modified semi-additive process introduction · electroplating and filling holes, and at the same...
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Modified Semi-Additive Process Introduction
30 Technical Paper
Journal of the HKPCA / 2018 / Summer / Issue No. 68
Liu Binyun / Ye ShaomingGuang Dong Toneset Science&Technology Co., Ltd.
Abstract:
Key words:
The light, small and multi-functional electronic products have
led to the development of the printed circuit board on which the
lines and vias depend on the high density interconnection, but it
still cannot meet the requirements of the future development.
With the advance of the 4G LTE and the development of the
future 5G, low loss of signal transmission is required, and the
shorter line is better. If the circuit board can achieve the same
density as the IC board, and it is possible to load the IC chip
directly on it. So the concept of the IC substrate like printed
circuits board appears, but the manufacturing of this kind of
board cannot be like the high cost of the IC substrate board
manufacturing. Therefore, the mSAP new technology will be
paid attention and developed. In this paper, the manufacturing
process and requirements of mSAP are discussed, for the
reference of the workers in PCB industry.
Printed Circuits Board (PCB), High Density Interconnection PCB,
Substrate Like PCB (SLPCB), modified Semi-Additive Process
(mSAP).
With the advent of the 5G era, mobile terminals, especially
smart phones, tablet PCs, and wearable devices, have become
smaller and more versatile. Although the size of mobile phones
has not changed significantly, it is clear that components and
as PCBs continue to smaller; the level of integration has
increased significantly to accommodate greater functionality. In
a typical smart phone, most of the space is occupied by display
screens and batteries, and the remaining electronic devices
have been reduced in size and integrated into small areas,
1. Background
resulting in PCB size shrinking, high-density interconnect (HDI)
Printed Circuits Board manufacturing technology continues to
increase. PCB wire width and spacing are further narrowed to
accommodate more components; on the other hand, 5G's
massive processing capacity requires more battery capacity, as
well as more sophisticated processors and components, higher
resolution displays, etc., need to reduce PCB size to the battery
and the display. Therefore, the line width/spacing of the mobile
PCB has dropped to 30/30 m, and is expected to gradually
decrease to 20/20 m . At the same time, the size of the micro-
via/via-pad will gradually decrease from 75/200 m to
50/150 m . With the increase of wireless data transmission
bandwidth and processing speed, the signal trace density is
continuously increasing, if the pitch of the line is less than 65ìm,
it has been very difficult to produce such a line by the traditional
subtractive method. Although the semi-additive process (SAP)
used in the IC substrate board can realize more precise circuit
fabrication, but there is a problem that the manufacturing cost
is high and the production scale is small, this resulted in the
concept of a IC Substrate Like PCB (SLPCB). Therefore, it is
necessary to select a suitable process for fabricating a SLPCB,
this process must be able to meet the requirements for
electroplating and filling holes, and at the same time, fine lines
can be produced and improved. Modified Semi-Additive
Process (mSAP) can achieve this goal.
Apple leads the market in the direction of SLPCB. Typical
products are the SLPCBs used by iPhone 8 and iPhone X. At
present, the minimum line width/spacing manufactured by
mSAP technology is 30/30 m. The typical laser drilling
diameter is designed to be a micro blind hole with diameter of
70 m and thickness of dielectric layer of 50 m. CO laser
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drilling will still dominate for a period of time in the future. Status,
in the processing speed, drilling quality and production
efficiency is very advantage . The SLPCB produced by the
mSAP manufacturing process is generally a laminated structure
of micro-via holes or micro-via superimposed. For example, the
process of a ten-layer board is promulgated as follows:
The SLPCB is still a kind of hard board in the PCB, but it is
closer to the IC substrate. Currently, the line width/spacing of
the SLPCB required is becoming smaller and smaller. This
technology will reduce the occupied area of the mobile phone
mainboard, thereby increasing the space of the battery and
making batteries last longer, and also adapted to System in
Package (SiP) technology .
[3 ]
[3 ]
Figure 1. Typical SLPCB Process Design
2. Modified semi-additive process introduction
With the development of electronic interconnection, Integrated
Circuits have been widely used to mount integrated circuit
chips and other electronic components on carrier printed circuit
boards (PCBs), wafers and interposers are required. The
manufacturing of integrated circuit substrate (IC Substrate)
requires interconnection and intercommunication between lines
during assembly, and the size of the pitch varies greatly. The
micro-scale dimensions and application objects are as follows:
Currently, circuit board manufacturing generally adopts
subtractive method. Subtractive methods for producing fine
lines will face restrictions on copper thickness (base copper
thickness is generally 1/2-2 oz) and copper thickness deviation
Figure 2. Circuit width design and application
Table 1. Comparison of Different Addition Methods and Their Performance
Specific substrate ABF substrate Common substrate
None None Yes
Pattern copper layer Panel plating copper + pattern Base copper layer + Electroless
plating layer Copper layer (possibly with flash
Plating) + pattern plating
0.5 m~6.0 m above 1 m 0.3 m~1.5 m
None Panel plating copper layer Base copper + panel plating copper
layer (possibly with flash plating)
adhesion is poor Resin surface roughening or The resin is connected to the base
Molecular interface technology copper and has good adhesion
to improve adhesion
Explosive plate is easy to There is a risk of stratified Good reliability, can meet
delamination, poor blasting and prone to poor the requirements
thermal stability anodic ion migration
No etching, less pollution Micro etching, less waste Low etching, low wastewater
water discharge discharge
Low High Medium
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Technology AP SAP mSAP
Substrate
Base copper
Copper layer
Electoless Copper
Etching thickness
Adhesion
Reliability
Environmental impact
Manufacturing cost
32 Technical Paper
Journal of the HKPCA / 2018 / Summer / Issue No. 68
(uniformity of plated copper plating). Base copper, electroless
copper and electroplating copper is needed to be etched away.
The thickness of the etched copper is generally more than
20 m, so the line side etching is relatively large. It is very
difficult to produce a line width/space below 50 m, and the
yield rate is low; to meet the needs of high-speed signal
transmission and miniaturization, if the PCB line is 30 m or less,
then the IC substrate can be omitted directly. This poses a
challenge to the traditional PCB manufacturing process and
requires the introduction of new additions process.
It can be seen that the selected semi-additive method
(hereinafter referred to as mSAP) material is available, the
process is similar to the existing PCB manufacturing, the
product reliability is good, the manufacturing cost is moderate,
based on the above analysis, mSAP method is selected for
manufacturing, and the fine line SLPCB is the best choice for
PCB development.
The so-called mSAP has no fixed standard process, diverse
process can be choosing due to different orders, equipments,
and raw materials. The most typical process flow and
requirements are as follows:
Because 3 m copper foil is more expensive, and some
factories directly try to use 1/3 OZ copper foil and then reduce
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to 3 m, so that the manufacturing cost is lower, so this article
will introduce the mSAP process and requirements according to
process 1, the flow diagram is shown As in Figure 4.
The first UV laser drilling rig launched in 1997 was a 355 nm
wavelength Nd:YAG. By the mid-2000s, industry-leading PCB
manufacturers began to develop CO laser drilling, which first
reduced the thickness of copper to 5 m to 12 m, and use the
black oxidation or brown oxide before the drilling to roughen
and darken the copper surface and directly drill the copper foil
with a CO laser. Due to the need to make fine PCB traces for
the SLPCB, if we use 1/3-1/2 oz base copper, before laser
drilling, it is necessary to reduce the thickness to 3 m, laser
drilling has the requirements of the aperture and roundness, so
the uniformity of copper reduction is particularly high.
The technical advantage of this laser direct drilling formation is
the reduction of the copper window etching step and the cost
is significantly reduced, this is the main method used today for
the mass production of the blind vias. However, the
disadvantage of this method is that the processing window is
narrow and cannot be reworked. From the quality point of view,
it is a huge challenge to stabilize the production of micro blind
vias with a volume of less than 70 m. Because defects such as
copper overhang, glass fiber protrusion, and resin residue will
lead to quality problems in the subsequent desmearing and
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3.1 Roughening and laser drilling
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3. mSAP process requirement and control
Figure 3. Typical mSAP flow
Figure 4. mSAP process flow diagram
33Technical Paper
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electroplating processes, these micro blind holes smaller than
100 m must be optimized for the hole shape, remove the
copper over the hole, and eliminate Glass fiber protruding and
resin residues and other defects.
For the current chemical copper reducing technology, it is
difficult for the electrolytic copper foil to obtain a uniform thin
copper and a better hole type. First of all, it is difficult to
manage the uniformity of copper thickness 3.0 0.5 m by the
normal copper reducing chemical, the best way is to use the
brown oxide process to directly reduce the copper, and then
with the uniformity design of the device, copper thickness after
the reduction of copper can be controlled within 0.5 m. At the
same time, the conventional browning has a specific surface
area of about 1.5. However, the 3 m ultra-thin copper foil may
have a specific surface area of 2.2-2.4 directly treated by a
low-etch LDD brown oxide process, and it also matches for
subsequent etching, smaller side etching, the side wall of the
circuit is very vertical, not cause under-cut, can get the good
line profile.
As can be seen from the figure below, the 3 m ultra-thin
copper foil with low-etch mSAP brown oxide is used together
with the low etching, the copper surface is villous fluffy, while
the copper surface treated by traditional browning solution is a
honeycomb structure.
Making hole conductive of mSAP uses generally a horizontal
PTH, it can deposit a thin electroless copper layer to achieve a
good coverage of the insulating layer in the blind via, which
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3.2 Electroless Copper
reduces the under-cut of the PTH layer during subsequent
etching and reaches the sidewall of the circuit vertical purpose.
The current blind via diameter is about 50~80 m, and the
dielectric thickness is 30~50 m. There is enough metallization
ability for the current horizontal PTH, but if the via pattern of
laser drilling is not good, or there is excessive biting by the next
steps, the PTH is required to have sufficient coverage to
prevent voids under the over-hang and crab legs, as shown in
Figure 7 below.
However, it should be noted that high-frequency materials are
more difficult to remove the drilling smear, increase the amount
of bite and fear of wicking problem, which will be fatal to signal
transmission, and therefore need to have a better desmearing
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Copper foil type & B/O Etching rate of Specific
Brown Oxide surface area
Ordinary copper foil with 1.4~1.8 m 1.4 ~ 1.6
normal LDD B/O
3 m ultra-thin copper foil 0.6~0.8 m 2.2 ~ 2.4
with LE mSAP B/O
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Table 2. Comparison of effects of different browning treatments
Figure 5. SEM results of low etching brown oxide of mSAP
Figure 6. SEM results of browning after general brown oxide treatment
34 Technical Paper
Journal of the HKPCA / 2018 / Summer / Issue No. 68
effect. On the other hand, quality of the board surface after
electroless copper is the key. If the depositing copper layer is
rough and there are residues or copper nodule on the surface,
it will directly affect the effect of electroplating, which is a fatal
flaw for the fine lines. In addition, the low stress copper is
generally used. Series potions to maintain a good adhesion of
the copper sink layer to the substrate.
Flash Plating, also known as "Cu Strike," is mainly for the
purpose of protecting the electroless copper layer from the
pattern transfer process, and can be microetched and
roughened before the subsequent pattern via-filling plating to
improve the copper layer inter-binding force.
The choice of flash plating solution and the thickness of copper
plating are all important. Generally, the solution with common
through holes and blind via plating capacity is selected. On the
one hand, the throwing power of the blind hole is better, and
the bottom of the blind via can be coated with arc-shaped
effects. "Crab legs" (incomplete copper plating or thin copper
thickness at the bottom corner of the blind via) are not allowed;
at the same time, the throwing power ability of the through hole
can be taken into account, in particular, the knee of the through
hole cannot be cut.
Copper thickness control is an important part of the mSAP.
How much copper is plated and how much copper is etched in
each stage must be accurately calculated to achieve the goal of
3.3 Flash plating
final copper thickness. Accordingly, the thickness of the flash
copper plating layer is generally 1-3 m or 5-7 m or so, and
can adjust according to requirements.
Graphics transfer includes pre-treatment, dry film image,
development steps.
Pre-treatment generally uses chemical micro-etching on flash
plating cooper, and common acid rinse is mainly used to high-
build electroless copper. Flash plating generally uses medium
roughening (flash-plated copper layer thickness is 1-3 m) or
super-roughening (the thickness of flash-plated copper is
5-7 m). The medium roughening can use hydrogen peroxide
type or composite salt series of micro-etching agents, and
there are also selective CuCl super-roughening agents for the
thickness flash copper. The overall point of view is the control of
adhesion and total copper thickness.
Fine pitches and hole rings require more rigorous control of the
graphics transfer process. For fine lines, rework, repair, etc.
cannot be accepted. If we want to get a higher yield, we must
pay attention to the quality of the graphics tools. The use of
laser direct imaging (LDI) to replace contact film exposure mode
is increasingly introduced for the manufacture of SLPCB.
Although LDI is inefficient and costly, but it has the advantage of
allowing each PCB board of different increases and decreases,
which will reduce scrap due to misalignment.
The development solution is nothing special, it can be prepared
with Na CO . The equipment has particular attention, to achieve
such a fine resolution, how to avoid the "pool effect" is the key.
The industry has a vertical developing machine, which has a
good development effect.
The pattern plating of mSAP is a pattern via filling plating
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3.4 Graphic Transfer
3.5 Pattern Plating
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Figure 7. Horizontal electroless copper plating coverage
35Technical Paper
www.hkpca.org
technology. This via filling process is a high-tech process, it
breaks the regularity of the distribution of the traditional
electroplating current field, and changes the difference in current
distribution between the plate surface and the hole, the copper
plating speed in the hole is fast. On the surface of the board, the
recessed holes are filled. For blind vias with a diameter of about
50~80 m and a thickness of 30~50 m, microcavity-free in the
filled via,the dimples and protrusions of the filling holes should
be less than 5 m, and it must control the copper thickness after
filling, the scope of the requirements, rather than the thinner the
better. On the other hand, the inhomogeneity of the graphics will
result in inconsistent distribution of the current density in the
plane direction, to make the surface copper plating uniform, the
requirements for equipment and chemical are even higher. The
thickness difference between the dense circuit area and the
sparse area of the SLPCB is guaranteed within 5 m, and there
is no phenomenon of film clamping. Moreover, the surface of the
circuit needs to be flat and straight, and cannot assume an arc
shape of the trace line surface. The arc rate of the line surface
requires 20%.
In addition, the quality of this copper platting is strict, because
the line width is only about 30 m, plating can not have any
pitting & dent, wrinkle and rough, even a pinhole on the circuit
will cause scrap. Special attention is paid to the fact that the
microcavity caused by subsequent etching is not allowed,
maybe the plating is too large crystal.
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3.6 Film stripping
3.7 Quick etching
The traditional NaOH cannot meet the requirements of fine line
film stripping. The need to remove the dry film between fine
lines requires the use of a special stripper, usually an organic
amine or solvent type, which can effectively strip the 20 to
30 m pitch dry film. There must be no residue of dry film debris
on the board after stripping. In addition, there is a higher
requirement for film stripping equipment and filtration effect,
and prevent the film from sticking to the surface of the board.
Figure 9 shows the effect of removing the film with organic film
stripper:
The quick etching is also called "Flash Etching", the etching
adopted by the mSAP process is completely different from the
traditional one. It does not have dry film or tin plating as the
resist layer. The whole board of the SLPCB after the film
stripping is only copper, but the height difference is not the
same, the copper thickness of the circuit surface is more than
is more than 25 m and the copper thickness between the lines
is only a few microns, so the differential etching method is used
to quickly etch away the copper layer between the lines, as the
same time, the copper on the line surface also erodes the same
thickness copper, it just comes back need to control the finish
line copper thickness.
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Figure 9. The effect of removing the film of fine line
Figure 8. mSAP via filled by pattern plating
36 Technical Paper
Journal of the HKPCA / 2018 / Summer / Issue No. 68
Hydrogen peroxide-type etching solution are also commonly
used in mSAP, and also known as "flash" agents. The main
reason is that the vertical downward etching rate is controllable,
and the line side etching is smaller, and the ratio of down
etching to side etching is larger than 1:0.6. Strictly control the
line type, the circuit etched out must be straight, the top line
width and bottom width of the entire production board is almost
the same, to ensure the required signal impedance and
insulation resistance, so that the transmission loss and
crosstalk are relatively low, the signal to noise ratio is high, the
signal integrity is good.
With the rapid development of mobile communications, the
development of compact and multifunctional portable and
wearable devices is still the mainstream, resulting in the
development of traditional high-density interconnect (HDI)
boards toward the Substrate Like PCB (SLPCB). The result is
mSAP technology application and development.
This article through the typical SLPCB manufacturing process
elaboration, mSAP process and requirements have a clear
outline, but after all, different SLPCB have different designs and
requirements, mSAP process will also be different; mSAP also
due to the current technology base of different companies, from
resources and with the continuous development and progress
of various processes, will continue to improve and improve in
the mass production. It is hoped that the majority of workers in
PCB industry will continue to work hard to improve the mSAP
process capability, to improve the quality and yield of SLPCB
4. Conclusions and Prospects
Figure 10. The geometry of the conductors after quick etching
products and pave the way for the early realization of new
technologies such as Internet of Things and 5G.
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Manufacturing Technology for 5G Smart Phones [J]. Hong
Kong Circuit Board Directory, 2017/Winter, (66): 16-18
[2] Erkko Helminen, Tatja Rapala-Virtanen, Miniaturization
Influence on Electrical Functionality of High Density Printed
Circuit Board in press ECWC13, 2014
[3] Wu Jinhua. The Challenge of the Next Generation of Ultra-
thin HDI Printed Circuit Boards [J]. Printed Circuit
Information, 2015, (6): 45-49.
[4] PCB Info, an article to understand PCB technology
changes and market trends [EB/OL].
http://www.pcbinfo.net/InfoShow.asp?cls=100&ID=208578,
2017-06-02
[5] PCBTech.Net, a paper that reads the status quo of major
PCB countries in the world [EB/OL].
http://www.pcbtech.net/view/analysis/19567.html, 2018-
06-07
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