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Digital Integrated Circuit DesignDigital Integrated Circuit DesignL1 Introduction
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General InformationGeneral Information
Instructor : Jinyong [email protected] 312, LG Research Building(Tue, Thu), g( , )Mailbox @copyroom on 2nd floorOffice: x5016(LG312), x0204(NCNT)
GradingHomework - 30%
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Term Project - 30%Midterm Exam- 20%Final Exam - 20%
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(continued)(continued)
Design Project32bit x 32bit NAND Flash
1.8V operationtransistor model: TBPControl logic (ECC optional) design & simulationcircuit design and simulationReport on target & performance comparison
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Report on target & performance comparison /analysisFinal Report by 12/11
(continued)(continued)Baseline textbook디지털집적회로, 대영사, 박홍준Digital Integrated Circuits By J. Rabaey, A. Chandrakasan, B. Nikolicy y, ,Prentice Hall
ReferenceAnalysis and Design of Digital Integrated Circuits
in deep submicron technologyBy D. Hodges, H. Jackson, R. SalehMcGraw Hill
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Class Material on webClass schedule
Mid term: 10/21 (Tue)Final on 12/18 (Thu)
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Class GoalsClass GoalsDigital Integrated Circuits
CMOS gatesPropagation delay, noise margins and power dissipation FOM’sdissipation, FOM sCombinational and sequential circuitsArithmetic, Datapath, Memory, Clock and InterconnectDesign for Testability
What will you learn?U d t di d i i d ti i i di it l
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Understanding, designing and optimizing digital circuits with respect to quality metrics: speed, power, cost and reliabilityCircuit Design (design & simulation, layout) on flash memory
Digital Integrated CircuitsDigital Integrated CircuitsIntroduction: Issues in digital designTh CMOS i tThe CMOS inverterCombinational logic structuresSequential logic gatesMemory CircuitDesign for TestabilityInterconnect: R L and C
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Interconnect: R, L and CTimingArithmetic building blocksDesign methodologies
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IntroductionIntroductionWhy is digital IC design different today than it was before?Differences from other disciplinesFuture perspectives
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The First Integrated Circuits The First Integrated Circuits
Bipolar logicp g1960’s
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ECL 3-input GateMotorola 1966
© Digital Integrated Circuits2nd
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Intel 4004 MicroIntel 4004 Micro--ProcessorProcessor
19711000 transistors1 MHz operation
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Dual core microprocessor Dual core microprocessor (Montecito, 90nm)(Montecito, 90nm)
1.72 * 10^9 tr
596 mm^2
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6
Transistor (90 nm technology)
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From Mark Bohr
DNA strand ~ 10nm
Intel
Wires (65nm process)8 layers of Metal (Cu)4 in X, 4 in Y directionVias connect layersWire delay determined by C and R Higher layer – bigger wire - smaller delayWidth can be controlled
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Width can be controlled
From Mark Bohr Intel
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Process scalingProcess scalingHigh Volume High Volume ManufacturingManufacturing
20042004 20062006 20082008 20102010 20122012 20142014 20162016 20182018
Technology Node Technology Node (nm)(nm)
9090 6565 4545 3232 2222 1616 1111 88
Integration Capacity Integration Capacity (BT)(BT)
2 4 8 16 32 64 128 256
Delay = CV/I scalingDelay = CV/I scaling 0.70.7 ~0.7~0.7 >0.7>0.7 Delay scaling will slow downDelay scaling will slow down
Energy/Logic Op Energy/Logic Op scalingscaling
>0.35>0.35 >0.5>0.5 >0.5>0.5 Energy scaling will slow downEnergy scaling will slow down
Bulk Planar CMOSBulk Planar CMOS High Probability Low ProbabilityHigh Probability Low ProbabilityAlternate, 3G etcAlternate, 3G etc Low Probability High ProbabilityLow Probability High Probability
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VariabilityVariability Medium High Very HighMedium High Very HighILD (K)ILD (K) ~3~3 <3<3 Reduce slowly towards 2Reduce slowly towards 2--2.52.5RC DelayRC Delay 11 11 11 11 11 11 11 11Metal LayersMetal Layers 66--77 77--88 88--99 0.5 to 1 layer per generation0.5 to 1 layer per generation
From Pat Gelsinger Intel
Moore’s Law and its costs Moore’s Law and its costs
1.E+01
1.E+02
1.E+03
1.E+04
MIP
s
$ per MIPS$ per MIPS
$100
$1,000
$10,000
st ($
M)
FAB CostFAB Cost
1.E-02
1.E-01
1.E+00
1960 1970 1980 1990 2000 2010
$/M
1 E 03
1.E-02
1.E-01
stor
$ per Transistor$ per Transistor
1.E+01
1.E+02
1.E+03
l ($)
Per ChipTest CapitalTest Capital
$1
$10
$100
1960 1970 1980 1990 2000 2010
Fab
Cos
www.icknowledge.com
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1.E-06
1.E-05
1.E-04
1.E-03
1960 1970 1980 1990 2000 2010
$/Tr
ansi
s
1.E-04
1.E-03
1.E-02
1.E-01
1.E+00
1980 1990 2000 2010
Test
Cap
ital
Based on SIA roadmap
Intel
8
Moore’s LawMoore’s LawIn 1965, Gordon Moore noted that the
number of transistors on a chip doublednumber of transistors on a chip doubled every 18 to 24 months.
He made a prediction that semiconductor technology will double its effectiveness every 18 months
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Moore’s LawMoore’s Law1615IO
N
1413121110
9876543LO
G2 O
F TH
E N
UM
BER
OF
ON
ENTS
PER
INTE
GR
ATE
D F
UN
CTI
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210
1959
1960
1961
1962
1963
1964
1965
1966
1967
1968
1969
1970
1971
1972
1973
1974
1975
CO
MPO
Electronics, April 19, 1965.
© Digital Integrated Circuits2nd
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Evolution in ComplexityEvolution in Complexity
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Transistor CountsTransistor Counts
1,000,000K
1 Billion 1 Billion TransistorsTransistors1,000,000
100,000
10,000
1,000
100 80286i386
i486Pentium®
Pentium® ProPentium® II
Pentium® III
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10
11975 1980 1985 1990 1995 2000 2005 2010
8086Source: IntelSource: Intel
ProjectedProjected
Courtesy, Intel© Digital Integrated Circuits2nd
10
Die Size GrowthDie Size Growth100
)
40048008
80808085
8086286
386486 Pentium ® procP6
1
10
Die
siz
e (m
m)
~7% growth per year~2X growth in 10 years
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11970 1980 1990 2000 2010
Year
Die size grows by 14% to satisfy Moore’s Law
Courtesy, Intel© Digital Integrated Circuits2nd
FrequencyFrequency
1000
10000
hz)
Doubles every2 years
P6Pentium ® proc
48638628680868085
8080800840040 1
1
10
100
Freq
uenc
y (M
h y
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0.11970 1980 1990 2000 2010
Year
Lead Microprocessors frequency doubles every 2 years
Courtesy, Intel© Digital Integrated Circuits2nd
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Power DissipationPower DissipationP6
Pentium ® proc
100
s)
486386
2868086
808580808008
4004
0.1
1
10
Pow
er (W
atts
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0.11971 1974 1978 1985 1992 2000
Year
Lead Microprocessors power continues to increase
Courtesy, Intel© Digital Integrated Circuits2nd
Power densityPower density
1000
10000
W/c
m2) Rocket
Nozzle
400480088080
8085
8086
286 386486
Pentium® procP6
1
10
100
Pow
er D
ensi
ty (W
Hot Plate
NuclearReactor
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11970 1980 1990 2000 2010
Year
Power density too high to keep junctions at low temp
Courtesy, Intel© Digital Integrated Circuits2nd
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Challenges in Digital DesignChallenges in Digital Design
∝ DSM ∝ 1/DSM
“Microscopic Problems”• Ultra-high speed design• Interconnect• Noise, Crosstalk• Reliability, Manufacturability• Power Dissipation• Clock distribution
“Macroscopic Issues”• Time-to-Market• Millions of Gates• High-Level Abstractions• Reuse & IP: Portability• Predictability• etc.
∝ DSM ∝ 1/DSM
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Clock distribution.
Everything Looks a Little Different…and There’s a Lot of Them!?
© Digital Integrated Circuits2nd
Productivity TrendsProductivity Trends
1,000,000
10,000,000
10,000,000
100,000,000Logic Tr./ChipTr./Staff Month.
10,000
1,000
er C
hip
(M)
10,000
100,000
Mo.
1
10
100
1,000
10,000
100,000
33 5 3 5 5
10
100
1,000
10,000
100,000
1,000,000
xxxx
xx
x21%/Yr. compound
Productivity growth rate
x
58%/Yr. compoundedComplexity growth rate
100
10
1
0.1
0.01
0.001
Logi
c Tr
ansi
stor
pe
0.01
0.1
1
10
100
1,000
Prod
uctiv
ity(K
) Tra
ns./S
taff
-M
Com
plex
ity
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2003
1981
1983
1985
1987
1989
1991
1993
1995
1997
1999
2001
2005
2007
2009
Source: Sematech
Complexity outpaces design productivity
Courtesy, ITRS Roadmap© Digital Integrated Circuits2nd
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Why Scaling?Why Scaling?Technology shrinks by 0.7/generationWith every generation can integrate 2x more functions per chip; chip cost does not increase significantlyCost of a function decreases by 2xBut …
How to design chips with more and more functions?Design engineering population does not double every
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Design engineering population does not double every two years…
Hence, a need for more efficient design methodsExploit different levels of abstraction
© Digital Integrated Circuits2nd
Design Abstraction LevelsDesign Abstraction LevelsSYSTEM
+
CIRCUIT
GATE
MODULE
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n+n+S
GD
DEVICE
© Digital Integrated Circuits2nd
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Design MetricsDesign Metrics
How to evaluate performance of a digital circuit (gate block )?digital circuit (gate, block, …)?
CostReliabilityScalabilitySpeed (delay, operating frequency) P di i ti
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Power dissipationEnergy to perform a function
© Digital Integrated Circuits2nd
Cost of Integrated CircuitsCost of Integrated CircuitsNRE (non-recurrent engineering) costs
design time and effort, mask generationone-time cost factor
Recurrent costssilicon processing, packaging, test
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proportional to volumeproportional to chip area
© Digital Integrated Circuits2nd
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NRE Cost is IncreasingNRE Cost is Increasing
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Die CostDie Cost
Single dieSingle die
Wafer
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Going up to 12” (30cm)
© Digital Integrated Circuits2nd
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YieldYield%100
per wafer chips ofnumber Totalper wafer chips good of No.
×=Y
costWafer costDie =yield Dieper wafer Dies
cost Die×
=
( )area die2
diameterwafer area die
diameter/2wafer per wafer Dies2
××π
−×π
=
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DefectsDefects
α−⎟⎞
⎜⎛ ×+=
area dieareaunit per defects1yielddie
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⎟⎠
⎜⎝ α+1yield die
α is approximately 3
4area) (die cost die f=
© Digital Integrated Circuits2nd
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Reliability―Reliability―Noise in Digital Integrated CircuitsNoise in Digital Integrated Circuits
i(t)
Inductive coupling Capacitive coupling Power and ground
v(t) VDD
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p g p p g gnoise
© Digital Integrated Circuits2nd
DC OperationDC OperationVoltage Transfer CharacteristicVoltage Transfer Characteristic
V(y)
VOH = f(VOL)VOH
VOL
VM
fV(y)=V(x)
Switching Threshold
VOH = f(VOL)VOL = f(VOH)VM = f(VM)
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V(x)
OL
VOHVOL
Nominal Voltage Levels
© Digital Integrated Circuits2nd
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Mapping between analog and digital signalsMapping between analog and digital signals
Slope = -1V
VoutVOH“1” Slope 1
Slope = -1
V OH
VIL
VIH
UndefinedRegion
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V IL V IH V in
p
V OL“0” VOL
IL
© Digital Integrated Circuits2nd
Definition of Noise MarginsDefinition of Noise Margins
"1"
Noise margin high
Noise margin low
VIH
VIL
UndefinedRegion
VOH
VOL
NMH
NML
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"0"
Gate Output Gate Input
© Digital Integrated Circuits2nd
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Noise BudgetNoise BudgetAllocates gross noise margin to expected sources of noiseSources: supply noise, cross talk, interference, offsetDifferentiate between fixed and
ti l i
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proportional noise sources
© Digital Integrated Circuits2nd
Key Reliability PropertiesKey Reliability PropertiesAbsolute noise margin values are deceptive
a floating node is more easily disturbed than a node driven by a low impedance (in terms of voltage)
Noise immunity is the more important metric –the capability to suppress noise sourcesKey metrics: Noise transfer functions Output
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Key metrics: Noise transfer functions, Output impedance of the driver and input impedance of the receiver;
© Digital Integrated Circuits2nd
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Regenerative PropertyRegenerative Property
vout
vout
v1
v3
finv(v)
f (v)
v3
v1
f (v)
finv(v)
v3
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v0 v2 in
Regenerative Non-Regenerativev2 v0 in
© Digital Integrated Circuits2nd
Regenerative PropertyRegenerative Property
v v v v v v v
A chain of inverters
v0 v1 v2 v3 v4 v5 v6
(Vol
t) v03
5
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2
V
4
v1v2
t (nsec)0
2 1
1
6 8 10Simulated response
© Digital Integrated Circuits2nd
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FanFan--in and Fanin and Fan--outout
NM
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Fan-out N Fan-in M
© Digital Integrated Circuits2nd
The Ideal GateThe Ideal Gate
V out
Ri = ∞Ro = 0Fanout = ∞NMH = NML = VDD/2 g = ∞
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V in
© Digital Integrated Circuits2nd
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An OldAn Old--time Invertertime Inverter
NM L4.0
5.0
NM H
Vout(V)V M
1 0
2.0
3.0
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V in (V)0.0
1.0
1.0 2.0 3.0 4.0 5.0
© Digital Integrated Circuits2nd
Delay DefinitionsDelay DefinitionsVin
Vout
tpHL tpLH
t
90%
50%
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tf trt10%
50%
© Digital Integrated Circuits2nd
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Ring OscillatorRing Oscillator
v0 v1 v5
v1 v2v0 v3 v4 v5
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T = 2 ´ tp ´ N
© Digital Integrated Circuits2nd
A FirstA First--Order RC NetworkOrder RC Network
Rvout
vin C
R
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tp = ln (2) τ = 0.69 RC
Important model – matches delay of inverter
© Digital Integrated Circuits2nd
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Power DissipationPower Dissipation
Instantaneous power:Instantaneous power: p(t) = v(t)i(t) = Vsupplyi(t)
Peak power: Ppeak = Vsupplyipeak
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Average power:
( )∫ ∫+ +
==Tt
tTt
t supplysupply
ave dttiT
Vdttp
TP )(1
© Digital Integrated Circuits2nd
Energy and EnergyEnergy and Energy--DelayDelay
Power-Delay Product (PDP) =owe De ay oduct ( D )
E = Energy per operation = Pav × tp
Energy-Delay Product (EDP) =
li i f E
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quality metric of gate = E × tp
© Digital Integrated Circuits2nd
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A FirstA First--Order RC NetworkOrder RC Network
voutR
E0 1 P t( )dtT∫ Vdd i l t( )dt
T∫ Vdd CLdV
Vdd
∫ CL Vdd• 2= = = =
vin CL
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E0 1→ P t( )dt0∫ Vdd isupply t( )dt
0∫ Vdd CLdVout
0∫ CL Vdd•
Ecap Pcap t( )dt0
T∫ Vouticap t( )dt
0
T∫ CLVoutdVout
0
Vdd∫
12---C
LVdd• 2= = = =
© Digital Integrated Circuits2nd
SummarySummaryDigital integrated circuits have come a long way and still have quite some potential left for th i d dthe coming decadesSome interesting challenges ahead
Getting a clear perspective on the challenges and potential solutions is the purpose of this book
Understanding the design metrics that govern digital design is crucial
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digital design is crucialCost, reliability, speed, power and energy dissipation
© Digital Integrated Circuits2nd