resume :prof. rakesh kumar, ch.charan singh university, meerut, … rakesh... · 2010-06-16 ·...

Resume :Prof. Rakesh Kumar, Ch.Charan Singh University, Meerut, India For Vice Chancellor, Ch. Charan Singh University Meerut

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Prof. Rakesh Kumar Professor in Physics and Department of Physics

Ch.Charan Singh University Meerut-250004 (India)

Email: [email protected]

Cell:+91-941205877, Residence:+91-121-2768549

Resume :Prof. Rakesh Kumar, Ch.Charan Singh University, Meerut, India

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CURRICULA VITAE Prof. Rakesh Kumar

Name Prof. Dr. RAKESH KUMAR

Date of Birth (In Christian Era) 15th January 1958

Nationality Indian

Present Position Address Correspondence

Professor in Physics, Department of Physics, Ch. Charan Singh University, Meerut-250004 (India) Email:[email protected] Cell:+91-9412705877,

Religion Hindu

Educational Ph.D (Physics) Panjab University Chandigarh in 1995 (April) M.Sc (Physics) in

TITLE OF THESIS: Fabrication of Optically Transparent SiN X-ray Mask Membrane with Low Stress and High Radiation Durability by High Temperature LPCVD Deposition. 1st Division Panjab University Chandigarh, India (1981)

Professional Experience Aug-04- till date Professor in Physics, and Coordinator, Nanoscience and

Nanotechnology Centre, Ch. Charan Singh University Meerut-250004, India

Jan’02-Jul’2004* Visiting Professor, INFM - National Institute for the Physics of Matter, Trieste, Italy.

Aug’99-Jul’00* Visiting Program Fellow, Nanyang Technological University, Singapore.

Oct’’91-Mayl’94* Visiting Scientist, OKI Electric Industry, Tokyo, Japan Nov’90-Jul’91* Visiting Professor, IESS-Institute for Electronics and Solid State,

Rome, Italy, Aug’88-Aug’90* Visiting Scientist, NEC Corporation, Tsukuba, Japan Aug’87-Aug’88* AOTS Trainee, NEC Corporation, Tsukuba, Japan Dec’82-Jul’04

Research Scientist, National Research Laboratory of Council of Scientific & Industrial Research, India.

*Visiting Assignments Knowledge of Foreign Language in addition to English Good Fluency in Spoken JAPANESE Language (Knowledge of Hiragana and Katagana Scripts)


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Total Experience in Years after Essential Qualification: Nearly 26 Years Experience at reputed Universities, and Institutes in India and Abroad in Semiconductor Device Fabrication, Thin Film, Material Science and in interdisciplinary areas of nanoscience and nanotechnology etc. Areas of Professional Experience Administration Member of Executive Council (Senate), Ch. Charan Singh University, Meerut. Member of Academic Council, Ch. Charan Singh University, Meerut. Former Chief Proctor of Ch. Charan Singh University, Meerut, India Coordinator, Nanotechnology and Nanoscience Centre of Ch. Charan Singh University, Meerut, India. Academic Council-Subject Expert Faculty of Science, Kurukshetra University, Kurukshetra, India Reviewer of International Journal of Micro Machining (JMM)

Foreign Collaboration Collaborating with INFM, Trieste, Italy (LILIT) Faculty of Medicine, University of Catanzaro, Italy Countries Visited Italy, Japan, USA, Singapore and European Countries Research Papers Over 65 in International Journals and Conferences. International Patent 2-International Patents granted, One in USA and One in Europe Book: Mathematical Physics (Published by Kedarnath Ramnath Publishers, New Delhi,), 2006 Chapter in Book:Micro and Nnanofabrication and their Medical Application: E.Di Fabrizio, R.Kumar, F.Perennes et.al, Contributed Chapter in the book "BIOMEMS AND BIOMEDICAL NANOTECHNOLOGY, Vol-1", Edited by A.P Lee, J. Lee and M. Ferrari, pp97, Published by Springer-Verlog (ISBN: 0-387-25563-X) Current Research Projects in Nanotechnology 1. Bilateral Joint Project: MICRO & NANOMANIPULATION DEVICES FOR CELL AND SUB

CELLULAR STUDIES: Study, realization and experiment on Nano & micro systems for in-situ controlled drug delivery.Awarding Agency: DST-Govt. India and MIUR-Govt of Italy

2. Project: Development of metallic ion beams using Electron Cyclotron Resonance Ion Sources

(ECRIS) :Collaborating Institute: Inter University Accelerator Centre (IUAC), New Delhi. (A University Grant Commission, India Research Institute), India.

Project- Micro and Nanomanipulation Devices for Cell and Sub-Cellular Studies: Study, realization and experiment on Nano & micro systems for in-situ controlled drug delivery. Awarding Agency: DST-Govt. India and MIUR-Govt of Italy. List of other joint Research Projects being currently Participating in Italian Collaborators.

Research Topics Study, realization and experiment on Microsystems for controlled drug

delivery in situ Miniaturized Systems for Electronics and Photonics

Design and fabrication of Optical Tweezers for Applications to Nanoscience & Biotechnology

Optical Nano Devices Using A few Photons Fabrication Technology Nanotechnology and Microsystems

Prof. Rakesh Kumar


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Recent Publications and Journal and International Conferences (2002-2006)

1. Local structure, optical and magnetic studies of Ni nanostructures embedded in a SiO2 matrix by ion implantation S K Sharma, P Kumar, RaviKumar, M Knobel, P Thakur, K.H.Chae, W K Choi, R Kumar and D Kanjilal

J. Phys.: Condens. Matter 20 (2008), 285211 2. Charge-state distributions of metallic electron cyclotron resonance plasmas

P. Kumar, R.Kumar, G. Rodrigues, P. S. Lakshmy, and D. Kanjilal J.Vac.Sci.Technol.A 26(1), 2008,

3. Development of Zn and Eu Beams by Plasma Sputtering, P.Kumar, G.Rodrigues D.Kanjilal, A.Roy, B. P. Singh and R.Kumar, Nuclear Instruments & Methods in Physics Research, B246 (2006), 440.

4. Development of Metallic Ion Beams Using ECRIS:

P.Kumar,G.Rodrigues D.Kanjilal, A.Roy, B. P. Singh and R.Kumar, Nuclear Instruments & Methods in Physics Research, B252 (2006), 354.

5. Low energy ion beams: A versatile tool for synthesis of magnetic metal nanoparticles,

P. Kumar, Ravi Kumar, D. Kanjilal, M. Knobel, P. Thakur, K.H. Chae, R. Kumar (Presented at 18th International Conference on Ion Beam Analysis (IBA-07), 23-28 September 2007, University of Hyderabad, Hyderabad. The proceedings of conference will be published in Nucl. Instr. and Meth. B)

6. Synthesis and characterization of Ni nanoparticles embedded in quartz matrix,

P. Kumar, Ravi Kumar, D. Kanjilal,M. Knobel, P. Thakur, K.H. Chae, R. Kumar

(Accepted in IVC-17/ICSS-13 and ICN+T2007 Congress, 2-6 July 2007, Stockholm,

Sweden. The proceedings of congress will be published in J. Appl. Phys. D)

7. Low Cost Transparent SU-8 Membrane Mask for Deep X-ray lithography, S. Cabrini, F. Pérennès, B. Marmiroli, A. Olivo, A. Carpentiero, R. Kumar, P. Candeloro and E. Di Fabrizio, Microsystem Technologies, 11 (4-5) (2005), 370.

8. Focused Ion Beam Lithography for Two Dimensional Array Structures for

Photonic Applications; S. Cabrini, A. Carpentiero, R.Kumar, L. Businaro, P. Candeloro, M. Prasciolu, A.Gosparini, C. Andreani, M. De Vittorio, T. Stomeo, E. Di Fabrizio; Microelectronic Engineering 78–79 (2005), 11. 9. SnO2 Lithographic Processing for Nano-patterned Gas Sensors, P.Candeloro, R.

Kumar, E. Comini, C. Baratto, A. Carpentiero, G. Faglia, E. Di Fabrizio, G. Sberveglieri, J.Vac.Sci.& Technol. B23(6) (2005), 2784.


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10. 3-D Digital Scanner Based on Micro-machined Micromirror for the Metrological Measurement of the Human Ear Canal,

M. Prasciolu, R.Kumar, R. Malureanu, S. Cabrini, D. Cojoc, L. Businaro, A. Carpentiero, E. Di Fabrizio, J.Vac.Sci.& Technol. B23(6) (2005), 2990. 11. Interface lithography: A hybrid Lithographic Approach for the Fabrication of

Patterns Embedded in Three-Dimensional Structures: F Romanato, R Kumar and E Di Fabrizio; Nanotechnology 15 (2004) 1–7. 12. Design and Implementation of Optical Tweezer Arrays using Diffractive Optical

Elements D. Cojoc, E. Ferrari, S. Cabrini, R. Malureanu, M. B. Danailov, A. Carpentiero, M.Prasciolu, R. Kumar, L. Businaro, E. M. Di Fabrizio. Proc. SPIE Vol. 5477,(2004), 281. 13. X-ray lithography for Micro & Nano Fabrication at Elettra for Interdisciplinary

Applications (Invited); E. Di Fabrizio, F. Romanato, S. Cabrini, R.Kumar, F.Perennes, M. Altissimo, L..Businaro, D.Cojoc, L. Vaccari, M. Prasciolu, P.Calendero, Journal of Physics: Condensed Matter, 16 (33), (2004), S3517-S3535. 14. Design and Fabrication of DOE-Microlens with Continuous Relief Fabricated on-

Top of Optical Fibre by Focused Ion Beam for Fibre-to-Waveguide Coupling; F.Schiappelli, R.Kumar, M.Prasciolu, D.Cojoc, S.Cabrini, R.Proietti, V. Degiorgio and E.Di Fabrizio, Jap.J.Appl.Phys. 43(6B), (2004), 3772.

15. Efficient fiber-to-waveguide coupling by a lens on the end of the optical fiber

fabricated by focused ion beam milling; F. Schiappelli, R.Kumar, M. Prasciolu, D. Cojoc, S. Cabrini, M. De Vittorio, G.Visimberga, A. Gerardino, V. Degiorgio and E. Di Fabrizio, ; Microelectronic Engineering, 73-74(2004), 397.

16. Electromagnetically Actuated Surface Micromachined Free Standing Torsion

Beam Micromirror Made by Electroplated Nickel; M. Prasciolu, A. Carpentiero, R. Kumar, D. Cojoc, S. Cabrini, L. Businaro, F.Romanato, E. Di Fabrizio, D. Recchia, G. Parmigiani, Jap.J.Appl.Phys. 43, (2004), 418.

17. Fabrication through silicon micromachining of 3D scanner for optical

determination of the ear canal IFMBE M. Prasciolu, S. Cabrini, D. Cojoc, R. Malureanu, R. Kumar, L. Businaro and E. Di Fabrizio MEDICON and HEALTH TELEMATICS 2004 “X-Mediterranean Conference on Medical and Biological Engineering”, Volume 6, Nov. 2004,


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18. Fabrication of 3D metallic photonic crystals by X-ray lithography F. Romanato, L. Businaro, M. Tormen, L. Vaccari, S. Cabrini, P. Candeloro, R. Kumar, E. Di Fabrizio Microelectronic Engineering, Vol. 67-68, (2003), 479.

19. Novel Diffractive Optics for X-ray Beam Shaping E. Di Fabrizio , S. Cabrini, D. Cojoc, F. Romanato , M. Altissimo, B. Kaulich , R.Kumar, T Wilhein, J. Susini, M.De Vittorio, E.Vitale, G.Gigli, R.Cingolani Microelectronic Engineering, Vol. 67-68, (2003), 87. 20. Fabrication of Diffractive Optical Elements On-Fiber for Photonic Applications by

Nanolitography; M. Prasciolu, P. Candeloro, R.Kumar, L. Businaro, E. Di Fabrizio, D. Cojoc, S. Cabrini, C. Liberale, V. Degiorgio, Jap.J.Appl.Phys., Vol.42 (6),(2003), 4177. 21. X-Ray Lithography Patterning of Magnetic Materials and Their Characterization P. Candeloro, M. Conti, R. Kumar, E. Di Fabrizio, G. Gubbiotti, A. Gerardino, R. Zivieri, O. Donzelli G. Carlotti Jap.J. Appl. Phys. Vol 42 (6) (2003), 3802.

22. Design and fabrication of diffractive optical elements for photonic applications by

means of nanolithography; M. Prasciolu, S. Cabrini, L. Businaro, D. Cojoc, C. Liberale, R. Kumar, E. Di Fabrizio, V. Degiorgio G.Gigli, D.Pisignano, R.Cingolati, ; Microelectronic Engineering, 67-68, (2003), 169. 23. Design and fabrication of on-fiber diffractive elements for fiber-waveguide

coupling by means of e-beam lithography M. Prasciolu, D. Cojoc, S. Cabrini, L. Businaro, P. Candeloro, M. Tormen, R. Kumar, C.Liberale, V. Degiorgio, A. Gerardino et al. Microelectronic Engineering, Vol.67-68,(2003),169 . 24. Fabrication of 3D metallic photonic crystals by X-ray lithography F. Romanato, L. Businaro, M. Tormen, L. Vaccari, S. Cabrini, P. Candeloro, R. Kumar, E. Di Fabrizio Microelectronic Engineering, Vol. 67-68 (2003),479.

25. Novel diffractive optics for X-ray beam shaping E. Di Fabrizio , S. Cabrini, D. Cojoc, F. Romanato , M. Altissimo, B. Kaulich , R.Kumar, T Wilhein, J. Susini, M.De Vittorio, E.Vitale, G.Gigli, R.Cingolani Microelectronic Engineering, Vol. 67-68 (2003),87.


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Recent Contributions in International Conferences/Symposiums (2002-2006) 1. Interface lithography: A hybrid lithographic approach for the fabrication of waveguide

patterns embedded in three-dimensional Photonic Crystal (PC) structures: Kaushal Rani, R Kumar, Beer Pal Singh: To be Presented at International Conference on Nanoscience and Technology -INCOSAT-2006, to be held from 16-18 March 2006 at New Delhi (India).

2. 3D Digital scanner based on micromachined micromirror for the metrological measurement of the human ear canal based on MEOMS scanning micromirror M. Prasciolu, R. Malureanu, S. Cabrini, D. Cojoc, A. Carpentiero, R. Kumar, E. Di Fabrizio 49th International Conference on Electron Ion and Photon Beam (EIPBN-2005) May 31st-June 3rd 2005 at Orlando, USA.

3. SnO2 lithographic processing for nano-patterned gas sensors : P.Candeloro, R. Kumar, E.Comini, C. Baratto, A. Carpentiero, G. Faglia, E. Di Fabrizio, G. Sberveglieri, 49th International Conference on Electron Ion and Photon Beam (EIPBN-2005) May 31st-June 3rd 2005 at Orlando, USA.

4. 3D Digital scanner for the metrological measurement of the human ear canal based on MEOMS scanning micromirror M. Prasciolu, R. Malureanu, S. Cabrini, D. Cojoc, A. Carpentiero, R. Kumar, E. Di Fabrizio

MNE2004 held at Rotterdam (Holland), 19-22 September 2004. 5. Design and fabrication of DOE-microlens with continuous relief fabricated on-top of

optical fibre by focused ion beam for fibre-to-waveguide coupling F.Schiappelli, R.Kumar, M.Prasciolu, D.Cojoc, S.Cabrini, R.Proietti, V. Degiorgio,E. Di Fabrizio, Microprocess and Nanotechnology International Conference, Tokyo Japan on 28-31 October 2003.

6. Design And Fabrication of Lenses on Top of Optical Fibre For Efficient Fibre-to-Waveguide Coupling By Focused Ion Beam : F. Schiappelli, R. Kumar, M. Prasciolu, D. Cojoc, S. Cabrini, M. De Vittorio, G. Visimberga, A.Gerardino, V. Degiorgio, E. Di Fabrizio International Micro and Nano Engineering -2003 Conference Held in Cambridge, UK from Sept 24-26, 2003 .

7. Design and fabrication of lenses on the top of an optical fibre for efficient fibre-to-waveguide coupling by means of Focus Ion Beam (FIB) lithography F. Schiappelli, R.Kumar, M. Prasciolu, D. Cojoc, S. Cabrini, M. De Vittorio, A.Gerardino, V. Degiorgio and E. Di Fabrizio Proceedings of Microelectronics and Nanoengineering 2003, Oct 2003, 166.


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8. Design and implementation of optical tweezers arrays using diffractive optical elements”( invited ), D. Cojoc, E.. Ferrari, S. Cabrini, R. Malureanu, M B. Danailov, A. Carpentiero, M. Prasciolu, R. Kumar, L. Businaro, E. Di Fabrizio, The Sixth International Conference "Correlation Optics-2003" SPIE - The International Society for Optical Engineering (Ukrainian and Russian Chapter) held in Chernivtsi, Ukraine on September 16-19, 2003.

9. X-Ray Lithography Patterning of Magnetic Material and their Characterization E. Di Fabrizio, P. Candeloro, R. Kumar, A. Gerardino, L. Vaccari, M. Altissimo, S. Cabrini, L. Businaro, D.Cojoc, F. Feri, F. Romanato, G. Carlotti, G. Gubbiotti, Presented at International Conference on Microprocesses and Nanotechnology 2002 held at Tokyo, Japan, from November 6-8 , 2002.

10. Design and fabrication of diffractive optical elements for photonic applications by means of nanolithography M. Prasciolu, S. Cabrini, L. Businaro, D. Cojoc, C. Liberale, R.Kumar, E. Di Fabrizio, V. Degiorgio, G.Gigli, D.Pisignano, R.Cingolani, Presented at Micro and Nano Engineering Conference (MNE-2002 conference) held at Lugano, Switzerland, from September 16-19, 2002.

11. Novel Diffractive optics for X-ray beam shaping Enzo Di Fabrizio, Stefano Cabrini, Dan Cojoc, Filippo Romanato, Matteo Altissimo, Burkhard Kaulich, R.Kumar, Thomas Wilhein, Jean Susini, M.De Vittorio, E.Vitale, G.Gigli, R.Cingolani, Presentated at Micro and Nano Engineering International Conference (MNE-2002 conference) held at Lugano,Switzerland, from September 16-19, 2002.

12. 3-D photonic crystal fabrication by X-ray lithography F. Romanato, L. Businaro, M. Tormen, L. Vaccari, S. Cabrini, P. Candeloro, R. Kumar, E. Di Fabrizio, Presented at Micro and Nano Engineering International Conference (MNE-2002 conference) held at Lugano, Switzerland, from September 16-19, 2002.

Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists

Abstract

What is described is a lithographic method for fabricating three-dimensional structures on the micrometric and submicro-metric scale, including the operations of: depositing a layer of a first resist on a substrate; depositing a layer of a second resist on the layer of the first resist; forming a pattern of the second resist by lithography; depositing a further layer of the first resist on the previous layers; and forming a pattern of the first resist by lithography. The second resist is sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first; in other words, it is transparent to the particles or to the electromagnetic radiation to which the first resist is sensitive, and therefore the processes of exposure and development of the two resists are mutually incompatible to the extent that the exposure and development of one does not interfere with the exposure and development of the other.

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United States Patent Application 20050064343Kind Code A1 Romanato, Filippo ; et al. March 24, 2005

Inventors: Romanato, Filippo; (Trieste, IT) ; Di Fabrizio, Enzo; (Trieste, IT) ; Kumar, Rakesh; (Chandigarh, IN)

Correspondence Name and Address:

SUGHRUE MION, PLLC 2100 PENNSYLVANIA AVENUE, N.W. SUITE 800 WASHINGTON DC 20037 US

Assignee Name and Adress:

INFM ISTITUTO NAZIONALE PER LA FISICA DELLA MATERIA

Serial No.: 945897Series Code: 10 Filed: September 22, 2004

Page 1 of 10United States Patent Application: 0050064343

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Foreign Application Data

Claims

What is claimed is: 1. Lithographic method for fabricating three-dimensional structures on the micrometric and submicrometric scale, including the operations of: providing a substrate; depositing on the said substrate a layer of a first polymeric material sensitive to exposure to charged particles or to electromagnetic radiation; depositing, on the layer of the first material, a layer of a second polymeric material sensitive to exposure to charged particles or to electromagnetic radiation in a different way from the first, so that the processes of exposure and development of the two materials are mutually incompatible to the extent that the exposure or development of one does not interfere with the exposure and development of the other; forming a pattern on the second material by a lithographic process, comprising the steps of: exposing the layer of the said material to charged particles or electromagnetic radiation according to a predetermined topography so as to define a first and a second portion of the said layer, respectively exposed and unexposed to the said particles or to the said radiation; and subsequently selectively removing one of the said first and second portions of the layer, so that regions of the first material are left uncovered; and forming a pattern on the first material by a lithographic process, comprising the steps of: exposing the layer of the said material to charged particles or electromagnetic radiation according to a predetermined topography so as to define a first and a second portion of the said layer, respectively exposed and unexposed to the said particles or to the said radiation; subsequently, selectively removing one of the said first and second portions of the layer, the second material being transparent to the particles or to the electromagnetic radiation to which the first material is sensitive. 2. Method according to claim 1, comprising the deposition, on the patterned layer of the second material and on the uncovered regions of the first material, of a further layer of the said first material before the lithographic forming of the pattern of the first material. 3. Method according to claim 2, comprising the iteration of the steps of: depositing a further layer of the second material on the further layer of the first material; forming a pattern of the second material by lithography; and possibly depositing a further layer of the said first material on the patterned layer of the second material, before the lithographic forming of the pattern of the first material. 4. Method according to claim 1, wherein the first polymeric material is a positive resist and the second polymeric material is a negative resist. 5. Method according to claim 1, wherein the first polymeric material is a low-sensitivity resist and the second polymeric material is a high-sensitivity resist. 6. Method according to claim 1, wherein the lithographic process for forming the pattern of the first

U.S. Current Class: 430/312; 430/313; 430/394 U.S. Class at Publication: 430/312; 430/313; 430/394 Intern'l Class: G03F 007/00

Date Code Application NumberSep 23, 2003 IT TO2003A000730

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Technology Developed (Collaborative Work) Nanofabrication Techniques

Patent Generation: In contributing to the research and development of new processes and techniques attentive care for to the generation of patents as a means of protecting the research work.

1. Direct Human Ear External Auditory Canal Measurement (Patent Pending): The conventional optical elements are not able to enter in the inner part of the ear and perform a scanning of the cavity. This work is devoted to the direct scanning of human external auditory canal by using electromagnetically actuated torsion micromirror fabricated by micromachining technique as scanner. This is the first ever demonstration of actual scanning of human external auditory canal by a single integral Micro-Electro-Mechanical System (MEMS). A novel prototype 3D scanning system is developed together with surface reconstruction algorithm to obtain an explicit 3D reconstruction of actual human auditory canal. The system is based on acquisition of optical range data by conoscopic holographic laser interferometer using electromagnetically actuated scanning MEMS micromirror. An innovative fabrication process based on polymethylmethacrylate (PMMA) sacrificial layer for fabrication of free standing micromirror is used. Micromirror actuation is achieved by using magnetic field generated with an electromagnetic coil stick. Micromirror and electromagnet coil assembly composes the opto-mechanical scanning probe used for entering in ear auditory canal. Based on actual scan map, a 3D reconstructed digital model of the ear canal was built using a surface point distribution approach. The proposed system allows noninvasive 3D imaging of ear canal with spatial resolution in the 10 µm range. Fabrication of actual shell from in-vivo ear canal scanning is also accomplished.

Figure: Human ear anatomy

Figure: prototype Otoscan 3D: 3D laser scanner based on surface silicon micromachining techniques for shape and size reconstruction of the human ear canal.


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e: Fig:Layout for integration of MEMS micromirror with electromagnet coil and concept of electromagnetic actuation under induced magnetic field.

Figure: Optical micrograph of fabricated MEMS micromirrors

Figure: Optical image of Layout for integration of MEOMS micromirror with electromagnet

coil and concept of electromagnetic actuation under induced magnetic field.

Figure: Otoscan3D in-vivo measurements: a) patient is immobilized with the help of a frame; b) positioning of the probe and tragus opening; c) scan of the EAC.


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Figure: a) reconstructed point-cloud image of EAC; b) digitally reconstructed view of EAC and c) laser sintering fabricated shell from the 3D reconstructed digital model from direct scanning of EAC. 2) Developed a multiple tilted X-ray Lithography Method for Fabrication of 3-D

Photonics Crystal and fabrication of complex 3-D Structures o A tilted illumination generates an array of tilted pillars (region I in fig. 1.a). o Azimuth rotation of the mask+sample system around their normal axis, o Second array of pillars is generated (see region 2 in fig.1.a). o Iterative repetition turns out in the the full 3D lattice (3 and then 4 in fig.

1.a). o square symmetry -> four exposures in 90° -> a cubic lattice. o equilateral triangle -> three fold 120° degree -> Yablonovite structure mask o array cube lattice the zenith angle must be qc=45°. o Yablonovite zenith angle qY =arcsin 1/=35.26deg.

90°

90°

90°

90°

θ=zenith

beam

azimuth

Technology Developed (Recent 5-Years) Intellectual Property Right (Patents) Obtained

X-ray and Nanoimprint lithography for 3D patterning In XRL, conventionally, the mask+wafer assembly is held perpendicularly to the beam. The mask shadows during one-to-one projection of the pattern on the resist providing a vertical, digital-like, lithographic profiles. However, the idea underlying for the realization of 3D pattern structuring by multiple-tilted x-ray lithography is based on unconventional exposure geometry. The schematics illustration of this geometry is shown in Fig. 2. In this scheme, the mask + wafer are mounted at a tilted angle with respect to the x-ray beam. Seen from the surface of the wafer, each opening of the x-ray mask behave as a collimated light source that exposes the resist along a tilted direction. A 180° azimuth angular rotation around the axis perpendicular to the mask-sample system will generate a second exposure along another direction. The relative position of mask+wafer is kept fixed during the rotation and, due to the fact that no further alignment is required, the multiple-tilted-exposure at different angles can be regarded simply as an independent single step process. The resulted structure in this case is simply triangular shaped trench or a vertical network of intersecting planes useful for micro fluidic. The concept of multiple-tilted x-ray lithography had successfully been implemented in fabrication of 3D structure. Most of the experimental details about interface lithography which is a hybrid lithography of EBL and XRL in combination of binary resist process scheme has been developede. This interface lithography has sucessfully been applied in fabrication of complex 3D microfluidic structures. International Patent: 2-Patents granted. 1-in European Patents and another in

United State of America.

European Patent United States Patent Patent No: TO200Á000730 Patent No.: 20050064343

Granted on: 23-09-2004 Granted on 03/24/2005 Patent Right Holder:

Filippo Romanato, Rakesh Kumar, Enzo Di Fabrizio,

Patent Right Holder: Filippo Romanato, Rakesh Kumar, Enzo Di

Fabrizio, "Procedure for the fabrication of complex

three-dimensional structures on submicrometric scale by means of two layers

photoresist lithographic process",

“Method for fabricating complex three-dimensional structures on the

submicrometric scale by combined lithography of two resists”

Figure: Tilted mask-wafer stage developed for multiple-tilt x-ray lithography for 3-D complex structure fabrication.

Figure: Multiple-tilte Interface lithography process flow scheme. Two resist are combined with two distinct lithography. After a first PMMA coating and baking (a), a second resist (SAL-607 ER7) is spun, baked (b), exposed by Electron beam lithography (c) and normally developed with MF312 (d). In the following a second PMMA coating is spun and normally baked (e). At this point x-ray lithography can be performed either in the usual vertical configuration (f.1) or in the multi tilted configuration (f.2). The SAL-607 ER7 structure at this point remains unchanged resulting completely embedded in the in the PMMA resist structure that can be used as template for a final electroplating metal growth (g).

a) PMMA Substrate

b) SAL 601

Creation of Embedded Pattern

c) Electron beam litho

d) Resist stripping

e) Second PMMA coatig

f.1 ) Vertical X-ray exposur

g.1) Metal electroplating

f.2) Multi tilted X-ray exposure

g.2) Metal electroplating

Nano-Bio-Medical Engineering Technology Development 3-D Scaffolds for Tissue Engineering Tissue engineering offers the possibility to help in the regeneration of tissues damaged by disease or trauma and in some cases to create new tissues and replace failing or malfunctioning organs. This is typically done through the use of degradable biomaterials to either induce surrounding tissue and cell in-growth or to serve as temporary scaffolds for transplanted cells to attach, grow, and maintain differentiated functions. Consequently, the first aspect of the scaffold design to be considered is related to the selection of the biodegradable polymer that will be used for its design and production. The definition of the most adequate scaffold design and the correspondent required properties is mainly determined by the tissue engineering approach selected for the regeneration of a specific tissue, as the scaffold must be able to induce the desired tissue response. 3D porous structures have been recognized as the most appropriate design to sustain cell adhesion and proliferation. For these reasons, it is considered essential to have a method of creating biomaterial scaffolds having a known and well-defined topology. Tissue engineering technology development is presently confined to create biodegradable 3D scaffold structures and devices to enable the in-vitro assembly of complex 3D cell-scaffold structures for tissue replacement and regeneration. These novel scaffolds structures should allow us to perfuse the growing tissue reducing nutrient limitations. We have developed deep x-ray lithography (DXRL) techniques for the production of tissue engineering scaffolds. This approach allowed us to develop scaffold structures that will have a highly pseudo-vascularised network similar to that found in tissues, and also allowed the development of bespoke 3D scaffolds for individual patients based on data from medical scans. The basic technology used is the 3D deep x-ray lithography (DXRL) technique that is used to produce casting moulds that offers on the one hand sufficient resolution and on the other hand the possibility to produce parts with reasonable outer dimensions within reasonable time.

Figure 1 : Fabrication process of the 3D scaffold in PMMA using DXRL

Figure 2 : 3D scaffold structure replicated in PMMA Polymer

3-D Micro-fluidic Structure Fabrication: Cellular Manipulation and Analysis, Bioassays and Sample Preparation Applications. The revolutionary miniaturization of analytical instrumentation and methodologies is nowhere more evident than in micro-fluidic systems. The development of miniaturized gas chromatographs and ink jet printer nozzles introduced the field of micro-fluidics applications have branched into many aspects of the biological and chemical sciences. Rapid progress in micro-fluidics relies upon advances in micro-fabrication technologies, customized assay chemistries, materials development and packaging concepts, converges with everything from biology to electrical engineering in a single monolithic micro-system. This field of micro-fluidics is showing great importance to Bio-Microsystems. Based upon interconnected networks of micro-channels and reservoirs with tiny volumes, micro-fluidic devices are well matched with micro-electromechanical system (MEMS) and miniaturized optics and thus set a platform for the miniaturization of instrument for cellular manipulation and analysis, integrated micro-fluidics for bioassays and sample preparation, and micro- and nano-fluidic chip processors for the manipulation and self-assembly of bio-molecules, genetic. We have developed a multiple-tilt X-ray Lithography Technology for fabrication of 3-D Micro-Fluidic Structure.

Figure: SEM micrograph showing a fabricated (a) high aspect ratio (45) arrays of tilted pillar obtained by single tilted x-ray lithography exposure. Shown (right hand) are the arrays of 15 µm thick tilted pillars micro-fluidic channel (after gold electroplating and resist stripping) by a two multiple-tilt x-ray lithographic exposure.

(a) (b) Figure: (a) single vertical array (after gold electroplating) of intersecting pillars, which can work as filter in microfluidic channel, and (b) the intersecting pillars array can also be sequenced in several vertical layers of filters for their possible application as electrode in electrochemical micro sensors.

Transdermal Drug Delivery System The micro gear pump was directly fabricated in PMMA by DXRL. The design of the gears and case was accomplished using a CAD tool minimising the clearance gap between both elements. Assuming the gears remain perfectly centred, the gap between the teeth tip and the case in the radial direction was fixed to 3µm. This was done to minimise the back flow of the gearpump and made possible in fabrication due to the extreme precision and resulting vertical sidewalls of the DXRL technique. The chromium mask was replicated by photolithography on 30 µm thick SU-8 resist and 20 µm of gold were electroplated to form the X-ray mask absorbing pattern. The substrate of the X-ray mask was a silicon wafer coated with a 2 µm thick Titanium base platting. After the gold electrodeposition, 200 µm thick SU-8 layer was spin coated on top of the absorbing structures and flush exposed. After etching of the Silicon in a hot KOH bath and removing the Titanium layer the thick SU-8 layer (acting as the mask membrane) with the embedded absorbing pattern was mounted on a frame. A self-standing 500 µm thick PMMA foil was exposed to X-ray through the mask and after development the pump case and both gears were released from the PMMA foil. Assembly was then performed by hand under a stereoscopic microscope. Error! Reference source not found. shows the fabrication process flow of the gear pump and a SEM photo of the assembled micropump is shown in Error! Reference source not found.. A circular magnet is to be mounted on the hollow gear to drive the pump.

Figure : Process flow for the fabrication of disposable microneedle arrays.

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Figure: SEM images of the assembled micro- niddal nedle and gear pump

Optical Tweezers Enabled 3D trapping and micromanipulation There is considerable interest in the use of optical-tweezer-based methods to trap, accelerate and rotate microscopic biological objects because the ability to trap, accelerate and orient such objects can aid in the study of the interaction between specific regions of the objects. Optical tweezers use the radiation pressure provided by tightly focused laser beams to move and manipulate matter on the micrometer scale and smaller. The optical tweezers provide a tool for nanoscale and microscale assembly of devices. Small particles held in the optical traps can be manipulated to the desired area and arrays of traps can be used to hold multiple parts. Arrays and single traps can also be automated with neural net (or fuzzy logic) control to recognize patterns and send traps to move particles to desired locations. Development of Diffractive Optical Elements (DoEs) based Optical Ttweezer for Multiple Trapping:

Multiple trapping and independent manipulation of the trapped particles is needed in many application and its accomplishment poses severe complexity and challenge. Multiple traps can be accomplished either by rapidly scanning the laser beam or by splitting the input beam in several beams. Scanned optical tweezers can trap multiple particles by dwelling briefly on each before moving onto the next. However, its main drawbacks are the restriction to planar patterns of traps and the limitation on the extent and the complexity of the patterns.

A new technique based on splitting of the input beam by using a diffractive optical element (DOEs) as beam-split has been developed. Diffractive optical elements as beam-splitter were designed by a computer generated codes for diffractive optical element (DOE). The methods for design of diffractive optical element is based on iterative algorithms and genetic optimisation algorithms for the propagation and superposition of spherical waves, to calculate phase-only DOEs which are capable to generate complicated pattern of traps organized not only in plane but also in volume. A new approach has been pioneered by demonstrating the successful manipulation in three dimensions using DOEs obtained by adding a lens term to the blazed gratings. Direct Binary Search (DBS) has been used as a fast calculation method to obtain binary phase DOEs for three-dimensional manipulation. The developed techniques have pioneered to fabricate DOE that, illuminated by a Gaussian beam, can generates Laguerre-Gaussian or high-order Bessel beams. The full utility of the DOEs in the field of laser trapping and micromanipulation was realized with the use of computer addressed spatial light modulator (SLM) to project sequences of trap-forming DOEs almost in real time. Experiments for trapping and dynamic manipulation, a sample cell built with two microscope slides separated by sticky tape 120 µm thick and filled with 2 µm diameter silica spheres immersed in water (0.2 % concentration) was used. In order to demonstrate the possibility to move trapped particles independently in x-y-z, three micro spheres were first trapped. Once the particles trapped, these were manipulated independently. The calculation of a new DOE takes about 1 sec (since the DOE is rather big: 1024x768 pixels). The particles were moved inside a volume of about 8x8x8 µm3 with a 0.3 µm lateral increment for x-y displacements and 1 µm increment for vertical displacement along z axis. The numbers of trapped beads were increased to hundreds for 2D and tens for 3D micromanipulation. The limitation comes from the available laser power (about 1 mW is required for each trapped particle).

PATENT PENDING

Figure: Showing (a) Diffractive optical element with four phase levels represented in grey levels; the DOE is 2 µm size defined by 512x512 pixels, (b) The intensity distribution of the diffracted pattern obtained from the DOE depicted in (a) in the focal plane of a converging lens (focal length 200 mm). The size of the pattern is about 2 mm.

Figure: The optical setup used to implement multiple 3D dynamic trapping and manipulation: PC – Personal Computer, PPM – Programmable Phase Modulator, X100 – microscope objective, DM– Dichroic Mirror, CCD – Charged Couple Device sensor.

Figure: Three trapped particles moved independently in x-y-z in a 8x8x8 µm3 volume: a) the scheme of the trajectories followed by the particles; b) the superposition of 6 images taken during the movement from bottom to the top in 20s.

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Laser Fiber Collimator

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Figure: Microparticle manipulation on x-y.z. Eight beads are trapped on a circle situated in a plane orthogonal to the optical axis. Another particle is moved along the optical axis Three dimensional array consisting of eight beads disposed in two planes separated by 6 µm along the optical axis z. Figure: a) Detail (512x512 pixels) of the central part of one of the ten DOEs which generate an eight spots planar plus a an axial spot disposed in two different focal planes (f’1= 400 mm and f’1= 500 mm); there are implemented 256 phase levels, represented by different grey levels in the image; b) image of nine micro spheres trapped in the same plane; the scale bar indicates a distance of 10 µm; c) image of nine micro spheres trapped in two different planes: eight in the same plane as in Fig. 1b (z’2= 10 µm) and one in a different plane at z’2= 16 µm; d) misaligned central particle trapped almost in the centre of the circle.

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Figure: a-c) The microbeads cage built in the vicinity of a ND7 neuronal like cell: the cell is placed under the cage by moving the microscope stage; d) the cell is stressed by dynamically changing the geometry of the trapping configuration. The scale bar indicates a length of 15 microns.

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Sensors Glucose Bio-SENSOR FOR DIABETES DETECTION This sensor was developed for detection of Gluconic acid from the droplet of blood of patient. The electrode comprised of platinum (Pt-anode) and Silver (Ag-cathode). The electrodes were fabricated by Electron Beam Lithography. The reaction mechanism for detection of Gluconic acid is based on following reaction:

β-D-Glucose+ O2 Gluconic Acid +H2O2 (1.5µl) Anode (Pt) + H2O2 O2+2H++2e- The technology developed had been released throgh Instituto Nazionale per Fisica del Materiale (INFM) for commercial production.

SnO2 based Gas-SENSOR (Technology Released through INFM, Italy)

2µm-wires80nm-wires

Technology for Fabrication of 3-D Photonic Crystal with embedded Wave-Guide Defects

Figure shows the embedded wave-guide inside the 3-D Photonic Crystal.

2-International Patents Granted. In USA and Europe.

Fiber-Wave Guide Optical Coupling using Nanofabrication

Patent Pending

resume :prof. rakesh kumar, ch.charan singh university, meerut, … rakesh... · 2010-06-16 ·...

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