Report copyright - PVD ポスト デポ 希土類酸化膜 HfO2 技術 Ta2O5 NH3+Al2O3/ZrO2 La2O3 SiO2 Nitrided SiO2 Tox Electrcal Equivalent (nm) Current Density (A/cm2) 23.3 26.1 27.0 9.62 16.9 15.6
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