high power pulse plasma generators …zpulser.com/assets/2012/01/zond-zpulser-2011.pdfhigh power...
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High Power Pulse Plasma Generators (HPPMS/HIPIMS/MPP)
for Material Processing Applications.
Zond, Inc / Zpulser, LLC.Mansfield, MA 02048 USA
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Magnetron Sputtering
• Magnetron sputtering is a widely used PVD (Physical Vapor Deposition)
technique to deposit thin films. This technique is based on the generation
of a low pressure magnetically enhanced glow discharge – magnetron
discharge.
B B
Sputtering target surface
I(t) = {1+ γSS (E)}Ii
Jφ
Jφ - azimuthally rotating current density due to Hall effect (vE/B =(ExB)/B2 ),
JD - discharge current density running perpendicular to the magnetic field lines
JDJD
2
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Magnetron Sputtered Films
• Columnar structure
• High stress
• Poor adhesion
• Low hardness
• Low level of ionization
of sputtered target material
Ta
Ti
Cr
Ti
Cr Cr
3
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Magnetron Sputtering
• How to increase metal ion flux near the substrate?
– Unbalanced magnetron
– Special design HCM
– Secondary discharge between sputtering target and substrate
– Electrical bias on the substrate in order to control energy from the gas and sputtered
target material atoms (DC bias, RF bias, Pulsed bias).
– More ions flux – bias , Less ions flux – bias , Usually bias voltage ~ -(20 – 200) V
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Voltage Current Characteristic for DC Magnetron
Id
Magnetron 0DC magnetron sputtering P ~ 10 – 100 W/cm2 , low level of ionization (low discharge current Id )
To increase level of ionization increase discharge current
High Voltage High Current High Power Short PulseHigh power pulse magnetron sputtering P ~ 0.3 -10 kW/cm2
Ud ≥ -1000V,Id ≥ 1000 A
Pulse duration ~ 50- 200 µsDuty cycle 1-10 %
500 V
40 A P = 20 kW (200 mm Wafer)
|Ud|300 V 700 V
Id ~ β( Ud)n
5
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High Power Pulse Magnetron Sputtering
• High Power Pulse Magnetron Sputtering is a relatively new technology.
– First paper was published in 1995, second in 1996, third in1999.
• This is the most cost effective way to generate metal ions during the
sputtering process.
• High level of ionization can be obtained at target power density in the
range of 0.3 – 3 kW/cm2 depends on applications
• Duty cycle of the pulse power generator usually is in the range of 5-20%.
• Typical Pulse duration ~ 50-200 µs
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High Power Pulse Magnetron Sputtering
(HPPMS/HIPIMS).
Modulated Pulse Power (MPP)
MPP(2)
HPPMS HIPIMS MPP(1)
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MPP Plasma Generator (Zpulser Solo)
Output voltage pulse shape
Circuit diagram for Zpulser Solo
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Voltage waveforms after solid state switch (IGBT)
before transformer
9
t, µs
600 V > Vch > 300 V
-600 V
+600 V Switch closed
Switch open
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Voltage waveforms after transformer before diodes
bridge
10
t, µs
-1200 V
+1200 V
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Voltage waveforms after diodes bridge
11
t, µs
-1200 V
Voltage waveform after LC circuit, output voltage
-1100 V
ton toff
T = (ton + toff)f = 1/(ton + toff)T
T
3µs< ton <18µs 6µs< toff <50µs f is in the range of 10-62.5 kHz
Vout = βDD = ton/(ton + toff)
PULSE
micro pulse
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Micro pulse frequency and micro pulse width
modulations
12
t, µs
+1200 V
t, µs
V output
micro pulse
V output pulse consists of train of
micro pulses
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HIPIMS (HPPMS) and MPP (Modulated pulse power)
13
Pulse duration 100-3000 µs
Multistage voltage pulse
Max voltage -1100 V
Max Peak power 0.6 MW
Average Power 22 kW
Voltage oscillations
HIPIMS MPP
Pulse duration 50-200 µs ?
Rectangular voltage pulse
Max voltage –(1000 -2000) V?
Max Peak power 3 MW?
Average Power 20 kW?
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Arc in HIPIMS/HPPMS
14
In HIPIMS the ignition voltage is equal to discharge voltage!!!
Arc in HIPIMS can happened in the ignition stage or in high power stage
V
t
MPP controls the ignition stage and high power stage ( long medium power instead of short high power)
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Micro pulse frequency and micro pulse width
modulations for control output voltage pulse
15
t, µs
+1200 Vt, µsmicro pulses
V output pulse consists of train of micro pulses
6 34 6 34 10 10 10 10 12 10 14 10 14 10 14
1st rise time V1
2nd rise timeV2
~(100 – 500) µs pre-ionization
High Peak Power
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Micro pulse frequency and micro pulse width
modulations for control output voltage pulse
16
t, µs
+1200 Vt, µsmicro pulses
V output pulse consists of train of micro pulses
6 34 6 34 8 10 11 10 12 10 14 10 14 10 14
V2
~(100 – 500) µs pre-ionization
High Peak Power
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High Power Pulse Magnetron Sputtering,
Zpulser Solo Plasma Generator (2)
(1) (2)
17
Yellow line – discharge voltage, blue line – discharge current, Cr target (500 cm2)
200 A200 A
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Voltage Pulse Shapes (Zpulser Solo)
18
(1) (2) (3)
(4) (5)
Yellow line – voltage, blue line-current(1) – (3) Cr target (80 cm2)(4) – (5) Resistive load
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Plasma Photo in dc and MPP sputtering(Colorado School of Mine-ACSEL)
Conventional dc Magnetron Sputtering operated at 1.5 kW
MPPTM sputtering Pave=1.5 kW
MPPTM sputtering Pave=2.7 kW
MPPTM sputtering Pave=3.5 kW
MPPTM sputtering Pave=4.09 kW
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MPP, Ta sputtering process
DC
MPP
0
20
40
60
80
100
120
140
200 250 300 350
Ta+ Ta+Ta+
Bias = - 30 V
Bias = -30 V
Inte
nsity
, cou
nts/
sec
Wavelength λ, nm
OES
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CONCLUSION
21
1. Zpulser plasma generator Solo/ Axia generates multistage negative voltage pulse with controllable voltage rise, duration and amplitude.
2. Zpulser plasma generator Solo/ Axia generates voltage pulse with voltage oscillations with frequency 10-62.5 kHz. And amplitude 5-30 %.
3. The presence of voltage oscillations enhance plasma stability and ionization.
4. Voltage oscillations induced by specific operation of the Zpulser plasma generator.
5. The presence of the voltage oscillations is beneficial for ionization and plasma stability.
6. The separation of ignition voltage and discharge voltage significantly reduces amount of Arcs particular for reactive sputtering.
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HIPIMS/HPPMS Plasma Generator (Zpulser Cyprium)
Output voltage pulse shape
Circuit diagram for Zpulser Cyperium
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Voltage waveforms after diodes bridge
23
t, µs
-1200 V
Voltage waveform after LC circuit, output voltage pulse
-1100 V
ton toff
T = (ton + toff)f = 1/(ton + toff)T
T
3µs< ton <18µs 6µs< toff <1000µs f is in the range of 10-62.5 kHz
Voutput = βDD = ton/(ton + toff)
PULSE
micro pulse
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Voltage waveform after LC circuit, output voltage pulse
24
-1100 V T
3µs< ton <18µs 6µs< toff <1000µs f is in the range of 10-62.5 kHz
Voutput = βDD = ton/(ton + toff)
PULSE
Voffset < 0V
Voffset > 0 V+ V
t
t
+ V
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Magnetron Discharge Afterglow (1)
Te, Ne
t, µs
Tafterglow
T(duty cycle)
∆T
U = − 2000 V U = − 2000 V
∆Tafterglow ~ 10 – 50 µs∆T(duty cycle) ~ 10000 µs
∆T(duty cycle) >> ∆Tafterglow(HPPMS, HIPIMS)
∆∆∆∆T(duty cycle) ≤ ∆∆∆∆Tafterglow ?
200 µs 200 µs
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Magnetron Discharge Afterglow (2)
Te, Ne
t, µs
Tafterglow
T(duty cycle)
U = − 2000 V U = − 2000 V
∆Tafterglow ?∆T(duty cycle) ~ 5 -500 µs ?
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Cyprium Pulse Plasma Generator (3)
1. New High Power Pulse Plasma Generator was developed.2. Pulse duration (voltage oscillation) is in the range of 5-20 µs.3. Output voltage up to 1700 V, peak power 1.2 MW. 4. Voltage oscillations amplitude (40-100 %), control of rise time, fall
time and frequency.
ID, A
VD, V
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Plasma Generator (4)(Cyprium plasma generator)
-1100 V
Vd
Id
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Voltage and Current Waveforms for Cu Discharge (1)(Cyprium plasma generator)
Influence of voltage oscillations frequency on discharge current(f1 = 12241 kHz, f2 = 41667 kHz)
I,(A)
U, (V)
f1f2
25 µs
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Voltage and Current Waveforms for Cu Discharge (2)(Cyprium plasma generator)
-800 V
150 A
1050 A
Id = Id (frequency, kHz)
Zond/Zpulser
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Voltage Current Characteristic for Cu Discharge.
(Cyprium plasma generator)
0
100
200
300
400
500
0 500 1000 1500 2000
f2
f1
Discharge Voltage, V
Dis
char
ge C
urre
nt, A
(f1 = 12241 kHz, f2 = 41667 kHz)
Ppeak = 540 kW(~ 7 kW/cm2)
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Voltage and Current Waveforms for C Discharge(Solo and Cyprium plasma generators)
~800 V
~30 A~200 A
~520 V
(2) Cyperium plasma generator(1) Solo plasma generator
Deposition Rate ~ 7.5 µm/hour (1250 Å/min), Paverage = 5kW, Hardness ~ 40 GPa (different conditions)
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Voltage and Current Wave forms for single oscillation
Zond/Zpulser
- 1700 V
-1000 V
200 A
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Reactive Sputtering of Al2O3 films
(Cyprium plasma generator)
0
50
100
150
200
390 395 400
Ar = 100 sccmO2 = 0 sccm
O2 = 0 sccm
λ, nmIn
tens
ity, c
ount
s/se
c
O2 = 8 sccm
O2= 14 sccm
Ar = 100 sccmO2 = 15 sccm
P peak ~105 kW(1.5 kW/cm2 )V peak ~ - 760 VI peak ~ 140 A
Deposition rate ~13 µm/hour
~ 100 A
∆
Ar = 100 sccm
O2 = 8 sccm
~800 V
~100 A
~900 V
~ 140 A
~760 V
Al+390.06 nm
Al394.4 nm
Al396.15 nm
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CONCLUSION (1)
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1. Zpulser plasma generator Cyperium generates multi frequency negative voltage oscillations with controllable voltage rise, duration and amplitude in one pulse.
2. Zpulser plasma generator Cyperium generates voltage pulse with voltage oscillations with frequency 10-62.5 kHz. And amplitude 30-100 %.
3. The presence of the voltage oscillations is beneficial for ionization and plasma stability.
4. Maximum output voltage 1700 V, current 550 – 800 A, average power 22 kW.
Perfect for high power pulse reactive nitride/ oxide magnetron sputtering processes
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CONCLUSIONS (2)
1. High Power Pulse Magnetron Technology – the most cost effective method to
generate ions.
2. Three different high power pulse plasma generators:
Thank you for your attention
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