I N Process Management WebEPD ENOVIA - Enterprise N N N I N N S S S S Process Definition Web

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM Enterprise GatewayProducts PGW ENOVIA - PPR Hub S S N S S N N N N N GatewaySTH ENOVIA - PPR Hub Step S S N S S N N N N N Part 21 Adapter

Configurations CUR MGR VER RVR ADR VAR LCR LCM LCP SUA ENOVIA VPM AdministrationProducts SYA ENOVIA - Multisite System N N N I N N N N N I Administration WebPOC ENOVIA - People, N N N I N N N N N I Organization & Security WebSAN ENOVIA - System & Data N N N I I N N N N N AdministrationPOS ENOVIA - People, N N N I I N N N N N Organization & SecurityVSA ENOVIA - Vault Server N N N N N I N N N N Administration

ENOVIA VPLM APIs

The ENOVIA VPLM - CAA API products are delivered with Component Application ArchitectureRapid Application Development Environment (CAA RADE; 5671-CDC). This release offers onenew API, VPN Navigator.

For information about the CAA RADE products, visit





ENOVIA V5 VPM customization

Customize ENOVIA V5 VPM using the CAA RADE V5 tools (for example, 5671-CDC, 5671-PAD), which can be ordered separately.

Reorganize the user interface without CAA RADE by using masks. These can be manipulatedeither by the system administrator or the end user. The user can:

• Remove attributes or move them within user panels

• Insert user-defined attributes into panels

• Reorganize or create tabs

• Rename tabs and attributes

• Relate masks to document types

• Support multiple environments where objects may have different attributes

Without CAA RADE V5, the user can:

• Customize life-cycle definitions for different object types

• Define object maturity values

• Create filters to selectively present objects to users

• Set default (for example, a default repository path) or acceptable values for attributes

User exits can be developed for a limited set of functions including object promotion and versionand revision control.

Using CAA RADE V5, the user can:

• Create new objects and object attributes

• Use ENOVIA V5 VPM APIs to develop code that adds, extends, or replaces object behavior

• Define additional life-cycle operators

• Extend the inter/intra-enterprise import/export platform

• Implement legacy federation through ENOVIA 3d com / ENOVIA DMU

ENOVIA VPLM Data Customization

Using CAA-RADE Data Model Customizer (part of the CAA RADE V5 development tool that canbe ordered separately), the users can add their own data on the following modelers:

• ENOVIA V5 VPM Product Structure

• ENOVIA Document

• ENOVIA ECO and ECR

Additional details

For descriptions of other ENOVIA VPLM products, visit

http://www.ibm.com/solutions/plm/guide

ENOVIA VPLM WLS V5

Additional details on previously announced functions

The WLS Companion Server facilitates deployment by eliminating the need to install the licensefunction and complete user companion Java™ client on individual student machines. Instead,the server runs these functions using Java 2 Platform, Enterprise Edition (J2EE) applicationserver software, such as WebSphere(R) or Apache Tomcat.

http://www.ibm.com/solutions/plm/guide



The standard WLS user companion installation, whether in a file standalone mode or HTTP pageserver mode, requires a full Java client and WLS license to be installed on each student clientmachine. The companion server consolidates these functions on a single machine to streamlinethe licensing process and to improve user companion response time.

Packaging model

• ENOVIA User Companion for VPM (5671-VMC, 5672-VMC) and User Companion for DMU(5671-DNC, 5672-DNC) are available as configurations.

Note: The modification level for ENOVIA VPLM WLS is 1.7.0.

• User Companion Desktop is included with every configuration.

Packaging and products

The user can order ENOVIA VPLM WLS configurations two ways:

• As shareable configurations, order User Companion for DMU Configuration (5671-DNC),for example. Shareable configurations are suited for users who need a limited number oflicenses.

These configurations are delivered with their own license key, allowing the user to obtain thekey at the beginning of the session, or to leave it for another user.

• As enterprise configurations, order User Companion for DMU Configuration - EnterpriseOption (5672-DNC), for example.

This licensing option offers a reduced primary license charge (PLC) and requires the user topurchase licenses in a quantity equal to the quantity of each licensed CATIA configuration orproduct as described by the following terms.

The ENOVIA VPLM WLS configuration 5672-DNC is licensed to users on a one-to-onerelationship between the 5672-DNC configuration and each licensed 5673-DN1 or -DMN add-on or 5671-DMN shareable product and also each licensed configuration (and any futureconfiguration) that includes the DMU Navigator 1 or DMU Navigator 2 product.

All subsequent orders for the applicable licensed configurations must be accompanied by anequivalent order for the supporting ENOVIA User Companion. The price of an enterprise seat isgreatly reduced compared to the price of a shareable order.

There is a 10-seat minimum requirement for the ENOVIA User Companion for VPMConfiguration - Enterprise Option (5672-VMC).

There is no minimum seat requirement for the User Companion for DMU Configuration -Enterprise Option (5672-DNC).

The following rules apply:

• When the EO is deployed, the shareable option is no longer necessary.

• A shareable product (5671) can be added only on top of a shareable configuration (5671).

• An enterprise product (5672) can be added only on top of an enterprise configuration product(5672).

• The user can have a 5671 type entry configuration and a 5672 type entry configuration (suchas 5671-MDC plus 5671-HDS and 5672-DNC).

Education support

Schedules and enrollment

Call the IBM PLM North American response line at 800-395-3339 for schedules and enrollments.



Technical information

Specified operating environment

Hardware requirements

ENOVIA DMU - ENOVIA VPLM WLS requirements

The following requirements are common to all operating systems supported by ENOVIA DMUproducts and ENOVIA VPLM WLS. System unit and graphics display requirements are platform-specific.

ENOVIA User Companion for VPM WLS is designed to run concurrently with ENOVIAVPM V1.6.For hardware prerequisites, refer to Software Announcement 206-199, dated September 5,2006.

ENOVIA DMU required components and features

• Disk drive: An internal or external disk drive is required (minimum recommended size 2 GBfor ENOVIA VPLM, 4 GB for ENOVIA VPLM WLS) to store program executables (installationof all ENOVIA DMU products requires about 700 MB on Windows, 900 MB on AIX, 1.0 GB onHP-UX, and 800 MB on Solaris), program data, usage environment, and paging space.

• Memory: 256 MB of RAM is the minimum recommended amount of memory for allapplications. 512 MB of RAM is recommended for ENOVIA - DMU Navigator applications onlarge assemblies. Requirements may be greater when a large amount of data is used.

• Internal/external drives: CD-ROM drive is required for program installation and access to theonline documentation, which can be downloaded optionally to disk.

• Graphics display: A graphics color display, compatible with selected platform-specificgraphics adapter. The minimum recommended size for usability reasons is 17 inches; 1024x 768 and 1280 x 1024 for UNIX workstations. When selecting a graphics adapter, hardwaretexturing capability is strongly recommended when using ENOVIA - DMU Products that usetexture mapping, in which case the amount of RAM has to be adequate for the number andcomplexity of textures to be used.

• Keyboard: A specific keyboard compatible with selected installation locale may be requiredfor national language support.

• Pointing device: Three-button mouse; on Windows workstations, a two-button mouse canbe used (the third button is emulated with a keyboard sequence). The three-button mouse isrecommended for usability reasons. IntelliMouse (two buttons plus wheel) is an alternative tothe three-button mouse on Windows workstations, the wheel acting as the middle button andallowing additional manipulations such as panning and scrolling.

• Optional components and features: A SpaceBall or a SpaceMouse can be used inaddition to the standard mouse to perform graphic manipulations (zoom, pan, rotate). Therequired drivers are delivered with these devices. DMU Fitting Simulator 2 (FIT) supports theSpaceball. The SpaceBall and the SpaceMouse are supported on both Platform 1 (P1) andPlatform 2 (P2). While in P1, they enable graphic manipulations (in examine or fly modes).

In P2, they also make it possible to move objects (part trajectories in ENOVIA DMU fitting, forexample).

The robustness of the overall solution is dependent on the robustness of the operatingsystem and the hardware environment used. For a list of Windows NT® and UNIX hardwareconfigurations certified by Dassault Systemes for running ENOVIA DMU products, visit


Although ENOVIA DMU products and WLS can run on other configurations or other graphicsadapters, incidents specific to these configurations or adapters are not accepted for support.





ENOVIA DMU platform-specific hardware requirements

Windows XP

• System unit:Intel® Pentium® III-, Pentium 4-, or Xeon-based workstations runningMicrosoft Windows XP Professional Edition SP2, Microsoft Windows Vista Enterprise, orMicrosoft Windows Vista Business.

• Graphics adapter with 3D OpenGL accelerator is required.

Note: Graphics performance (panning, zooming, rotating model) depends on the selectedadapter. Recommended minimum:

– 24-bit, true color, double buffered visual

– 24-bit Z-buffer

– Stencil buffer

– Minimum supported resolution 1024 x 768; 1280 x 1024 recommended for usability

• Network adapter: An active LAN adapter (Ethernet or token ring, installed and configured) isrequired for licensing purposes.

Supported configurations of Windows XP

For a current list of hardware configurations, certified by Dassault Systemes for running ENOVIADMU products, visit


Windows x86-64 64-bit environment

• Disk drive: 2.5 GB

• Memory: 4 GB is the minimum recommended amount of memory.

• System unit:Intel EM64T, AMD Opteron 64-bit based workstations running Windows XPProfessional x64 Edition

• Graphics adapter: A graphics adapter with a 3D OpenGL accelerator is required.

Note: Graphics performance on local transformations (panning, zooming, and rotating model)will depend on the selected graphics adapter. The graphics adapter should have the followingcapabilities:

– 24-bit, true color, double buffered visual

– 24-bit Z-buffer

– Stencil buffer

– Minimum supported resolution 1024 x 768; 1280 x 1024 recommended for usability reasons

• Network adapter: An active LAN adapter (Ethernet or token ring, installed and configured) isrequired for license key purposes.

• Supported configurations on Windows XP Professional x64 Edition: for an updated listof hardware configurations, certified at Dassault Systemes for running ENOVIA 3d com V5products, visit


AIX

• System unit: Any IBM System P processor families, supported on AIX V5.3

• Graphics adapter -- One of the following graphics adapters:

– GXT500P

– GXT550P

– GXT800P

– GXT800M

– GXT2000P





– GXT3000P

– GXT4000P

– GXT4500P

– GXT6000P

– GXT6500P

Note: Support of the IBM eServer™ P5 and IBM System P5 Server requires AIX V5.3. HP-UX

• System unit: any B-Class, C-Class or J-Class workstation based on a PA8000, PA8800,PA8900 processor family, supported on HP-UX 11.11 (HP-UX 11iv1)


– Visualize-FXE

– Visualize-FX2

– Visualize-FX4

– Visualize-FX5

– Visualize-FX6

– Visualize-FX10

– Fire GL-UX

– Fire GL T2-128

– Fire GL X1

– Fire GL X3

Sun Solaris

• System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, SUN Blade 100, SUN Blade 150,SUN Blade 1000, SUN Blade 1500, SUN Blade 2000, SUN Blade 2500, or SUN Blade 1500+(1.5 GHz) workstation based on UltraSPARC processor, supported on Solaris 10, providedthat requirements are met.


– Creator3D

– Creator3D Series III

– Elite 3D (U10-440 MHz only, for U10 workstations)

– Expert3D Lite

– Expert3D

– XVR-500

– XVR-1000

– XVR-1200

– XVR 600

ENOVIA 3d com client hardware requirements

Common requirements

The following requirements are common to all operating systems supported by ENOVIA 3d com.System unit and graphics requirements are platform-specific and include:

• Disk drive: 100 MB of disk space is required for data dynamically downloaded from theENOVIA 3d com product server.

• Memory: 128 MB of RAM is the minimum recommended amount of real memory; 256 MB ofRAM is recommended on ENOVIA 3d com clients.

• Graphics display: A graphics color display, compatible with the selected platform-specificgraphics adapter. The minimum recommended size for usability reasons is 17 inches. Theminimum resolution required for Windows workstations is 1024 x 768, and 1280 x 1024 onUNIX workstations.

• LAN adapter: A network adapter is required to connect the server and clients to the LAN orWAN.




• Pointing device: Two- or three-button mouse.

Platform-specific requirements

Microsoft Windows

• System unit:Intel Pentium III- or Pentium 4-based workstations running Microsoft WindowsXP Professional Edition SP1 or SP2, Microsoft Windows Vista Enterprise, orMicrosoft Windows Vista Business.

• Graphics adapter: A 3D graphics adapter is required.

Note: Memory consumption is about 50 MB after all ENOVIA 3d com applets, the Java VirtualMachine, and the browser itself is loaded.

AIX

• System unit: Any IBM system family supported on AIX V5.3 with system units based onPower4, Power5, Power6 or PowerPC® 970 processor technologies.


– GXT500P

– GXT550P

– GXT800P

– GXT800M

– GXT2000P

– GXT3000P

– GXT4000P

– GXT4500P

– GXT6000P

– GXT6500P

HP-UX

• Any B-Class, C-Class or J-Class workstation based on a PA8000, PA8800 and PA8900processor, supported on HP-UX 11.11 (HP-UX 11iv1), provided that requirements are met.

• One of the following graphics adapters:

– Visualize-FXE

– Visualize-FX2

– Visualize-FX4

– Visualize-FX5

– Visualize-FX6

– Visualize-FX10

– Fire GL-UX

– Fire GL X1

– Fire GL X3

– Fire GL-T2



Sun Solaris

• System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Ultra80, Sun Blade 100, Sun Blade150, Sun Blade 1000, Sun Blade 1500, Sun Blade 1500+ (1.5 GHz), Sun Blade 2000, orSun Blade 2500 workstation based on the UltraSPARC processor, supported on Solaris 10(SPARC) provided that requirements are met.


– Creator3D

– Creator3D Series III

– Elite 3D (U10-440 MHz for Ultra 10 workstations)

– Expert 3D Lite

– Expert 3D

– XVR-500

– XVR-1000

– XVR-1200

– XVR-600

ENOVIA 3d com server hardware requirements

Common requirements (classic ENOVIA 3d com)

The following requirements are common to all operating systems supported by ENOVIA 3d comproducts. System unit and graphic requirements are platform-specific and are detailed in thesections that follow:

• Disk drive: An internal or external disk drive is required to store program executables(installation of all ENOVIA 3d com products requires about 800 MB on Windows or Solaris,1.1 GB on AIX, 1.3 GB on HP-UX), program data, usage environment, and paging space.Requirements may be larger when large amounts of data are used.

• Memory: 256 MB of RAM is the minimum recommended amount of memory for allapplications. Requirements may be greater when large amounts of data are used.

• Internal/external drives: A CD-ROM drive is required for program and online documentationinstallation.

• Display: A graphic color display, compatible with the selected platform-specific graphicsadapter. The minimum recommended size is 17 inches. The minimum resolution required forWindows workstations is 1024 x 768, and 1280 x 1024 on UNIX workstations.

• LAN adapter: A network adapter is required to connect the server and clients to the LAN orWAN.


• Pointing device: Three-button mouse.

General rules for memory requirements (classic ENOVIA 3d com)

The memory requirement depends on the number of simultaneous ENOVIA ENOVIA 3d comsessions; the users need to dimension the server system accordingly.

The server dimensioning needs to take into account the memory used by the CAD/CAM processon the server.

For CATIA V5 (classic ENOVIA 3d com)

• ENOVIA 3d com consumes 50 MB for the first session plus 10 MB for each additional sessionfor an average 1 MB model.

• The RAM requirement formula is the following: 50 MB + n*10 MB+n*m MB, where n is thenumber of maximum concurrent sessions and m the average size of the CATIA models.

Note: If several models are selected in one session, only one model remains loaded at thesame time, optimizing the memory consumption. As an example, for 10 concurrent usersmanipulating 10 MB average-size models, the minimum RAM requirement is 256 MB.



• For better response time, a graphics card can be installed on the server and shared in asequential mode between the simultaneous sessions to improve 3D rendering, customersmust dimension the graphics card accordingly.


Windows XP (classic ENOVIA 3d com)

• System unit - Any Intel Pentium 4, Intel Xeon® workstation running Microsoft Windows 2003Standard Edition or Windows 2003 Enterprise Edition.

• Graphics adapter: The same as for CATIA V5. For a list of supported graphics adapters, visit


UNIX (AIX, HP-UX, or Solaris) (classic ENOVIA 3d com)

For system unit and graphics adapter requirements, refer to ENOVIA 3d com client hardwarerequirements ENOVIA 3d com client hardware requirements section.

Note: In addition to graphics adapters supported on an AIX ENOVIA 3d com client, VirtualFrame Buffer technology offered through AIX operating system is also supported on an AIXENOVIA 3d com server.

ENOVIA V5 VPM client hardware requirements

Common requirements

The following requirements are common to all operating systems supported by ENOVIA V5VPM. System unit and graphic requirements are specific to the platform.

• Disk drive: 250 MB of disk space.

• Memory: Client workstation RAM: Minimum 256 MB recommended.

• Internal/external drives: CD-ROM drive for program and online documentation installation.

• Display: A graphic color display, compatible with the selected platform-specific graphicsadapter. The minimum recommended size is 17 inches. The minimum resolution required forWindows workstations is 1024 x 768, and 1280 x 1024 on UNIX workstations.

• Graphics adapter: An OpenGL graphics adapter, compatible with the windowing manager ofthe selected operating system (CDE on AIX, HP-UX, or Solaris).

• LAN adapter: A network adapter to connect the server and clients to the LAN or WAN.

• Keyboard: Keyboard compatible with selected installation locale may be required for nationallanguage support.

• Pointing device: Two- or three-button mouse.


Windows XP

System unit:Intel Pentium III- or Pentium 4-based workstations running Microsoft Windows XPSP 1 or SP 2 Professional, Microsoft Windows Vista Enterprise, or Microsoft Windows VistaBusiness.

AIX

System unit

• Any RS/6000®, based on Power4 processor family supported on AIX V5.3

• System units based on Power5 or PowerPC 970 processor families, supported on AIX V5.3.

HP-UX

System unit: Any B-Class, C-Class or J-Class workstation based on PA8000 Processor familysupported on HP-UX 11.11 (HP-UX 11i).




Sun Solaris

System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Ultra80, Sun Blade 100, Sun Blade150, Sun Blade 1000, Sun Blade 1500, Sun Blade 1500+ (1.5 GHz), Sun Blade 2000, or SunBlade 2500 workstation based on the UltraSPARC processor supported on Solaris 10 (SPARC).

ENOVIA V5 VPM server hardware requirements

Common requirements

The following requirements are common to all operating systems supported by ENOVIA V5VPM. System unit requirements are specific to the platform.

• Disk drive: Internal or external disk drive to store program executables, program data,usage environment, and paging space. Installation of all ENOVIA V5 VPM products requiresapproximately 1.0 GB on AIX or Solaris, and 1.3 GB on HP-UX. Requirements may be largerwhen large amounts of data are used.

• Memory: ENOVIA V5 VPM requires at least 256 MB of real memory for the first session,including the operating system, but could use up to 2 GB (or more in some cases) dependingon system settings, database parameters, and other factors.

If ENOVIA V5 VPM server is installed on the same server as the database, be sure to add thedatabase memory requirement to that needed for ENOVIA V5 VPM.

Additional memory is required for each additional application server session, and 75 MBshould be used as a typical-use starting point (with a minimum of 25MB per user session forthose only logged-on). More or less additional-session memory may be required dependingon user-specific factors such as the amount of data loaded, the number of different applicationareas open concurrently, local customizations, and so on. Additional sizing rules will beprovided after further capacity planning evaluations.

• Internal/external drives: CD-ROM drive for program and online documentation installation

• Display: A graphic color display compatible with the selected platform-specific graphicsadapter. The minimum recommended size is 17 inches. The minimum resolution required is1024 x 768 on Windows workstations and 1280 x 1024 on UNIX workstations.

• Graphics adapter: An OpenGL graphics adapter, compatible with windowing manager of theselected operating system (CDE on AIX, HP-UX).

• LAN adapter: Network adapter to connect the server and clients to the LAN or WAN.

• Keyboard: Keyboard compatible with selected installation locale may be required for nationallanguage support.

• Pointing device: Three-button mouse.


Windows 2003

System unit:Intel Pentium III- or Pentium 4-based workstations or server runningMicrosoft Windows Server 2003 Standard Edition and Windows Server 2003 Enterprise Editionare supported on ENOVIA V5 VPM Server side.

AIX

System unit: Any IBM system family supported on AIX V5.3 with system units based onPower4, Power5, Power6 or PowerPC 970 processor technologies.

In addition to the above hardware requirements, IBM eServer P5 and IBM System P5 Server aresupported with AIX V5.3.

HP-UX

System unit: Any B-Class, C-Class, or J-Class supported on HP-UX 11.11 (HP-UX 11i).



Sun Solaris

System unit: Any Ultra1, Ultra2, Ultra10, Ultra30, Ultra60, Sun Blade 100, Sun Blade 150, SunBlade 1000, Sun Blade 1500, Sun Blade 2000, or Sun Blade 2500 workstation based on theUltraSPARC processor, supported on Solaris 10 (SPARC).

Note: ENOVIA VPLM application server and Web-client (ENOVIA VPM Lifecycle Navigator)deployment on WebSphere® Application Server are supported on Solaris (WebSphereApplication Server V6.0.2 on Solaris 32).

Software requirements

Requirements for interoperability with CATIA products

• CATIA V5 and ENOVIA VPLM must be at the same release, service pack, and hot fix level forproper interoperability.

• CATIA V5 and ENOVIA VPLM ENOVIAVPM interoperability is supported between variousCATIA V5 release and ENOVIA VPLM ENOVIAVPM PTF levels. Refer to the most recentENOVIA VPLM ENOVIAVPM PTF program directory for the current prerequisite andrecommended interoperability PTFs.

Specific software requirements for ENOVIA WLS V5

Access to the companion desktop - Companion desktop access is accomplished using the samebrowser requirements as ENOVIA VPLM (refer to Access to product information (ENOVIA DMU /ENOVIA 3d com) section and section. The Java plug-in (Java Runtime Environment (JRE) ata minimum level of 1.5) is required to visualize the different types of simulations (Show Me,Discover It, Try It, and the Quiz) and to allow for automatic model loading from ENOVIA VPLM.

The supported level of JRE 1.5 can be downloaded from

http://java.sun.com/products/archive/index.html

WLS license management - Licenses can be managed either using standard ENOVIA VPLMlicensing or by using the J2EE Companion Server. For standard licensing, refer to the licensemanagement environment prerequisite sections for ENOVIA 3d com, ENOVIA DMU, andENOVIA V5 VPM). Requirements for the J2EE Companion Server are:

• Application server setup - The application server used must support Servlet 2.4 and JSP2.0 and must be able to handle the Companion Server WAR or EAR files. These files arecopied during installation if the application server option was selected during the installationprocedure. The server setup operation depends on the application server used and must bedone by the system administrator.

• Companion application setup for license serving - The application server machine must beable to access WLS licenses, and licenses must be available to this server machine. For theEO, the total number of licenses must be equal to the maximum number of students that willbe connected at the same time to the application server.

Operating system support exceptions

There are 4 MultiCAx products that are only supported on Windows XP:

• MultiCAx - SolidWorks Plug-in

• MultiCAx - SE Plug-in (Solid Edge)

• MultiCAx - AD Plug-in (ACIS - DXF3D - Inventor)

• MultiCAx - UD Plug-in (Unigraphix Direct Interface)




ENOVIA DMU and ENOVIA VPLM WLS common software requirements

Note: As of V5.18, the following are no longer supported:

• Windows 2000 Professional

• AIX 5.2

• Solaris 8

• SGI IRIX

ENOVIA VPLM WLS has the same software requirements as ENOVIA DMU unlessotherwise noted.

ENOVIA User Companion for VPM WLS is designed to run concurrently with ENOVIAVPM V1.6.For software prerequisites, refer to Software Announcement206-199, dated September 5, 2006.

Refer to the Program Directory or contact the IBM Support Center for appropriate correctiveservice to apply to the following software.

ENOVIA DMU platform-specific software requirements

ENOVIA DMU V5 runs on selected system levels of:

• Microsoft Windows XP

• AIX

• Hewlett Packard HP-UX

• Sun Solaris

Windows XP

Minimum level required: Microsoft Windows XP Professional Edition SP2, or higher, with thefollowing components:

• Microsoft Windows XP delivers an implementation of OpenGL libraries. Dassault Systemeswill provide recommendations related to driver levels based on tested graphic adapters at

http://www.3ds.com/implementation/technology/windows/ certified-workstations-list/• A localized version of the operating system may be required when the selected installation

differs from Latin1.

Additional Windows XP requirements

• MS06-075: Vulnerability in Windows could allow elevation of privilege. Information is availableat

http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx• MSI Installer 3.1: Windows Installer 3.1 v2 (3.1.4000.2435) available at

http://support.microsoft.com/kb/893803• Windows XP Professional x64 Edition (refer to the following section for description)

ENOVIA DMU V5 64-bit on Windows XP Professional x64 edition

• Minimum level required: Windows XP Professional x64 Edition

• Microsoft implementation of OpenGL libraries, as delivered with Windows. Forrecommendations related to driver levels based on tested graphic adapters, visit

http://www.3ds.com/implementation/technology/windows/ certified-workstations-list/


http://www.3ds.com/implementation/technology/windows/certified-workstations-list/

http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx

http://support.microsoft.com/kb/893803




ENOVIA DMU V5 32-bit on Windows XP Professional x64 edition




The following set of patches are required when running 32-bit applications on x64 environment:

• KB903648: When using macro and VBScript features, V5 may crash when accessing morethan 2 GB of address space. A Microsoft patch is available to correct this problem. To seeMicrosoft Article KB903648, visit

http://support.microsoft.com/default.aspx?scid=kb;en-us;903648• KB911021: Required for applications allowing more than 2 GB of address space. Contact your

Microsoft support representative for any questions regarding this patch.

AIX

Base support

AIX V5.3 ML03 (using 64-bit kernel) with the following components:

• OpenGL and GL3.2 Runtime Environment (delivered with the operating system)

• Common Desktop Environment (CDE), delivered with the operating system

• XL C/C++ Enterprise Edition V7.0.0 Run-time Environment: XL 7 May 2005 PTF R/T(xlC.aix50.rte at level 7.0.0.6), delivered through APAR IY71976

• XL Fortran Enterprise Edition V9.1.0 for AIX Run-Time: November 2004 XL Fortran for AIXV9.1 Runtime PTF

Available at

http://www-1.ibm.com/support/docview.wss?rs=0&uid=swg24008377

Additional support

AIX V5.3 TL04-SP1 (using 64-bit kernel) with the following components:



• XL C/C++ Enterprise Edition V8.0.0 Run-time Environment: January 2006 IBM C++ RuntimeEnvironment Component for AIX, available at

http://www.ibm.com/support/docview.wss?uid=swg24011532• XL Fortran Enterprise Edition V10.1.0 for AIX Run-Time: Base level available at

http://www-1.ibm.com/support/docview.wss?uid=swg24010669• Support for the use of nodelock license requires:

– IY80993: Workaround Application Dependency on System-ID

– Firmware Version: AT061_061 or later

• Nodelock licensing requires the following patches:

– IY82392: 0C9 System Crash with Graphics Adapter

– Support of GXT4500P requires the following patch to be applied: IY80526: CATIA V4Hangs on GXT4500P when rotating a model.

WebSphere Application Server V6.1 and WebSphere Portal Server support orIBM IntelliStation® P185 support requires AIX 5.3 TL04-SP1 with above recommendations

HP-UX

• HP-UX 11.v1 v2, including HP 11iv1 (11.11) December 2004 with the following requirements:

– HP-UX Technical Computing OE (TCOE) Component December 2004


http://support.microsoft.com/default.aspx?scid=kb;en-us;903648


http://www.ibm.com/support/docview.wss?uid=swg24011532

http://www-1.ibm.com/support/docview.wss?uid=swg24010669



– Hardware Enablement Patches for HP-UX 11i v1, December 2004

– Gold Applications Patches for HP-UX 11i v1, December 2004

– Gold Base Patches for HP-UX 11i v1, December 2004

– With the following patches applied:

-- PHCO_31923: libc cumulative header file patch

-- PHCO_33360: libc cumulative patch

-- PHKL_31918: fsadm;ACL;locking order;8K mount;readdir

-- PHNE_32477: ONC/NFS General Release/Performance Patch

-- PHSS_29483: HP aC++ Compiler (A.03.52)

-- PHSS_31271: PEX 5.1/Starbase/Hardcopy Run (PA2.0 only)

-- PHSS_31274: Starbase/Hardcopy Dev (PA2.0 only)

-- PHSS_31275: OpenGL 1.1 Dev (PA2.0 only)

-- PHSS_32573: HP aC++ -AA runtime libraries (aCC A.03.61)

-- PHSS_32928: 3D Common Run (PA2.0 only)

-- PHSS_32934: OpenGL 1.1 Run (PA2.0 only)

-- PHSS_32939: Xserver cumulative patch

-- PHSS_33033: ld(1) and linker tools cumulative patch

– HP-UX 700 OpenGL 3D API Runtime Environment

– CDE, delivered with the operating system

– A localized version of the operating system may be required when the selected installationlocale differs from ISO code pages.

Note: WebSphere Application Server V6.1 and WebSphere Portal Server support requiresHP11iv2. V5 applications are not supported on HP 11iv2.

Sun Solaris

The minimum indicated level is Sun Solaris 10 H/W 05/03 with the following components:

• C and C++ runtime environment (delivered with the operating system)

• OpenGL runtime environment (delivered with the operating system)

• Fortran runtime environment is delivered with ENOVIA - DMU Navigator

• CDE (delivered with the operating system)

• A localized version -- May be required when the selected installation locale differs from ISO-1.

• Motif 2.1

• 119280-06 CDE 1.6: Runtime library patch for Solaris 10 is required.

Notes

• Additional support for SOLARIS Run time on SPARC system is Solaris 10.03/05 (on 32-bitonly)

• Support of the XVR 600 graphic adapter -- Requires OpenGL runtime environment at level 1.3

Specific software requirements for ENOVIA VPLM WLS

An HTML browser is required:

• UNIX environment: Mozilla is required at level 1.7 on all UNIX, which requires Mozilla 1.4.

• Windows environment: Microsoft Internet Explorer 6.0 (Microsoft VM version number 3158) isa minimum requirement.

Browser plug-ins: Some WLS products may provide learning resources using the PortableDocument Format (PDF). To view these documents, Adobe® Acrobat Reader V3, or later, mustbe installed as a plug-in on the browser. To download, visit

http://www.adobe.com/




Although access to WLS might work on other HTML browsers, incidents specific to browsersother than the products mentioned above are not eligible for support.

Access to product information (ENOVIA DMU / ENOVIA 3d com)

Product information and User GALAXY (online product marketing information) are delivered inHTML format. An HTML browser is required to access this documentation. Online documentationmay be installed and used only in an officially supported operating environment.

In a UNIX environment (AIX, HP-UX, Solaris)

• Mozilla 1.7 for AIX and HP-UX with Java plug-in installed

• Firefox 2.0 for SUN Solaris SPARC available at

http://www.mozilla.com/en-US/firefox/2.0.0.3/releasenotes

In a Windows environment, either

• Microsoft Internet Explorer at a minimum level of 7.0

• Firefox 2.0 with Java plug-in installed

Although access to the online documentation might work on other HTML browsers, incidentsspecific to browsers other than products mentioned above are not eligible for support.

In addition to a Java-enabled Web browser, a Java plug-in at level 1.5 (or 5.0) is required tosearch online documentation.

Note: Improvements in HTML searching and printing capabilities eliminate the need to duplicateproduct information in the Portable Document Format (PDF) format. PDF CDs are therefore nolonger included in the ENOVIA VPLM softcopy collection kit.

For Microsoft Windows, Java plug-in version 5 Update 7 may be downloaded from


For AIX, Java Runtime Environment version Java 1.5.0 SR3 can be downloaded from

http://www-106.ibm.com/developerworks/java/jdk/aix/service.html

For HP-UX, Java Runtime Environment 5.0.0.1 can be downloaded from

http://www.hp.com/go/java/

For Sun Solaris, Java Runtime Environment version 5 Update 7 may be downloaded from


ENOVIA DMU prerequisites for the license management environment

• Windows workstations must have an active LAN card (Ethernet or token ring) and TCP/IP installed and properly configured, but there is no requirement for the workstations to beconnected to the network.

• No additional software is required when accessing nodelock licenses.

• IBM License Use Management (LUM) is required to serve concurrent licenses across anetwork. A LUM configuration file (i4ls.ini) is required on ENOVIA - DMU clients to accessconcurrent licenses from these servers.

• ENOVIA VPLM add-on product (AOP) and shareable products may require license keys forprerequisite products that are not already included in a standard configuration. Prerequisitesfor shareable products can be satisfied by a standard configuration, by an AOP within acustom configuration, or by a shareable product.

However, because all add-on products are defined within one custom license key, any AOPprerequisites must be satisfied by either a standard configuration or by other AOPs purchasedand defined within the same custom configuration.








• There is no limit to the number of ENOVIA DMU processes launched for a given licensekey (configuration or product). For instance, a user can launch the following simultaneousprocesses:

– A V5 interactive session

– A V5 process executed through an OLE container application

– Replay of macros recorded from captured sequences of V5 user interactions

• IBM LUM level - IBM LUM at a minimum level 4.6.8.3 is required.

LUM 4.6.8 with Patch 4.6.8.3 is shipped with ENOVIA VPLM. Various release levels of LUMmay be downloaded, at no charge, from

http://www.ibm.com/software/lum

ENOVIA DMU macro replay capabilities

ENOVIA DMU products have built-in macro record and replay: For UNIX, the interpreter isVisualBasic (VB) Script 3.0 from Mainsoft. It is included in ENOVIA DMU products as sharedlibraries.

For Windows, the interpreter is either:

• VB Script 5.0, or later, delivered with Microsoft Internet Explorer. VB Script libraries at level5.0.0.3715 are delivered with Internet Explorer 5.0, or later, with later versions of InternetExplorer. Use of VB Script is recommended for developing Windows/UNIX compatiblemacros.

• Microsoft VisualBasic for Applications (VBA) 6.0, or later. VBA is delivered and installed bydefault with ENOVIA DMU.

ENOVIA DMU printer and plotter support in a UNIX environment

ENOVIA DMU products provide support for main plotter/printer languages:

• CGM-ISO, ATA, CALS

• Hewlett Packard HP-GL/2-RTL and HP-GL or IBM-GL subsets

• OCE Graphics GPR50: VDF Plotting routines

• PostScript®

ENOVIA DMU printer and plotter support in a Windows environment

Support of printers and plotters on Windows is performed through the availability, for the targetedprinters/plotters, of the corresponding vendors' drivers, compatible with the targeted version ofthe operating system. Contact the appropriate printer/plotter vendor for support.

Batch monitoring using WebSphere MQ (formally known as MQSeries)

Using WebSphere MQ communication tools, some batch operations can now be launchedremotely. When implemented at the batch level, this optional feature requires:

• WebSphere MQ V6.0. For information about availability, visit

http://www.ibm.com/software/integration/wmq• WebSphere MQ client -- Required on systems where the transaction is initiated. WebSphere

MQ server is required on systems where remote batches are executed.

ENOVIA DMU software installation

• On Windows, installing and uninstalling rely on Windows-compliant tools such as InstallShield,which enables anyone familiar with Windows procedures and concepts to install the software.

• The concepts, procedures, and look and feel of installation procedures for Windows arecarried over to the UNIX environment to give a common ENOVIA - DMU Products interface forall supported operating systems.

• Installation procedures feature:

– Easy and fast installation: Any user can install and execute the product with a limitednumber of interactions.


http://www.ibm.com/software/integration/wmq



– Reduced user environment: When installed, a product requires customization.

– Customizable installation: The user can select downloaded products.

ENOVIA 3d com client software requirements

Common client software requirements



• AIX 5.2

• Solaris 8

• SGI IRIX

Java-enabled Web browser on the client machines

• Windows

Microsoft Internet Explorer 7.0 or Mozilla 1.7 on Windows with Java plug-in V6.0 update 2available under the JDK/JRE 6.0 section at

http://java.sun.com/products/archive/index.html• AIX

For Mozilla 1.7, the recommended plug-in on AIX, is Java 1.5.0 SR3, which is available at

http://www.ibm.com/developerworks/java/jdk/aix/service.html• HP-UX

When using Mozilla 1.7 browser, a Java plug-in is necessary. The recommended plug-in onHP-UX, at minimum level 5.0.0.1, is available at

http://www.hp.com/go/java/• Solaris

Use Mozilla Firefox 2.0 browser, which is available at


On Sun Solaris, IBM AIX, HP-UX and Windows, for classic ENOVIA 3d com, the Java RuntimeEnvironment at level 1.5 (or 5.0) is required for ENOVIA 3d com Classic. Java RuntimeEnvironment can be downloaded from

• Sun Solaris


http://www-106.ibm.com/developerworks/java/jdk/aix/service.html• HP-UX

http://www.hp.com/go/java/• Windows


Dynamic conversion to virtual reality modeling language (VRML) does not require any additionalsoftware.

• If no plug-in is available to display the converted data, the browser will propose to store thedata with the extension .wrl on the client.

• If a VRML plug-in is available, it is automatically invoked for viewing and manipulation.

For interoperability between a CATIA V5 session and a VPM database, using a ENOVIA 3d comDB2 client or Oracle client, refer to the appropriate VPM announcement for specific supportedrelational database management system (RDBMS) release levels.


http://www.ibm.com/developerworks/java/jdk/aix/service.html









Platform-specific software requirements

UNIX

Operating system requirements stated in the Specific server software requirements sectionapply equally for ENOVIA 3d com Product clients on UNIX machines.

Windows XP

Microsoft Windows XP SP2 with the following components:

Microsoft Windows XP delivers an implementation of OpenGL libraries. Dassault Systemes willprovide recommendations related to driver levels based on certified configurations at


These drivers may offer a CATIA V5 application setting. If available, the user should select thissetting (from Display Properties screen on Microsoft Windows XP Control Panel) so that anyapplication-specific features can be used. The user can update these libraries depending on thegraphics adapter selected when he installed the adapter and associated drivers.

A localized version of the operating system may be required when the selected installation localediffers from Latin1.



http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx• MSI Installer 3: Windows Installer 3.1 v2 (3.1.4000.2435) available at

http://support.microsoft.com/kb/893803• Windows XP Professional x64 Edition (Refer to the following section for description)

Windows XP Professional x64 edition for V5 32-bit




The following set of patches are required when running 32-bit applications on x64 environment:

• KB903648: When using macro and VBScript features, V5 may crash when accessing morethan 2 GB of address space. A Microsoft patch is available to correct this problem. To seeMicrosoft Article: KB903648, visit

http://support.microsoft.com/default.aspx?scid=kb;en-us;903648• KB911021: required for applications allowing more than 2 GB of address space. Contact your

Microsoft support representative.

ENOVIA 3d com server software requirements

Information in this section describes requirements specific to each supported operating systemon ENOVIA 3d com servers.

Windows 2003

Windows Server 2003 Standard Edition or Windows Server 2003 Enterprise Edition is requiredwith Service Pack 1.

• Microsoft Windows 2003 delivers an implementation of OpenGL libraries. These libraries maybe updated depending on the selected graphics adapter when the user installs the graphicsadapter and associated drivers.








• DirectX at minimum level 8.1 is required for correct operation of ENOVIA 3d com Server in amulti-user environment. It is available from

http://www.microsoft.com/downloads/• A localized version of the operating system may be required when the selected installation

locale differs from Latin1.

AIX

Base support





• XL Fortran Enterprise Edition V9.1.0 for AIX Run-Time: November 2004 XL Fortran for AIXV9.1 Runtime PTF, available at


Additional support includes:



• CDE, delivered with the operating system









WebSphere Application Server V6.1 and WebSphere Portal Server support or IBM IntelliStationP185 support requires AIX 5.3 TL04-SP1 with respect to previously described recommendations.

HP-UX













http://www.microsoft.com/downloads/















– A localized version of the operating system that may be required when the selectedinstallation locale differs from ISO code pages

Note: V5 applications are not supported on HP 11iv2.

Sun Solaris

Sun Solaris 10 SPARC HW 03/05, including:

• C and C++ runtime environment (delivered with the operating system).

• OpenGL 1.3 runtime environment (delivered with the operating system).

• Fortran runtime environment (delivered with the operating system).

• A localized version of the operating system may be required when the selected installationlocale differs from ISO-1.

• 119280-06 CDE 1.6: Runtime library patch for Solaris 10 is required.

• WebSphere Application Server V6.1 is currently supported.

Notes

• WebSphere Application Server V6.0.2 is currently supported on Solaris 32.

• Current® support for Solaris run-time on SPARC system is Solaris 10.03/05 (on 32-bit only).

Additional ENOVIA 3d com server software requirements

The following components are required or optional on ENOVIA 3d com servers for all supportedoperating systems:

HTTP server

• ENOVIA 3d com Classic requires an HTTP server (not delivered with the ENOVIA 3d comproducts) on the server machine. The user will need to configure it after the ENOVIA 3d cominstallation.

• ENOVIA 3d com Classic supports the following HTTP servers:

– Apache Server

– IBM HTTP Server

– Microsoft Internet Information Services

– Incidents specific to other servers will not be eligible for support.

ORBIX

ORBIX (supplied with ENOVIA 3d com Navigator) enables internet interoperability objectprotocol (IIOP) based, CORBA-compliant communications on the server side.

Java virtual machine (classic and modular 3d com)

• A Java Runtime Environment is required for the Workbook server at the following level:

– Windows: SUN, Java Runtime Environment version 5 Update 7 may be downloaded from





– AIX: Java Runtime Environment version Java 1.5.0 SR3 can be downloaded from

http://www-106.ibm.com/developerworks/java/jdk/aix/service.html– HP-UX: Java Runtime Environment 5.0.0.1 can be downloaded from

http://www.hp.com/go/java/– Sun Solaris: Java Runtime Environment version 5 Update 7 may be downloaded from


Workbook can be managed through a WebSphere Application Server.

WebSphere Portal (ENOVIA 3d com Web Navigator and ENOVIA - VPM LifecycleNavigator)

On AIX and Windows, WebSphere Portal Server V5.1.0.2 on WebSphere Application ServerV6.0.2 can be used with the new File Explorer and the ENOVIA 3d com Web Navigator andENOVIA - VPM Lifecycle Navigator portlets. For more information about WebSphere Portal, visit

http://www.ibm.com/websphere/portal

To use the Sametime® collaboration capabilities, Lotus® Instant Messaging and WebConferencing V7.5.1 is required.

ENOVIA 3d com prerequisites for the license management environment

• "Nodelock" license keys are not allowed with ENOVIA 3d com. LUM is required to serveconcurrent license keys across a network. A LUM configuration file (i4ls.ini) is required onclients to access concurrent license keys from these servers.

Note: Concurrent offline licensing is not supported.




Optional ENOVIA 3d com server requirements

For CATIA V5

• CATIA V5 server code is included on the ENOVIA 3d com CD-ROM and installed by default.To use ENOVIA 3d com in conjunction with CATIA V5, the user must install ENOVIA 3d comwith the ENOVIA 3d com Navigator or with ENOVIA 3d com CAD Viewing configuration.

• The ENOVIA 3d com Navigator and CAD Viewing configurations include a V5 server thatsupports reading and visualizing of CATIA 3D data created at any level up to and includingCATIA V5.12 and CATIA V4.2.4.1.

Notes

• MultiCAx plug-ins (ProEngineer(R), Unigraphics(R), and I-deas(R)) must be installed on theserver side when multi-CAD support is required.

• ENOVIAVPM (for installation using ENOVIA - MultiPDM CDM/VPM Plug-in) requiresENOVIAVPM V1.6.

Requirements for using instant collaboration capabilities with ENOVIA 3d com

• Sametime Server: 7.5.1

• Server operating system: Refer to Sametime release Note

• Client operating system: Windows, AIX V5.3, Solaris 10




http://www.ibm.com/websphere/portal




Using ENOVIAVPM V1.6 with ENOVIA VPLM V5.19 or CATIA V5.19 products

ENOVIAVPM V1.6 customers who plan to interoperate with the V5.19 family of ENOVIA VPLMor CATIA products must install an ENOVIAVPM program temporary fix (PTF) to obtain therequired interoperability level. (V5.19 service pack may also be required.)

The required PTF could vary depending on whether the base level of the V5.19 product is beingused, or a subsequent service pack level. Check the V5.19 documentation for interoperabilityinformation, or contact IBM Support for specific details, or visit

https://www.ibm.com/software/applications/plm/support/support.wss

Select Fixes, tools on the left side.

ENOVIA V5 VPM Enterprise Process Definition (E-PD) support

This product is supported on Windows XP only.

ENOVIA V5 VPM client software requirements

Common client software requirements



• AIX 5.2

• Solaris 8

• SGI IRIX

For ENOVIA VPM Product Editor and ENOVIA V5 VPM: Java Runtime environment, V1.5 isrequired (Refer to the respective Program Directories for further details.)

For Web-client ENOVIA V5 VPM (ENOVIA - VPM Navigator): The following Java-enabled Web-browsers on the client machines are supported:

• Windows

– Microsoft Internet Explorer 7.0 or higher on Windows with Java plug-in 1.5.0_07 available at

http://java.sun.com/products/archive/index.html– Mozilla 1.7 with Java plug-in 1.5.0_07 available at


Java Runtime Environment Version Java 1.5.0 SR3 can be downloaded from


Mozilla 1.7 with Java Runtime Environment 5.0.0.1 can be downloaded from

http://www.hp.com/go/java/• Sun Solaris

Use Mozilla Firefox 2.0 browser, which is available at


The Java Runtime Environment Version 5 Update 7 can be downloaded from


https://www.ibm.com/software/applications/plm/support/support.wss









Platform-specific client software requirements

UNIX

Operating system requirements for clients on UNIX machines are the same as those stated inthe ENOVIA V5 VPM server software requirements section.

Windows XP

Microsoft Windows XP Professional SP2 with the following components:

Microsoft Windows XP delivers an implementation of OpenGL libraries. Dassault Systemes willoffer recommendations related to driver levels based on certified configurations at


These drivers may offer a CATIA Version 5 application setting (see Control Panel, DisplayProperties), which should be selected when available, as they may contain application specificfeatures. The user can update these libraries depending on the graphics adapter selected whenhe installed the adapter and associated drivers.

A localized version of the operating system may be required when the selected installation localediffers from Latin1.



http://www.microsoft.com/technet/security/bulletin/MS06-075.mspx• MSI Installer 3.1 : Windows Installer 3.1 v2 (3.1.4000.2435) available at

http://support.microsoft.com/kb/893803• Windows XP Professional x64 Edition (Refer to the following section for description)

Windows XP Professional x64 edition for V5 32-bit

• Minimum level required: Windows XP Professional x64 Edition.



These drivers may offer a CATIA V5 application setting (see Control Panel, Display Propertiestabs), which should be selected when available, as they may contain application specificfeatures.

• Although the V5 products are 32-bit applications, they can allocate up to 4GB of Memorywhen running on this operating system.

• The following set of patches are required when running 32-bit applications on x64environment:

– KB903648: When using macro and VB Script features, V5 may crash when accessing morethan 2 GB of address space. A Microsoft patch is available to correct this problem. To seeMicrosoft Article: KB903648, visit

http://support.microsoft.com/default.aspx?scid=kb;en-us;903648– KB911021: Required for applications allowing more than 2GB of address space. Contact

your Microsoft support representative.

ENOVIA V5 VPM server software requirements

Common server software requirements

Java Runtime Environment V1.5.0 (5.0) is required.

• Sun Solaris










• AIX


http://www.hp.com/go/java/• Windows


Database Management System (DBMS) requirements

ENOVIA VPLM data persistency is independent of a specific implementation. It supports:

• ENOVIA V5 VPM requirement on DB2

When running on Windows, IBM AIX 5.3, HP-UX 11i, or Sun Solaris 10, IBM DB2 UDB ClientVersion DB2 V9.1 Fix Pack 4.

• ENOVIA VPM requirement on ORACLE

ORACLE 10.2.0.2 client-connection modules are required when running on Windows, AIX,HP-UX, and SUN.

Contact the local IBM or ORACLE representative for planning and support information aboutDB2 or ORACLE.

Notes

• DB2 UDB Enterprise Edition V9.1 Fix Pack 4 is shipped with ENOVIA V5 VPM V5.19.

• Further DB2 or Oracle fixpack requirements, if any, will be documented in program directories.

• Contact the local IBM or Oracle representative for planning and support information aboutDB2 or Oracle.

ENOVIA VPM Lifecycle Navigator V5 32-bit on Windows XP Professional x64 edition




Platform-specific server software requirements

Information in this section describes requirements specific to each supported operating systemon ENOVIA V5 VPM servers.

Microsoft Windows

• Microsoft Windows Server 2003 Standard Edition, or Windows Server 2003 Enterprise Editionis required with Service Pack 1.

• Microsoft Windows -- Delivers an implementation of OpenGL libraries. These libraries may beupdated depending on the selected graphics adapter when installing the graphics adapter andassociated drivers.

• DirectX at minimum level 8.1 -- Required for correct operation of ENOVIA V5 VPM server in amulti-user environment. Available from


Also available with Windows XP Service Pack 1.

• A localized version of the operating system may be required when the selected localinstallation differs from Latin1.








AIX



• XL Fortran Enterprise Edition V9.1.0 for AIX Run-Time: November 2004 XL Fortran for AIXV9.1 Runtime PTF, available at


Additional support



• CDE, delivered with the operating system









WebSphere Application Server V6.1 and WebSphere Portal Server support or IBM IntelliStationP185 support requires AIX 5.3 TL04-SP1 with previously described recommendations

HP-UX



























– A localized version of the operating system may be required when the selected installationlocale differs from ISO code pages.

Note: V5 applications are not supported on HP 11iv2.

Sun Solaris

Sun Solaris 10 SPARC HW 03/05, including:

• C and C++ runtime environment -- Delivered with the operating system

• OpenGL runtime environment -- Delivered with the operating system

• CDE -- Delivered with the operating system

• 119280-06 CDE 1.6: Runtime library patch for Solaris 10 is required

Support of the XVR 600 graphic adapter requires OpenGL runtime environment at level 1.3.

Note: A localized version of the operating system may be required when the selected installationlocale differs from ISO-1.

Additional software requirements on the server side

The following components are required or optional on thin client (ENOVIA - VPM LifecycleNavigator) servers for all supported operating systems. It is also required for VPM Navigatorcustomers who implement ENOVIA - VPM Navigator Instant Collaboration.

WebSphere Application Server

• Implementing ENOVIA VPM Lifecycle Navigator requires WebSphere Application Server(Refer to ENOVIA VPM Lifecycle Program Directories for detailed information on ENOVIAVPM Lifecycle Navigator implementation).

Note: ENOVIA VPM Lifecycle Navigator products installed on the WebSphere ApplicationServer are supported on AIX, HP-UX, and Windows 2003 server.

• ENOVIA VPM Lifecycle application server and the Web Application Server may run ondifferent machines and are installed separately. This Web Application Server requires:

– IBM WebSphere Application Server Express, Base or Network Deployment V6.0.2 is therecommended level.

LDAP: In the case that ENOVIA VPM Lifecycle Navigator Web Application Server managesSingle Sign On, an LDAP directory server supported by the selected WebSphere ApplicationServer version is required in addition to the earlier described middleware requirements.

ORBIX: The ORBIX 3.0.1 product (supplied with ENOVIA VPM Lifecycle Navigator) is used andenables IIOP-based, CORBA-compliant communications on the server side.

Lotus Sametime: For customers deploying ENOVIA - VPM Navigator Instant Collaboration andENOVIA 3d com Instant Collaboration, Lotus Sametime Server V7.5.1 is required in addition tothe earlier described middleware requirements.

MQ: For customers deploying ENOVIA - Enterprise Process Management Web (E-PM) andENOVIA - Enterprise Process Definition Web (E-PD), the following MQ applications are requiredin addition to the earlier described middleware requirements:

• Message-oriented middleware: WebSphere MQ V6.0

• Workflow engine: WebSphere MQ Workflow V3.6



Additional ENOVIA V5 VPM requirements

Access to product information (ENOVIA V5 VPM)

Product documentation is delivered in HTML format. An HTML browser is required to access thisdocumentation. Product documentation may be installed and used only in an officially supportedoperating environment.

• On Windows, Microsoft Internet Explorer 6.0 or higher with Java plug-ins at level 1.5

• On UNIX, except Windows, Mozilla 1.7 with Java plug-ins at level 1.5 (the java level isavailable in the program directories)

Although access to product documentation might work on other HTML browsers, incidentsspecific to other browsers are not eligible for support.

In addition to a Java-enabled Web browser, a Java plug-in at level 1.4 is required on the clientside.

Note: Improvements in HTML searching and printing capabilities eliminate the need to duplicateproduct information in the Portable Document Format (PDF) format. PDF CDs are therefore nolonger included in the ENOVIA VPLM softcopy collection kit.

Prerequisites for the ENOVIA V5 VPM license management environment

• Nodelock license keys are not allowed with ENOVIA V5 VPM. IBM LUM is required to serveconcurrent license keys across a network. A LUM configuration file (i4ls.ini) is required onclients to access concurrent license keys from license servers.

Note: Concurrent offline licensing is not supported.




Documentation

Complete online documentation is available on CD. Totally Web-oriented using standard HTMLand graphics formats, online documentation is readily accessible using a standard Web browser.Navigation help includes the ability to do full text search.

Documentation is also available in PDF. Printing and browsing requires Adobe Acrobat ReaderV5.0, or later. To download, visit


License Management Model

ENOVIA V5 VPM delivers identical license management mechanisms in UNIX and Windowsenvironments, based on LUM and on the UNIX license management server, shareable acrossUNIX and Window clients. The following license management principles apply:

• A license key is required to use an ENOVIA V5 VPM configuration or product.

• License keys are acquired and released for the total configuration. The products within astandard or custom configuration cannot be broken up or shared outside of it.

• In all cases, license keys are acquired at the beginning of the process (login) and released atits termination (logout).

ENOVIA V5 VPM products and configurations are licensed on a concurrent usage basis.





ENOVIA VPLM General Licensing Principles

ENOVIA VPLM AOP and sharable products may require prerequisite products that are notincluded in a standard purchased configuration. When a prerequisite product is not includedin the selected standard configuration, both the AOP and its prerequisite products must bepurchased and included as AOPs within a custom configuration.

Prerequisites for shareable products can be satisfied by a standard configuration, by an AOPwithin a custom configuration, or by a shareable product.

Planning information

Direct customer support

Direct customer support is provided under a Product Lifecycle Management (PLM) enhancedsupport contract. This service for a fee enhances the customer's productivity by providing voiceand electronic access to the PLM Support Center. For eligible products, the PLM help desk cananswer questions pertaining to the installation, administration, use, and handling of suspectedsoftware defects.

For additional information about the enhanced support contract and other available PLM servicesofferings, visit the PLM Technical Support Web site

http://www.ibm.com/software/applications/plm/support/

Click on the "ECSR enhanced support details" link or contact the PLM marketing representativeor authorized IBM Business Partner for more information.

Packaging

ENOVIA VPLM packaging

Note: The ENOVIA VPLM API CDs are shipped with CAA RADE as LCD4-7422.

ENOVIA 3d com / ENOVIA DMU box kit (LK4T-0077)

• Four code CDs (in one cardboard CD holder) for ENOVIA 3d com (LCD4-4242) containing:

– AIX

– HP-UX

– Solaris

– Windows

• Eight code CDs (in one cardboard CD holder) for ENOVIA DMU (LCD4-4676) containing:

– AIX

– AIX 64-bit

– HP-UX (2 CDs)

– Solaris (2 CDs)

– Windows

– Windows 64-bit

• One Program Directory CD (LCD7-3619)

• One LUM Run Time V4.6.8 + patch 4.6.8.3 CD (LCD4-7882)

• English Documentation: 2 CDs (in a double jewel case; SK3T-5188)

– ENOVIA 3d com V5R19 English Documentation CD

– ENOVIA DMU V5R19 English Documentation CD

• Informal documents

– PLM Products Current User Memorandum (GI11-4403)

– PLM Products Software Registration Memorandum (GI11-4404)




The following are shipped outside the box kit:

• Licensed Program Specification (GI11-6293)

• Seven CDs (in a one portfolio CD holder) for ENOVIA MULTICAx products (LCD4-7456)

– AIX

– AIX 64-bit

– HP-UX

– Solaris

– Windows

– Windows 64-bit

– Program directory

ENOVIA V5 VPM box kit (LK4T-0078)

Each shipment of ENOVIA V5 VPM includes:

• Nine code CDs (in one cardboard CD holder) for ENOVIA V5 VPM (LCD4-7617) containing:

– AIX (2 CDs)

– AIX 64-bit

– HP-UX (2 CDs)

– Solaris (2 CDs)

– Windows

– Windows 64-bit

• One Program Directory CD (LCD7-3619)

• One LUM Run Time V4.6.8 + patch 4.6.8.3 CD (LCD4-7882)

• English Documentation: One CD (in a single jewel case; SK3T-7835)

– ENOVIA V5 VPM English Documentation CD

• Informal documents

– PLM Products Current User Memorandum (GI11-4403)

– PLM Products Software Registration Memorandum (GI11-4404)

The following are shipped outside the box kit:

• Licensed Program Specification (GI11-6293)

• DB2 V9.1 (base plus FP4) code CDs (LCD7-3621) - 1 DVD and 3 CDs in Univenture CDholder

ENOVIA VPLM national language packaging

Product integrated information (PII) is included on the code CDs at general availability. Softcopycollection kits of translated publications for each language are available after general availability.

Additional Softcopy Collection Kits can be ordered through the IBM representative or businesspartner using the following numbers:

Publication name Publication number

ENOVIA V5 (ENOVIA 3d com/ENOVIA DMU) Softcopy Collection Kit - French SK3T-0572 ENOVIA V5 (ENOVIA 3d com/ENOVIA DMU) Softcopy Collection Kit - German SK3T-0573 ENOVIA V5 (ENOVIA 3d com/ENOVIA DMU) Softcopy Collection Kit - Japanese SK3T-0574 ENOVIA V5 (ENOVIA 3d com only) Softcopy Collection Kit - Korean SK24-0017



ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - French SK3T-0617 ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - German SK3T-0616 ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - Japanese SK3T-0615 ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - Korean SK24-0016 ENOVIA CES Softcopy Collection Kit - French SK4T-3624

ENOVIA VPLM WLS V5 packaging

The ENOVIA VPLM WLS products are packaged so that all user companions for UNIX andWindows are under a single form number.

The ENOVIA WLS V5 User Companion for DMU (LCD4-7848) includes:

• User Companion for DMU for UNIX

• User Companion for DMU for Windows

The ENOVIA WLS V5 User Companion for VPM (LCD4-7849) includes:

• ENOVIA User Companion for VPM for UNIX

• ENOVIA User Companion for VPM for Windows

ENOVIA WLS V5 User Companion for V5 VPM (LCD4-7879) includes:

• ENOVIA User Companion for V5 VPM for UNIX

• ENOVIA User Companion for V5 VPM for Windows

In addition, all ENOVIA VPLM WLS V5 user companions include the following informaldocuments:

• PLM Products Current User's Memorandum (GI11-4403)

• PLM Products Software Registration Memorandum (GI11-4404)

• ENOVIA V5.19 LPS (GI11-6293)

National language versions (NLVs) of WLS products

National language versions of WLS products at the current release level will be available aftergeneral availability. The standard order process applies. The ENOVIA VPLM WLS NLV productsare packaged so that all user companions for UNIX and Windows are under a single formnumber:

User Companion for DMU for French (LCD4-7860) includes:


• User Companion for DMU for WINDOWS

User Companion for DMU for German (LCD4-7853) includes:



User Companion for DMU for Japanese (LCD4-7856) includes:





ENOVIA User Companion for VPM for French (LCD4-7859) includes:

• User Companion for VPM for WINDOWS

• User Companion for VPM for UNIX

ENOVIA V5 VPM WLS is available in English only. There will be no national languagedeliverables for ENOVIA V5 VPM WLS for V5.19.

Security, auditability, and control

The announced programs use the security and auditability features of the operating systemsoftware. The customer is responsible for evaluation, selection, and implementation of securityfeatures, administrative procedures, and appropriate controls in application systems andcommunication facilities.

Ordering information

Current licensees

Current licensees will receive this update from IBM Software Delivery and Fulfillmentautomatically.

Shipment of this release of ENOVIA VPLM is scheduled to be completed by October 17, 2008;shipment of this release of ENOVIA VPLM WLS V5 is scheduled to be completed by November7, 2008.

New licensees

Orders for new licenses can be placed now.

Unless a later date is specified, orders entered before the planned availability date will beassigned a schedule date of one week following availability.

Shipment will begin on the planned availability date.

Release summary

There are no new products being announced this release.

Withdrawals

Effective September 23, 2008, the following product is withdrawn from marketing.

Program number Program name 5671-SAH ENOVIA - PPR Hub SA Adapter Product

Product ordering

The ShopPLM configurator must be used to submit all PLM CBS orders. For information on theShopPLM configurator, visit

https://steamboat.boulder.ibm.com/webapp/shopplm/landing.wss

System program order (5628-EP5)

To ship machine-readable materials and publications and to register for future updates, onesystem program order (5628-EP5) must be placed in addition to the basic license orders.

Within the system program order, specify the orderable supply ID of the products you areordering, based on the following tables:

https://steamboat.boulder.ibm.com/webapp/shopplm/landing.wss



5628-EP5 SPO Orderable DistributionSupply ID Language Medium Description S0137FG English CD-ROM ENOVIA V5 3d com CAD View Cf (5671-C3V) S0137FH English CD-ROM ENOVIA V5 3d com Navigatr Cf (5671-N3G)S0137FJ English CD-ROM ENOVIA V5 3dcom VPM WebCl Cf (5671-V3C)S0137FN English CD-ROM ENOVIA V5 DMU Digit Synth Cf (5671-DPS)S0137FT English CD-ROM ENOVIA V5 DMU Human Sim 2 Cf (5671-DH2)S0137FP English CD-ROM ENOVIA V5 DMU Immer Rev 3 Cf (5671-DM3)S0137FR English CD-ROM ENOVIA V5 DMU Review 1 Cf (5671-DM1)S0137FD English CD-ROM ENOVIA V5 DMU Review 2 Cf (5671-DM2)S0137FS English CD-ROM ENOVIA V5 DMU Viewer 1 Cf (5671-DV1)S0156K2 English CD-ROM ENOVIA V5 MultiPDM OP Pr (5671-OGL)S0137FV English CD-ROM MULTICAx - AD Plug-In Pr (5671-DAL)S013T6T English CD-ROM MULTICAx - ID Plug-In Pr (5671-IDL)S0137G3 English CD-ROM MULTICAx - IGES Plug-In Pr (5671-DGL)S0137G1 English CD-ROM MULTICAx - PD Plug-In Pr (5671-PDL)S0137FW English CD-ROM MULTICAx - SE Plug-In Pr (5671-DEL)S0137FX English CD-ROM MULTICAx - SolidWrks Plug Pr (5671-DSL)S0137G0 English CD-ROM MULTICAx - STEP Plug-In Pr (5671-DTL)S0137G2 English CD-ROM MultiCAx - UD Plug-In Pr (5671-UDL)

System program order (5628-EL5)

To ship machine-readable materials and publications and to register for future updates, onesystem program order (5628-EL5) must be placed in addition to the basic license orders.


5628-EL5 SPO Orderable DistributionSupply ID Language Medium Description S013JSG English CD-ROM ENOVIA - Sys&User Adm WEB Cf (5671-SUA)S013JSC English CD-ROM ENOVIA -Ent Proc Mgmt WEB Cf (5671-LCP)S013JSD English CD-ROM ENOVIA -VPM Lfcy Mgmt WEB Cf (5671-LCM)S013JSF English CD-ROM ENOVIA -VPM Lifecycle Rev Cf (5671-LCR)S013JSB English CD-ROM ENOVIA V5 Casual User Cf (5671-CUR)S013JSH English CD-ROM ENOVIA V5 Profession User Cf (5671-MGR)S013JSJ English CD-ROM ENOVIA V5 Security Admin Cf (5671-ADR)S013JSK English CD-ROM ENOVIA V5 Sys & Data Adm Cf (5671-RVR)S013JSL English CD-ROM ENOVIA V5 Vault Aministra Cf (5671-VAR)S013JSM English CD-ROM ENOVIA V5 VPM DMU Review Cf (5671-VDM)S013JSN English CD-ROM ENOVIA V5 VPM Engineer Cf (5671-VER)S013JSP English CD-ROM ENOVIA V5 VPM Product Dsg Cf (5671-DER)S013JSR English CD-ROM MULTICAx - PD Plug-In Pr (5671-PDL)



System program order (5628-CS5)

To ship machine-readable materials and publications and to register for future updates, onesystem program order (5628-CS5) must be placed in addition to the basic license orders.


5628-CS5 SPO Orderable Distribution Supply ID Language Medium Description S014PXT English CD-ROM ENO CES Component Intro Mgmt (5672-SCI)S014PXZ English CD-ROM ENO CES Component Reuse (5672-SLR)S014PZ1 English CD-ROM ENO CES Component Sourcing (5672-SSG)S014PXV English CD-ROM ENO CES Engineering Cat.Nav. (5672-SEC)S014PZ0 English CD-ROM ENO CES Engine. Comp. Reuse (5672-SRU)S014PXS English CD-ROM ENO CES Ent. Catalog Admin. (5672-SCA)S014PXW English CD-ROM ENO CES Ent. Catalog Mgmt. (5672-SCG)S014PXX English CD-ROM ENO CES Ent. Catalog Nav. (5672-SLC)

Customization options

Contact IBM Customer Support Operations (CSO) for any special handling, such as suppressionof media or expediting an order.

One English softcopy collection kit is included in each base shipment.

Customers of record can order one additional copy.

Note: Additional kits can be purchased through the IBM Publication Ordering System at:

http://www.ibm.com/shop/publications/order

Use the following order numbers:

OrderDescription number ENOVIA V5 (ENOVIA 3d com/ENOVIA DMU) Softcopy Collection Kit - English SK3T-5188 ENOVIA V5 (ENOVIA V5 VPM) Softcopy Collection Kit - English SK3T-7835 ENOVIA CES Softcopy Collection Kit - English SK4T-3623

Licensed documentation

Subsequent updates (technical newsletters or revisions between releases) to the publicationsshipped with the product will be distributed to the user of record for as long as a license for thissoftware remains in effect. A separate publication order or subscription is not needed.

Terms and conditions

Agreement

IBM Customer Agreement

Designated machine

Not Required

http://www.ibm.com/shop/publications/order



Variable charges apply

No

Location license applies

No

Use limitation applies

Yes, as implemented by the license management model described.

ENOVIA VPLM license management model

ENOVIA VPLM controls the number of concurrent users of a ENOVIA VPLM configuration orproduct, according to the number of license keys acquired for the configuration or product.

ENOVIA VPLM delivers identical license management mechanisms on UNIX and Windowsenvironments, based on IBM LUM. The following license management principles apply:

• An ENOVIA VPLM configuration (standard or custom) will require a license key. License keysfor ENOVIA VPLM configurations are acquired and released for the total configuration. Theproducts within a configuration cannot be shared.

• Each ENOVIA VPLM shareable product will require a license key, in addition to one for theprerequisite configuration and any prerequisite product, if applicable.

• In all cases, ENOVIA VPLM configuration license keys are acquired at the beginning of theprocess and are released at its termination.

• ENOVIA VPLM AOP and shareable products may require license keys for prerequisiteproducts that are not already included in a standard configuration. Prerequisites forshareable products can be satisfied by a standard configuration, by an AOP within a customconfiguration, or by a shareable product. However, because all AOPs are defined withinone custom license key, any AOP prerequisites must be satisfied by either a standardconfiguration or by other AOPs purchased and defined within the same custom configuration.

Additional licenses, features, or authorizations, as appropriate must be obtained to extend uselevels.

Additional licenses or features, as appropriate, must be obtained to exceed usage limits.

ENOVIA 3d com products and ENOVIA PPR Hub MultiPDM plug-ins licensing

All ENOVIA VPLM products are concurrent-user licensed in a manner similar to license usein CATIA V5. The license keys of ENOVIA 3d com configurations and shareable products areinstalled on the server and can be accessed by thin clients (no code is installed on clients). Alicense for one user gives one connection line. Any offline user is required to have a ENOVIA 3dcom license access with which code can be downloaded. Code should not be duplicated from aprevious download.

When accessing other systems via ENOVIA 3d com products, you need to have a licenseor required authorization on that system. For example, to work with data in ENOVIA VPLMENOVIAVPM, ENOVIAPM, or Optegra, a license for the corresponding user role within thosesystems is needed. The ENOVIA 3D com Navigator and CAD Viewing configurations can havean optional corequisite loaded on the server for CAD access.

For CATIA V5, the required CAD server is included and installed by default. When used inconjunction with CATIA V4, you need to install CATIA COM license keys on the server. Onelicense of CATIA V4 COM authorizes 10 simultaneous connections.

The ENOVIA 3d com Space Analysis product has an optional corequisite of the correspondingCATIA Space Product (5671-SPA) for CATIA V4 (with the same 10:1 ratio of users per license).

Note: If data such as CAD models are to be loaded into the authoring system such as CATIAV5, the corresponding product configuration and license must be available.

The ENOVIA 3d com Web Search (part of the ENOVIA PPR Navigator product) function canbe installed on CPUs other than the server to which an authorized user connects. The user



task uses the search function to go through its ENOVIA 3d com Web Browser for the correctconnection. Because of this capability, the search function is restricted to users defined on theENOVIA 3d com server. This restriction applies even if the search component is physicallyinstalled on a CPU other than ENOVIA 3d com Navigator server.

ENOVIA DMU products licensing principles

ENOVIA DMU Navigator Configuration licenses continue as already announced and in usewithin the ENOVIA VPLM Portfolio. Working under the CATIA V5 concurrent-user licensingscheme, ENOVIA DMU products use the same methods. This provides a consistent userseat designation across both CATIA V5 and ENOVIA VPLM. ENOVIA DMU products such asKinematic Simulation or DMU Optimizer, licensed as shareable in CATIA V5, now also work andcan be shared within the ENOVIA DMU environment.

ENOVIA PPR Hub MultiCAx plug-in licensing principles

All MultiCAx Plug-ins are licensed as concurrent-user shareable products available to ENOVIA3d com, CAD Viewing, and ENOVIA DMU users. Specifying a MultiCAx license in the profileenables the workstation to use the MultiCAx capabilities within any simultaneous sessions on thesame workstation (of ENOVIA 3d com Products, CAD Viewing, or ENOVIA DMU Products).

ENOVIA VPLM general licensing principles

ENOVIA VPLM AOP and sharable products may require prerequisite products that are notincluded in a standard purchased configuration. When a prerequisite product is not includedin the selected standard configuration, both the AOP and its prerequisite products must bepurchased and included as AOPs within a custom configuration. Prerequisites for shareableproducts can be satisfied by a standard configuration, by an AOP within a custom configuration,or by a shareable product.

Use of DB2 UDB components

ENOVIA V5 VPM V5.19 and ENOVIAVPM V1.6 are shipped with the DB2 Universal Database™(DB2 UDB) program. (ENOVIA V5 VPM ships DB2; ENOVIA 3d com and ENOVIA DMU donot ship DB2.) You are authorized to use this DB2 UDB only in conjunction with and in supportof the solution (as defined below), and are authorized to install and use this DB2 UDB onlyin association with your licensed use of the ENOVIA VPLM products for the storage andmanagement of data used or generated by the solution and not for any other data managementpurposes. Only inbound and outbound data transactions in which the solution directly eithercreates, reads, updates or deletes data are permitted.

Examples of uses not permitted include (i) inbound connections to the database from otherapplications for queries or report generation, or (ii) outbound database connections in which thesolution provides no added value to the data transaction.

The solution and DB2 UDB can be installed on either the same server or separate servers. In thecase where DB2 UDB is installed on a separate server, the access point to the DB2 UDB servermust be solely through the Solution server.

• SmarTeam -- Development Suite, a component of the IBM program product SmarTeam --Development Suite Configuration (5691-SDV)

• All CAA RADE products and APIs

• SmarTeam -- Development Suite, a component of the IBM program product SmarTeam --Development Suite Configuration (5671-SDV)

• All CAA RADE products and APIs

Educational allowance available

No.



Volume orders

Contact your IBM representative.

Warranty applies

Yes

Licensed program materials availability

Restricted Materials of IBM: None Non-Restricted Source Materials: None Object Code Only (OCO): All

Program services

Program Services offer a method of reporting code-related problems for ENOVIA VPLM andWLS licensed software products. Program Services are available electronically using theproblem submission process at the PLM Technical Support Web site at:


Note: In order to use this facility, you must use an IBM ID which has associated to it thelicensed IBM customer number under which the product was purchased. If you have not yetobtained an IBM ID, visit

http://www.ibm.com/account/profile/

If you have not yet associated the licensed IBM customer number to your IBM ID, you will beprompted to do so when accessing the problem submission facility.

When using Program Services, the problem report is submitted via the PLM Technical SupportWeb site; all subsequent communications will be via email. The response time for these problemreports, regardless of the severity, will be within two business days. All communications must bein English.

Not all options of the Product Lifecycle Management (PLM) technical support e-services areavailable in all countries.

If the problem reported is not determined to be a code-related problem, the customer will beinformed that work will continue on it provided the customer has ECSR (Electronic CustomerSupport Representative) enhanced support (reference PRPQ 5799-C88) with the ENOVIA VPLMsupport feature. Enhanced support for WLS is included in the base product's feature code; noseparate enhanced support is required.

For additional information about the enhanced support contract and other available PLM servicesofferings visit


Click on the "ECSR enhanced support details" link or contact your PLM marketing representativeor authorized IBM Business Partner for more information.

Preventive Service is delivered through the next release of ENOVIA VPLM products. The newrelease also includes corrections to problems, depending on the time of their submission andtheir severity.

During the Program Services period, Corrective Service for ENOVIA VPLM releases is deliveredthrough service packs on a regular basis. A service pack includes corrections for BlockingProblems in production systems reported on this release and all corrections available for allcomponents at the time it is built. Service packs are provided at the same time for all platformscurrently supported. Each service pack supersedes the previous one and may be installed ontop of the released level or on top of a previous service pack. (The exception is WLS products,where Corrective Service is provided in the next release of the product. No maintenance for WLSproducts is provided in the service packs.)


http://www.ibm.com/account/profile/




Customers may request a correction via a service pack for Blocking Problems. A BlockingProblem is defined as:

• A problem that stops production: The customer is currently using the level for which a fix isrequested in a production environment.

• A problem that prevents migration: The customer must provide the migration plan.

• A problem that halts testing of a given level: A fix will allow customer to continue the testing.

• Installation problem: A problem that prevents the customer from installing or using the product.

• Regression: Problems reported as regressions may be due to an operation that was beingperformed erroneously or created incorrect data with a previous release and the currentrelease no longer permits these operations. Therefore, each problem reported as a regressionmust be evaluated. True regressions will be handled as Severity 1 problems.

Note: Customers experiencing problems with DB2 UDB V9.1 delivered with the ENOVIA V5VPM product may report these problems through PLM product support, as long as DB2 UDB isbeing used in conjunction with ENOVIA V5 VPM and the DB2 and ENOVIA V5 VPM productsare still within their respective support periods. Customers will receive the same level of supportas they are entitled to for their ENOVIA VPLM products.

Customers experiencing problems with IBM License Use Management (LUM) products whenused with ENOVIA VPLM products may report these problems through PLM product support.Note this only applies when the LUM product is being used in conjunction with an ENOVIAVPLM product and the ENOVIA VPLM product is within its support period. LUM products arenot included in the enhanced support offering; LUM problems will receive the Program Serviceslevel of support and must be submitted via the Problem Reporting process at the PLM TechnicalSupport Web site at


Program Services will be provided for this release of ENOVIA VPLM and WLS products (V5.19)until June 3, 2011. After that date, should it be necessary for customers who are up-to-date ontheir Annual License Charge (ALC) payments to extend support, a support extension will beavailable for an additional fee.

This extension is for one year only, with no possibility of renewal, and will be limited to supportof critical situations found in production running on an announced, supported environment andsubject to the availability and maintainability of Operating Systems, databases, middlewareand hardware (clients and servers) at the time the critical situation is reported. Critical situationmeans a Severity 1 defect that is blocking production and has no workable alternative to unblockproduction.

In order to insure uninterrupted support, support extension requests should be submitted byDecember 3, 2010 through the customer's marketing team or Business Partner.

This extension of support will not constitute an alternative to the customer's migration to thelatest release or version of the installed products and therefore the customer is obligated to havea documented and viable migration plan to the latest release or version in order to obtain anextension of support.

The ENOVIA User Companion for VPM 1.6 Configuration (WLS) will follow the support termsand conditions as announced for ENOVIAVPM V1.6. For the ENOVIAVPM V1.6 support period,refer to Software Announcement 206-199, dated September 5, 2006.

For a list of all currently supported releases of CATIA, ENOVIA VPLM and ENOVIA SmarTeamproducts visit


At the bottom of the page, select "End of support dates" under Plan, Product life cycle.

IBM operational support services - SupportLine

No






Other support

PLM Support Centers

Prices

For prices, contact your IBM representative.

Use level charge: Charges for this program are based on usage levels. When a customerupgrades to a higher level of usage, a usage upgrade charge will apply, equal to the differencebetween the charge for the current level of usage and the higher level of usage.

Trademarks

Microsoft, Windows and Windows NT are registered trademarks of Microsoft Corporation in theUnited States, other countries, or both.

SmoothStart, Perform, eServer and DB2 Universal Database are trademarks of IBM Corporationin the United States, other countries, or both.

AIX, DB2, Learning Solutions, IBM, PowerPC, RS/6000, WebSphere, IntelliStation, Current,Sametime and Lotus are registered trademarks of IBM Corporation in the United States, othercountries, or both.

UNIX is a registered trademark of The Open Group in the United States and other countries.

Java and all Java-based trademarks are trademarks of Sun Microsystems, Inc. in the UnitedStates, other countries, or both.

Intel, Pentium and Xeon are registered trademarks of Intel Corporation or its subsidiaries in theUnited States and other countries.

Adobe and PostScript are registered trademarks of Adobe Systems Incorporated in the UnitedStates, and/or other countries.

Other company, product, and service names may be trademarks or service marks of others.

Terms of use

IBM products and services which are announced and available in your country can be orderedunder the applicable standard agreements, terms, conditions, and prices in effect at the time.IBM reserves the right to modify or withdraw this announcement at any time without notice. Thisannouncement is provided for your information only. Additional terms of use are located at:

http://www.ibm.com/legal/us/en/

For the most current information regarding IBM products, consult your IBM representative orreseller, or visit the IBM worldwide contacts page

http://www.ibm.com/planetwide/us/

http://www.ibm.com/legal/us/en/

http://www.ibm.com/planetwide/us/