Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods andApplications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas.

The book provides a comprehensive overview of related phenomena such as plasma

bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant

technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown

spectroscopy, and laser-induced fluorescence measurement, and explores the

increasing research on atmospheric pressure nonequilibrium plasma jets. The authors

also discuss how low temperature plasmas are used in the synthesis of nanomaterials,

environmental applications, the treatment of biomaterials, and plasma medicine.

Features

• Focuses on the modeling of low pressure plasma and its use in nanomaterials,

atmospheric pressure plasma generation, diagnostics, and industry applications

• Describes the most promising methods for generating atmospheric pressure

nonequilibrium plasmas such as microplasmas and nanosecond pulsed discharge plasmas

• Classifies plasma jet devices into several categories based on their electrode

configurations and discusses the interesting phenomenon of plasma bullet

behavior

• Examines the principles of advanced diagnostic methods, including cavity

ringdown spectroscopy and laser-induced fluorescence, and offers tips to improve your experiments

This book provides a balanced and thorough treatment of the core principles, novel

technology and diagnostics, and state-of-the-art applications of low temperature

plasmas. It is accessible to scientists and graduate students in low-pressure plasma

physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.

ISBN: 978 - 1-4665-0990-0

I 1111111 90000 9 781466 509900 II lilll 111111 II

Low TemperaturePlasma

TechnologyMethods and Applications

Edited by

Paul K. ChuXinPei Lu

CRCPress Taylor & Francis Group 6000 Broken Sound Parkway NW, Suite 300 Boca Raton, FL 33487-2742

© 2014 by Taylor & Francis Group, LLC CRC Press is an imprint of Taylor & Francis Group, an Informa business

No claim to original U.S. Government works

Printed on acid-free paper Version Date: 20130214

International Standard Book Number-13: 978-1-4665-0990-0 (Hardback)

This book contains information obtained from authentic and highly regarded sources. Reasonable efforts have been made to publish reliable data and information, but the author and publisher cannot assume responsibility for the validity of all materials or the consequences of their use. The authors and publishers have attempted to trace the copyright holders of all material reproduced in this publication and apologize to copyright holders if permission to publish in this form has not been obtained. Ifany copyright material has not been acknowledged please write and let us know so we may rectify in any future reprint.

Except as permitted under U.S. Copyright Law, no part of this book may be reprinted, reproduced, transmitted, or utilized in any form by any electronic, mechanical, or other means, now known or hereafter invented, including photocopying, microfilming, and recording, or in any information storage or retrieval system, without written permission from the publishers.

For permission to photocopy or use material electronically from this work, please access www.copyright.com (http:// www.copyright.coml) or contact the Copyright Clearance Center, Inc. (CCe), 222 Rosewood Drive, Danvers, MA 01923, 978-750-8400. CCC is a not-for-profit organization that provides licenses and registration for a variety of users. For organizations that have been granted a photocopy license by the CCC, a separate system of payment has been arranged.

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Library ofCongress Cataloging-in-Publication Data

Low temperature plasma technology: methods and applications! edited by Paul K. Chu and XinPei Lu. pagescm Includes bibliographical references and index. ISBN 978-1-4665-0990-0 (hardback) 1. Low temperature plasmas. 2. Low temperature plasmas--Industrial applications. 3. Low

temperature plasmas--Scientific applications. I. Chu, Paul K.

QC718.5.L6L6942013 621.5'6--dc23 2013001659

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and the CRC Press Web site at http://www.crcpress.com

http:http://www.crcpress.comhttp:http://www.taylorandfrancis.comwww.copyright.comlhttp:www.copyright.com

CRC PressTaylor & Francis Group6000 Broken Sound Parkway NW, Suite 300Boca Raton, FL 33487-2742

© 2014 by Taylor & Francis Group, LLCCRC Press is an imprint of Taylor & Francis Group, an Informa business

No claim to original U.S. Government worksVersion Date: 20130214

International Standard Book Number-13: 978-1-4665-0991-7 (eBook - PDF)

This book contains information obtained from authentic and highly regarded sources. Reasonable efforts have been made to publish reliable data and information, but the author and publisher cannot assume responsibility for the valid-ity of all materials or the consequences of their use. The authors and publishers have attempted to trace the copyright holders of all material reproduced in this publication and apologize to copyright holders if permission to publish in this form has not been obtained. If any copyright material has not been acknowledged please write and let us know so we may rectify in any future reprint.

Except as permitted under U.S. Copyright Law, no part of this book may be reprinted, reproduced, transmitted, or uti-lized in any form by any electronic, mechanical, or other means, now known or hereafter invented, including photocopy-ing, microfilming, and recording, or in any information storage or retrieval system, without written permission from the publishers.

For permission to photocopy or use material electronically from this work, please access www.copyright.com (http://www.copyright.com/) or contact the Copyright Clearance Center, Inc. (CCC), 222 Rosewood Drive, Danvers, MA 01923, 978-750-8400. CCC is a not-for-profit organization that provides licenses and registration for a variety of users. For organizations that have been granted a photocopy license by the CCC, a separate system of payment has been arranged.

Trademark Notice: Product or corporate names may be trademarks or registered trademarks, and are used only for identification and explanation without intent to infringe.

Visit the Taylor & Francis Web site athttp://www.taylorandfrancis.com

and the CRC Press Web site athttp://www.crcpress.com

v

Contents

Preface......................................................................................................................vii

Editors Note .............................................................................................................. ix

Contributors ............................................................................................................. xi

Section i Fundamentals

1 Introduction ....................................................................................................................... 3DaWe Liu and XinPei Lu

2 Atmospheric Pressure Plasmas ................................................................................... 13Peter J. Bruggeman

Section ii Processing and characterization

3 Modeling of Low-Pressure Plasmas ................................................................................. 41Wei Jiang, Yu-ru Zhang, and You-nian Wang

4 Modeling of Atmospheric Pressure Plasmas ........................................................... 61Yanhui Wang, Jizhong Sun, and Dezhen Wang

5 High-Pressure Microcavity Discharges .................................................................... 97Karl H. Schoenbach

6 Atmospheric Pressure Nanosecond Pulsed Discharge Plasmas .......................119Zdenko Machala, David Z. Pai, Mario Janda, and Christophe O. Laux

7 On Atmospheric Pressure Nonequilibrium Plasma Jets .....................................173XinPei Lu

8 Cavity Ringdown Spectroscopy of Plasma Species ............................................. 207Chuji Wang

9 Laser-Induced Fluorescence Methods for Transient Species Detection in High-Pressure Discharges ..................................................................................... 261Santolo De Benedictis and Giorgio Dilecce

vi Contents

Section iii Applications

10 Plasma Technology in Silicon Photovoltaics ........................................................ 287Shaoqing Xiao, Shuyan Xu, and Haiping Zhou

11 Environmental Applications of Plasmas .................................................................311Keping Yan

12 Assessment of Potential Applications of Plasma with Liquid Water ............. 367Peter J. Bruggeman and Bruce R. Locke

13 Plasma-Assisted Surface Modification of Polymeric Biomaterials ................. 401Nathalie De Geyter, Peter Dubruel, Rino Morent, and Christophe Leys

14 Emerging Applications of Plasmas in Medicine: Fashion versus Efficacy ....419Chunqi Jiang

15 Plasma Surface Engineering of Titanium-Based Materials for Osseointegration .................................................................................................... 443Huiliang Cao and Xuanyong Liu

Index ....................................................................................................................... 475

vii

Preface

During the last few decades, low-temperature plasmas, especially atmospheric pressure plasmas, which are driven by several urgent applications including plasma medicine and treatment of biocompatible materials, have attracted much attention. In order to meet the ever-increasing requirements, novel methods have been proposed since the mid-1990s, for example, using nanosecond voltage pulses rather than DC or kHz AC voltages to drive the plasmas, generating plasmas by using confined micro-discharge gaps, and generating plasma in open space (plasma jets). At the same time, in order to better understand the various plasma characteristics, there have been major advances in plasma diagnostics such as cavity ringdown spectroscopy and laser-induced fluorescence methods. On the heels of these developments, applications of low-temperature plasmas have been extended to various fields, includ-ing nanomaterials, environment, liquid treatment, biocompatible materials treatment, and plasma medicine.

The objective of this book is to summarize recent technological advances and research in the rapidly growing field of low-temperature plasmas and their applications. The book is intended to provide a com-prehensive overview of the related phenomena such as plasma bullets, plasma penetration into biofilms, the discharge mode transition of atmospheric pressure plasmas, self-organization of microdischarges, and so on. It also describes relevant technology and diagnostics such as nanosecond pulsed discharge, cavity ringdown spectroscopy, laser-induced fluorescence measurement, and also fast-developing research on atmospheric pressure nonequilibrium plasma jets. Finally, applications of low-temperature plasmas, including synthesis of nanomaterials, environmental applications, treatment of biomaterials, and plasma medicine will be discussed. All in all, this book will provide a balanced and thorough treatment of the core principles, relevant novel technologies and diagnostics, and state-of-the-art applications of low- temperature plasmas.

Although the book focuses mainly on low-temperature plasmas and related topics, the scope of this book is actually quite wide. In order to ensure high quality, we are very happy to have renowned authors from many different countries including Italy, the Netherlands, Belgium, the United States, France, Slovakia, Singapore, and the People’s Republic of China. These authors are pioneers in the respective fields. For example, Prof. Schoenbach, the contributor of Chapter 5 on high-pressure micro-cavity discharges, was the first to report stable high-pressure operation of microdischarges, even in air, in a cylindrical hollow cathode geometry. His group innovated the term “microhollow cathode discharges (MHCDs)” for these discharges, and it is well adopted by others to describe the three-layer configuration. Other contributors such as Profs. Y.N. Wang, D.Z. Wang, C.O. Laux, S. De Benedictis, C. Wang, C. Leys, S.Y. Xu, B.R. Locke, K.P. Yan, and X.Y. Liu have been known for decades for their excellent contributions to their fields.

This book is intended for graduate students and scientists working in low-pressure plasmas, atmospheric pressure plasmas, plasma diagnostics, plasma nanotechnology, and plasma medicine.

viii Preface

It  is  written at a level appropriate for graduate education in low-temperature plasma physics and materials science and has relevance in biology, chemistry, and engineering. The book also constitutes an excellent advanced reference for senior college students who want to pursue research in these topics on the graduate level.

XinPei Lu and Paul K. ChuEditors

ix

Editors Note

Paul K. Chu received his BS in mathematics from the Ohio State University in 1977 and his MS and PhD in chemistry from Cornell University in 1979 and 1982, respectively. He is Chair Professor of Materials Engineering in the Department of Physics and Materials Science in City University of Hong Kong. Paul’s research activi-ties are quite diverse, encompassing plasma surface engineering and various types of materials and nanotechnology. Professor Chu has coedited 8  books on plasma science, biomedical engineering, and nanotechnology, special issues in IEEE Transactions of Plasma Science and Surface and Coatings Technology, as well as MRS proceedings. He has coauthored more than 30 book chapters, 1100 journal papers, and 800 conference papers. He has also been granted numerous patents in the United States, Europe, and the People’s Republic of China. He is chairman of the Plasma-Based Ion Implantation and Deposition (PBII&D) International Committee and member of the Ion Implantation Technology (IIT) International Committee and IEEE Nuclear and Plasma Science Society Fellow Evaluation Committee. He is fellow of the IEEE, APS, AVS, MRS, and HKIE (Hong Kong Institution of Engineers), senior editor of IEEE Transactions on Plasma Science, and associate editor of Materials Science & Engineering Reports. Professor Chu is also an editorial board member of international journals that include Biomaterials, Plasma Sources Science and Technology, and Surface and Coatings Technology, and he has won a number of awards, includ-ing the 2007 IEEE NPSS Merit Award.

XinPei Lu received his PhD in electrical engineering from the Huazhong University of Science and Technology, Hubei, People’s Republic of China. Upon graduation, he worked at Old Dominion University as a research associate for 4 years. In 2007, he joined Huazhong University of Science and Technology, where he is now a professor (Chang Jiang Scholar) with the College of Electrical and Electronic Engineering. He is a senior member of IEEE. He has also served as a guest editor for IEEE Transactions on Plasma Science and as a session chair at the International Conference on Plasma Science since 2007. He has given many invited talks at international confer-ences, including the IEEE International Conference on Plasma Science. His research interests include low-temperature plasma sources and their biomedical applications, modeling of low-temperature plasmas, and plasma diagnostics. He is the author or coauthor of about 50  peer-reviewed journal articles and holds six patents in these areas.

xi

Contributors

Peter J. BruggemanDepartment of Applied PhysicsEindhoven University of TechnologyEindhoven, the Netherlands

Huiliang CaoShanghai Institute of CeramicsChinese Academy of SciencesShanghai, People’s Republic of China

Santolo De BenedictisCNR Istituto di Metodologie Inorganiche e dei

PlasmiUnità Organizzativa di Supporto di BariBari, Italy

Nathalie De GeyterDepartment of Applied PhysicsGhent UniversityGhent, Belgium

Giorgio DilecceCNR Istituto di Metodologie Inorganiche e dei

PlasmiUnità Organizzativa di Supporto di BariBari, Italy

Peter DubruelDepartment of Organic ChemistryGhent UniversityGhent, Belgium

Mario JandaDepartment of Astronomy, Earth Physics

and MeteorologyComenius UniversityBratislava, Slovakia

Chunqi JiangDepartment of Electrical EngineeringUniversity of Southern CaliforniaLos Angeles, California

Wei JiangSchool of PhysicsHuazhong University of Science and TechnologyHubei, People’s Republic of China

Christophe O. LauxDepartment of Astronomy, Earth Physics

and MeteorologyComenius UniversityBratislava, Slovakia

Christophe LeysDepartment of Applied PhysicsGhent UniversityGhent, Belgium

DaWe LiuState Key Laboratory of Advanced

Electromagnetic Engineering and TechnologyHuazhong University of Science and TechnologyHubei, People’s Republic of China

Xuanyong LiuShanghai Institute of CeramicsChinese Academy of SciencesShanghai, People’s Republic of China

Bruce R. LockeDepartment of Chemical and Biomedical

EngineeringFlorida State UniversityTallahassee, Florida

xii Contributors

XinPei LuState Key Laboratory of Advanced

Electromagnetic Engineering and TechnologyHuazhong University of Science and TechnologyHubei, People’s Republic of China

Zdenko MachalaDepartment of Astronomy, Earth Physics

and MeteorologyComenius UniversityBratislava, Slovakia

Rino MorentDepartment of Applied PhysicsandDepartment of Organic ChemistryGhent UniversityGhent, Belgium

David Z. PaiDepartment of Astronomy, Earth Physics

and MeteorologyComenius UniversityBratislava, Slovakia

Karl H. SchoenbachFrank Reidy Research Center for BioelectricsOld Dominion UniversityNorfolk, Virginia

Jizhong SunDepartment of PhysicsDalian University of TechnologyDalian, People’s Republic of China

Chuji WangDepartment of Physics and AstronomyMississippi State UniversityMississippi State, Mississippi

Dezhen WangDepartment of PhysicsDalian University of TechnologyDalian, People’s Republic of China

Yanhui WangDepartment of PhysicsDalian University of TechnologyDalian, People’s Republic of China

You-nian WangSchool of Physics and Optoelectronic

TechnologyDalian University of TechnologyDalian, People’s Republic of China

Shaoqing XiaoNIE and Institute of Advanced StudiesNanyang Technological UniversitySingapore

Shuyan XuNIE and Institute of Advanced StudiesNanyang Technological UniversitySingapore

Keping YanDepartment of Chemical and Biological

EngineeringZhejiang UniversityHangzhou, People’s Republic of China

Yu-ru ZhangSchool of Physics and Optoelectronic TechnologyDalian University of TechnologyDalian, People’s Republic of China

Haiping ZhouNIE and Institute of Advanced StudiesNanyang Technological UniversitySingapore

b15153-1.pdfContentsPrefaceEditors NoteContributors