non-contact sheet resistance testing for thin films and...
TRANSCRIPT
Non-Contact Sheet Resistance Testing for Thin Films and Multi-Layer Systems
SURAGUS GmbH Maria-‐Reiche-‐Str. 1 D-‐01109 Dresden Germany
Office: +49 351 27 35 98 01 Fax: +49 351 32 99 20 58 E-‐Mail: [email protected]
Cer%fied Quality Management System for development, manufacturing and sales of non-‐destruc%ve tes%ng
equipment (NDT) in compliance with ISO 9001:2008.
Contactless sheet resistance mapping of TCO layers
Determination of optical transmission
Sheet Resistance Ohm
/sq 20 mm 20 mm
Accuracy in comparison to actual values
LeP: Four-‐point probe (RM3-‐AR Jandel) with 100 points manual measurement
Right: Automated Eddy Current C-‐Scan with EddyCus® TF map 2020SR
Inline sheet resistance measurement
Conductivity mapping of thin films on wafer
Thin-Film monitoring of: § Transparent Conductive Oxides (ITO, ZnO, etc.) § Metal Nanowires & Meshes § Graphene § Carbon Nanotubes § Metal layers (Al, Mo, Au, etc.)
§ Non-contact sheet resistance measurement § Simultaneous measurement of anisotropy / optical transmission § Film thickness measurement and monitoring § Inline-monitoring (ex-vacuo and in-vacuo) § Detection of deposition inhomogeneities § Imaging of conductivity-related characteristics
Characterization of Thin Films
“EddyCus® TF lab” for monitoring sheet resistance and layer thickness of conductive thin films
“EddyCus® TF map” for automated high resolu%on mapping of sheet resistance and layer thickness of conduc%ve thin films
“EddyCus® TF inline” for inline monitoring sheet resistance and layer thickness of conduc%ve thin films
Offers Fields of Application
Sheet resistance
Layer thickness
Op%cal transmission at 2 different spots
25 mm
Eddy current technology
S. Bae et al. Nature Nano. 5, 571 (2010); Daniel Neumaier; Proceedings TCO/TCM WS 2013 (2013)
A Z O o n sapphire wafer
G a N o n S i -‐wafer
G r a p h e n e o n S i O ₂ -‐wafer
Pt on Si-‐wafer
I n l i n e s h e e t r e s i s t a n c e monitoring with 3 measurement lanes
Photograph of ITO on glass
M a p p i n g o f structured ITO on glass
Supercapacitor foil
Drivers in Research & Development
Sheet resistance
vs.
op%cal transmission
25 mm
25 mm
25 mm
Line Scan 1
Line Scan 2
Line Scan 3
Eddy Current Testing Devices for Thin Film and Multi-Layer Systems
Benefits of High Frequency Tes%ng up to 100 Mhz Signal Amplitude
+ Contact-‐free
+ High sample rate
+ High sensi%vity
+ Measurement of encapsulated layers
412 3.000
0
100
1 4 7 10 13 16 19 22 25 28
Sheet
Distance from sample
Line Scan 1
New options: + Optical transmission
+ Electrical anisotropy
Sheet Resistance (Ω/sq)
Sheet Resistance (Ω/sq)
Sheet Resistance (Ω/sq)
Sheet Resistance (Ω/sq)
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