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Photoelectrochemical Water Splitting 2004 DOE Hydrogen, Fuel Cells & Infrastructure Technologies Program Review John A. Turner National Renewable Energy Laboratory [email protected] 303-275-4270 May 24-27, 2004 This presentation does not contain any proprietary or confidential information.

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Page 1: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Photoelectrochemical WaterSplitting

2004 DOE Hydrogen, Fuel Cells & Infrastructure TechnologiesProgram Review

John A. Turner

National Renewable Energy [email protected] 303-275-4270

May 24-27, 2004

This presentation does not contain any proprietary or confidential information.

Page 2: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Photoelectrochemical ConversionGoals and Objectives

1. Identify and characterize new semiconductor materials that have

appropriate bandgaps and are stable in aqueous solutions.

2. Study multijunction semiconductor systems for higher efficiency water

splitting.

3. Develop techniques for the energetic control of the semiconductor

electrolyte interphase.

4. Develop techniques for the preparation of transparent catalytic

coatings and their application to semiconductor surfaces.

5. Identify environmental factors (e.g., pH, ionic strength, solution

composition, etc.) that affect the energetics of the semiconductor, the

properties of the catalysts, and the stability of the semiconductor.

The goal of this research is to develop a stable, cost effective,

photoelectrochemical based system that will split water using sunlight

as the only energy input. Our objectives are:

Our work this year has only been on Objective #1

Page 3: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Budget

Funding for FY2004 = $400k

Staff:– Todd Deutsch, PhD Student, University

of Colorado

– Jennifer Leisch, PhD Student, ColoradoSchool of Mines

+ +

Page 4: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

PEC Targets from Multi-Year Plan

522360Projected H2

Cost ($/kg)

20,00010,0001,000Durability(hours)

1497.5Solar-to-hydrogen

efficiency (%)

201520102005Target Dates

2010 goal: Projected Cost of PEC hydrogen within 50% of thatfor PV/Electrolysis.

Current NREL Status is a 12% efficiency, but only a 20-hour lifetime.

Page 5: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Technical Challenges (the big three)Barriers for Photoelectrochemical Hydrogen Production

• Material Durability: Barrier M– The most photochemically stable semiconductors in aqueous solution are

oxides, but their band gaps are either too large for efficient light absorption(~3 eV), or their semiconductor characteristics are poor.

• Efficiency (Bandgap): Barrier O– For reasonable solar efficiencies, the band gap must be less than about 2.2

eV, unfortunately, most useful semiconductors with bandgaps in this rangeare photochemically unstable in water.

• Energetics: Not Included in Multi-Year Plan– In contrast to metal electrodes, semiconductor electrodes in contact with

liquid electrolytes have fixed energies where the charge carriers enter thesolution. So even though a semiconductor electrode may generatesufficient energy to effect an electrochemical reaction, the energeticposition of the band edges may prevent it from doing so. For spontaneouswater splitting, the oxygen and hydrogen reactions must lie between thevalence and conduction band edges, and this is almost never the case.

Page 6: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Summary of Approach

GaInP2 - NREL (fundamental materials understanding)

GaPN - NREL (high efficiency, stability)

InGaN - CSM, NREL, (high efficiency, stability)

CuInGa(Se,S)2 - UNAM (Mexico), NREL (Low cost)

Multi-junction Amorphous Silicon - University of Toledo andECD (Low cost)

EnergeticsBand edge control

Catalysis

Surface studies

The primary task is to synthesize the semiconducting material or thesemiconductor structure with the necessary properties. This involvesmaterial research issues (material discovery), multi-layer design andfabrication, and surface chemistry. Activities are divided into the task areasbelow – funded ones in black:

Page 7: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

PEC Project Timeline

• Phase I - Feasibility1 Project definition and laboratory set-up2 Materials identification, experimental design and implementation.

• Phase II – Development of High-Efficiency directwater splitting system.3 Select materials and structure4 Structural modification and testing5 World Record result – 12.4% solar-to-hydrogen (Science)

• Phase III – Alternative materials for longer lifetimeand lower costs.6 Studies of a-Si triple junctions7 Low cost thin-films8 Nitrides for longer lifetimes

Phase I Phase II Phase III

10/91 - 9/94 10/95-9/99 10/99-9/04

1 2 3 4 5 6 7 8

Page 8: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Band Edges of p- and n-TypeSemiconductors Immersed in Aqueous Electrolytes to Form

Liquid Junctions

Econduction

Evalence

O2

H2

Econduction

Evalence

2H2O +

2e – = 2OH – + H

H2O +

2h+ = 2H+ + 1/2 O

2

P158-A199107

n-type

p-type

2

Page 9: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Material and Energetic Criteria

Band Gap (Eg) must be atleast 1.6-1.7 eV.

Band Edges must straddleH2O redox potentials

Rapid charge transfer

Stable in aqueous solution

1.23 eV

1.6-1.7 eV

p-typeSemiconductor

Eg

CounterElectrode

H2O/H2

H2O/O2

All must besatisfied

simultaneously

Page 10: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

10-8

10-7

10-6

1x10-5

1x10-4

10-3

10-2

10-1

100

-2.0

-1.5

-1.0

-0.5

0.0

0.5

ianodic

ianodic

icathodic

icathodic

10M KOH

under illumination

dark

E (V

) vs

SC

E

log i (log(A/cm2))

Potentiodynamic Curves for p-GaInP2 - Base

In order to meet lifetime goals we must discover materials with inherentlyhigher stability.

Page 11: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

One possibility is nitride materials, anexample of which is p-GaN

10-8

10-7

10-6

10-5

10-4

10-3

-1.0

-0.5

0.0

0.5

1.0

dark

under illumination

icathodic

icathodic

ianodic

ianodicp-GaN

0.1 M KOH

E (

V)

vs S

CE

log i(log(A/cm2))

0 1000 2000 3000 4000

1.0x10-5

2.0x10-5

3.0x10-5

4.0x10-5

5.0x10-5

6.0x10-5

7.0x10-5

8.0x10-5

9.0x10-5

1 M KOH pH 7 buffer 3 M H

2SO

4

Cu

rre

nt

de

nsi

ty (

A/c

m2

)

Time (s)

It shows excellent stability…

…and water splitting capability

But…>3.0eV bandgap

Page 12: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Preliminary Investigation of GaPxN(1-x) forPEC Water Splitting Systems

with Professor Carl Koval University of Colorado at Boulder

Direct Photoresponse ME087-2

y = 9E-08x - 2E-07

R2 = 0.9926

Eg=1.88 eV

0

0.000000005

0.00000001

0.000000015

0.00000002

0.000000025

0.00000003

1 .5E+00 1 .6E+00 1 .7E+00 1 .8E+00 1 .9E+00 2 .0E+00 2 .1E+00 2 .2E+00 2 .3E+00

Energy (eV)

(Norm

alized

Photo

curr

ent)

^2Electrode % Nitrogen Meas. Direct Eg

ME477-3 1.6 2.07

ME477-4 1.6 2.06

ME460-3 2.1 2.01

ME460-4 2.1 2.01

ME463-3 2.6 2

ME463-4 2.6 2

ME461-3 3.5 1.96

ME461-4 3.5 1.96

Page 13: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Corrosion analysis for GaPN

-2.00

-1.50

-1.00

-0.50

0.00

0.50

1.00

1.0E-11 1.0E-10 1.0E-09 1.0E-08 1.0E-07 1.0E-06 1.0E-05 1.0E-04 1.0E-03 1.0E-02 1.0E-01 1.0E+00

Curent Density (Amps/cm^2)

E (

Vo

lts

vs

. A

g/A

gC

l)

3M sulfuric acid

3M sulfuric acid

1M KOH

1M KOH

1 SunDark

These low bandgap nitride materials exhibit exceptional stability.

Page 14: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

GaPN - Preliminary Results

(Preliminary two-electrode multimeter measurementsin acid (in mV and microA except where noted). Ptcounter electrode.)

Electrode Dark OCP 6sun OCP Dark SSC 6sun SSC type

MF097-1

-28 -1.45 V 0.1 -3.5 mA n

MF097-2

-20 -1.49 V 0.1 -5.0 mA n

MF097-3

-7 -0.67 V 0.1 -3.0 mA n

MF097-4

-5 -0.81 V 0.1 -1.5 mA n

MF098-1

16 250 0.05 0.4 p

MF098-2

-201 -3 -0.3 -0.4 p

MF098-3

-230 28 -0.25 0.2 p

MF098-4

-203 3 -0.1 0.2 p

Page 15: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

• Dependence on sulfurcontent noted.

• However, this is convolutedby varying concentrations ofother elements (5component system!)

Goal: Consistent synthesis of highbandgap material

New Materials - Band Gap Requirements forElectrodeposited CIGSS

Page 16: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Technical Challenges (Cont.)

• Catalysts:

– Oxygen (most important -- highest energy loss).

– Hydrogen

– Transparency might be necessary

– Non-precious metal (lower current density!)

• Band edge engineering

• Semiconductor hybrid designs

• Low cost system designs featuring passivecontrols

Page 17: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Project Safety• Hydrogen generation from our samples is small (a few µl/min), so

no special precautions over standard engineering controls forchemical laboratories are taken at this time.

– Sample sizes are small (<0.5 cm2) so hydrogen production evenfrom the most efficient cells is low.

– Cells are open to allow rapid diffusion of the hydrogen (no build-up).

– Air exchanges are 6-10/hour in the lab.

– For PEC H2 and O2 are produced at separated electrodes.

• For scale-up, a complete hazard identification and riskassessment will be done to identify issues relating to personnel,equipment and environmental factors.

– Hardware and material analysis will be done to identify possiblecomponent failure modes.

– This will be integrated into the design of the test facility and modules,and guide the write-up of the operational procedures.

Page 18: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Collaborations

In the USColorado School of MinesUniversity of ColoradoProgram Production Solicitation

Outside of the USSwitzerland, Mexico, Armenia, Sweden, Japan

Page 19: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

1. Focus on candidate lightabsorbing materials.

2. Efforts should continue toinclude amorphous siliconphotoelectrodes as well as othernewer materials.

3. Without some intermediate goals,the work will go on for 5 yearswithout an off-ramp strategy.

4. Concentrating on thesemiconductor and PEC devicehas left him less time for catalystquestions – developing theelectrodes for the O2 and H2generation.

1. Focused on nitrides and thin-film CIGSSe material

2. No funding for a-Si

3. Intermediate goals concentrateon specific material studies.Materials with poor propertiesare discarded, e.g. themultijunction GaInP2 systemand GaAsPN.

4. No funding for catalystsstudies.

“A great apostle of the program to a skeptical industrial world.”

Reviewers’ Comments from 2003 Poster

Comments Response

Page 20: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

PEC Project Timeline - Outyears

• Phase IV – Synthesis and characterization ofNitride materials and thin-film materials

9 GaNP and CuInSSe materials – perhaps a-Si10 GaInN materials

• Phase V –High-Efficiency direct water splittingsystem based on nitrides.

11 Select materials and structure12 Structural modification and testing13 8% and 1000 hours

• Phase VI – Module development and testing14 Design development and safety assessment15 Build and test16 IPO and retire!

Phase IV Phase V Phase VI

10/04 - 9/05 10/05-9/06 10/06-9/10

9 10 11 12 13 14 15

Page 21: Photoelectrochemical Water Splitting - Energy.gov · Nitride materials and thin-film materials 9 GaNP and CuInSSe materials – perhaps a-Si 10 GaInN materials • Phase V –High-Efficiency

Future Plans

• Remainder of FY2004:– Continue evaluation of nitride material

– Continue evaluation of thin-film CIGSSe

• For FY2005:– Additional materials with LBNL, CSM, …

– Coatings: SiN, SiC, …

– Band-edge engineering (perhaps with Office ofScience.

– Multijunction structures