l1 intro r1.ppt [호환 모드]

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1 Digital Integrated Circuit Design Digital Integrated Circuit Design L1 Introduction EE141 1 General Information General Information Instructor : Jinyong Chung [email protected] Room 312, LG Research Building(Tue, Thu) Mailbox @copyroom on 2 nd floor Office: x5016(LG312), x0204(NCNT) Grading Homework - 30% EE141 2 Term Project - 30% Midterm Exam - 20% Final Exam - 20%

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Page 1: L1 intro r1.ppt [호환 모드]

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Digital Integrated Circuit DesignDigital Integrated Circuit DesignL1 Introduction

EE141 1

General InformationGeneral Information

Instructor : Jinyong [email protected] 312, LG Research Building(Tue, Thu), g( , )Mailbox @copyroom on 2nd floorOffice: x5016(LG312), x0204(NCNT)

GradingHomework - 30%

EE141 2

Term Project - 30%Midterm Exam- 20%Final Exam - 20%

Page 2: L1 intro r1.ppt [호환 모드]

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(continued)(continued)

Design Project32bit x 32bit NAND Flash

1.8V operationtransistor model: TBPControl logic (ECC optional) design & simulationcircuit design and simulationReport on target & performance comparison

EE141 3

Report on target & performance comparison /analysisFinal Report by 12/11

(continued)(continued)Baseline textbook디지털집적회로, 대영사, 박홍준Digital Integrated Circuits By J. Rabaey, A. Chandrakasan, B. Nikolicy y, ,Prentice Hall

ReferenceAnalysis and Design of Digital Integrated Circuits

in deep submicron technologyBy D. Hodges, H. Jackson, R. SalehMcGraw Hill

EE141 4

Class Material on webClass schedule

Mid term: 10/21 (Tue)Final on 12/18 (Thu)

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Class GoalsClass GoalsDigital Integrated Circuits

CMOS gatesPropagation delay, noise margins and power dissipation FOM’sdissipation, FOM sCombinational and sequential circuitsArithmetic, Datapath, Memory, Clock and InterconnectDesign for Testability

What will you learn?U d t di d i i d ti i i di it l

EE141 5

Understanding, designing and optimizing digital circuits with respect to quality metrics: speed, power, cost and reliabilityCircuit Design (design & simulation, layout) on flash memory

Digital Integrated CircuitsDigital Integrated CircuitsIntroduction: Issues in digital designTh CMOS i tThe CMOS inverterCombinational logic structuresSequential logic gatesMemory CircuitDesign for TestabilityInterconnect: R L and C

EE141 6

Interconnect: R, L and CTimingArithmetic building blocksDesign methodologies

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IntroductionIntroductionWhy is digital IC design different today than it was before?Differences from other disciplinesFuture perspectives

EE141 7

The First Integrated Circuits The First Integrated Circuits

Bipolar logicp g1960’s

EE141 8

ECL 3-input GateMotorola 1966

© Digital Integrated Circuits2nd

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Intel 4004 MicroIntel 4004 Micro--ProcessorProcessor

19711000 transistors1 MHz operation

EE141 9© Digital Integrated Circuits2nd

Dual core microprocessor Dual core microprocessor (Montecito, 90nm)(Montecito, 90nm)

1.72 * 10^9 tr

596 mm^2

EE141 10Intel

Page 6: L1 intro r1.ppt [호환 모드]

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Transistor (90 nm technology)

EE141 11

From Mark Bohr

DNA strand ~ 10nm

Intel

Wires (65nm process)8 layers of Metal (Cu)4 in X, 4 in Y directionVias connect layersWire delay determined by C and R Higher layer – bigger wire - smaller delayWidth can be controlled

EE141 12

Width can be controlled

From Mark Bohr Intel

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Process scalingProcess scalingHigh Volume High Volume ManufacturingManufacturing

20042004 20062006 20082008 20102010 20122012 20142014 20162016 20182018

Technology Node Technology Node (nm)(nm)

9090 6565 4545 3232 2222 1616 1111 88

Integration Capacity Integration Capacity (BT)(BT)

2 4 8 16 32 64 128 256

Delay = CV/I scalingDelay = CV/I scaling 0.70.7 ~0.7~0.7 >0.7>0.7 Delay scaling will slow downDelay scaling will slow down

Energy/Logic Op Energy/Logic Op scalingscaling

>0.35>0.35 >0.5>0.5 >0.5>0.5 Energy scaling will slow downEnergy scaling will slow down

Bulk Planar CMOSBulk Planar CMOS High Probability Low ProbabilityHigh Probability Low ProbabilityAlternate, 3G etcAlternate, 3G etc Low Probability High ProbabilityLow Probability High Probability

EE141 13

VariabilityVariability Medium High Very HighMedium High Very HighILD (K)ILD (K) ~3~3 <3<3 Reduce slowly towards 2Reduce slowly towards 2--2.52.5RC DelayRC Delay 11 11 11 11 11 11 11 11Metal LayersMetal Layers 66--77 77--88 88--99 0.5 to 1 layer per generation0.5 to 1 layer per generation

From Pat Gelsinger Intel

Moore’s Law and its costs Moore’s Law and its costs

1.E+01

1.E+02

1.E+03

1.E+04

MIP

s

$ per MIPS$ per MIPS

$100

$1,000

$10,000

st ($

M)

FAB CostFAB Cost

1.E-02

1.E-01

1.E+00

1960 1970 1980 1990 2000 2010

$/M

1 E 03

1.E-02

1.E-01

stor

$ per Transistor$ per Transistor

1.E+01

1.E+02

1.E+03

l ($)

Per ChipTest CapitalTest Capital

$1

$10

$100

1960 1970 1980 1990 2000 2010

Fab

Cos

www.icknowledge.com

EE141 14

1.E-06

1.E-05

1.E-04

1.E-03

1960 1970 1980 1990 2000 2010

$/Tr

ansi

s

1.E-04

1.E-03

1.E-02

1.E-01

1.E+00

1980 1990 2000 2010

Test

Cap

ital

Based on SIA roadmap

Intel

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Moore’s LawMoore’s LawIn 1965, Gordon Moore noted that the

number of transistors on a chip doublednumber of transistors on a chip doubled every 18 to 24 months.

He made a prediction that semiconductor technology will double its effectiveness every 18 months

EE141 15© Digital Integrated Circuits2nd

Moore’s LawMoore’s Law1615IO

N

1413121110

9876543LO

G2 O

F TH

E N

UM

BER

OF

ON

ENTS

PER

INTE

GR

ATE

D F

UN

CTI

EE141 16

210

1959

1960

1961

1962

1963

1964

1965

1966

1967

1968

1969

1970

1971

1972

1973

1974

1975

CO

MPO

Electronics, April 19, 1965.

© Digital Integrated Circuits2nd

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Evolution in ComplexityEvolution in Complexity

EE141 17© Digital Integrated Circuits2nd

Transistor CountsTransistor Counts

1,000,000K

1 Billion 1 Billion TransistorsTransistors1,000,000

100,000

10,000

1,000

100 80286i386

i486Pentium®

Pentium® ProPentium® II

Pentium® III

EE141 18

10

11975 1980 1985 1990 1995 2000 2005 2010

8086Source: IntelSource: Intel

ProjectedProjected

Courtesy, Intel© Digital Integrated Circuits2nd

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Die Size GrowthDie Size Growth100

)

40048008

80808085

8086286

386486 Pentium ® procP6

1

10

Die

siz

e (m

m)

~7% growth per year~2X growth in 10 years

EE141 19

11970 1980 1990 2000 2010

Year

Die size grows by 14% to satisfy Moore’s Law

Courtesy, Intel© Digital Integrated Circuits2nd

FrequencyFrequency

1000

10000

hz)

Doubles every2 years

P6Pentium ® proc

48638628680868085

8080800840040 1

1

10

100

Freq

uenc

y (M

h y

EE141 20

0.11970 1980 1990 2000 2010

Year

Lead Microprocessors frequency doubles every 2 years

Courtesy, Intel© Digital Integrated Circuits2nd

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Power DissipationPower DissipationP6

Pentium ® proc

100

s)

486386

2868086

808580808008

4004

0.1

1

10

Pow

er (W

atts

EE141 21

0.11971 1974 1978 1985 1992 2000

Year

Lead Microprocessors power continues to increase

Courtesy, Intel© Digital Integrated Circuits2nd

Power densityPower density

1000

10000

W/c

m2) Rocket

Nozzle

400480088080

8085

8086

286 386486

Pentium® procP6

1

10

100

Pow

er D

ensi

ty (W

Hot Plate

NuclearReactor

EE141 22

11970 1980 1990 2000 2010

Year

Power density too high to keep junctions at low temp

Courtesy, Intel© Digital Integrated Circuits2nd

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Challenges in Digital DesignChallenges in Digital Design

∝ DSM ∝ 1/DSM

“Microscopic Problems”• Ultra-high speed design• Interconnect• Noise, Crosstalk• Reliability, Manufacturability• Power Dissipation• Clock distribution

“Macroscopic Issues”• Time-to-Market• Millions of Gates• High-Level Abstractions• Reuse & IP: Portability• Predictability• etc.

∝ DSM ∝ 1/DSM

EE141 23

Clock distribution.

Everything Looks a Little Different…and There’s a Lot of Them!?

© Digital Integrated Circuits2nd

Productivity TrendsProductivity Trends

1,000,000

10,000,000

10,000,000

100,000,000Logic Tr./ChipTr./Staff Month.

10,000

1,000

er C

hip

(M)

10,000

100,000

Mo.

1

10

100

1,000

10,000

100,000

33 5 3 5 5

10

100

1,000

10,000

100,000

1,000,000

xxxx

xx

x21%/Yr. compound

Productivity growth rate

x

58%/Yr. compoundedComplexity growth rate

100

10

1

0.1

0.01

0.001

Logi

c Tr

ansi

stor

pe

0.01

0.1

1

10

100

1,000

Prod

uctiv

ity(K

) Tra

ns./S

taff

-M

Com

plex

ity

EE141 24

2003

1981

1983

1985

1987

1989

1991

1993

1995

1997

1999

2001

2005

2007

2009

Source: Sematech

Complexity outpaces design productivity

Courtesy, ITRS Roadmap© Digital Integrated Circuits2nd

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Why Scaling?Why Scaling?Technology shrinks by 0.7/generationWith every generation can integrate 2x more functions per chip; chip cost does not increase significantlyCost of a function decreases by 2xBut …

How to design chips with more and more functions?Design engineering population does not double every

EE141 25

Design engineering population does not double every two years…

Hence, a need for more efficient design methodsExploit different levels of abstraction

© Digital Integrated Circuits2nd

Design Abstraction LevelsDesign Abstraction LevelsSYSTEM

+

CIRCUIT

GATE

MODULE

EE141 26

n+n+S

GD

DEVICE

© Digital Integrated Circuits2nd

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Design MetricsDesign Metrics

How to evaluate performance of a digital circuit (gate block )?digital circuit (gate, block, …)?

CostReliabilityScalabilitySpeed (delay, operating frequency) P di i ti

EE141 27

Power dissipationEnergy to perform a function

© Digital Integrated Circuits2nd

Cost of Integrated CircuitsCost of Integrated CircuitsNRE (non-recurrent engineering) costs

design time and effort, mask generationone-time cost factor

Recurrent costssilicon processing, packaging, test

EE141 28

proportional to volumeproportional to chip area

© Digital Integrated Circuits2nd

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NRE Cost is IncreasingNRE Cost is Increasing

EE141 29© Digital Integrated Circuits2nd

Die CostDie Cost

Single dieSingle die

Wafer

EE141 30From http://www.amd.com

Going up to 12” (30cm)

© Digital Integrated Circuits2nd

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YieldYield%100

per wafer chips ofnumber Totalper wafer chips good of No.

×=Y

costWafer costDie =yield Dieper wafer Dies

cost Die×

=

( )area die2

diameterwafer area die

diameter/2wafer per wafer Dies2

××π

−×π

=

EE141 31© Digital Integrated Circuits2nd

DefectsDefects

α−⎟⎞

⎜⎛ ×+=

area dieareaunit per defects1yielddie

EE141 32

⎟⎠

⎜⎝ α+1yield die

α is approximately 3

4area) (die cost die f=

© Digital Integrated Circuits2nd

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Reliability―Reliability―Noise in Digital Integrated CircuitsNoise in Digital Integrated Circuits

i(t)

Inductive coupling Capacitive coupling Power and ground

v(t) VDD

EE141 33

p g p p g gnoise

© Digital Integrated Circuits2nd

DC OperationDC OperationVoltage Transfer CharacteristicVoltage Transfer Characteristic

V(y)

VOH = f(VOL)VOH

VOL

VM

fV(y)=V(x)

Switching Threshold

VOH = f(VOL)VOL = f(VOH)VM = f(VM)

EE141 34

V(x)

OL

VOHVOL

Nominal Voltage Levels

© Digital Integrated Circuits2nd

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Mapping between analog and digital signalsMapping between analog and digital signals

Slope = -1V

VoutVOH“1” Slope 1

Slope = -1

V OH

VIL

VIH

UndefinedRegion

EE141 35

V IL V IH V in

p

V OL“0” VOL

IL

© Digital Integrated Circuits2nd

Definition of Noise MarginsDefinition of Noise Margins

"1"

Noise margin high

Noise margin low

VIH

VIL

UndefinedRegion

VOH

VOL

NMH

NML

EE141 36

"0"

Gate Output Gate Input

© Digital Integrated Circuits2nd

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Noise BudgetNoise BudgetAllocates gross noise margin to expected sources of noiseSources: supply noise, cross talk, interference, offsetDifferentiate between fixed and

ti l i

EE141 37

proportional noise sources

© Digital Integrated Circuits2nd

Key Reliability PropertiesKey Reliability PropertiesAbsolute noise margin values are deceptive

a floating node is more easily disturbed than a node driven by a low impedance (in terms of voltage)

Noise immunity is the more important metric –the capability to suppress noise sourcesKey metrics: Noise transfer functions Output

EE141 38

Key metrics: Noise transfer functions, Output impedance of the driver and input impedance of the receiver;

© Digital Integrated Circuits2nd

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Regenerative PropertyRegenerative Property

vout

vout

v1

v3

finv(v)

f (v)

v3

v1

f (v)

finv(v)

v3

EE141 39

v0 v2 in

Regenerative Non-Regenerativev2 v0 in

© Digital Integrated Circuits2nd

Regenerative PropertyRegenerative Property

v v v v v v v

A chain of inverters

v0 v1 v2 v3 v4 v5 v6

(Vol

t) v03

5

EE141 40

2

V

4

v1v2

t (nsec)0

2 1

1

6 8 10Simulated response

© Digital Integrated Circuits2nd

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FanFan--in and Fanin and Fan--outout

NM

EE141 41

Fan-out N Fan-in M

© Digital Integrated Circuits2nd

The Ideal GateThe Ideal Gate

V out

Ri = ∞Ro = 0Fanout = ∞NMH = NML = VDD/2 g = ∞

EE141 42

V in

© Digital Integrated Circuits2nd

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An OldAn Old--time Invertertime Inverter

NM L4.0

5.0

NM H

Vout(V)V M

1 0

2.0

3.0

EE141 43

V in (V)0.0

1.0

1.0 2.0 3.0 4.0 5.0

© Digital Integrated Circuits2nd

Delay DefinitionsDelay DefinitionsVin

Vout

tpHL tpLH

t

90%

50%

EE141 44

tf trt10%

50%

© Digital Integrated Circuits2nd

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Ring OscillatorRing Oscillator

v0 v1 v5

v1 v2v0 v3 v4 v5

EE141 45

T = 2 ´ tp ´ N

© Digital Integrated Circuits2nd

A FirstA First--Order RC NetworkOrder RC Network

Rvout

vin C

R

EE141 46

tp = ln (2) τ = 0.69 RC

Important model – matches delay of inverter

© Digital Integrated Circuits2nd

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Power DissipationPower Dissipation

Instantaneous power:Instantaneous power: p(t) = v(t)i(t) = Vsupplyi(t)

Peak power: Ppeak = Vsupplyipeak

EE141 47

Average power:

( )∫ ∫+ +

==Tt

tTt

t supplysupply

ave dttiT

Vdttp

TP )(1

© Digital Integrated Circuits2nd

Energy and EnergyEnergy and Energy--DelayDelay

Power-Delay Product (PDP) =owe De ay oduct ( D )

E = Energy per operation = Pav × tp

Energy-Delay Product (EDP) =

li i f E

EE141 48

quality metric of gate = E × tp

© Digital Integrated Circuits2nd

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A FirstA First--Order RC NetworkOrder RC Network

voutR

E0 1 P t( )dtT∫ Vdd i l t( )dt

T∫ Vdd CLdV

Vdd

∫ CL Vdd• 2= = = =

vin CL

EE141 49

E0 1→ P t( )dt0∫ Vdd isupply t( )dt

0∫ Vdd CLdVout

0∫ CL Vdd•

Ecap Pcap t( )dt0

T∫ Vouticap t( )dt

0

T∫ CLVoutdVout

0

Vdd∫

12---C

LVdd• 2= = = =

© Digital Integrated Circuits2nd

SummarySummaryDigital integrated circuits have come a long way and still have quite some potential left for th i d dthe coming decadesSome interesting challenges ahead

Getting a clear perspective on the challenges and potential solutions is the purpose of this book

Understanding the design metrics that govern digital design is crucial

EE141 50

digital design is crucialCost, reliability, speed, power and energy dissipation

© Digital Integrated Circuits2nd