Glancing Angle Deposition（ GLAD）

Reporter: Zhibin Luo

Jul 11th 2013

Progress report

Glancing angle deposition JVSTA 2007 Matthew M. Hawkeye

Substrate

Vapor

Deposition Source

UHV

Thin Film Deposition

PVD CVD

Atomic Layer Deposition Chem. Rev. 2010 Steven M. George

The atoms are more strongly bound to the substrate than to each other

The interaction between the atoms is greater than the interaction with the substrate

Atoms will initially cover the surface in monolayers due to the strong interaction with the substrate, but after the deposition of one or several layers, islanding will occur

Initial growth of the thin film

Layer growth

Island growth

Layer plus island growth

Substrate

Substrate

Substrate

Atoms

Atoms

Atoms

Structure zone models

Substrate temperature T/Tm

The temperature is too low for any significant diffusion to occur

Surface diffusion strongly influences the growth

There is sufficient energy for bulk

diffusion to occur

Substrate

Vapor

Deposition Source

Substrate

Inciden

t

Vapor F

lux

α

ψ

UHV

GLAD

Glancing Angle Deposition

Archetypal GLAD fabricated microstructures

Tilted columns

Vertical columnsHelical columns

Zig-zag columns

Self-shadowing

StageⅡ

StageⅠ

tanα=2tanβ

The atoms evaporate from the surface or buried by the arrival of new atoms

Deposition onto nonplanar substrates

Improving the uniformity

Postdeposition processing or initial seeds for column growth

Embossing 、 laser-direct write lithography 、 monolayers of self-assembled nanospheres、optical lithography, etc

Archetypal GLAD fabricated microstructures

Tilted columns

Vertical columnsHelical columns

Zig-zag columns

PhiSweep

Orientation Sweep axis Angle from central sweep axis

Orientation Sweep axis 90°turn to create square helix

Film properties and applications

First, because the films possess an internal microstructure, the exposed surface area of the film is dramatically higher than in a dense coating

Second, the particular geometry of the micro and nanostructures produced with the GLAD technique can directly impact various physical properties

Dichrosim、 birefringence and anisotropic resitivity

Dye sensitized solar cells（ DSSCs）

Sensor devices

Photocatalyze the degradation of organic chemicals

Materials for electrochemical supercapacitors

Surface chemistry applications

Applications

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