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PN Junction
Dr. Abdallah Hammad Assistant professor
Faculty of Engineering at Shoubra Benha University
ECE 111
Objective
• band diagram • pn-junction • depletion region • depletion width • built-in potential • biased junction
Selected areas covered in this lecture:
Dr. Abdallah Hammad (2012-2013)
Charter member of the family of all the solid state devices. Basic theory of operation of p-n junctions is essential to the understanding of all the other devices. Many of these devices also contain parasitic p-n junctions. It is essential to understand how these parasitic junctions affect the performance of the main device. What are p-n junctions? In part I of this course we focused on semiconductors which are either n-type or p-type. Now we will study the behavior of samples that are doped with different type of impurities in different parts of the sample.
P-N Junctions - Introduction
Dr. Abdallah Hammad (2012-2013)
P-N Junction formation technology
There are three main methods of formation of p-n junctions: Diffusion
Start with an n-type wafer. Diffuse a p-type impurity at a high temperature. Or start with a p-type wafer and diffuse an n-type impurity. In both cases a p-n junction is formed near the surface of the wafer. Typical junction depths are a few microns.
Ion implantation Start with an n-type wafer and shoot ions of a p-type impurity. Ion energies typically 50 - 200 KeV. Alternatively, implant ions of an n-type impurity into a p-type substrate.
Epitaxy Start with an n-type wafer. Deposit a thin layer of p-type Si epitaxially (single crystal Si).
The first two techniques are extensively used in Si technology. Epitaxial junctions are more common in GaAs technology.
Dr. Abdallah Hammad (2012-2013)
Step junction versus linearly graded junction
Step junction: If the conductivity type changes abruptly at some plane, then the junction is called a step junction or abrupt junction. Epitaxial method results in abrupt junctions. The plane x= xj at which the conductivity type changes is called the junction-plane or the metallurgical junction.
X<Xj, NA > ND (usually ND on the p-side is very small) X> Xj, ND >NA (usually NA n-side is very small)
Dr. Abdallah Hammad (2012-2013)
Linearly graded junctions: Diffused junctions are generally linearly graded junctions. The plane X=Xj at which ND = NA is called the junction plane.
» For x < Xj, NA > ND (p-type) » For x > Xj, ND > NA (n-type) » At X=Xj, n= p= ni. Hole concentration (p= NA-ND)
increases linearly to the left of Xj. Electron (n= ND-NA) concentration increases linearly to the right of Xj
Dr. Abdallah Hammad (2012-2013)
abrupt junction
p-type
NA
n-type
ND
Dr. Abdallah Hammad (2012-2013)
pn-junction in thermal equilibrium
EFno
EC
EV
Ei
p-type
EFpo
n-type
EC
EV
Ei
Eg
EFno
EC
EV
Ei
p-type
EFpo
n-type
EC
EV
Ei
before connection
connection
Dr. Abdallah Hammad (2012-2013)
0=dx
dEFfor thermal equilibrium consequence: the Fermi levels in the p- and n-type semiconductors must be equal
requirement of thermal equilibrium
EFn
EC
EV
Ei
ener
gy
EFp
EC
EV
Ei
biqV built-in potential (diffusion potential)
After connection
Dr. Abdallah Hammad (2012-2013)
depletion region
EF
EC
EV
Ei
ener
gy
EF
EC
EV
Ei
char
ge d
ensi
ty
DqN
AqN−
Dr. Abdallah Hammad (2012-2013)
depletion region ch
arge
den
sity
DqN
AqN−
depletion region
neutral region neutral region
metallurgical junction
Dr. Abdallah Hammad (2012-2013)
depletion region po
tent
ial
char
ge d
ensi
ty
DqN
AqN−
E-fie
ld
biV
Dr. Abdallah Hammad (2012-2013)
At equilibrium condition the drift current due to the electric field must exactly cancel the diffusion current due to the concentration gradient
0p p pdpJ qμ p qDdx
= − =E
0=+=dxdnqDnqμJ nnn E
Thermal equilibrium condition
1D Poisson’s equation:
[ ])()()()(
)()()(2
2
xnxpxNxNεq
εxρ
dxxd
dxxψd
AD
s
−+−−=
=−=−=E ψ - electrostatical potential
ρ
εs - space charge density
- semiconductor permittivity
Dr. Abdallah Hammad (2012-2013)
εqN
dxxd
dxxψd A−=−=
)()(2
2 E for 0<≤− xxp
for nxx ≤<0ε
qNdx
xddx
xψd D=−=)()(
2
2 E
Poisson’s equation for abrupt junction
junction potential
DqN
AqN−
biV
nxpx−
x
x
x
ψ
ρ
E
0)(=
dxxdE
Dr. Abdallah Hammad (2012-2013)
electric field distribution
DqN
AqN−
biV
nxpx−
x
x
x
εAqN
dxxd −
=)(E
1)( EE +−= xqNx A
ε
pA xqN
ε−=1E
( )pA xxqNx +−=
ε)(E
ψ
ρ
E
Dr. Abdallah Hammad (2012-2013)
electric field distribution
DqN
AqN−
biV
nxpx−
x
x
x
εDqN
dxxd
=)(E
2)( EE += xqNx D
ε
nD xqN
ε−=2E
( )nD xxqNx −=
ε)(E
ψ
ρ
E
Dr. Abdallah Hammad (2012-2013)
maximum electric field
nD
pA xqNxqN
εε−=−== )0(max EE
pDpA xNxN =consequence:
nx xpx−
potential distribution
dxsdx )()( ψ
−=E
∫−= dxxs )()( Eψ
Dr. Abdallah Hammad (2012-2013)
potential distribution
DqN
AqN−
biV
nxpx−
x
x
x
( )dxxxqNx pA∫ +=
εψ )(
1
2
2ψ
ε+
+= xxxqN
pA
2
2
1pA xqN
εψ =
0)( =− pxψwith
( )22
)( xxqNx pA +=ε
ψ
ψ
ρ
E
0px x− < <
Dr. Abdallah Hammad (2012-2013)
potential distribution
DqN
AqN−
biV
nxpx−
x
x
x
( )dxxxqNx nD∫ +=
εψ )(
2
2
2ψ
ε+
−=
xxxqNn
D
2
2
2nD
bixqNV
εψ −=
bin Vx =)(ψwith
( )22
)( xxqNVx nD
bi −−=ε
ψ
ψ
ρ
E
0 nx x< <
Dr. Abdallah Hammad (2012-2013)
built-in potential
( )22
)( xxqNx pA +=ε
ψ( )22
)( xxqNVx nD
bi −−=ε
ψ
for 0=x both expressions
must give the same value:
22
22)0( p
An
Dbi xqNxqNV
εεψ =−=
( )22
2 pAnDbi xNxNqV +=ε
Dr. Abdallah Hammad (2012-2013)
depletion width
( )22
2 pAnDbi xNxNqV +=ε nDpA xNxN =
+=
+=
A
DDn
A
nDAnDbi N
NNqxN
xNNxNqV2
22
2
22 εε
biDAD
An V
NNNN
qx 2
2+
=ε
pnd xxx +≡
biAAD
Dp V
NNNN
qx 2
2+
=ε
+=
+
= A
D
ApnA
D
pADbi N
NNqxxN
NxN
NqV2
222
22 εε
Dr. Abdallah Hammad (2012-2013)
depletion width
biDAD
An V
NNNN
qx 2
2+
=ε
biAAD
Dp V
NNNN
qx 2
2+
=ε
( )
( )( )
biAD
DA
ADDA
DADAbi
biADA
Dbi
DAD
A
biADA
Dbi
DAD
Apnd
VNNNN
qNNNNNNNNV
q
VNNN
Nq
VNNN
Nq
VNNN
Nq
VNNN
Nq
xxx
+=
+++
=+
⋅+
⋅+
++
+=+=
εε
εε
εε
222
222
22
22
22
2222
( )bi
AD
DAd V
NNNN
qx +
=ε2
Dr. Abdallah Hammad (2012-2013)
one-side abrupt junction
if
D
bind qN
εVxx 2=≅
( )bi
AD
DAd V
NNNN
qx +
=ε2
np xx <<
Dr. Abdallah Hammad (2012-2013)
potential vs. carrier concentration
=−= 2ln
i
ADpnbi n
NNq
kTψψV
The derivation will be done in the lecture:
Dr. Abdallah Hammad (2012-2013)
E [eV]
x
qVbi EFn EFp
EC
EV
EFi pqψ−
nqψ
n-type p-type
P N
unbiased junction
EFp EFn
x
q(Vbi-VF) E [eV]
EC EFi
n-type
p-type
P N + - IF
-qVF forward-biased junction
Dr. Abdallah Hammad (2012-2013)
p n + - IR EV q(Vbi+VR)
E [eV]
EFp
EC
EFn qVR
reverse-biased junction
generalized depletion layer width
( )B
bid qN
VVεx −=
2
NB – lightly doped bulk concentration V - positive for FB, negative for RB
Dr. Abdallah Hammad (2012-2013)