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High-efciency plasma surface modication of graphite-encapsulated magnetic nanoparticles
using a pulsed particle explosion technique
Teguh Endah Saraswati1,2, Shun Tsumura3, and Masaaki Nagatsu1
1Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8561, Japan2Department of Chemistry, Faculty of Mathematics and Natural Sciences, Sebelas Maret University, Surakarta 57126, Indonesia3Graduate School of Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
Received July 17, 2013; accepted September 22, 2013; published online December 30, 2013
A high-efciency surface modication of graphite-encapsulated iron compounds magnetic nanoparticles using an inductively coupled radio-
frequency plasma with a pulsed particle explosion technique was studied. A signicant increase in N 1s peak intensity in the X-ray photoelectron
spectroscopy spectra was obtained by applying a negative pulsed bias voltage of %1 kV to the substrate stage for 15 s or less at a repetition
frequency of 1 kHz and a duty ratio of 50% in ammonia plasma. The intensity of the N 1s peak and the N/C ratio of the nanoparticles treated in a
pulsed particle explosion system were 34 times higher than those of the particles treated without bias. The amino group population of
nanoparticles treated using the present technique was determined to be about 8.2 ' 104 molecules per nanoparticle, roughly four times higher than
that of particles treated without bias. The dispersion of the plasma-treated nanoparticles was signicantly improved compared with those of the
untreated and treated particles in the nonbiasing system. The surface structure analysis by transmission electron microscopy showed no
signicant damage on the structure or morphology of the treated nanoparticles, indicating that the present technique is applicable to the high-
efciency surface modication of magnetic nanoparticles. 2014 The Japan Society of Applied Physics
1. Introduction
Recently, carbon-coated magnetic nanoparticles have at-
tracted considerable interest in materials science research.
The incorporation of both metallic nanoparticles and carbon
in a stable coreshell system improves their advantageous
properties, which make them potentially applicable in various
applications such as magnetic data storage, magnetic uid,
magnetic inks,1) catalyst support,2) magnetic separation,
electrode, additives for many uses (i.e., as sintering agents
and propellants), conductive paste, conductive coating, and
biotechnological and biomedical applications.310)
Bare metallic nanoparticles have high reactivity and high
toxicity, which are limitations for realizing their practical
applications, such as instability under oxidation and degra-
dation conditions (i.e., in acids). The other disadvantages are
their easy agglomeration and unsupported-surface structure
for providing functional group attachment for absorbing
appropriate molecules. Consequently, coating bare metal-
magnetic nanoparticles with a protective shell is an
appropriate technique to overcome those limitations.
Compared with polymers and silica, carbon with the
graphite structure is a promising coating material for bio-
applications because of its high stability at high temperatureand pressure, and in various chemical and physical environ-
ments (i.e., acid or base media). Moreover, the graphite shell
allows for further functionalization with specic functional
groups and biomolecules. Unfortunately, graphite-encapsu-
lated magnetic nanoparticles conventionally prepared by
the arc-discharge method, generally disperse only in organic
solvents. This phenomenon makes them unsuitable for
bioapplications. To enhance nanoparticle biocompatibility,
surface modication processing has become a necessary
procedure before nanoparticles nd practical applications.
One of the efcient methods of surface modication
is plasma treatment, which has been commonly used for
many industrial applications. Plasma surface modication is
environmentally friendly with a short reaction time, and
provides various functional groups.11) Plasma processing can
markedly increase production if the system is optimized.
Recently, the plasma processing of magnetic materials has
drawn much attention with regard to nanoparticle surface
treatment for medical uses, such as drug delivery systems or
magnetic resonance imaging systems. There have been several
plasma reactor systems already developed for particle treat-
ment, such as the bell jar reactor,12,13) downstream reactor,14)
rotary drum reactor,15) plasma uidized bed reactor,1618)
circulating bed reactor,19,20) plasma batch reactor,21) plasma
downer reactor,22) and plasma reactor with a mechanical
vibrator such as an electromagnet12) or a stirrer.13)
The purpose of these plasma systems is to interface
particles with plasma species. An efcient interaction
between the particle surface and the plasma is the key to
achieve the maximum surface modication. Early attempts to
improve the dispersion of pigment particles were carried out
using plasma techniques.23,24) In the case of polymer webs,
the entire surface is exposed to plasma using conventional
drum- or batch-type plasma reactors.25) However, such
plasma reactors are often unsuitable for particle materials
owing to the lack of solid mixing.26)
As described in our previous paper,27) we successfully
modied graphite-encapsulated iron compound magnetic
nanoparticles deposited on a silicon substrate with amino
groups using Ar and NH3 plasmas in successive stages. Totreat the particles homogeneously, they should be placed on
the sample stage such that they are dispersed as widely as
possible. When the placement of the particle sample is not
performed well, the uniform treatment of the entire bulk of
particles is difcult to achieve because the modication will
likely take place only on the top layers of the sample, that is,
particles inside the bulk will be less exposed to the plasma
than particles at the surface of the bulk.
To enhance the interaction between the particles and the
plasma, a modied setup is required. We consider that the
particle explosion technique enables an enhanced surface
interaction between the particle samples and the plasma
species. Therefore, in the present study, we developed a
plasma reactor for particle treatment to explode the particles
inside the chamber by a negative pulsed biasing of the sample
stage during the plasma processing.
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2. Experimental procedure
2.1 Nanoparticle fabrication and plasma processing
setup
Graphite-encapsulated iron compound magnetic nanoparticles
were prepared by the arc discharge method,28,29) which has
already been described in previous papers.27,30) The character-
istics of the magnetic nanoparticles, such as magnetic prop-
erties or crystalline structures, have been described in a pre-
vious paper.30) Following nanoparticle synthesis, the nano-
particles are treated using a radio-frequency (RF) inductively
coupled plasma device. A schematic view of the chamber is
shown in Fig. 1. The stainless-steel chamber is 200 mm in
both diameter and height. The water-cooling copper pipe
helical antenna with a coil diameter of 100 mm and a pipe
diameter of 20mm was wound around the quartz bell jar
(110 mm in outer diameter and 260 mm in height) mounted on
the stainless-steel chamber. The helical antenna was coupled
to an RF power generator at 13.56 MHz via a matching
network. The typical input RF power was about 80 W.
The chamber used in this work was modied by adding themetal substrate for the sample stage inside the chamber. The
metal substrate of 10 mm diameter was attached to the center
of the glass dish placed at z= 2cm (see Fig. 1), where
z= 0 is dened as the center of the helical antenna on its
axial axis. To conne the nanoparticles exploded by applying
bias, a glass tube with a diameter of 80 mm and a height of
60 mm was placed on the glass dish.
In the experiment, rstly, we put the particle sample (about
5 mg) on the metal substrate. The chamber was evacuated to a
base pressure of approximately 103 Pa. After the vacuum
evacuation, NH3 gas was introduced into the chamber and
kept at 50 Pa. During the plasma processing, the gate chamber
was closed to prevent the nanoparticles from owing to the
turbo pump system. The biasing conditions were as follows: a
substrate pulse biasing of1 kV was applied at a repetition
frequency of 1 kHz and a duty ratio of 50%. The negative
pulsed bias voltage was turned on immediately after switching
the plasma on. Generally, it will take time to match the input
and reection powers before applying the pulsed bias to the
substrate. The bias time tb was varied from 0 to 60 s. After
biasing off, the plasma was kept turned on up to the desired
plasma treatment time tp of 10min. The explosion of the
particles by applying pulsed biasing was visually observed
and recorded using a high-resolution digital camera (Nikon
D90) at a capture speed of 24fps. The videos were then
processed using the software VirtualDub to add the timestamp
and obtain sequential images.
2.2 X-ray photoelectron spectroscopy and transmission
electron microscopy analysis
Following the plasma treatment, the samples were further
analyzed by X-ray photoelectron spectroscopy (XPS) per-
formed using a Shimadzu ESCA-3400 with a Mg K X-ray
source and high-resolution transmission electron microscopy
(HR-TEM) performed using a JEM-2100F at an acceleration
voltage of 200 kV.
2.3 Estimation of amino group population
The amino group population of the plasma-treated nano-
particles was analyzed by the chemical derivatization method
using sulfosuccinimidyl 6-[3A(2-pyridyldithio)-propion-
amido] hexanoate (sulfo-LC-SPDP) according to the specic
chemical procedure.3133) The modied nanoparticles
(250 g) were suspended by bath sonication in 200 l of
10 mM sulfo-LC-SPDP in phosphate buffer saline (PBS) and
reacted for 30 min under light shielding conditions, repeating
the ultrasonication every 5 min. The treated nanoparticles
were washed three times with PBS through ultrasonication
and centrifugation and collected magnetically. The centrifu-
gation was performed for 5 min with a gravitational force of
20,400g (14,000 rpm). The nanoparticles with sulfo-LC-
SPDP complexes were then reacted with 300 l of 20 mM
dithiothreitol (DTT) in PBS and reacted under light shielding
Fig. 1. (Color online) Schematic view of experimental setup: (1) quartz bell jar, (2) sample stage, (3) copper coil connected to the water cooling system,(4) pressure gauge, (5) leaking valve, (6) gas inlet, (7) gas outlet connected to the turbo and rotary pump, and (8) biasing power supply. The black rectangle
represents the timeline of experimental stages during plasma processing;tp and tb represent the total time for plasma treatment and the initial time for biasing,
respectively.
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conditions, repeating the ultrasonication every 5 min. After a
15 min reaction, 5 min centrifugation at 20,400g (14000 rpm)
was performed and the cleavage product pyridine-2-thione
liberated from the sulfo-LC-SPDP present in the recovered
supernatant liquid, was determined by spectrophotometry
at 343 nm. The number of amino groups in 250 g of the
modied nanoparticles was quantitatively determined from
the calibration curve or by theoretical evaluation using theextinction coefcient of pyridine-2-thione at 343 nm: 8.08
103 M1 cm1. The number of amino groups per nanoparticle
was calculated when the number of nanoparticles per gram
was 1.14 1014. This number was estimated by measuring
the ratio of the mass of the nanoparticles to their volume
under the assumption that the nanoparticles have a regular
spherical shape mainly of 20 nm diameter determined from
the nanoparticle size distribution taken by HR-TEM.27,30)
2.4 Dispersion property
The nanoparticle dispersion before and after the plasma
treatment in both cases with and without the biasing systemwas also observed. The observation was performed by
dispersing equal numbers of nanoparticles in the same
volume of distilled water by ultrasonication for about 5 min.
3. Results and discussion
The present study was started by preparing nanoparticle
samples by the arc discharge method. The TEM images and
EDS proles of successfully fabricated nanoparticles are
shown in Fig. 2. Using TEM, we conrmed that iron com-
pound magnetic nanoparticles are clearly encapsulated by
graphitic carbon. This result shows good agreement with the
EDS proles of the selected particles that reveal at least three
possible phases: particles that exhibit the presence of O, Fe,
and C. The interplanar distances of the graphite lattice and
iron fringes are about 0.34 and 0.202 nm, respectively.
Following the nanoparticle fabrication, we placed nano-
particle samples (about 5 mg) on the metal substrate of the
sample holder located at the center of the glass dish. After
applying a pulse bias with a voltage of1 kV, a frequency of
1 kHz, and a duty ratio of 50%, the particles were exploded,
as shown in the successive images in Fig.3. These sequential
images were captured during the pulsed biasing. The rst
image (left top) in Fig. 3shows the condition before starting
the experiment (plasma OFF). The next image shows the
situation just after turning the plasma on. Then, it generallytook time to produce a stable plasma. Until the time of
turning the bias on, the sample particles are still in the metal
stage. Plasma generation will be easily achieved if the
matching is adjusted at the desired power beforehand. The
shorter time interval for turning on the bias provides an
effective interaction between the plasma and the particle
sample because the lifetime of an NH2radical is short (a few
microseconds).3436) The lifetime of these plasma species is
important because we used the no-ow gas condition, that is,
the chamber gate valve was closed during plasma treatment,
maintaining a pressure at 50 Pa. The negative pulsed bias
voltage was turned on about 11.4 s after turning on the
plasma. At the biasing-on time, the particles started to
explode and dropped back to the substrate stage after half
a second. After a certain biasing time (called tb), the bias
voltage was turned off, but the plasma treatment was con-
tinued without biasing up to the desired treatment timetp
. For
clarity, red dashed lines are added in the pictures to show
when and how the particles began to y and ended up.
In Fig. 4, we summarized the phenomenon observed in
Fig.3as the temporal behavior of the height changes of the
(a) (b)
Intensity
(arb.unit) (d)(c)
Fig. 2. (a) Low- and (b) high-magnication TEM images of the graphite-
encapsulated iron compound nanoparticle successfully fabricated by arc
discharge, (c) energy-dispersive X-ray spectra of the synthesized
nanoparticles, and (d) magnied image showing the interplanar distance of
graphite coating and iron core.
Fig. 3. (Color online) Time-sequential images of particle-explosion event
during biased-plasma processing.
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exploding particles, attb= 15 s andtp= 3 min. The height ofthe exploding particles was measured as the highest position
taken from each image frame. The inset gure shows a
magnied view of the peak area. The letters shown in Fig. 4
denote the main events. A and B represent the timer ON
and plasma ON, which correspond to the rst (0.000 s) and
second (0.417 s) images in Fig.3, respectively. C represents
the time when the biasing was turned on, shown in the fourth
image (11.791 s) in Fig.3. The gap between B and C
indicates the time required for the impedance matching
between the RF source and the plasma. The particles started
to explode at C, reached their maximum height at D
(12.125 s), and ended up at E (12.5 s). F represents the time
when the bias was turned off after 15 s of having the bias
turned on, and G represents the time when the plasma was
switched off after 180 s (3 min).
The explosion event is explained by the ion bombardment
mechanism. After turning on the biasing, the pulsed negative
high voltage caused a high electric eld in the sheath between
the plasma and the substrate. The existence of a high electric
eld caused the ions in the plasma to accelerate toward
the substrate where the particles were placed. Because the
particles were placed on the stage in powder form, once
the powder was bombarded by plasma ions, the particles
spontaneously popped out and exploded upwards in a very
fast manner. This phenomenon is similar to a conventionalion sputtering event. The ion bombardment energy depends
on the difference in potential between the plasma and the
substrate (V= Vp Vsub) and is subsequently expressed as
e(Vp Vsub). In this study, if the estimated plasma potential
Vpis more or less on the order of 10 V, the ion bombardment
energy when biasing is turned on is approximately 1 keV,
estimated from a biasing voltage of1 kV. This proposed
mechanism also enables agglomerated nanoparticles to
separate into ne particles during the explosion process. By
using a small (diameter 10 mm) metal substrate with a high
negative voltage, the particles explode and do not return back
to the substrate but fall on the glass dish area surrounding the
metal substrate owing to gravitational force. The dynamic
behavior of the particles and the forces acting on them under
biasing have been discussed in several papers,3741) which are
beyond the scope of our present paper.
After the plasma treatment, the treated particles were
characterized by XPS. Figure5 shows the data set of the
N 1s peak of the XPS proles with various biasing times tbreferred to as the C F range (see Fig. 4). The observed
N 1s peaks located at approximately 399.8 eV are considered
as a signal of the nitrogen-containing group for the amino
group, which was successfully grafted on the surface.Figure5 shows the N 1s spectra at different biasing times
oftb= 0 (no biasing), 2, 15, 30, and 60 s, each of which was
obtained for various plasma treatment times tp of up to
30 min. Comparing the biasing system with the nonbiasing
system (tb= 0 s), the intensity of the N 1s peak of the biasing
system (tb= 2, 15, 30, and 60 s) is signicantly increased.
For example, the intensity of the N 1s peak of the nano-
particles treated in the biasing system (tb= 15s) is raised to
about 34 times higher than those in the nonbiasing system
(tb= 0 s) for short plasma treatment times tp of up to 3 min.
This indicates that the plasma treatment with applied biasing
had a signicant effect of increasing N 1s peak intensity.
These increases in the N 1s peak intensity are supposed to be
due to the enhancement of the efcient interaction between
the particles and the plasma species, particularly nitrogen-
containing species, during an explosion event.
Fig. 4. (Color online) Explosion height vs plasma treatment time under
experimental conditions oftb=15s; tp=3 min. A: timer ON. B: plasma
ON. C: bias ON, explosion starts. D: maximum height of explosion event.
E: explosion ends. F: bias OFF. G: plasma OFF.
Intensity
(arb.unit)
Intensity
(arb.un
it)
Fig. 5. (Color online) Comparison of N 1s XPS proles for various
plasma-treatment times (tp=0, 1, 2, 3, 6, 8, 10, 15, and 30 min) and biasing
times (tb=0, 2, 15, 30, and 60s).
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to the treated nanoparticles under various (tb, tp) conditions
of (0s, 3 min), (2s, 3 min), (15 s, 3 min), (30 s, 3 min),
(60 s, 3 min), and (15 s, 30 min). All of the images conrm that
no damage or destruction was induced in the nanoparticle
structure after performing the plasma treatment in the
nonbiasing or biasing system. The structure of the graphite
layers was found to be stable under all the experimental
conditions. Similarly to the graphite coating, the iron com-pound core also remained encapsulated inside the graphite
layers even when the particles were subjected to long-term
plasma treatment, as shown in Fig. 9(f ). This result indicates
that the pulsed-biasing particle explosion technique per-
formed in the present study is highly efcient in amino group
functionalization. Furthermore, it is also suitable for surface
modication, particularly for powder samples because of its
ability to retain the structural stability of nanoparticles.
4. Conclusions
The surface of graphite-encapsulated iron compound mag-
netic nanoparticles fabricated by arc discharge was success-fully modied by a pulsed particle explosion technique. This
technique was performed by applying a high negative bias of
1 kV to the substrate stage for 260 s at a repetition fre-
quency of 1 kHz and a duty ratio of 50% in ammonia plasma
generated using a radio frequency inductively coupled
plasma device. The intensity of the N 1s peak in the XPS
spectrum of the nanoparticles treated in the biasing system
was three to four times higher than that treated in the
nonbiasing system owing to the enhancement of the interac-
tion between the nanoparticles and the plasma species. The
present results also indicate the efcient enhancement of
amino group modication by approximately fourfold from
about 1.9 104 molecules/nanoparticle in the case of
(tb= 0 s, tp= 3 min) to 8.2 104 molecules/nanoparticle
in the case of (tb= 15s, tp= 3 min) by the negative pulsed
biasing during the NH3 plasma processing. Moreover, the
results also showed that the dispersion of the treated nano-
particles in biasing system was improved compared with
those of the untreated and treated samples in the nonbiasing
system.
In addition, analysis by HR-TEM showed no signicant
damage on the nanoparticle structures, indicating that the
present technique is suitable mainly for the surface mod-
ication of particle samples owing to its high efciency in
surface modication without causing any signicant changeor destruction of the structural and morphological properties.
Acknowledgments
This work was supported in part by a Grant-in-Aid for
Scientic Research (No. 2110010) from the Japan Society for
the Promotion of Science (JSPS). The authors would like to
thank Associate Professor A. Ogino of Shizuoka University
for technical assistance in the plasma chamber development
and UVvis absorption spectroscopy measurement.
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Jpn. J. Appl. Phys. 53, 010205 (2014) SELECTED TOPICS IN APPLIED PHYSICS
010205-7 2014 The Japan Society of Applied Physics
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8/13/2019 surface modification by plasma
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Teguh Endah Saraswati is currently a Lecturer and
Researcher in Chemistry Department, Mathematics
and Natural Sciences Faculty, Sebelas Maret Uni-
versity, Indonesia. She received Master of Science
degree in chemistry from Nagoya University in
2009, which was supported by Panasonic Scholar-
ship Program. In 2012, she completed the doctoral
program, which was partly supported by Amano
Foundation Scholarship. She obtained Ph. D degreeat Nanovision Technology Department, Graduate
School of Science and Technology, Shizuoka University under the
supervision of Prof. Masaaki Nagatsu. Her research interests are inorganic
and materials chemistry, and surface modication by plasma processing.
Shun Tsumurareceived the B.S. and M.S. degrees in electrical engineering
from Shizuoka University in 2011 and 2013, respectively. During his
bachelor and maste r cour ses, he engaged in the study of su rface modication
of magnetic nanoparticles by using an RF excited inductively coupled
plasma under the supervision of Prof. Masaaki Nagatsu.
Masaaki Nagatsu received the B.S., M.S., and Dr.
Eng. Degrees from Nagoya University in 1975,
1979, and 1985, respectively. During 1975 to 1976,he worked for Hitachi Research Laboratory, Hitachi,
Ltd. From 1982 to 2000, he was an assistant
professor (19821989), lecturer (19901991), and
associate professor (19912000) in the Department
of Electrical Engineering of Nagoya University.
During 19871989, he worked as a visiting
researcher in University of California, Los Angeles.
In 2001, he became a professor of Department of Engineering in Shizuoka
University. He became a Director of Graduate School of Science and
Technology, Research Division in 2006 and a Dean of Graduate School of
Science and Technology of Shizuoka University since 2008. His research
eld is the plasma production and surface modication of materials for bio-
medical and environmental application.
Jpn. J. Appl. Phys. 53, 010205 (2014) SELECTED TOPICS IN APPLIED PHYSICS
010205-8 2014 The Japan Society of Applied Physics