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KIT – The Research University in the Helmholtz Association Institute for Technical Physics | Cryogenics www.kit.edu Cryogenics H. Neumann to M. Süßer Low temperature measurement and control technique not for publication

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Page 1: Low temperature Cryogenics - HySafe

KIT – The Research University in the Helmholtz Association

Institute for Technical Physics | Cryogenics

www.kit.edu

CryogenicsH. Neumannto M. Süßer

Low temperature measurement and control technique

not for publication

Page 2: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics2 11.10.2018 VDIH. Neumann

Content

Low temperature measurementtemperature scale ITS-90calibration and fit interpolationselection of low temperature sensorsTVO-sensorCernox-sensorcomparison TVO vs CernoxPlatinum-sensorSilizium diodes (semiconductor)Thermo couplessensor selectionsensitivity-temperature resolutiontwo-wire versus four-wire-measurementself heating and thermal boundary resistancebalancing the uncertainty due to self heating and voltage drop

Page 3: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics3 11.10.2018 VDIH. Neumann

Content

Low temperature measurementthermal EMF (electromotiv force)wiring for cryogenic instrumentationthermal dumping – heat sinkelectrical resistance in parallel – feed throughsthermometer holdercomparison of joint conductancesensor mounting – general rulessensor mounting inside pipeTVO sensor mounted on end of capillarysensor mounting outside pipecomparison between inside and outside mounting of sensor in pipesinfluences on accuracygeneral considerations of uncertainty

Page 4: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics4 11.10.2018 VDIH. Neumann

Content

Pressure / Differential Pressure Measurements

thermo acoustic oscillations (TAO´s)differential pressure sensor

Mass flow measurement orificeclassical venturi tube ISO 5167- 4V-conecorioliscomparison

Level measurementcontinuouslydiscrete

Cryogenic valvesspecificationvalve characteristicvalve sizing coefficient

Page 5: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics5 11.10.2018 VDI

Low temperature measurement

H. Neumann

Page 6: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics6 11.10.2018 VDI

Low temperature measurement –Temperature scale ITS-90

the International Temperature Scale was adopted 1990 by the International Committee of Weights and Measures

temperature range 0.65 – 1358 K

three constitutive elements: a set of definitions or fixed points a mathematical definitionan interpolating instrument

H. Neumann

Page 7: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics7 11.10.2018 VDI

Low temperature measurement –temperature scale ITS-90

definition temperature

ITS 90 defined by He vapour pressure and fix points0.65 K ≤ T ≤ 5 K: vapour pressure 3He and 4HeT = 13.8033 K: triple point hydrogenT = 24.5561 K: triple point neonT = 54.3584 K: triple point oxygenT = 83.0858 K: triple point argonT = 234.3156 K: triple point mercuryT = 273.16 K: triple point waterT = 302.9146 K: melting point gallium

temperature scale is transferred from primary thermometers to secondary thermometers. Scale maintained by National Metrology Institute (NMI) such as NIST, NPL, PTB, IMGCthe most common secondary thermometer is the high purity standard Platinum resistance thermometer (SPRT) or the Rhodium-Iron resistance thermometer (RIRT)

H. Neumann

1 ∙ ,273.16

Page 8: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics8 11.10.2018 VDI

Low temperature measurement –temperature scale ITS-90

reference temperature: triple point of water

H. Neumann

water

ice/watermixture

water vapourdewar

ice sheath

thermal contactliquid

thermometerwell

p [atm]

t [°C]

criticalpoint

solidliquid

vapour

triplepoint

0 0.01 99.947

611.657

101325

Page 9: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics9 11.10.2018 VDI

Low temperature measurement –Calibration and Fit Interpolation

commercially calibrated sensors should have calibrations traceable to international standards

calibration uncertainty typically increases by a factor of 5 to 10 between the successive levels

an interpolation method is required for temperatures between calibration points. Typically the uncertainties introduced by the interpolation function are in the order of 1/10 of the calibration uncertainty

H. Neumann

NMI*ITS-90 Realisation

Calibration LabITS-90 Dissemination

Temperature measurement

*National Metrology Institute (NMI)

uncertainty

Page 10: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics10 11.10.2018 VDI

Low temperature measurement –Calibration and Fit Interpolation

primary sensorsbased on understood physics: ideal gas thermometer, vapor pressure thermometer, fix pointsbut: impractical - only calibration laboratories

secondary sensorsneeds to be calibrated from some primary standard sensors:interpolating thermometers -standard-Platin-sensor (Pt25) rhodium-iron-sensor (RhFe)

working standardinterpolating thermometers: resistive thermometers, diodes, thermocouples

H. Neumann

NMI*ITS-90 Realisation

Calibration LabITS-90 Dissemination

Temperature measurement

*National Metrology Institute (NMI)

uncertainty

Page 11: Low temperature Cryogenics - HySafe

Institute for Technical Physics | Cryogenics11 11.10.2018 VDI

Low temperature measurement –selection of low temperature sensors

resistorsresistors with negative temperature coefficient (NTC-sensors – semiconductors)

carbon-glass resistor (CGR)cernox (CX)carbon (Allen Bradley)germanium (Ge)carbon compound (TVO)

resistors with positvietemperature coefficient (PTC-sensors – metal)

platinum (Pt)rhodium-iron (RhFe)

H. Neumann

diodesSi-diodesGaAlAs-diodes

OtherthermocouplesCLTS (Cryogenic Linear Temperature Sensor)capacity thermometers

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Institute for Technical Physics | Cryogenics12 11.10.2018 VDI

Low temperature measurement –selection of low temperature sensors

H. Neumann

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Institute for Technical Physics | Cryogenics13 11.10.2018 VDI

Low temperature measurement –TVO-sensor

H. Neumann

carbon - Al2O3 Compoundstrong electrical leadsweak point on the connection to the sensing elementsensitive against bending and local pressureindividual calibration necessaryundefined geometrical shapecalibration after potting necessarytemperature range 2 – 370 K

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Low temperature measurement –Cernox-sensor (CX)

H. Neumann

Zirconium sensing element on a sapphire substrateCX-AA

sensor element protected by means of copper canisterinternal atmosphere: Heinternal wiring: 50.8 µm diameter gold wires

CX-SDflat square shapedpackagesinternal atmosphere: vacuum

CX-BRbare sensor

very sensitive against overloadindividual calibration necessaryT-range: 0.1 – 420 K

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Low temperature measurement – comparison TVO vs Cernox

H. Neumann

Temperature [K] Temperature [K]

Res

ista

nce

[]

Sen

sitiv

ity [

/K]

Sensitivity characteristiccurveS = (dR / dT) S = f (T)

Resistance characteristic curveR = f (T)

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Low temperature measurement – comparison TVO vs Cernox

H. Neumann

sensitivity to magnetic field

magnetic field [T]

T

[K]

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Low temperature measurement – comparison TVO vs Cernox

H. Neumann

temperature resolution

Temperature [K]

dim

ensi

onle

ss s

ensi

tivity

Sd

[-]∆T: temperature resolution

∆U: resolution voltmeter(quality of voltmeter)

U: voltage drop at sensor(U = I R )

T: temperature

Sd : dimensionless sensitivity

Sd = T/R (dR / dT)

∆T = (∆U/U)T / Sd

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Institute for Technical Physics | Cryogenics18 11.10.2018 VDI

Low temperature measurement – comparison TVO vs Cernox

H. Neumann

assumption: digital voltmeter – resolution: 10µV

temperature[ K ]

resistance[ Ω ]

feeding current[ μA ]

voltage drop at sensor[ mV ]

Sd ∆T[ K ]

4 3000 10 30 0.6 0.002

100 1200 10 12 0.2 0.1

300 1000 10 10 0.2 1.5

temperature[ K ]

resistance[ Ω ]

feeding current[ μA ]

voltage drop at sensor[ mV ]

Sd ∆T[ K ]

4 3000 10 30 1 0.002

100 100 20 2 1 0.5

300 50 50 2.5 1 1.2

Cernox

TVO

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Low temperature measurement –platinum-sensor (Pt)

H. Neumann

Pt100 sensors are industry standardavailable with different resistance at 273 K: Pt100, Pt500, Pt1000, Pt10000electrical characteristics follow an industry standard curve from 73 K to 873 K with good sensitivity over this range Pt-sensors can also be used down to 20 Kinexpensive and require simple instrumentation

Thin filmGlas wire wound

Ceramic wire wound

Thermal ribbons

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Temperature [K]

volta

ge [V

]

Low temperature measurement –silizium diodes (semiconductors)

Good choice for general-purpose cryogenic use, temperatures depend forward bias fast response, constant current (10 μA), high sensitive against magnetic fields, interchangeable (they follow a standard curve), available in robust mounting packagesand probes, high self heating effect, voltage across the diodes can be measured only inforward direction, less accurate also the long time stability, AC-noise-induced temperaturecan be prevalent in diodes Silicon diodes are easy and inexpensive to instrument, high sensitivity over limited range

H. Neumann

Temperature range 1 – 500 K

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Low temperature measurement –thermo couples

H. Neumann

Temperature [K]

Sen

sitiv

ity [m

V/K

]

useful for low mass or differential temperaturemeasurement

in-situ calibration necessary otherwise errors in the range5 – 10 K occur

no self heating

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Low temperature measurement –sensor selection

quality of measurementrepeatability, resolution, sensitivity, uncertainty

experimental designrelated to the experiment and boundary conditions: physical size, temperature range, thermal response time, power dissipation

environmental constrainseffects due to external conditions: magnetic field, vibration, mechanical impacts, vacuum, ionizing radiation

utility requirementscosts, required expertise

H. Neumann

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Low temperature measurement –sensor selection

remarks to environmental constrainssuitability in magnetic fields

magnetic fields can cause reversible calibration shiftsCernox sensors are the first choice, diodes also Pt and RhFe have big shifts

suitability in ionizing radiation areasradiation can produce temporary or permanent calibration shifts

suitability under vacuum conditionsbake out procedure performed in most high vacuum systems can be damaging the materials used in the construction, even the sensor withstands the bakeouttemperature, the calibration may shift

some materials in the sensor for example Stycast at CX AA-Package get a leakage and may interfere with the high vacuum by acting as a virtual leakPt or RhFe sensors are recommended sensors for high baking temperatures

H. Neumann

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Low temperature measurement –sensor selection

range of uselimited by three typical factors

the sensitivity must occur on a measurable level appropriate to the temperature range of usematerials like epoxy, solders insulators are useful at low temperatures but can break at higher temperatureshigh temperatures can induce strain in the sensor due to changes in packaging materials or in the leads – resulting strain can cause a shift in the low temperature regioninsulation of wiring must also be suitable for the temperature range

H. Neumann

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Low temperature measurement –sensitivity-temperature resolution

Sensitivity S is a quality of the sensor and a very strong function of temperature

resistors sensitivities 0.1 ∙ 10,000 ∙

diodes sensitivities 2 ∙ 180 ∙

dimensionless sensitivity (material specific parameter): ∙ ∙

temperature resolution: ∆ ∆ ∙

with: U: resolution voltmeter; U: voltage drop on sensor, U = IR;T: temperature of operation

H. Neumann

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Low temperature measurement –two-wire versus four-wire-measurement

H. Neumann

four - wire - measurement: the voltage sense located across the resistor - only the resistance of the sensor is measured and not the lead resistance

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Low temperature measurement – lead resistance

example RL = 10 Ω (5 Ω each lead)Error due to resistance: ∆TL = RL / S (2-lead configuration)

H. Neumann

sensor T [K] S [/K] T = RL / S [K]TVO 300 1 10/1 = 10TVO 4 600 10/600 = 0.02CX 300 0.11 10/0.11 = 91CX 4 1000 10/1000 = 0.01Pt 100 70 - 300 0.4 10/0.4 = 25Pt 500 70 - 300 2 10/2 = 5RhFe 4 - 300 0.1 10/0.1 = 100

SI-diode temperature sensors:T < 30 K: S 26 mV/K T 40 mK (SI current: I = 10µA; T = RI/S)T > 30 K: S 2.3 mV/K T 430 mKUnless the lead resistance can be reduced in magnitude or the resultant error, a 4-lead measurement is recommended

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Low temperature measurement –self heating and thermal boundary resistance

H. Neumann

Energie inputPS= I2 RS

Heat conduction wiring

Heat conduction

Heat conduction inside the housing

External heat source in case of insufficient thermal dumping of the leads

Energy transfer due toheat transmissionPt = k A ∆T

Rt : thermal resistanceRt = (k A)-1

Pt = ∆T/Rt

PS = Pt

I2 RS = ∆T / Rt

∆T = I2 RS Rt

**

Heat conductionwiring

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Low temperature measurement –self heating and thermal boundary resistance

H. Neumann

Self heating – exampleCernox at 4 K

I = 10 μA, RS = 3000 Ω, PS = 0.30 μWwith Rt Cernox 4K = 5 mK/μWΔT = PS Rt = I2 RS Rt ΔT = 1.5 mK

TVO at 4 KI = 10 μA, RS = 3000 Ω, PS = 0.30 μWwith Rt TVO 4K = 1 mK/μW ΔT = 0.3 mK

Si diode at 4 KI = 10 μA, US = 2 V, PS = 20 μWwith Rt Si 4K = 5 mK/μW

ΔT = 100 mK[1]

Temperature [K]

Ther

mal

resi

stan

ce[K

/W]

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Low temperature measurement – balancing the uncertainty due to self heating and voltage drop

H. Neumann

increasing excitation current indicates:

increasing uncertainty due to self heating

higher resolution of the voltage signal

improvement of signal / noise ratio

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Low temperature measurement – thermal EMF (electromotiv force)

H. Neumann

SEEBECK coefficient of different materials in region of ∆T

produces a thermal emf, even if no current is flowing

solution: reversing polarity only for resistive sensors - diodes

do not allow current reversal

Example:: UEMF = 10 μV

Error caused due EMF ∆TEMF = UEMF / (dU/dT) S: Sensitivity (dU/dT) = S i i: Excitation current

TVO 300 K I = 10 μA S = 1 Ω/K (dU/dT) = 1 x 10 = 10 μV/K ∆TEMF = 10/10 = 1 KTVO 4 K I = 10 μA S = 600 Ω/K (dU/dT) = 600 x 10 = 6 mV/K ∆TEMF = 10/6000 = 0.0015 K

CX 300K I = 10 μA S = 0.1 Ω/K (dU/dT) = 0.1 x 10 = 1 μV/K ∆TEMF = 10/1 = 10 KCX 4K I = 10 μA S = 1000 Ω/K (dU/dT) = 1000 x 10 = 10 mV/K ∆TEMF = 10/10000 = 0.001 K

Pt100 300K I = 1 mA S = 0.4 Ω/K (dU/dT) = 0.4 x 1 = 0.4 mV/K ∆TEMF = 10/400 = 0.025 KPt100 70K I = 3 mA S = 0.4 Ω/K (dU/dT) = 0.4 x 3 = 1.2 mV/K ∆TEMF = 10/1200 = 0.008 K

RhFe 300K I = 1 mA S = 0.1 Ω/K (dU/dT) = 0.1 x 1= 0.1 mV/K ∆TEMF = 10/100 = 0.10 KRhFe 4K I = 3 mA S = 0.1 Ω/K (dU/dT) = 0.1 x 3= 0.3 mV/K ∆TEMF = 10/300 = 0.03 K

Si Diode 300K I = 10 μA (dU/dT) = 3 mV/K ∆TEMF = 10/3000 = 0.003 KSi Diode 4K I = 10 μA (dU/dT) = 30 mV/K ∆TEMF = 10/30000 = 0.0003 K

U1 = I · R + UemfU2 = I · R - UemfR = (U1 + U2) / (2 · I)

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Low temperature measurement – wiring forcryogenic instrumentation

H. Neumann

low thermal conductivity wiring to minimize heat load from higher temperature surroundings

heat sinks leads as appropriate - minimize heat from higher temperature surroundings

low thermal EMF materials (Keithley handbook on Low Level Measurements)

twisted pairs for wiring for the reduction of AC-noise

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Low temperature measurement – wiring forcryogenic instrumentation

H. Neumann

Wiedeman-Franz law relates the thermal conductivity of a wire to its electrical conductivity and solutions using resistance wire or a good electrical conductor such as copper or silver to give a impedance for low self heating, will give similar passive heat leaks

Cryogenic wire is different from normal wire due to its low thermal conductivity and high electrical resistivity. Most common types are phosphor bronze and manganin but also copper wire are used

Data from Lake Shore

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Low temperature measurement – wiring forcryogenic instrumentation

H. Neumann

L2 = (Heat-sinking length see Tabelle 1)T1 = 300K, L1 = 250mm Ts – T3 = 1mK

J.G. Hust: Thermal anchoring of wires in cryogenic apparatus, Rev. Sci. Instrum (1970) 41 622

For accurate temperature readings, the sensor and istleads must be anchored so they are at the same temperature as the sample being measured

Leads with heavy insulation (Teflon) and bigger dimensions minimize the potential for making a thermal short to the surroundings but resulting in more thermal conduction down the leads into the sensing element

Data from Lake Shore [2]

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Low temperature measurement – thermal dumping – heat sink

H. Neumann

Beryllium Oxide Heat Sink Chip

Heat Sink Bobbin

Solder Terminals

[4]

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Low temperature measurement – electricalresistance in parallel – feed throughs

H. Neumann

check the resistance in parallel before connecting the sensor

if possible avoid flux; use glass fiber brush to clean the surface and to remove layers of oxides

use heat shrink tubing for solder connections on electrical feed throughs

resistive element housing

thermo-electricvoltage

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Low temperature measurement – thermometerholder

H. Neumann

Indium or vacuum grease as contact agent to get a low thermal resistance to the surface

Ekin: Experimental Techniques for Low Temperature Measurements (2007)

Temperature sensorsoldered or glued to copper block

Leads soldered to

metallized pads or

Beryllium-oxide

heat-sink chip

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Low temperature measurement – comparison ofjoint conductance

H. Neumann

S.W. Van Sciver, M.J. Niles, and J. PfotenhauerThermal and Electrical Contact Conductance Between Metals At Low Temperatures, Proc. SpaceCryogenics Workshop (1984)

E Gmelin, et al.Thermal boundary resistance of mechanical contacts between solidsat sub-ambient temperatures,J. Phys. D: Appl. Phys. 32 (1999)

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Low temperature measurement – sensormounting – general rules

three aspects: proper mounting , proper connecting wiring, proper thermal anchoring

permanent mounting or for limited timemechanical mounting using a spring loaded clamp is a common methodsensor could be changed or replaced – experimental methodthermal conductor: Apiezon, grease, vacuum grease, flat indium foil should be used between sensor and surface to enhance thermal contactusing Stycast increasing the thermal resistance and it is a more a permanent methodStycast can stress diode packages and cause piezo resistive shift in the calibration curvemounting in holes is a favorite methodcylindrical package is obviously better suited for insertion into a cylindrical cavity than a flat square shaped packages

H. Neumann

providing good thermal contact between sensor and surface is essential

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Low temperature measurement – sensormounting inside pipe

sensors are under the stress of the fluidvelocity, turbulencestatic and dynamic pressure

high reliable feed throughs are necessarysensor replacement needs opening of pipemeasurement of stagnation temperature

H. Neumann

Stagnation point3.3

3.4

3.5

Entropie S [J/gK

12.2

12.3

12.4

12.5

12.6

12.7

12.8

Ent

halp

ie H

[J/g

]

P=4b

arP=4.

2barP=4.

4bar

P=4.

6bar

P=4.

8bar

P=5b

ar

P=5.

2bar

P=5.

4bar

P=5.

6bar

P=5.

8bar

T=4.4K

T=4.44K

T=4.48K

T=4.52K

T=4.56K

T=4.6K

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Low temperature measurement – TVO sensor mounted on end of capillary

H. Neumann

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Low temperature measurement – TVO sensor mounted on end of capillary

H. Neumann

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Low temperature measurement – sensormounting outside pipe

measurement of the surface temperature of the pipeadditional thermal resistance between sensor and fluidvery efficient radiation shield and proper sensor mounting necessaryinfluences:

residual heat loadflow conditions

H. Neumann

temperature difference between temperature of the sensor TSand temperature of the fluid T

∆T = Ts - T

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Low temperature measurement – sensormounting outside pipe

H. Neumann

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Low temperature measurement – comparisonbetween inside and outside mounting of sensor in pipes

H. Neumann

inside mounting outside mountingachievable accuracy

high

depending on homogenous temperature distribution

local measurement of the fluid

temperature at the stagnation point of the sensor

moderate

depending on residual heat load, vacuum conditions and flow conditions

several thermal resistances between sensor and fluid

integral measurement of the surface temperature of the piping

cost for manufacturing

of equal value of equal value

cost for tests high

thermal cycling, afterwards leak test of the feed through necessary

less

arrangement could be tested in advance on the work bench

skills of workers high

special knowledge of feed through preparation and mounting

moderate

basic skills sufficient

reliability risks of leaks very high

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Low temperature measurement – influences on accuracy

caused by sensoraccuracy of calibrationstabilityapproximation error

caused by measurement techniquevoltage measurement (2 or 4 wire circuit)current measurement, stability of current sourceoverheating (self-heating)

caused by wiringthermoelectric voltageresistance in parallelinsulation resistancecable routing (twisted or not)heat conduction

H. Neumann

caused by sensor mountingmounting inside pipemounting outside pipeflow conditions

boundary conditions of experimentmagnetic fieldpressure

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Low temperature measurement – generalconsiderations of uncertainty

H. Neumann

uncertainties from random effects ; random errors can be described and optimized with statistical methods

measurand output

uncertainties from systematic effects; systematic errors can be corrected

tolerance

+

-

for example: a resistive thermometer measures only its temperature- the voltage drop on the resistive element

measurement results are approximations of the real value

think about the entire system not just the sensor

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Pressure / Differential Pressure Measurements

H. Neumann

pressure measurement at room temperature

risks of thermoacousticoscillationsloss of dynamics of measurementbig selection of transducerreliable

pressure measurement at cryogenic temperature

less choice of transducerchange of sensitivity

PCB PiezotronicsCryogenic pressure sensorSerie 102A10

Baumer Comp.

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Pressure / Differential Pressure Measurements – thermo acoustic oscillations (TAO´s)

thermo acoustic oscillations occur in cryogenic systems where a long tube open at the cold end is extended to the closed end at the warm boundary. TAO's can be very damaging, as the oscillations are accompanied by a considerable heat conduction down the tube. This can increase the heat leak of the system by several orders of magnitude.

H. Neumann

example thermo acustic oscillations: acoustic oscillation changes frequency and amplitude when capillary leaves liquid

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Pressure / Differential Pressure Measurements – thermo acoustic oscillations (TAO´s)

H. Neumann

Tw: Temperature warm partTk: Temperature cold partd: Diameter of capillaryc: Velocity of sound coldl: length coldζ: Ratio lenght warm / lenght coldυ: kinematic viscosity cold

[4] T. von Hofmann, U. Lienert, H. Quack: Experiments on thermallydriven gas Oscillations, Cryogenics 13 (1973)

prevention: change in geometry, reduce diameter at the cold end, insertion of a wire

no oscillation

oscillation

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Pressure / Differential Pressure Measurements

comparison of pressure measurement at ambient temperature and at low temperature

H. Neumann

example: sensor at 4.3K and at 300K, capillary di ~ 1 mm, l ~ 6 m

[5] F. Haug, A. McIntruff: Measurements of pressure transmission in long capillaries, CEC/ICMC, Los Angeles 1989

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Pressure / Differential Pressure Measurements - differential pressure sensor

H. Neumann

Baumer Companythin-film -sensorshift in sensitivity ~ 2 % between 300 K and 4.2 Ksensitivity 0.12 mV / bar Voverpressure 2 nominal pressure

Baumer

Baumer

voltage supply

pressure [bar absolute]ou

tput

vol

tage

[mV

]

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Mass flow measurement – orifice

H. Neumann

according ISO 5167-2with corner tappings

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Mass flow measurement – classical venturi tube ISO 5167- 4

H. Neumann

characteristics:

cylindrical section Dconical section 210

cylindrical section d (throat)diameter ratio β = d/Dthroat ratio l/d = 1conical section angle θ = 7 – 150 (diffuser)cylindrical section D

cone easier to manufacturethan shape of quarter ellipse

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Mass flow measurement – classical venturi tube ISO 5167- 4

H. Neumann

: mass flow rate

D: upstream internal pipe diameter

d: diameter of throat under working conditions

C: coefficient of discharge, C = f (Re)

β: diameter ratio β= d/D

∆ph: differential pressure (pressure head)

ρ: density of fluid, ρ = f (p, T)

ε: expansibility factor

: pressure ratio p2/p1 (throat pressure / upstream pressure)

: isentropic coefficient, = f(p,T)

∙ /

1 ∙1

1 ∙ / ∙1 /

1

1∙ ∙ 4 ∙ ∙ 2 ∙ ∆ ∙

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Mass flow measurement – classical venturi tube ISO 5167- 4 – discharge coefficient C

H. Neumann

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Mass flow measurement – classical venturi tube ISO 5167- 4 – permanent pressure loss

H. Neumann

relative pressure loss: ξ = permanent pressure loss ∆pp / pressure head ∆ph

ξ = Δpp / Δph

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Mass flow measurement – classical venturi tube ISO 5167- 4 – pressure measurement equipment

H. Neumann

Leak test procedure necessary :High static pressure load there should no indication of differential pressureotherwise leaks in the auxilliary equipment

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Mass flow measurement – classical venturi tube ISO 5167- 4

influences on the uncertainty budgetmanufacturing defects - prevention or reduction by calibration

selection of β-ratio: reduction at low β-ratio

static hole problem - prevention or reduction by geometrical layout of pressure measuring connectors

flow distortion - prevention or reduction by upstream length, conditioner

flow pulsation - prevention or reduction by pump system, stable controller

capillary effects - prevention or reduction by high pressure head

H. Neumann

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Mass flow measurement – V-cone

advantagespressure drop = 50% of pressure headflow coefficient constantcalibration is included by manufacturers

disadvantagesnominal diameter of 15 mm is the smallest (how far we know)

H. Neumann

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Mass flow measurement – coriolis mass flow meter

measuring span:1:50high pressure loss

recommendation: use of devices with higher nominal mass flow to reduce pressure drop

H. Neumann

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Mass flow measurement – comparison

H. Neumann

venturi orifice V-cone coriolis

space requirements

in pipe mounting

in pipe mounting

in pipe mounting

additional space

straight upstream length

effects of upstream conditions

effects of upstream conditions

effects of upstream conditions

no effects of upstream conditions

connections capillaries capillaries capillaries electr. wiring

reliability very high very high very high no info.

investment cost

high high high medium

operation cost less high medium high

magnetic field influence

no no no yes

dynamic measurements

errors due frequency amplitude

errors due frequency amplitude

errors due frequency amplitude

depending on frequency

uncertainty 5% 5% 5% 2%

pressure overload

high high high medium

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Level measurement – continuosly

H. Neumann

superconducting wire level device

The active element of the probe is a Niobium-Titanium (NbTi) wire, superconductivity transitiontemperature is above the boiling point of liquid helium.NbTi-wire enclosed in a perforated protection tube(different diameters and materials available)

Current in the range of ~100 mA. At the start ofmeasurement the probe is excited by a boost current (~200 mA)

The voltage drop across the probe is a function of the depth of immersion.

The selection of the boost current and themeasuring current is a very tricky affair as largehelium losses can occur if high current is left oncontinuously

Useful: Sample and Hold-Function to reduce losses.Sensor burnout protection during operation in vacuum necessary.

Heat losses:

Probe length 1m, i = 0,1A immersed in LHe 10 %, Resistance of probe ~500 ΩPL = 0,12 x 500 = 5 W

liquid

gasdisplayrange

CF with cuttingring fitting

constant current source

voltmeter or amplyfier with inversion

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Level measurement – continuosly

H. Neumann

Capacitive probe

Recommended for LN2, LH2 ( εL / εG )N2 = 1.43( εL / εG )Ne = 1.19( εL / εG )H2 = 1.40

But not recommended for LHe( εL / εG )He = 1.04

Big influence of parasitic capacitance of the wiring

Usefull is compensation of the wiring capacity

Homemade sensor with transcuder fromVEGA-Company

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Level measurement – discrete

H. Neumann

using Pt100 or TVO-sensors

Operation current must be sufficientto self heat the sensor in vapor butnot in liquid . Operation current in the range of some mA.

Sensors should be small to minimize heat generation in liquid.

High overload capability of the sensor necessary liquid

gas

liquid

CF with cuttingring fitting

constant current source

voltmeter with limiting contacts or elec. alarm value display

gas

alarm high

alarm low

resistance sensor

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Cryogenic valves

H. Neumann

[6]

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Cryogenic valves – specification

H. Neumann

[6]

valve size diameter nominale DNpressure nominal PNcontrol – shutoff valvenormally closed or open Kv (Cv) – valueplug in profile: linear, equal percentage or otherscryogenic length Cu thermal flange to contact the thermal shieldvalve actuator manual, pneumatic or electricalfail function in case off loss energy supplyleak tightness over the seat or to the atmosphereswitches to indicate the position

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Cryogenic valves – valve characteristic

H. Neumann

[6]

Rel

ativ

e flo

w c

oeffi

cien

t Kv [%

]

Relative valve travel [%]

Fast opening

Linear flow

Equal precentage

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Cryogenic valves – valve sizing coefficient

H. Neumann

Digital(on/off)

Linear flow(linear)

Equal percentage(= %)

Interest for control system

Kv (Cv) is a valve sizing coefficient determined experimentally

Kv = 0.865 Cv

KV – value is a valve sizing coefficient determined experimentallyfor each style indication of how many water m3/h under the differential pressure of 1 bar at room temperature will flow through the valveat the respective flow

KVS –value Indication of how many water m3/h under the differential pressure of 1 bar at room temperature will flow through the valveat the respective flow at 100 % stroke

KVR-value Smallest flow coefficient at with the gradient tolerance is still complied with

Range ability SR = Kvs / KvR : The range of the largest to the smallest coefficient within witch the deviation from the specified flow characteristics does not exceed the limits(common value SR = 50)

VV 0

1K Vp

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Thank youfor your

attention!

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references[1] S. Scott Courts, W.E. Davenport, D. Scott Holmes, Thermal resistance of cryogenic temperature sensors from 1 –

300K Advances in Cryogenic Engineering, Volume 45[2] http://www.lakeshore.com/Pages/Home.aspx[3] C.Balle, J.Casas Industrail-type cryogenic thermometer with built-in heat interception, Proc. CEC1995[4] T. von Hofmann, U. Lienert, H. Quack: Experiments on thermally driven gas oscillations, Cryogenics 13 (1973)[5] F. Haug, A. McIntruff: Measurements of pressure transmission in long capillaries, CEC/ICMC, Los Angeles 1989[6] pictures of cryo valves by weka: http://www.weka-ag.ch/de/kryoventile

H. Neumann