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    High-efciency plasma surface modication of graphite-encapsulated magnetic nanoparticles

    using a pulsed particle explosion technique

    Teguh Endah Saraswati1,2, Shun Tsumura3, and Masaaki Nagatsu1

    1Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan2Department of Chemistry, Faculty of Mathematics and Natural Sciences, Sebelas Maret University, Surakarta 57126, Indonesia3Graduate School of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan

    Received July 17, 2013; accepted September 22, 2013; published online December 30, 2013

    A high-efciency surface modication of graphite-encapsulated iron compounds magnetic nanoparticles using an inductively coupled radio-

    frequency plasma with a pulsed particle explosion technique was studied. A signicant increase in N 1s peak intensity in the X-ray photoelectron

    spectroscopy spectra was obtained by applying a negative pulsed bias voltage of %1 kV to the substrate stage for 15 s or less at a repetition

    frequency of 1 kHz and a duty ratio of 50% in ammonia plasma. The intensity of the N 1s peak and the N/C ratio of the nanoparticles treated in a

    pulsed particle explosion system were 34 times higher than those of the particles treated without bias. The amino group population of

    nanoparticles treated using the present technique was determined to be about 8.2 ' 104 molecules per nanoparticle, roughly four times higher than

    that of particles treated without bias. The dispersion of the plasma-treated nanoparticles was signicantly improved compared with those of the

    untreated and treated particles in the nonbiasing system. The surface structure analysis by transmission electron microscopy showed no

    signicant damage on the structure or morphology of the treated nanoparticles, indicating that the present technique is applicable to the high-

    efciency surface modication of magnetic nanoparticles. 2014 The Japan Society of Applied Physics

    1. Introduction

    Recently, carbon-coated magnetic nanoparticles have at-

    tracted considerable interest in materials science research.

    The incorporation of both metallic nanoparticles and carbon

    in a stable coreshell system improves their advantageous

    properties, which make them potentially applicable in various

    applications such as magnetic data storage, magnetic uid,

    magnetic inks,1) catalyst support,2) magnetic separation,

    electrode, additives for many uses (i.e., as sintering agents

    and propellants), conductive paste, conductive coating, and

    biotechnological and biomedical applications.310)

    Bare metallic nanoparticles have high reactivity and high

    toxicity, which are limitations for realizing their practical

    applications, such as instability under oxidation and degra-

    dation conditions (i.e., in acids). The other disadvantages are

    their easy agglomeration and unsupported-surface structure

    for providing functional group attachment for absorbing

    appropriate molecules. Consequently, coating bare metal-

    magnetic nanoparticles with a protective shell is an

    appropriate technique to overcome those limitations.

    Compared with polymers and silica, carbon with the

    graphite structure is a promising coating material for bio-

    applications because of its high stability at high temperatureand pressure, and in various chemical and physical environ-

    ments (i.e., acid or base media). Moreover, the graphite shell

    allows for further functionalization with specic functional

    groups and biomolecules. Unfortunately, graphite-encapsu-

    lated magnetic nanoparticles conventionally prepared by

    the arc-discharge method, generally disperse only in organic

    solvents. This phenomenon makes them unsuitable for

    bioapplications. To enhance nanoparticle biocompatibility,

    surface modication processing has become a necessary

    procedure before nanoparticles nd practical applications.

    One of the efcient methods of surface modication

    is plasma treatment, which has been commonly used for

    many industrial applications. Plasma surface modication is

    environmentally friendly with a short reaction time, and

    provides various functional groups.11) Plasma processing can

    markedly increase production if the system is optimized.

    Recently, the plasma processing of magnetic materials has

    drawn much attention with regard to nanoparticle surface

    treatment for medical uses, such as drug delivery systems or

    magnetic resonance imaging systems. There have been several

    plasma reactor systems already developed for particle treat-

    ment, such as the bell jar reactor,12,13) downstream reactor,14)

    rotary drum reactor,15) plasma uidized bed reactor,1618)

    circulating bed reactor,19,20) plasma batch reactor,21) plasma

    downer reactor,22) and plasma reactor with a mechanical

    vibrator such as an electromagnet12) or a stirrer.13)

    The purpose of these plasma systems is to interface

    particles with plasma species. An efcient interaction

    between the particle surface and the plasma is the key to

    achieve the maximum surface modication. Early attempts to

    improve the dispersion of pigment particles were carried out

    using plasma techniques.23,24) In the case of polymer webs,

    the entire surface is exposed to plasma using conventional

    drum- or batch-type plasma reactors.25) However, such

    plasma reactors are often unsuitable for particle materials

    owing to the lack of solid mixing.26)

    As described in our previous paper,27) we successfully

    modied graphite-encapsulated iron compound magnetic

    nanoparticles deposited on a silicon substrate with amino

    groups using Ar and NH3 plasmas in successive stages. Totreat the particles homogeneously, they should be placed on

    the sample stage such that they are dispersed as widely as

    possible. When the placement of the particle sample is not

    performed well, the uniform treatment of the entire bulk of

    particles is difcult to achieve because the modication will

    likely take place only on the top layers of the sample, that is,

    particles inside the bulk will be less exposed to the plasma

    than particles at the surface of the bulk.

    To enhance the interaction between the particles and the

    plasma, a modied setup is required. We consider that the

    particle explosion technique enables an enhanced surface

    interaction between the particle samples and the plasma

    species. Therefore, in the present study, we developed a

    plasma reactor for particle treatment to explode the particles

    inside the chamber by a negative pulsed biasing of the sample

    stage during the plasma processing.

    Japanese Journal of Applied Physics 53, 010205 (2014)

    http://dx.doi.org/10.7567/JJAP.53.010205

    SELECTED TOPICS IN APPLIED PHYSICS

    Interactions between Plasmas and Nano-Interfaces

    010205-1 2014 The Japan Society of Applied Physics

    http://dx.doi.org/10.7567/JJAP.53.010205http://dx.doi.org/10.7567/JJAP.53.010205http://dx.doi.org/10.7567/JJAP.53.010205
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    2. Experimental procedure

    2.1 Nanoparticle fabrication and plasma processing

    setup

    Graphite-encapsulated iron compound magnetic nanoparticles

    were prepared by the arc discharge method,28,29) which has

    already been described in previous papers.27,30) The character-

    istics of the magnetic nanoparticles, such as magnetic prop-

    erties or crystalline structures, have been described in a pre-

    vious paper.30) Following nanoparticle synthesis, the nano-

    particles are treated using a radio-frequency (RF) inductively

    coupled plasma device. A schematic view of the chamber is

    shown in Fig. 1. The stainless-steel chamber is 200 mm in

    both diameter and height. The water-cooling copper pipe

    helical antenna with a coil diameter of 100 mm and a pipe

    diameter of 20mm was wound around the quartz bell jar

    (110 mm in outer diameter and 260 mm in height) mounted on

    the stainless-steel chamber. The helical antenna was coupled

    to an RF power generator at 13.56 MHz via a matching

    network. The typical input RF power was about 80 W.

    The chamber used in this work was modied by adding themetal substrate for the sample stage inside the chamber. The

    metal substrate of 10 mm diameter was attached to the center

    of the glass dish placed at z= 2cm (see Fig. 1), where

    z= 0 is dened as the center of the helical antenna on its

    axial axis. To conne the nanoparticles exploded by applying

    bias, a glass tube with a diameter of 80 mm and a height of

    60 mm was placed on the glass dish.

    In the experiment, rstly, we put the particle sample (about

    5 mg) on the metal substrate. The chamber was evacuated to a

    base pressure of approximately 103 Pa. After the vacuum

    evacuation, NH3 gas was introduced into the chamber and

    kept at 50 Pa. During the plasma processing, the gate chamber

    was closed to prevent the nanoparticles from owing to the

    turbo pump system. The biasing conditions were as follows: a

    substrate pulse biasing of1 kV was applied at a repetition

    frequency of 1 kHz and a duty ratio of 50%. The negative

    pulsed bias voltage was turned on immediately after switching

    the plasma on. Generally, it will take time to match the input

    and reection powers before applying the pulsed bias to the

    substrate. The bias time tb was varied from 0 to 60 s. After

    biasing off, the plasma was kept turned on up to the desired

    plasma treatment time tp of 10min. The explosion of the

    particles by applying pulsed biasing was visually observed

    and recorded using a high-resolution digital camera (Nikon

    D90) at a capture speed of 24fps. The videos were then

    processed using the software VirtualDub to add the timestamp

    and obtain sequential images.

    2.2 X-ray photoelectron spectroscopy and transmission

    electron microscopy analysis

    Following the plasma treatment, the samples were further

    analyzed by X-ray photoelectron spectroscopy (XPS) per-

    formed using a Shimadzu ESCA-3400 with a Mg K X-ray

    source and high-resolution transmission electron microscopy

    (HR-TEM) performed using a JEM-2100F at an acceleration

    voltage of 200 kV.

    2.3 Estimation of amino group population

    The amino group population of the plasma-treated nano-

    particles was analyzed by the chemical derivatization method

    using sulfosuccinimidyl 6-[3A(2-pyridyldithio)-propion-

    amido] hexanoate (sulfo-LC-SPDP) according to the specic

    chemical procedure.3133) The modied nanoparticles

    (250 g) were suspended by bath sonication in 200 l of

    10 mM sulfo-LC-SPDP in phosphate buffer saline (PBS) and

    reacted for 30 min under light shielding conditions, repeating

    the ultrasonication every 5 min. The treated nanoparticles

    were washed three times with PBS through ultrasonication

    and centrifugation and collected magnetically. The centrifu-

    gation was performed for 5 min with a gravitational force of

    20,400g (14,000 rpm). The nanoparticles with sulfo-LC-

    SPDP complexes were then reacted with 300 l of 20 mM

    dithiothreitol (DTT) in PBS and reacted under light shielding

    Fig. 1. (Color online) Schematic view of experimental setup: (1) quartz bell jar, (2) sample stage, (3) copper coil connected to the water cooling system,(4) pressure gauge, (5) leaking valve, (6) gas inlet, (7) gas outlet connected to the turbo and rotary pump, and (8) biasing power supply. The black rectangle

    represents the timeline of experimental stages during plasma processing;tp and tb represent the total time for plasma treatment and the initial time for biasing,

    respectively.

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    conditions, repeating the ultrasonication every 5 min. After a

    15 min reaction, 5 min centrifugation at 20,400g (14000 rpm)

    was performed and the cleavage product pyridine-2-thione

    liberated from the sulfo-LC-SPDP present in the recovered

    supernatant liquid, was determined by spectrophotometry

    at 343 nm. The number of amino groups in 250 g of the

    modied nanoparticles was quantitatively determined from

    the calibration curve or by theoretical evaluation using theextinction coefcient of pyridine-2-thione at 343 nm: 8.08

    103 M1 cm1. The number of amino groups per nanoparticle

    was calculated when the number of nanoparticles per gram

    was 1.14 1014. This number was estimated by measuring

    the ratio of the mass of the nanoparticles to their volume

    under the assumption that the nanoparticles have a regular

    spherical shape mainly of 20 nm diameter determined from

    the nanoparticle size distribution taken by HR-TEM.27,30)

    2.4 Dispersion property

    The nanoparticle dispersion before and after the plasma

    treatment in both cases with and without the biasing systemwas also observed. The observation was performed by

    dispersing equal numbers of nanoparticles in the same

    volume of distilled water by ultrasonication for about 5 min.

    3. Results and discussion

    The present study was started by preparing nanoparticle

    samples by the arc discharge method. The TEM images and

    EDS proles of successfully fabricated nanoparticles are

    shown in Fig. 2. Using TEM, we conrmed that iron com-

    pound magnetic nanoparticles are clearly encapsulated by

    graphitic carbon. This result shows good agreement with the

    EDS proles of the selected particles that reveal at least three

    possible phases: particles that exhibit the presence of O, Fe,

    and C. The interplanar distances of the graphite lattice and

    iron fringes are about 0.34 and 0.202 nm, respectively.

    Following the nanoparticle fabrication, we placed nano-

    particle samples (about 5 mg) on the metal substrate of the

    sample holder located at the center of the glass dish. After

    applying a pulse bias with a voltage of1 kV, a frequency of

    1 kHz, and a duty ratio of 50%, the particles were exploded,

    as shown in the successive images in Fig.3. These sequential

    images were captured during the pulsed biasing. The rst

    image (left top) in Fig. 3shows the condition before starting

    the experiment (plasma OFF). The next image shows the

    situation just after turning the plasma on. Then, it generallytook time to produce a stable plasma. Until the time of

    turning the bias on, the sample particles are still in the metal

    stage. Plasma generation will be easily achieved if the

    matching is adjusted at the desired power beforehand. The

    shorter time interval for turning on the bias provides an

    effective interaction between the plasma and the particle

    sample because the lifetime of an NH2radical is short (a few

    microseconds).3436) The lifetime of these plasma species is

    important because we used the no-ow gas condition, that is,

    the chamber gate valve was closed during plasma treatment,

    maintaining a pressure at 50 Pa. The negative pulsed bias

    voltage was turned on about 11.4 s after turning on the

    plasma. At the biasing-on time, the particles started to

    explode and dropped back to the substrate stage after half

    a second. After a certain biasing time (called tb), the bias

    voltage was turned off, but the plasma treatment was con-

    tinued without biasing up to the desired treatment timetp

    . For

    clarity, red dashed lines are added in the pictures to show

    when and how the particles began to y and ended up.

    In Fig. 4, we summarized the phenomenon observed in

    Fig.3as the temporal behavior of the height changes of the

    (a) (b)

    Intensity

    (arb.unit) (d)(c)

    Fig. 2. (a) Low- and (b) high-magnication TEM images of the graphite-

    encapsulated iron compound nanoparticle successfully fabricated by arc

    discharge, (c) energy-dispersive X-ray spectra of the synthesized

    nanoparticles, and (d) magnied image showing the interplanar distance of

    graphite coating and iron core.

    Fig. 3. (Color online) Time-sequential images of particle-explosion event

    during biased-plasma processing.

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    exploding particles, attb= 15 s andtp= 3 min. The height ofthe exploding particles was measured as the highest position

    taken from each image frame. The inset gure shows a

    magnied view of the peak area. The letters shown in Fig. 4

    denote the main events. A and B represent the timer ON

    and plasma ON, which correspond to the rst (0.000 s) and

    second (0.417 s) images in Fig.3, respectively. C represents

    the time when the biasing was turned on, shown in the fourth

    image (11.791 s) in Fig.3. The gap between B and C

    indicates the time required for the impedance matching

    between the RF source and the plasma. The particles started

    to explode at C, reached their maximum height at D

    (12.125 s), and ended up at E (12.5 s). F represents the time

    when the bias was turned off after 15 s of having the bias

    turned on, and G represents the time when the plasma was

    switched off after 180 s (3 min).

    The explosion event is explained by the ion bombardment

    mechanism. After turning on the biasing, the pulsed negative

    high voltage caused a high electric eld in the sheath between

    the plasma and the substrate. The existence of a high electric

    eld caused the ions in the plasma to accelerate toward

    the substrate where the particles were placed. Because the

    particles were placed on the stage in powder form, once

    the powder was bombarded by plasma ions, the particles

    spontaneously popped out and exploded upwards in a very

    fast manner. This phenomenon is similar to a conventionalion sputtering event. The ion bombardment energy depends

    on the difference in potential between the plasma and the

    substrate (V= Vp Vsub) and is subsequently expressed as

    e(Vp Vsub). In this study, if the estimated plasma potential

    Vpis more or less on the order of 10 V, the ion bombardment

    energy when biasing is turned on is approximately 1 keV,

    estimated from a biasing voltage of1 kV. This proposed

    mechanism also enables agglomerated nanoparticles to

    separate into ne particles during the explosion process. By

    using a small (diameter 10 mm) metal substrate with a high

    negative voltage, the particles explode and do not return back

    to the substrate but fall on the glass dish area surrounding the

    metal substrate owing to gravitational force. The dynamic

    behavior of the particles and the forces acting on them under

    biasing have been discussed in several papers,3741) which are

    beyond the scope of our present paper.

    After the plasma treatment, the treated particles were

    characterized by XPS. Figure5 shows the data set of the

    N 1s peak of the XPS proles with various biasing times tbreferred to as the C F range (see Fig. 4). The observed

    N 1s peaks located at approximately 399.8 eV are considered

    as a signal of the nitrogen-containing group for the amino

    group, which was successfully grafted on the surface.Figure5 shows the N 1s spectra at different biasing times

    oftb= 0 (no biasing), 2, 15, 30, and 60 s, each of which was

    obtained for various plasma treatment times tp of up to

    30 min. Comparing the biasing system with the nonbiasing

    system (tb= 0 s), the intensity of the N 1s peak of the biasing

    system (tb= 2, 15, 30, and 60 s) is signicantly increased.

    For example, the intensity of the N 1s peak of the nano-

    particles treated in the biasing system (tb= 15s) is raised to

    about 34 times higher than those in the nonbiasing system

    (tb= 0 s) for short plasma treatment times tp of up to 3 min.

    This indicates that the plasma treatment with applied biasing

    had a signicant effect of increasing N 1s peak intensity.

    These increases in the N 1s peak intensity are supposed to be

    due to the enhancement of the efcient interaction between

    the particles and the plasma species, particularly nitrogen-

    containing species, during an explosion event.

    Fig. 4. (Color online) Explosion height vs plasma treatment time under

    experimental conditions oftb=15s; tp=3 min. A: timer ON. B: plasma

    ON. C: bias ON, explosion starts. D: maximum height of explosion event.

    E: explosion ends. F: bias OFF. G: plasma OFF.

    Intensity

    (arb.unit)

    Intensity

    (arb.un

    it)

    Fig. 5. (Color online) Comparison of N 1s XPS proles for various

    plasma-treatment times (tp=0, 1, 2, 3, 6, 8, 10, 15, and 30 min) and biasing

    times (tb=0, 2, 15, 30, and 60s).

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    to the treated nanoparticles under various (tb, tp) conditions

    of (0s, 3 min), (2s, 3 min), (15 s, 3 min), (30 s, 3 min),

    (60 s, 3 min), and (15 s, 30 min). All of the images conrm that

    no damage or destruction was induced in the nanoparticle

    structure after performing the plasma treatment in the

    nonbiasing or biasing system. The structure of the graphite

    layers was found to be stable under all the experimental

    conditions. Similarly to the graphite coating, the iron com-pound core also remained encapsulated inside the graphite

    layers even when the particles were subjected to long-term

    plasma treatment, as shown in Fig. 9(f ). This result indicates

    that the pulsed-biasing particle explosion technique per-

    formed in the present study is highly efcient in amino group

    functionalization. Furthermore, it is also suitable for surface

    modication, particularly for powder samples because of its

    ability to retain the structural stability of nanoparticles.

    4. Conclusions

    The surface of graphite-encapsulated iron compound mag-

    netic nanoparticles fabricated by arc discharge was success-fully modied by a pulsed particle explosion technique. This

    technique was performed by applying a high negative bias of

    1 kV to the substrate stage for 260 s at a repetition fre-

    quency of 1 kHz and a duty ratio of 50% in ammonia plasma

    generated using a radio frequency inductively coupled

    plasma device. The intensity of the N 1s peak in the XPS

    spectrum of the nanoparticles treated in the biasing system

    was three to four times higher than that treated in the

    nonbiasing system owing to the enhancement of the interac-

    tion between the nanoparticles and the plasma species. The

    present results also indicate the efcient enhancement of

    amino group modication by approximately fourfold from

    about 1.9 104 molecules/nanoparticle in the case of

    (tb= 0 s, tp= 3 min) to 8.2 104 molecules/nanoparticle

    in the case of (tb= 15s, tp= 3 min) by the negative pulsed

    biasing during the NH3 plasma processing. Moreover, the

    results also showed that the dispersion of the treated nano-

    particles in biasing system was improved compared with

    those of the untreated and treated samples in the nonbiasing

    system.

    In addition, analysis by HR-TEM showed no signicant

    damage on the nanoparticle structures, indicating that the

    present technique is suitable mainly for the surface mod-

    ication of particle samples owing to its high efciency in

    surface modication without causing any signicant changeor destruction of the structural and morphological properties.

    Acknowledgments

    This work was supported in part by a Grant-in-Aid for

    Scientic Research (No. 2110010) from the Japan Society for

    the Promotion of Science (JSPS). The authors would like to

    thank Associate Professor A. Ogino of Shizuoka University

    for technical assistance in the plasma chamber development

    and UVvis absorption spectroscopy measurement.

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    010205-7 2014 The Japan Society of Applied Physics

    http://dx.doi.org/10.1016/0921-5093(95)09930-1http://dx.doi.org/10.1016/0921-5093(95)09930-1http://dx.doi.org/10.1016/0921-5093(95)09930-1http://dx.doi.org/10.1021/am101077ahttp://dx.doi.org/10.1021/am101077ahttp://dx.doi.org/10.1021/am101077ahttp://dx.doi.org/10.1021/am101077ahttp://dx.doi.org/10.1007/s11095-008-9811-0http://dx.doi.org/10.1007/s11095-008-9811-0http://dx.doi.org/10.1007/s11095-008-9811-0http://dx.doi.org/10.1088/0022-3727/42/22/224001http://dx.doi.org/10.1088/0022-3727/42/22/224001http://dx.doi.org/10.1088/0022-3727/42/22/224001http://dx.doi.org/10.1088/0022-3727/42/22/224001http://dx.doi.org/10.1088/0022-3727/36/13/201http://dx.doi.org/10.1088/0022-3727/36/13/201http://dx.doi.org/10.1088/0022-3727/36/13/201http://dx.doi.org/10.1088/0022-3727/36/13/201http://dx.doi.org/10.1002/anie.200602866http://dx.doi.org/10.1002/anie.200602866http://dx.doi.org/10.1002/anie.200602866http://dx.doi.org/10.1002/anie.200602866http://dx.doi.org/10.1016/j.carbon.2008.05.027http://dx.doi.org/10.1016/j.carbon.2008.05.027http://dx.doi.org/10.1016/j.carbon.2008.05.027http://dx.doi.org/10.1016/j.carbon.2008.05.027http://dx.doi.org/10.1263/jbb.100.1http://dx.doi.org/10.1263/jbb.100.1http://dx.doi.org/10.1263/jbb.100.1http://dx.doi.org/10.1263/jbb.100.1http://dx.doi.org/10.1088/0022-3727/36/13/203http://dx.doi.org/10.1088/0022-3727/36/13/203http://dx.doi.org/10.1088/0022-3727/36/13/203http://dx.doi.org/10.1088/0022-3727/42/22/224003http://dx.doi.org/10.1088/0022-3727/42/22/224003http://dx.doi.org/10.1088/0022-3727/42/22/224003http://dx.doi.org/10.1063/1.3377007http://dx.doi.org/10.1063/1.3377007http://dx.doi.org/10.1063/1.3377007http://dx.doi.org/10.1063/1.3377007http://dx.doi.org/10.1016/S0016-2361(97)00111-7http://dx.doi.org/10.1016/S0016-2361(97)00111-7http://dx.doi.org/10.1016/S0016-2361(97)00111-7http://dx.doi.org/10.1016/S0008-6223(99)00209-2http://dx.doi.org/10.1016/S0008-6223(99)00209-2http://dx.doi.org/10.1016/S0008-6223(99)00209-2http://dx.doi.org/10.1016/S0008-6223(99)00209-2http://dx.doi.org/10.1590/S1516-14392004000100014http://dx.doi.org/10.1590/S1516-14392004000100014http://dx.doi.org/10.1590/S1516-14392004000100014http://dx.doi.org/10.1016/j.diamond.2003.10.061http://dx.doi.org/10.1016/j.diamond.2003.10.061http://dx.doi.org/10.1016/j.diamond.2003.10.061http://dx.doi.org/10.1016/j.diamond.2003.10.061http://dx.doi.org/10.1016/j.reactfunctpolym.2004.06.003http://dx.doi.org/10.1016/j.reactfunctpolym.2004.06.003http://dx.doi.org/10.1016/j.reactfunctpolym.2004.06.003http://dx.doi.org/10.1016/j.surfcoat.2005.02.184http://dx.doi.org/10.1016/j.surfcoat.2005.02.184http://dx.doi.org/10.1016/j.surfcoat.2005.02.184http://dx.doi.org/10.1002/ppap.200400029http://dx.doi.org/10.1002/ppap.200400029http://dx.doi.org/10.1002/ppap.200400029http://dx.doi.org/10.1002/ppap.200400029http://dx.doi.org/10.1007/s002890170012http://dx.doi.org/10.1007/s002890170012http://dx.doi.org/10.1007/s002890170012http://dx.doi.org/10.1007/s002890170012http://dx.doi.org/10.1252/jcej.37.166http://dx.doi.org/10.1252/jcej.37.166http://dx.doi.org/10.1252/jcej.37.166http://dx.doi.org/10.1007/BF02699309http://dx.doi.org/10.1007/BF02699309http://dx.doi.org/10.1007/BF02699309http://dx.doi.org/10.1007/BF02699309http://dx.doi.org/10.1016/j.apsusc.2005.02.099http://dx.doi.org/10.1016/j.apsusc.2005.02.099http://dx.doi.org/10.1016/j.apsusc.2005.02.099http://dx.doi.org/10.1016/j.apsusc.2005.02.099http://dx.doi.org/10.1246/cl.1986.675http://dx.doi.org/10.1246/cl.1986.675http://dx.doi.org/10.1246/cl.1986.675http://dx.doi.org/10.1351/pac199668051047http://dx.doi.org/10.1351/pac199668051047http://dx.doi.org/10.1351/pac199668051047http://dx.doi.org/10.1016/j.diamond.2011.01.027http://dx.doi.org/10.1016/j.diamond.2011.01.027http://dx.doi.org/10.1016/j.diamond.2011.01.027http://dx.doi.org/10.1016/j.diamond.2011.01.027http://dx.doi.org/10.1016/j.carbon.2006.06.005http://dx.doi.org/10.1016/j.carbon.2006.06.005http://dx.doi.org/10.1016/j.carbon.2006.06.005http://dx.doi.org/10.1016/0009-2614(93)89341-Ehttp://dx.doi.org/10.1016/0009-2614(93)89341-Ehttp://dx.doi.org/10.1016/0009-2614(93)89341-Ehttp://dx.doi.org/10.1016/j.carbon.2011.10.044http://dx.doi.org/10.1016/j.carbon.2011.10.044http://dx.doi.org/10.1016/j.carbon.2011.10.044http://dx.doi.org/10.1016/S0168-1656(02)00342-5http://dx.doi.org/10.1016/S0168-1656(02)00342-5http://dx.doi.org/10.1016/S0168-1656(02)00342-5http://dx.doi.org/10.1088/0256-307X/18/7/331http://dx.doi.org/10.1088/0256-307X/18/7/331http://dx.doi.org/10.1088/0256-307X/18/7/331http://dx.doi.org/10.1002/ppap.200400011http://dx.doi.org/10.1002/ppap.200400011http://dx.doi.org/10.1002/ppap.200400011http://dx.doi.org/10.1002/ppap.200400051http://dx.doi.org/10.1002/ppap.200400051http://dx.doi.org/10.1002/ppap.200400051http://dx.doi.org/10.1143/JJAP.44.4871http://dx.doi.org/10.1143/JJAP.44.4871http://dx.doi.org/10.1143/JJAP.44.4871http://dx.doi.org/10.1088/0963-0252/13/3/005http://dx.doi.org/10.1088/0963-0252/13/3/005http://dx.doi.org/10.1088/0963-0252/13/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  • 8/13/2019 surface modification by plasma

    8/8

    Teguh Endah Saraswati is currently a Lecturer and

    Researcher in Chemistry Department, Mathematics

    and Natural Sciences Faculty, Sebelas Maret Uni-

    versity, Indonesia. She received Master of Science

    degree in chemistry from Nagoya University in

    2009, which was supported by Panasonic Scholar-

    ship Program. In 2012, she completed the doctoral

    program, which was partly supported by Amano

    Foundation Scholarship. She obtained Ph. D degreeat Nanovision Technology Department, Graduate

    School of Science and Technology, Shizuoka University under the

    supervision of Prof. Masaaki Nagatsu. Her research interests are inorganic

    and materials chemistry, and surface modication by plasma processing.

    Shun Tsumurareceived the B.S. and M.S. degrees in electrical engineering

    from Shizuoka University in 2011 and 2013, respectively. During his

    bachelor and maste r cour ses, he engaged in the study of su rface modication

    of magnetic nanoparticles by using an RF excited inductively coupled

    plasma under the supervision of Prof. Masaaki Nagatsu.

    Masaaki Nagatsu received the B.S., M.S., and Dr.

    Eng. Degrees from Nagoya University in 1975,

    1979, and 1985, respectively. During 1975 to 1976,he worked for Hitachi Research Laboratory, Hitachi,

    Ltd. From 1982 to 2000, he was an assistant

    professor (19821989), lecturer (19901991), and

    associate professor (19912000) in the Department

    of Electrical Engineering of Nagoya University.

    During 19871989, he worked as a visiting

    researcher in University of California, Los Angeles.

    In 2001, he became a professor of Department of Engineering in Shizuoka

    University. He became a Director of Graduate School of Science and

    Technology, Research Division in 2006 and a Dean of Graduate School of

    Science and Technology of Shizuoka University since 2008. His research

    eld is the plasma production and surface modication of materials for bio-

    medical and environmental application.

    Jpn. J. Appl. Phys. 53, 010205 (2014) SELECTED TOPICS IN APPLIED PHYSICS

    010205-8 2014 The Japan Society of Applied Physics