fiber lasers for euv lithography workshop/oral 7 source … ·  · 2017-02-15fiber lasers for euv...

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Fiber Lasers for EUV Lithography A. Galvanauskas , KaiChung Hou*, Cheng Zhu CUOS, EECS Department, University of Michigan P. Amaya Arbor Photonics, Inc. * Currently with Cymer, Inc 2009 International Workshop on EUV Lithography, Sheraton Waikiki, July 1317, 2009

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Page 1: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Fiber Lasers for EUV Lithography

A. Galvanauskas, Kai‐Chung Hou*, Cheng ZhuCUOS, EECS Department, University of Michigan

P. AmayaArbor Photonics, Inc.

* Currently with Cymer, Inc

2009 International Workshop on EUV Lithography, Sheraton Waikiki, July 13‐17, 2009

Page 2: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

EUVL Source Power Requirement

180 W~500W EUV Power

CE~2% Required Laser Power ~25kW

U. Hinze et al. , Laser Zentrum Hannover e.V., EUVL Symposium 2007

Spectral Purity Filter  T~0.9

Collector 5sr and R=50% 

Debris ShieldT~1

Page 3: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Advantages of Fiber Laser Technology

• E‐>O efficiency is highest

• Robust and compact

• Long lifetime/reliable

• High repetition rate capability

• High beam quality

• Superior power scalability

Pulsed Laser ArchitectureCommercial Product Electrical-to-Optical

EfficiencyQ-Switched Yb:Glass fiber 25% - 30%

Q-Switched DPSS or Thin Disc 12 –16 %

RF Excited CO2 8.5-10%

Page 4: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

High power fiber laser revolutionHistorical trend in diffraction‐limited 

cw fiber laser power

YLR-50000

Commercial incoherently combined50kW cw fiber laser system(non diffraction‐limited:  M2 = 33)

Fiber lasers constitute a new and developing technology:‐Continuous improvement in fiber and component technology‐Continuing advances in power 

Page 5: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Summary of 13.4nm EUV generation results with pulsed fiber lasers

• First proof‐of‐principle demonstration with a solid‐Sn target

• 2% efficient 13.4nm in‐band EUV generation using Sn‐droplet source

• Kai‐Chung Hou et al, Optics Express 16, 965 – 975 (2008)

• Simi A. George et al, Opt. Express 15, 13942‐13948 (2007)

• A. Mordovanakis et al, Optics Letters 31, 2517 – 2519 (2006) 

Page 6: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Main trade‐off for high power pulsed fiber laser drivers for EUVL

• Practical droplet source can not exceed certain maximum repetition rate – For Sn‐droplet source it is considered to be at 80kHz – 100kHz

• Maximum pulse energy from a single fiber is limited by extractable energy and fiber nonlinearities– For 3ns‐10ns pulses max energies are 4mJ‐10mJ respectively

• Consequently, maximum power from single‐fiber EUVL driver can not exceed ~1kW– Practical considerations restricts to much less (approximately to 200W – 500W range)

Page 7: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Single‐Emitter FiberIntegrated Module (SEFIM)200 ‐ 500W (~80‐100kHz, 2‐6ns)

Power Scaling Strategy for 25‐kW Fiber‐Laser EUV Driver

λ1

λ2

λn

Spectrally CombinedModules  (SCM)5 ‐ >10kW

~500W EUV

Spatially multiplexed SCM blocks  >25kW

Page 8: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Conventional Spectral combining using diffraction gratings

• Based on spatial spectral dispersion of diffraction gratings:

λ1λ2λn

Combined Beam

Fiber Laser Channels

Transform Lens

f f

Page 9: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Linewidth considerations in a MW peak power fiber amplifier

• SPM‐induced spectral broadening:

• Example:– 1MW peak 1ns pulse in 100μm core PCF fiber

Δωmax ≈ 18 GHz*

1 2max 0

1 ( )

1 exp( )20.86n

i ii

i eff i i

g LnT PA gπδω

λ−

=

−=∑

*Consistent with experimental results:Christopher D. Brooks and Fabio Di Teodoro, Appl. Phys. Lett. 89, 111119 (2006)

Page 10: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Beam‐size and bandwidth trade‐off in diffraction‐grating based SBC

Tradeoff • Linewidth and beam‐width requirement to retain mode quality 

Small beam‐width  • high‐power density on grating

Small linewidth• MW peak power can not achieved, limited by SPM

Example• 20GHz  linewidth  1mm beam‐width • 25kW (targeted power) 1000 kW/cm2

• Thermal distortion or damage

102

103

104

105

0.1 1 10

10

100

Beamwidth 1/e2 radius (mm)

Line

width (G

Hz)

Intensity (kW/cm

2)

Design Trade for M2~1.2

Page 11: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Spatial dispersion‐free spectral combining based on sharp‐edge spectral filters

Initial experimental results:•2nm inter‐channel separation,  0.5 nm spectral linewidth•91% combining efficiency, 52 W combined•Combined ns‐duration pulses with 4mJ output energy

• No trade‐off between beam size and channel bandwidth –power scalability per channel and for total power

Page 12: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Commercially available LWP Filters 

• No limitation on linewidth and beamwidth

• Sharp transition ‐> high channel density– ~0.8 nm measured on sample– ~0.3 nm available from mfg– Yb3+ has 60 nm gain bandwidth

• Tunability– Measured 50 nm shift in cut‐off 

with 28⁰ change of angle– Same sharpness in broad tuning 

range

00.10.20.30.40.50.60.70.80.91.0

1058.5 1059.0 1059.5 1060.0 1060.5 1061.0 1061.5

~0.8nm

Wavelength (nm)

Tran

smis

sion

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1.0

1000 1010 1020 1030 1040 1050 1060 1070 1080

0º 14º 28º

Wavelength (nm)

Tran

smis

sion

Page 13: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

99.7% average R

Commercially available LWP Filters 

0.80

0.82

0.84

0.86

0.88

0.90

0.92

0.94

0.96

0.95 0.96 0.97 0.98 0.99 1.00

98.6% 99.4%

99.7%

96.8%

N=40N=20N=10

N=5

ReflectanceO

vera

ll C

ombi

ning

Effi

cien

cy (η

)

High damage threshold:•Energy =1J/cm2 (measured by manufacturer)•Power = 100kW/cm2

Measured performance:•Transmission = 95%, Reflectivity = 99.7%

Residual absorption in this type of coatings:• 2 – 10 ppm

Page 14: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Combining Demonstration Setup

Channel‐Amplifiers

SplitterPump1

Pump2

Pump3

Input BeamCombined Output 

F1 F2 F3 F4

Delay Lines

Combiner

80μm core Yb‐doped LMAfibers

Page 15: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Spatial Beam Overlapping

a

dc

b

Combined BeamRed Channel

Blue Channel Green Channel 0

200

400

600

800

1000

0 50 100 150 200 250 300 350

Position (mm)

FWH

M B

eam

Dia

met

er (μ

m)

0

200

400

600

800

1000

1200

0 100 200 300 400

Position (mm)

FWH

M B

eam

Dia

met

er (μ

m)

M2~1.85

M2~1.82

Output Beam Mode QualityBeam Profiles after Combiner

M2~1.85

M2~1.82

Horizontal axis

Vertical axis

Page 16: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

0

0.03

0.06

0.09

-2 -1 0 1 2 3 4 5 6 7 8

τ (ns)

Nor

mal

ized

Am

plitu

de (a

.u.)

Seed Pulse 

~2ns

Combined Pulses

0

0.03

0.06

0.09

-2 -1 0 1 2 3 4 5 6 7 8

τ (ns)

Nor

mal

ized

Am

plitu

de (a

.u.)

Combined Pulse @52W

0.1 ns = 3cm

Temporal Pulse Overlap

Combined power 52 W

Combined pulseenergy 4 mJ

Page 17: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

λ1λ2

λn

Spectrally CombinedModules (SCM)  5‐10kW

Demonstrated Feasibility of SBC for multi‐kW EUVL Sources

Non‐spatially dispersive combining scheme

• Combines concurrent high peak power and average power 

• Practical scheme for fiber laser based EUVL source

• Current filters allow up to 40 channels combined with 90% combining efficiency

• >92% efficiency, 52W combined power, M2~1.85 demonstrated

• 4.6mJ combined demonstrated

K. Regelskis, K. Hou, G. Raciukaitis, and A. Galvanauskas, "Spatial‐Dispersion‐Free Spectral Beam Combiningof High Power Pulsed Yb‐Doped Fiber Lasers,“ in CLEO 2008, paper CMA4.http://www.opticsinfobase.org/abstract.cfm?URI=CLEO‐2008‐CMA4

Page 18: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

ARBOR PHOTONICS, Inc. Powering advanced laser processing Slide 18ARBOR PHOTONICS, Inc. Powering advanced laser processing Slide 18

Size, Efficiency, Reliability & CostComparison of Continuous Wave Industrial Lasers

Page 19: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

ARBOR PHOTONICS, Inc. Powering advanced laser processing Slide 19

Power Scaling & Cost ProjectionsProjected Trend for Short‐pulse Fiber Lasers

Page 20: Fiber Lasers for EUV Lithography Workshop/Oral 7 Source … ·  · 2017-02-15Fiber Lasers for EUV Lithography ... Fiber lasers constitute a new and developingtechnology: ... •Thermal

Acknowledgements

• This work is partially supported by SRC:

– Task ID 1180.001 Feasibility study of a compact and efficient 1‐kW fiber laser source for EUV generation

– Task ID 1779.001 Demonstration of Power Scalability of LPP EUV Lithography Sources Using Fiber Laser Technology with Spectral Multiplexing