interpreting ichq11: a risk assessment tool for assessing ... ich q1… · sm 1 4 4 53 0 1 1 0 0 8...
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© 2009 Genentech, Inc.
Interpreting ICHQ11: A Risk Assessment Tool for
Assessing Starting Material Acceptability
Larry Wigman Genentech – SMACQC
Webinar - Lhasa Mirabilis Users Group
November 9th, 2017
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Overview
• A Changing Regulatory Climate For Starting Materials
• Selection of Regulatory Starting Material
• A new Risk Assessment Tool • based on EMA Reflection Paper and ICHQ11 Q&A
• Erivedge Example - Disclosure of more Synthetic Steps
• More Highly Reactive, Potentially Genotoxic Intermediates
• Leveraging M7 Control Options
• Applying Purging Rationale
• Opportunity to add RSM Risk Assessment Tool to Mirabilis
Slide 2
© 2009 Genentech, Inc.
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Statement of the Problem
• Industry and Health Authorities were interpreting ICHQ11
Differently
• Increased HA Scrutiny of Starting Materials
• Challenges for Phase 3 and Registration
• Significant Queries even for Phase 1
• Route, specifications, COA’s
Slide 3
© 2009 Genentech, Inc.
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Changing Regulatory Climate for Starting Materials
• EMA Reflection Paper on ICHQ11
• ICH Question and Answer Paper
- Focused on: • Proximity and Purging Power
• Stages and Steps
- “Telescoped” Process
• Complexity and Criticality
• Change Control and GMP
Slide 4
© 2009 Genentech, Inc.
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Risk Assessment – A New Tool for Genentech/Roche
• Distilled down to the most essential criteria • Proximity
• sufficient number of Stages
• Purging Power • Impurity purging steps/Isolations
• Complexity • % Wt of the API
• Number of Chiral Centers
• Number of Substitutions
• Number of rings
• Impurity Carryover
• Stability
Slide 5
© 2009 Genentech, Inc.
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Calculation of the RSM Risk Score Slide 6
© 2009 Genentech, Inc.
Criterion Instruction Values
Bond forming stages to API Count all bond forming (chemical) steps 1 to n
No of isolated steps to API Count all isolations (cryst. and product dist.) 1 to n
% w/w of API Count only the part which ends-up in the API 1-100
No of stereogenic centers Count all stereogenic (chiral) centers 0 to n
No of substituted aryls or
double bonds
Count 1 per substituted aryl and substituted
double bond
0 to n
No of rings Count all rings 0 to n
Impurity carry over to API 1 if at least one impurity is carried over to API 0 or 1
Instability 1 if instability is observed or may arise 0 or 1
Risk Score =4
A+
8
B+ C × 0.06 + D + E + F + G + H
< 8 low, > 8 - < 10 medium, > 10 high
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Demonstration - Vemurafenib Slide 7
© 2009 Genentech, Inc.
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Demonstration - Vemurafenib Slide 8
© 2009 Genentech, Inc.
Starting Material
Bond Forming Stages
a
Isolation Steps
%W/W of API
Stereogenic Centers
Substituted Aryls or Double Bonds
Rings Impurity Carry over
Instability Risk Score
SM 1 4 4 53 0 1 1 0 0 8
SM 2 4 4 24 0 1 2 0 0 7
SM 3 2 2 23 0 1 1 0 0 9 a Protection of indole and deprotection of 2,6-dichlorobenzoyl group are counted for bond forming stages
by offering quality control opportunities.
• No starting materials identified as high risk
• Materials were globally accepted health authorities
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Case Study – Erivedge
• Approved in 2012 • 150mg Capsule QD
• Basel Cell Carcinoma
Slide 9
© 2009 Genentech, Inc.
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Case Study – Erivedge
• Approved in 2012 • 150mg Capsule QD
• Basel Cell Carcinoma
• 10 ppm = TTC • >10 year dosing, No S9 Consideration
• Synthetic Scheme Analysis
• For RSM Risk • RSM Synthesis: New PGI’s Disclosed
• Selective AMES Testing
• Justifying Options 3
- no Finished API Specifications for PGI’s - Purge Power and Reactivity Rationale - Confirmation of Purge Power
Slide 10
© 2009 Genentech, Inc.
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GMP Synthesis Scheme – Erivedge (vismodegib) Slide 11
© 2009 Genentech, Inc.
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Changing Regulatory Climate For Starting Materials
• Increased Concern about Impurities form non-GMP Steps • Route assessment
• Change Control
• Control Strategy
Slide 12
© 2009 Genentech, Inc.
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Synthesis Scheme – Risk Assessment of RSM’s Slide 13
© 2009 Genentech, Inc.
RSM 1
RSM 2
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Risk Assessment of RSM’s for Erivedge Slide 14
© 2009 Genentech, Inc.
SM1 Nitro aromatic: Characterized as high complexity by health authorities
SM 2 Sulfonic Acid: Commercially available, high purity, well characterized
Contribution to MW is due to heteroatoms
Starting Material
Bond Forming Stages
Isolation Steps
%W/W of API
Stereogenic Centers
Substituted Aryls or Double Bonds
Rings Impurity Carry over
Instability Risk Score
SM 1 1 3 56 0 1 2 1 0 14.0
SM 2 2 2 44 0 1 1 0 0 10.6
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Mitigate Risks for RSM 1 Slide 15
© 2009 Genentech, Inc.
• Demonstrate Characterization and Purity
• Qualify Vendors and Produce under change control
• Disclose RSM chemistry
• Assess RSM routes for PGI’s
• Develop control strategy for RSM PGI’s
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Two Vendors and two Routes to RSM1 Slide 16
© 2009 Genentech, Inc.
Vendor 1
Negishi Route
Vendor 2
Pyrimidinium Route
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PGI’s from In-Silico Assessment Slide 17
© 2009 Genentech, Inc.
Vendor 1
Negishi Route
Vendor 2
Pyrimidinium Route
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AMES Testing on In-Silico Alerts Slide 18
© 2009 Genentech, Inc.
Vendor 1
Negishi Route
Vendor 2
Pyrimidinium Route
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Challenging Methods for PPM Level Slide 19
© 2009 Genentech, Inc.
Vendor 1
Negishi Route
Vendor 2
Pyrimidinium Route
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ICH M7 Rationale for Routine Quality Control
Slide 20
© 2009 Genentech, Inc.
Option Routine QC Control Analytical method
1 Most Challenging Impurity specified in drug substance
Acceptance criteria TTC/LTL
PPM level methods required for
routine analysis -
Difficult for QC Labs
2 Challenging
Impurity specified upstream (Starting
material, intermediate or as in-process
control)
Acceptance criteria TTC/LTL
3 Typical Testing
Impurity specified upstream (Starting
material, intermediate or as in-process
control)
Acceptance criteria > TTC /LTL
(TTC or LTL x Purge factor)
PPM Level methods only required
to support purge studies and
process validation -
Not required for QC Labs
4 No Testing
Impurity NOT specified and Control is
Unnecessary due to high purge factor
Inc
rea
ing
Ne
ed f
or
co
mp
reh
en
siv
e
sc
ien
tifi
c d
ata
/ r
ati
on
ale
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Slide 21
© 2009 Genentech, Inc.
Analytical Method Challenges
• PPM Level Sensitivity
• Complex Sample Matrix
• Highly Reactive Analyte
• Wide Range of Properties
• Polarity • Molecular Weight • Vapor Pressure
• Low UV Absorbance
© 2009 Genentech, Inc.
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Slide 22
© 2009 Genentech, Inc.
Analytical Methods
Slide 22
© 2009 Genentech, Inc.
Volatile Thermally stable
GC
Limited volatility Thermally Labile
HPLC
Method Development Strategy
Direct
Injection Headspace Derivatization
Matrix interference removal to enhance sensitivity
To improve ionization for
MS
To improve volatility
Analyte
Extraction
Matrix Deactivation
Backflushing
2D-GC
LLE LLME SPE SPME
High column loading LC-UV
Derivatization LC-MS (SIM) LC-MS/MS
(SRM) L
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Challenging Methods for PPM Level Slide 23
© 2009 Genentech, Inc.
Vendor 1
Negishi Route
Vendor 2
Pyrimidinium Route
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Slide 24
© 2009 Genentech, Inc.
Slide 24
© 2009 Genentech, Inc.
QC Friendly method (HPLC-UV)
Column: Zorbax XDB C18, 15cm 3.0mm 3.5 micron
Mobile Phase: 1ml/min 0.05% TFA water/ACN gradient
Detection: 225 nm
Det
ecto
r re
spo
nse
LOQ 500 ppm, LOD 200 ppm
120 2 4 6 8 10
10
20
30
40
50
60
120 2 4 6 8 10 120 2 4 6 8 10
10
20
30
40
50
60
10
20
30
40
50
60
D. Blank
C. Unspiked sample
B. 0.5 ppm spiked sample
A. Spiked sample
Retention Time (min)
D
C
B
A
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Slide 25
© 2009 Genentech, Inc.
Slide 25
© 2009 Genentech, Inc.
LC-MS analysis Positive Ion Mode, SIM
Aromatic nitro compound are difficult to ionize: LOD ~ percentage levels –
lacks sensitivity
min 2 4 6 8 10 12 14 16 18
0
250
500
750
1000
1250
1500
1750
2000
8.8
93
min 2 4 6 8 10 12 14 16 18
0
1000
2000
3000
4000 8.3
08
Not detected
min 2 4 6 8 10 12 14 16 18
0
20000
40000
60000
80000
100000
15.5
89
17.4
93
19.2
81
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Slide 26
© 2009 Genentech, Inc.
Slide 26
© 2009 Genentech, Inc.
4 ppm standard
Blank
0 1 2 3 4 5
180
200
220
240
260
280
300
320
340
360
Retention time (minutes)
Det
ecto
r re
spo
nse
LC-MS negative ion mode, SIM For Compound 8 (non-volatile acid)
Samples
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Slide 27
© 2009 Genentech, Inc.
Slide 27
© 2009 Genentech, Inc.
GC-MS (SIM) analysis of Compounds 6, 7 and 9
Retention time (minutes)
1.20 1.40 1.60 1.80 2.00 2.20 2.40 2.60 2.80 3.00 3.20 3.40 3.60 3.80
100
200
300
400
500
600
700
800
900
1.20 1.40 1.60 1.80 2.00 2.20 2.40 2.60 2.80 3.00 3.20 3.40 3.60 3.80
100
200
300
400
500
600
700
800
900
1000
1100
1200
1300
Det
ecto
r re
sponse
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Purging Power Demonstrated Slide 28
© 2009 Genentech, Inc.
1% of 6, 7, 8 and 9 Spiked
<4 PPM of 6, 7, 8 and 9
>2500 Purge Power
Confirmed 1000X prediction
Justified Option 3
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Summary Slide 29
© 2009 Genentech, Inc.
• Regulatory approval of proposed RSM’s
• Based on Route, Control Strategy and Manufacturers/Change Control
• Control Strategy fro RSM 1
• Developed & validated PPM Level methods
• for 6,7,8 and 9 in Starting Material 1 and API
• Generated lot history data for multiple lots
• SM 1 and resulting API lots
• All results < 4 ppm
• Generated purging data for 6, 7 ,8 and 9 for 1% Spiked Starting Material
• API levels <4PPM
• Purge factor of >25000
• Justified Option 3
• Specification of ≤ 0.10% for 6, 7, 8 and 9 in Starting Material 1 established
• QC HPLC Method Developed
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C.J. Venkatramani
Remy Angelaud
Christine Gu
Lutz Muller
Hiroshi Iwamura
Francis Gosselin
Rolf Schulte Oestrich
Wolfgang Göhring
Stefan Hildbrand
Fabian Schwarb
Jean-Philippe Crochard
Slide 30
© 2009 Genentech, Inc.
Slide 30
© 2009 Genentech, Inc.
Slide 30
© 2009 Genentech, Inc.
Acknowledgements
References Manufacturing Development and Genotoxic Impurity Control Strategy of the Hedgehog Pathway
Inhibitor Vismodegib, Organic Process Research and Development Volume 20, Issue 8, 19 August
2016, Pages 1509-1519
A New Risk Assessment Tool for Regulatory Starting Material Evaluation, American
Pharmaceutical Review, 20(2),74-78 (2017)
Vemurafenib Patent, WO 2011/015522, 2009 (F. Hoffmann-La Roche)
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Slide 31
© 2009 Genentech, Inc.
Slide 31
© 2009 Genentech, Inc.
Slide 31
© 2009 Genentech, Inc.
Appendix
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Slide 32
© 2009 Genentech, Inc.
Mutagenicity (Genotoxicity)
Induce genetic damage and fixation • Gene mutation • Larger scale chromosomal damage • Recombination and numerical chromosome changes
Cause cancer or heritable changes
• Carcinogenicity more easily detected
Slide 32
© 2009 Genentech, Inc.
32
© 2009 Genentech, Inc. © 2009 Genentech, Inc.
32 © 2009 Genentech, Inc.
32
No Structural AlertsCategory 5
Alerting structure – Non-
unique compared to API
Category 4
Alerting structure – Unique
but uncertain Relevance
Category 3
Mutagens with unknown
carcinogenic potential or a
“close-in” analog
Category 2
Mutagenic and
carcinogenic
Category 1
Approach to Control
Human Exposures
Definition
Weight of Evidence
Impurity
Classification
No Structural AlertsCategory 5
Alerting structure – Non-
unique compared to API
Category 4
Alerting structure – Unique
but uncertain Relevance
Category 3
Mutagens with unknown
carcinogenic potential or a
“close-in” analog
Category 2
Mutagenic and
carcinogenic
Category 1
Approach to Control
Human Exposures
Definition
Weight of Evidence
Impurity
Classification
M7 Guidance
ICH Q3
controls apply
M7 provides a risk based
exemption (up to 14 days)
for Phase 1 (treat as non-
genotoxics)
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Slide 33
© 2009 Genentech, Inc.
Compound Evaluation
© 2009 Genentech, Inc. 33
• Synthesis scheme
– Raw materials
– Intermediates
– Reagents
• Impurities detected in the API
– Byproducts
– Degradation products
• Readily predicted Impurities
– Predominantly in final steps
– Stress Studies
Class 4, 5:
No Alert
M7 specifies Full AMES/GLP Like Testing –
expect more positive results than from AMES
II Tests
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Slide 34
© 2009 Genentech, Inc.
M7 LTL limits: Individual and Multiple Mutagenic Impurities
Slide 34
© 2009 Genentech, Inc.
Duration of
Treatment
< 1 month >1-12 months >1-10 years >10 years to
lifetime
Daily intake
[µg/day] 120 20 10 1.5
Acceptable Intakes in relation to ‘less-than-lifetime’ (LTL) exposure
Acceptable Intakes for multiple mutagenic impurities (NMT 3x individual limit)
When 3 or more mutagenic impurities are controlled
Duration of
Treatment
< 1 month >1-12 months >1-10 years >10 years to
lifetime
Daily intake
[µg/day] 120 60 30 5
Only impurities that are specified in the final drug substance specification
contribute to the calculation for Total.