leakage reduction techniques 2006. 10. 30. three major leakage current components 1. gate leakage ;...

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Leakage reduction techniques 2006. 10. 30

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Page 1: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Leakage reduction techniques

2006. 10. 30

Page 2: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Three major leakage current components

1. Gate leakage ; ~ Vdd4

2. Subthreshold ; ~ Vdd3

3. P/N junction BTBT current

Page 3: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Circuit techniques to reduce leakage

• Design time techniques– DTCMOS(dual threshold CMOS)– Multiple power supply voltages (islands)

• Run time techniques– Reducing standby leakage

• Using transistor stacks• MTCMOS ; sleep transistor• VTCMOS

– Reducing active leakage• DVS ; dynamic Vdd scaling• DVTS ; dynamic Vth scaling

Page 4: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

DTCMOS (Dual Threshold CMOS)

Page 5: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Increasing Vth followed by upsizing yields similar on current with much less leakage current at the cost

of switching power and chip area.

Vgs

Ids

Page 6: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Transistors on during precharge period is a non-critical path and is given high Vth.

Page 7: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction
Page 8: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

If Vs is raised, there are three mechanisms leading to the reduction of drain current, i.e., Vds, Vgs and Vth

Page 9: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Input vector control, e.g., ABC=111 and 000 yields lowest leakage current for 3-in NOR and 3-in NAND. Explain why.

As gate leakage becomes dominant over subthreshold, ABC=100 can yield less leakage than ABC=000. Explain why.

Page 10: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

MTCMOS ; reduces leakage during sleep mode only, at the cost of area and delay. Only NMOS may be used.

Page 11: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

In Stby mode Clk=1, Sleep=1That prevents continuous supply of leakage current to GND through node 1, and leakage current to GND through node 2.

Page 12: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

VTCMOS ; (a) Body (and N-well) biasing technique, Z(ero)BB or F(orward)BB for speed up & reducing SCE in active mode , while RBB in stby mode. Routing grid for body biasing adds area.103 reduction in 0.35 um technology. Effectiveness of RBB to lower Ioff

decreases as IBTBT increases exponentially due to HALO doping.

(b) Source biasing instead of p-substrate. Substrate is shared betweenTarget and control circuitry. VNEWLL is raised to conserve the stored charge if necessary. Reducing VDS thereby further decreases leakageCurrent thru less DIBL which raises Vth.

Page 13: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

DVS (Dynamic Voltage Scaling) consists of 1. Processor operating in wide voltage/frequency range2. Regulation loop (F-V) generating min vtg needed for the given freq.3. Operating System that computes desired clock frequency

Page 14: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

DVTS vs. DVS

Similar effect when leakage is dominant over switching power.

Page 15: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Merits & Issues of DVTS (Candidate topic for individual project)

• Simple hardware ; – charge pump is used as current demand

is low instead of buck converter which is used in DVS

• Transition energy overhead• Substrate noise ;

– due to absence of inductor, charge pumps can generate noise

• Process complexity

Page 16: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Continuous Feedback loop control

Page 17: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Vth hopping scheme

Page 18: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Leakage reduction is especially important in cache As each cell is in inactive state most of the time.

Page 19: Leakage reduction techniques 2006. 10. 30. Three major leakage current components 1. Gate leakage ; ~ Vdd 4 2. Subthreshold ; ~ Vdd 3 3. P/N junction

Five different Low-leakage SRAM cell techniques in Table

13.3

• Things for further study (research candidate)– Re-evaluation of each different technique in ter

ms of their effect on each different leakage component, i.e., subthreshold, direct tunneling gate oxide, BTBT leakage

– How the read/write delay is affected by each low leakage technique

– Transition latency/energy overhead– Impact on cell reliability incl. SER