journal of materials chemistry issue 30, 2008 · 1 a. teleki, m.k. akhtar and s.e. pratsinis “the...
TRANSCRIPT
1
A. Teleki, M.K. Akhtar and S.E. Pratsinis“The quality of SiO2-coatings on flame-made TiO2-based nanoparticles”
Journal of Materials Chemistry Issue 30, 2008
06.07.2008
Flame Spray Synthesis and in-situCoating of Nanoparticles in One Step
Alexandra Teleki, Martin C. Heine, F. Krumeich, M.K. Akhtar and S.E. Pratsinis
Particle Technology Laboratory, ETH Zurich, Switzerland
3
Applications of SiO2-coated TiO2
UV-absorption in liquid suspensions[1] or polymer composites[2]
[1] Lademann, J., H. J. Weigmann, H. Schafer, G. Muller, and W. Sterry, Skin Pharmacol. Appl. Skin Physiol. 13, 258 (2000).[2] Nussbaumer, R. J., W. R. Caseri, P. Smith, and T. Tervoort, Macromol. Mater. Eng. 288, 44 (2003).
Rutile TiO2 in PS[3] SiO2-coated TiO2
Photocatalytic activity of TiO2 degrades surrounding matrixhigh rutile content and/or coatings
TiO2SiO2
[3] Chandra, A., L.-S. Turng, S. Gong, D.C. Hall, D.F. Caulfield, and H. Yang, Polymer Composites, 241 (2007).
4
Vapor-fed flame synthesis (chloride process) of pigmentary TiO2: ~ 2 million tons/year[1]
[1] Fisher, J., and T.A. Egerton, Titanium compounds, Inorganic, In Kirk-Othmer Encyclopedia of Chemical Technology, John Wiley & Sons, Inc., (2001).
In-situ SiO2-coating of flame-made TiO2
5
Si, Al and Ti
co-oxidized
amorphous
crystalline
co-oxidized SiO2/Al2O3/TiO2
Segregation in co-oxidized SiO2/Al2O3/TiO2
6
co-oxidized
amorphous
crystalline
Al-doped TiO2Vapor flame-made SiO2/TiO2[1]
Co-oxidation of Si/Ti precursors leads to segregation and separate SiO2 and TiO2 particles
[1] Teleki A., S.E. Pratsinis, R. Jossen, and F. Krumeich, J. Mater. Res. 20, 1336 (2005).
Segregation in co-oxidized SiO2/Al2O3/TiO2
co-oxidized SiO2/Al2O3/TiO2
7
Experimental set-up for in-situ coating
N2
Si prec.
Si injection
point
1. Si injection point[1]
(burner-ring-distance: BRD) (20 wt% SiO2, 15 l/min N2)
Si injection
point
25 g/h: 4 wt% Al2O3/TiO25 ml/min precursor solution (1 M Al(s-BuO)3/TTIP)5 l/min O2 dispersion40 l/min O2 sheath
Al and Ti
2. SiO2 content[2]
(15 l/min, 20 cm BRD)
[1] Lee, B. S., D.J. Kang, and S.G. Kim, J. Mater. Sci. 38, 3545 (2003).[2] Siddiquey, I.A., T. Furusawa, M. Sato, K. Honda, and N. Suzuki, Dyes and Pigments, 76, 754 (2008).
3. Co-oxidized SiO2/Al2O3/TiO2(15 l/min, 20 cm BRD)
Si, Al and Ti
N2
Si prec.
8
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Effect of Si Injection PointPhotooxidation of isopropanol (IPA) to acetone
Al/TiO2
9
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Effect of Si Injection Point
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Photooxidation of isopropanol (IPA) to acetone
Al/TiO2
10
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Effect of Si Injection Point
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300 Impact of Si on TiO2crystallinity and size[1]
is reduced at higher Si precursor injection points.
[1] Akhtar, M.K., S.E. Pratsinis, and S.V.R. Mastrangelo, J. Am. Ceram. Soc., 1992, 75, 3408.
pure TiO2
Si injection point, cm
0 5 10 15 20 25 30
μ g A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
rutil
e w
t%
30
40
50
60
70
Photooxidation of isopropanol (IPA) to acetone
Al/TiO2
11
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Effect of Si Injection Point
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Si injection point, cm
0 5 10 15 20 25 30
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Photooxidation of isopropanol (IPA) to acetone
20 cm
5 cm
10 cm
amorphous
crystalline
amorphous
crystalline
crystalline
amorphous
Premature Si injection results in separate SiO2and poorly-coated TiO2.
Al/TiO2
12
SiO2 wt% fraction
0 5 10 15 20
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
SiO2 wt% fraction
0 5 10 15 20
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
SiO2 wt% fraction
0 5 10 15 20
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
Effect of Si Content on Photocatalytic Activity
coating processco-oxidized
13
SiO2 wt% fraction
0 5 10 15 20
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300 Co-oxidized: the rutilefraction decreases as SiO2 is added.
In the coating processthe rutile fraction israther independent of SiO2 content.
68 wt% rutile 36 wt% rutile
60 wt% rutile
coating processco-oxidized
Effect of Si Content on Photocatalytic Activity
14
SiO2 wt% fraction
0 5 10 15 20
μg A
ceto
ne/m
l IPA
0
50
100
150
200
250
300
amorphous
crystalline
20 wt% SiO2
co-oxidized
amorphous
crystalline
5 wt% SiO2
coating processco-oxidized
Effect of Si Content on Photocatalytic Activity
Theoretical coating thickness 5 wt% SiO2: < 1 nm 20 wt% SiO2: 2.7 nm
Increasing coating thickness
15
Homogeneous, Smooth Coatings –No separate SiO2
Ti
Ti
Ti
20 wt% SiO2
16
Characterization of the SiO2 Coating Quality
Fast and quantitative characterization of coating quality
TEM: difficult to gather statistically reliable data and to
distinguish ultra thin coatings[1]
[1] Egerton, T.A., and I.R. Tooley, J. Mater. Chem. 12, 1111 (2002).
17
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5co-oxidized ySi/Al/TiO2
Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5co-oxidized ySi/Al/TiO2
2.5 wt%
Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5co-oxidized ySi/Al/TiO2
5 wt%2.5 wt%
Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5co-oxidized ySi/Al/TiO2
10 wt%
5 wt%2.5 wt%
Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5co-oxidized ySi/Al/TiO2
15 wt%
10 wt%
5 wt%2.5 wt%
Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5co-oxidized ySi/Al/TiO2
20 wt% SiO2
15 wt%
10 wt%
5 wt%2.5 wt%
Al/TiO2
FT-IR
Si-O-Ti[1]Si-O-Si[1]
[1] Larouche S., H. Szymanowski, J.E. Klemberg-Sapieha, L. Martinu, and S.C. Gujrathi, J. Vac. Sci. Techn. A 22, 1200 (2004).
Chemical Structureco-oxidized
High and increasingintensity of Si-O-Si (asymmetric) band is attributed to theformation of large separate SiO2domains[2].
[2] Martins, O., and R.M. Almeida, J. Sol-Gel Sci. Technol. 19, 651 (2000).
Si-O-Si[1]
18
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5
Al/TiO2
SiO2-coated Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5
2.5 wt% Al/TiO2
SiO2-coated Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5
5 wt%
2.5 wt% Al/TiO2
SiO2-coated Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5
10 wt%
5 wt%
2.5 wt% Al/TiO2
SiO2-coated Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5
15 wt%
10 wt%
5 wt%
2.5 wt% Al/TiO2
SiO2-coated Al/TiO2
Wavenumber, cm-1
900100011001200
IR a
bsor
banc
e, a
.u.
0.0
0.1
0.2
0.3
0.4
0.5
20 wt% SiO2
15 wt%
10 wt%
5 wt%
2.5 wt% Al/TiO2
SiO2-coated Al/TiO2
Chemical Structure
Si-O-Ti
Si-O-Si
Si-O-Si
Shift of the Si-O-Si 1100 cm-1 band and high intensity of 1225 cm-1 band attributed to Si-O-Si bond strain[1,2].
The bond strain isreduced as coatingthickness increases.
[1] Almeida, R.M., and C.G. Pantano, J. Appl. Phys. 68, 4225 (1990). [2] Almeida, R.M., T.A. Guiton, and C.G. Pantano, J. Non-Cryst. Solids, 121, 193 (1990).
19
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60pure Al/TiO2
pure SiO2
co-oxidized Si/Al/TiO2
Zeta Potential - Effect of SiO2 ContentAqueous suspensions of product particles
Isoelectric point (IEP)
pH 7.7pH 1.7Presence of both Al and Ti hydroxidesurface groups[1]
[1] Morris, G.E., W.A. Skinner, P.G. Self, and R.S. Smart, Colloid Surf. A-Physiochem. Eng. Asp. 155, 27 (1999).
IEP pure TiO2: pH 5 - 7[1]
IEP pure Al2O3 : pH 9[1]
20
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60pure Al/TiO2
pure SiO2
co-oxidized Si/Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pure SiO2
co-oxidized Si/Al/TiO2pure Al/TiO2
2.5 wt% SiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
5 "pure SiO2
co-oxidized Si/Al/TiO2pure Al/TiO2
2.5 wt% SiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
5 "10 "pure SiO2
co-oxidized Si/Al/TiO2pure Al/TiO2
2.5 wt% SiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
5 "10 "15 "pure SiO2
co-oxidized Si/Al/TiO2pure Al/TiO2
2.5 wt% SiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
5 "10 "15 "20 "pure SiO2
co-oxidized Si/Al/TiO2pure Al/TiO2
2.5 wt% SiO2
Zeta Potential - Effect of SiO2 Content
co-oxidized The IEP shifts towardslower pH as the SiO2content increases and large SiO2 domains areformed in agreementwith FT-IR spectra.
21
SiO2-coated Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pureSiO2
SiO2-coated Al/TiO2
5 " 10 "15 "20 "
pure Al/TiO2
2.5 wt% SiO2
SiO2-coated Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pureSiO2
SiO2-coated Al/TiO2
5 " 10 "15 "20 "
pure Al/TiO2
2.5 wt% SiO2
SiO2-coated Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pureSiO2
SiO2-coated Al/TiO2
5 " 10 "15 "20 "
pure Al/TiO2
2.5 wt% SiO2
SiO2-coated Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pureSiO2
SiO2-coated Al/TiO2
5 " 10 "
15 "20 "
pure Al/TiO2
2.5 wt% SiO2
SiO2-coated Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pureSiO2
SiO2-coated Al/TiO2
5 " 10 "15 "
20 "
pure Al/TiO2
2.5 wt% SiO2
SiO2-coated Al/TiO2
pH
2 4 6 8 10
Zeta
pot
entia
l ζ, m
V
-60
-40
-20
0
20
40
60
pureSiO2
SiO2-coated Al/TiO2
5 " 10 "15 "20 "
pure Al/TiO2
2.5 wt% SiO2
Zeta Potential - Effect of SiO2 Content
The negative zeta-potential at all pH for ≥ 10 wt% SiO2 might beattributed to difference in silica surface chemistrycompared to particleswith large SiO2 domainsas seen byFT-IR.
improved dispersionstability[1]
[1] Siddiquey, I.A., T. Furusawa, M. Sato, K. Honda, and N. Suzuki, Dyes and Pigments 76 754 (2008).
Very thin/partial coatingsat 2.5 - 5 wt% SiO2.
22
Temperature, °C
100 200 300 400 500
Ther
mal
con
duct
ivity
(TC
) sig
nal,
a.u.
pure Al/TiO2
wt% SiO2
0 5 10 15 20
Ther
mal
con
duct
ivity
(TC
) pe
ak te
mpe
ratu
re, °
C150
170
190
210
230
250
270
Isopropanol Chemisorption
Temperature, °C
100 200 300 400 500
Ther
mal
con
duct
ivity
(TC
) sig
nal,
a.u. pure SiO2
pure Al/TiO2
Temperature, °C
100 200 300 400 500
Ther
mal
con
duct
ivity
(TC
) sig
nal,
a.u. pure SiO2
5 wt% SiO2-coated Al/TiO2
pure Al/TiO2
Temperature, °C
100 200 300 400 500
Ther
mal
con
duct
ivity
(TC
) sig
nal,
a.u. pure SiO2
20 wt% SiO2-coated Al/TiO2
5 wt% SiO2-coated Al/TiO2
pure Al/TiO2
277 °C
[2] Liu Z., J. Tabora, and J. Davis, J. Cat. 149, 117 (1994).
No desorption from a pure SiO2 surface[2]
Surface-adsorbate interactions weaker on silica-containing oxides[2]
coating processco-oxidized
Chemisorption at 110 °C[1]
Isopropanol release monitored by the change in the gas thermal conductivity
[1] Kulkarni, D., and I.E. Wachs, Appl. Catal. A-Gen., 237, 121 (2002).
23
Conclusions
A process was developed for in-situ coating of flame-made particles.
Smooth and homogeneous SiO2coatings 2 – 4 nm thick on TiO2nanoparticles were obtained.
SiO2-coated TiO2 particles exhibitedlimited photoactivity.
The extent of SiO2 surface coverage was determined electrophoreticallyand chemically by isopropanolchemisorption.
N2
Si prec.