efficient light emission from leds, oleds, and nanolasers via …optics.hanyang.ac.kr/~shsong/5-sp...
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Efficient light emission from LEDs, OLEDs, and
(Fifth Lecture) Techno Forum on Micro-optics and Nano-optics Technologies
Efficient light emission from LEDs, OLEDs, and nanolasers via surface-plasmon resonance
송 석 호, 한양대학교 물리학과, http://optics.anyang.ac.kr/~shsong
silver gratingsilver grating
1. How does the surface plamon resonance enhance the internal quantum efficiency of light source?2. Understand the Fermi-Golden rule and Purcell enhancement factor in spontaneous emission3. What are the practical difficulties in realizing SP-enhanced LEDs?
Key notes p g
4. Summary of the five lecturesnotes
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Remind!
The next chip-scale technology Three light-design regimes
λ limit
Light extraction
WAVE DESIGN
( d ~ λ )
e limit
LED RAY DESIGNLED( d > λ )
Internal QEPHOTON DESIGN
( d < λ )
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Power conversion efficiency of III-Nitride LEDs
E lExample:λ=530nm, I=350mAPCE ~ 12%
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External efficiency of LEDsExternal efficiency of LEDs
Rη η⎛ ⎞
= ⎜ ⎟
:extraction efficiency
externalnr
e
extrac
xtracti
tio
on
nη R Rη
η
= ⎜ ⎟+⎝ ⎠[ ]
2sin)(1
21
, 0⎟⎠⎞
⎜⎝⎛−⎟
⎠⎞
⎜⎝⎛= ∑ ∫psextraction dR
c θθθηθ
:nonradiative-recombination rate:spontaneous-emission ratenrRR
i (1 0)G N(2 5)f%4
)/(41
2≈
⎠⎝⎠⎝
gf nn
air(1.0)-GaN(2.5)for %4=
-
Wave Design for efficient extraction of the guided light-. Geometric optics
extractexternalnr
ionRη
R Rη
⎛ ⎞= ⎜ ⎟+⎝ ⎠
-. Random scattering gin surface textured structure
APL 63, 2174 (1993)
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Photon Design for increasing the emission rate external extractionnr
η ηRR
R⎛ ⎞
= ⎜ ⎟+⎝ ⎠
What determines spontaneous emission rate of radiating source?electron
iEEnergy of EM field
( 1/ 2)nω +
N b f h t V fl t ti
fE
Number of photon(Stimulated emission)
Vacuum fluctuation(Spontaneous emission)
f
1 1Fermi’s Golden Rule
2
0
1 1 ( )( ) 2
R f i ρ ωτ ω ε
= = ⋅p ESE Rate : Photon DOS(density of states)
eMD Lab. 6Microoptics Lab –Hanyang University
Dipole moment of radiation source
Electric field strengthof half photon (vacuum fluctuation)
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Photon Design for increasing the emission rate⎛ ⎞
external extractionnr
η ηRR
R⎛ ⎞
= ⎜ ⎟+⎝ ⎠
2
02)1
( )(1R f i
τ ωρ
εω= = ⋅Ep E, ρ increase
Ag
n GaNQuantum Quantum WellWell
pp--GaNGaN
g
n-GaN
Atoms in microcavity• High Q
Photonic crystal cavity• Moderate Q
Wid Δ
Surface plasmon coupling• Low Q
• Narrow Δν• Fp ~ 1 – 5
• Low volume filling factor
• Wider Δν• Fp(Quantum wells) ~ 3
• Fp(Quantum dots) ~ 5 –100• Off-resonant and
• Narrow Δν• Fp ~ 5 – 100
• lossy and off-resonant
complicated fabrication
www.phys.unt.edu/research/ photonic/website/Surf-Plasmon-OHPs-f.pptDepartment of Physics, University of North Texas, Denton, Texas 76203
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Photonic-crystal approach
external extractionnr
η ηRR
R⎛ ⎞
= ⎜ ⎟+⎝ ⎠
2
02)1
( )(1R f i
τ ωρ
εω= = ⋅Ep E, ρ increase
nr⎝ ⎠0( )
BabaLimited by surface recombination
G d h !!!
Limited by surface recombination
G d h !
LumiLed
Good scheme!!!100 um device size achievable.
Several layer of PC for extraction.
G d i t l t ffi i
Good scheme!100 um device size achievable.
Several layer of PC for extraction.
G d i t l t ffi iGood internal quantum efficiency Needed (>90%).
Multiple pass limits device size (~10um).
Small volume needed.
Good internal quantum efficiency Needed (>90%).
Multiple pass limits device size (~10um).
Small volume needed.Small volume needed.Not so good for lighting.
Surface recombination limited
Small volume needed.Not so good for lighting.
Surface recombination limited
Noda
Surface recombination limited.Surface recombination limited.
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Photonic-crystal assisted LEDs
2
2)1
( )(1R f i
τ ωρ
εω= = ⋅Ep
02( )τ ω ε
Very small increase in E, ρ !
Look like a result of wave design rather than photon design!
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Surface-plasmon approach
pRη =intp nrR R
η =+
' sppintp np rs
RR R
RR
η+
=+ +
Surface Plasmons
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The SP approach was started for organic LEDs
Conventional Structures:ITO glass (anode)
Organic molecules
Strongly coupled to SPPs
Main issue: SPP Radiation couplingCathode & Mirror SPP quenching
(~40%)SPP Radiation coupling
Metallic mirror Metallic thin film
SPP1
SPP2
SPP1
( / )SPPkπΛ >( ~ / )SPPkπΛDirect couplingSPP band gap SPP cross-coupling
1 2( /[ ])SPP SPPk kπΛ = −
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Effect of SPP band gap on PL11411
Angle resolved PLAngle resolved PL of dye molecule (DCM)
1st and 2nd orderdiffraction of SPPsd act o o S s
Tracing 1st order peaks shows SPP band gap.
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Modification of Spontaneous Emission Rate of Eu3+
Main emission of Eu3+ (614nm)Main emission of Eu (614nm)
SPP hi
( )h k
SPP quenching
( )spacer thicknessτ
TRPL at 614nm
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Self-driven dipole (CPS) modeling
d
p Metal interface
2 22d d ep b p p Eω+ + =
2
/ 1 Im{ }eb b E= +0 02( / 2) ( / 2)
0 0,
r
i ib t i ib tr
p b p p Edt mdt
p p e E E eω ω
ω
− − − −
+ + =
= =
0 00 0
/ 1 Im{ }b b Em p bω
= +
2 20 Re{ }
bbb e Eω⎛ ⎞
Δ ≈⎜ ⎟
14
00 0 0
Re{ }8 4 2
Em p
ωω ω ω
Δ ≈ − −⎜ ⎟⎝ ⎠2 unknowns and 2 equations
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Dipole Decay Calculation Test : Metal Mirror Cavity
102
10-4
101
102
wer
10-1
100
pate
d po
w
10-3
10-2
perpendicular dipole parallel dipole
diss
i
15
0.0 0.5 1.0 1.5 2.010-4
kx / k1 J. A. E. Wasey and W. L. Barnes, J. Mod. Opt. 47, 725-741, 2000
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CPS Model Calculation for Spontaneous Emission Rates of an OLED
Emission SpectrumNo guided mode TM0 TM0+TE0 TM0+TE0+TM
1
Emission Spectrum
70nm 100nm 200nm 390nm
3 0
2.0
2.5
3.0
total emission rate air emissionemission to substrate guided modeste
(R0)
cover (medium c)
1.0
1.5
g emission to active layer guided modes
adia
tion
rat
hchdipole active material
(medium a)
0 50 100 150 200 250 300 350 400
0.0
0.5ra sh( )
substrate (medium s)
( )a s ch h h= +
16
active layer thickness (nm)
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Comparison with an experiment
90
100
%) 90
100
80
90
ienc
y (%
50607080
ratio
(%)
60
70
PL E
ffic
10203040
Pair+Psub+1.0Pguided Pair+Psub+0.4Pguided Pair+Psub+0.8Pguided Pair+Psub+0.2Pguided Pair+Psub+0.6Pguided Pair+Psub+0.0Pguided
pow
er
100 200 300 400 50060
Film Thickness (nm)0.00 0.05 0.10 0.15 0.20 0.25 0.30 0.35 0.400
active layer thickness (μm)
(measured) (calculated)
17
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SPP Enhanced Spontaneous Emission of Eu3+ Ion
SE rate
90% SPP li
Dipole-SPP
90% SPP coupling25 times SE rate
Dipole-SPPcoupling fraction
Maximum internal efficiency
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Role of Preferred Orientation of the Dipole Source
Adv. Mater. 14 19 1393
Angle integrated EL
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Enhanced PL by Coupled SPP
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Cross-Coupled vs Coupled SPP
(1)
(2)
(3)
(4)
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SPP Enhanced PL of InGaAs QWMost cited paper
Un-processed(a)
Half-processed
(b)
Fully-processed(c) 480nm period (2nd order coupling)(d) 250nm period (1st order coupling)(160nm gap)
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1st Result of SPP enhanced PL from InGaN QWNature Materials VOL 3 p 601 605 2004
external extractionη ηR⎛ ⎞
= ⎜ ⎟2
2)1
( )(1R f i ρ ω= = ⋅Ep E, ρ increase
Nature Materials, VOL 3, p.601-605, 2004
external extractionnr
η ηRR⎜ ⎟+⎝ ⎠02
)( )
(fτ ω
ρε
p
Nature Materials, VOL 3, p.601-605, 2004
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1st Result of SPP enhanced PL from InGaN QWNature Materials, VOL 3, p.601-605, 2004
40x100nm2 133nm wide, 400nm period grating
(no enhancement for 200nm wide, 600nm period grating)
0.42
0 06
0.18
x14x2x28
0.06
Average internal quantum efficiency estimatione age te a qua tu e c e cy est at o
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TRPL of SPP enhanced InGaN QW emission
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How does the surface-plasmon resonance contribute to emission rate?
21 1 2
0
1 ( )1( ) 2
R f i ρτ ω
ωε
= = ⋅EpHigh DOS due to decrease in
Field enhancement near the source layer
due to decrease in group velocity
eMD Lab. 26Microoptics Lab –Hanyang University
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21 ( )1( ) 2
R f i ρτ ω
ωε
= = ⋅Ep0( ) 2τ ω ε
Field enhancement
High DOS due to decrease in group velocity
near the source layer
Requirements for enhancing SE rate
-. slow group velocityslow group velocity,high lossBg p y
-. tight confinement of mode-. low ohmic loss-. large field enhancement
g
fast group velocity,l l
A
low loss
A B
Q.W. Q.W.
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Purcell factor defining enhancement of the spontaneous emission
R R R+1original additional additionalp
original original
R R RF
R R+
≡ = +
For a cavity mode:3
2mode volume
3 ( / )4
cav cp
free
R Q nFR V
λπ
= =
0/11 1SP SPR k k
F λ⎛ ⎞⎜ ⎟
_f
0
0
1 12 /
SP SPp
SP
FR L cπ υ
⎛ ⎞= + = + ⎜ ⎟⎝ ⎠
( )∂
For a SP mode :
2
2
( ) ( ),SPSP
at dipole
dz zdL
dk
ωεω ωυ
∞
−∞
∂∂= =
∫ EE at dipole
We need a slow and confined mode!
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Factors influencing Purcell Enhancement Factors influencing Purcell Enhancement FFpp((ωω))
Si l Q t W llSi l Q t W llGaN ~ GaN ~ ζζ
Ag ~ z
GaNSingle Quantum WellSingle Quantum Well
Variation with Ag thickness Variation with GaN thicknessVariation with Ag thickness Variation with GaN thickness
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Purcell enhancement factor (F-1)Purcell factor: A numerical estimationcovercover
Cover = 1.0
C 2 0Cover = 1.5
Cover = 2.0
Need a very thin p-GaN layer !!
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ImprovementI-L curve
2.68 10at KF
⎛= ⎜ No improvement1.75 300p
Fat K
= ⎜⎝
No improvementI-V curve
“… the enhanced Fp … can be attributed to an increase in the spontaneous emission rate due to SP-QW coupling.”
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Why SP-LED hasn’t been successful yet?y y
Practical Barriers (especially for InGaN/GaN devices)Practical Barriers (especially for InGaN/GaN devices)
• Thin p-GaN leads to abrupt occurrence of leakage current d t i thi kunder a certain thickness
• SP propagation length in blue wavelength along the Ag/GaN interface is extremely shorty
• Nanopatterning becomes a huge burden at short wavelength
• Damageless p GaN patterning has been impossible• Damageless p-GaN patterning has been impossible• SQW devices are prone to leakage current due to carrier overflow• Silver is a nasty material with poor adhesion to GaN
and tends to agglomerate at an elevated temperature
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SP propagation length NanopatterningSP propagation length
123
εεεω ′′⎟⎞⎜⎛ ′
Nanopatterning
4000
m]
kPLSPs ′′
=21
2)(2 mm
dm
dm
ck
εε
εεεεω
′⎟⎟⎠
⎞⎜⎜⎝
⎛+′
=′′
2 5
Λ = λsp, 2λsp, 3λsp, …
2500
3000
3500
of S
Ps
[nm Surface Plasmon on the Ag/GaN Interface
1 5
2.0
2.5
πc/μ
m)
460nm530nm λsp~70 nm
1000
1500
2000
2500
tion
Leng
th
1.0
1.5
quen
cy (2
π 530nm
SP-dispersion
λsp 70 nm λsp~140 nm
450 500 550 600 650 700 750 8000
500
1000
P
ropa
gat
0.0
0.5
0 2 4 6 8 10 12 14I l W t (2 / )
Freq
S d spe s oon Ag/GaN
Wavelength of Photon [nm] In-plane Wavevector (2π /μm)
2nd order gratings (Λ~280nm)
i ht b dil f b i t d Green LEDs might be possible.
might be readily fabricated
by Holo litho at Green.
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Schematic structure
Photon
n-GaN
Sapphire
Exciton generationRadiation
Metal (Ag-based)
p-GaN
n-GaN Exciton generation
Surface plasmon excitation
InGaN MQW e-h
Metal (Ag-based)
Silicon submount
Surface plasmon excitation
Silicon submountΛΛ
Dh
Dh
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High output directionality g p yby grating with non-even fill-factor
1st order grating, fill factor=0.1 1st order grating, fill factor=0.5
2nd order grating, fill factor=0.1 2nd order grating, fill factor=0.7
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Extraction efficiency of a metal grating
• Data sampling at λ = 530 nm / w = 5 nm
1 ext spη γη+ ⋅
=
• Data sampling at λ = 530 nm / w = 5 nm
1int nr spη
γ γ=
+ ⋅
1 ext spFDTD η γ+ ⋅
1
1
(1 ) 1FDTDi tη γ+ −
1pFDTD
intsp
ηγ
=+
00
extη
(1 ) 1int spext
sp
η γη
γ+
=
10
180
60 100nrγη
: nonradiative re-comb. rate
: internal quantum effMax ~ 80% (at 140 nm / 40 nm)
int
ext
ηη
: internal quantum eff.
: extraction efficiency of metal grating
spγ : re-comb. rate to surface plasmon
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단일 원기둥 구조 계산Two-dimensional silver-grating (2nd order)
1.1
1.2
Normalized LifeTimeInternal Quantum Efficiency 2 0
2.2
0 8
0.9
1.0y
Upward Emitted Power
nter
nal Q
E
1 4
1.6
1.8
2.0 Upw
ard em
0.6
0.7
0.8
zed
LT /
In
1.0
1.2
1.4 mitted pow
0.3
0.4
0.5N
orm
aliz
0.4
0.6
0.8
wer (a.u.)
Λ = 250nmGrating depth = 50nm Gap to QW = 30 nm
50 100 150 200 250 300 350 400 450 500
0.3
Diameter (nm)
0.2p
169 nm
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Optimum gap distance between metal and QW
2.0
2.5
cem
ent
λ = 530 nmd = 20 nm
1.0
1.5d
enha
nc
0 0
0.5
Upw
ard
0 5 10 15 20 25 300.0
Distance [nm]
coupling to surface plasmonscoupling to lossy surface wave coupling to surface plasmonscoupling to lossy surface wave
6nm is a theoretical limit given by self-driven dipole (CPS) modeling[W. L. Barens and P. T. Worthing, Optics Communications 162, 16 (1999)]
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Grating on p-GaN
Rotation
Aperture
Mirror
L-Shape
Substratemount
Zθ
• Little damage to p-GaN• Enlarged surface area for
otat ostage L-Shapemount
X
Y
low contact resistance Linearstage
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EL Measurement0.004
0.0045
Higher output power t 70 %
0.0025
0.003
0.0035
arb.)
r e f
250A_3
250B_2
250C_2
up to 70 %
0.0015
0.002
0.0025
Power(a
270A_4
270B_2
270C_3
290A_3
0
0.0005
0.001 290B_2
0
0 0.1 0.2 0.3 0.4
Cu r re n t (A )
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Sample images
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An Optimistic Estimation for SP-enhanced LEDsFDTD l l ti
At green (530 nm)with a 1st order grating
10 nm
epth 20 nm
FDTD calculation
5 nmMQW
grat
ing
de 2.3 times more
Photons5 nm
60 nm100 nm 180
140 nm
g
ti i d
Photonsgenerated
0.8
1.0
ed
100 nm 180 nmgrating period
82 %Good directionality
0 2
0.4
0.6
hoto
ns e
scap
34.1% within 20oafter escape
400 500 600 700 8000.0
0.2PhWavelength (nm)
1/(2n2) = 8 %Surface plasmon
(Bare-chip LED with 8 % extraction) (82 % / 8 %) x 2.3 ~ 24 times Brighter( Optimized LED with 50 % extraction) (82 % / 50 %) x 2.3 ~ 4 times Brighter
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Nanocavity lasers
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Nanocavity lasersNanocavity lasers
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Final comments
1. How does the surface plamon resonance enhance the internal quantum efficiency of light source?2. Understand the Fermi-Golden rule and Purcell enhancement factor in spontaneous emission3. What are the practical difficulties in realizing SP-enhanced LEDs?
Key notes 3. What are the practical difficulties in realizing SP enhanced LEDs?
4. Summary of the five lecturesnotes
External Efficienciesp
pnr p
RER R
η =+
E R E R
Conventional LED
' p p SP SPnr p SP
E R E RR R R
η+
=+ +
SP LED
An Optimistic Estimation for SP-enhanced LEDs10 nm
FDTD calculation
At green (530 nm)with a 1st order grating
10 nm
dept
h 20 nm
2 3 ti
5 nmMQW
grat
ing
d 2.3 times more
Photonsti
60 nm100 nm 180 nm
140 nm
grating period
generation
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Final comments
Summary of the five lectures
(06/23) Introduction: Micro- and nano-optics based on diffraction effect for next generation technologies(06/30) Guided-mode resonance (GMR) effect for filtering devices in LCD display panels(07/07) Surface-plasmons: A basic(07/14) Surface plasmon waveguides for biosensor applications(07/14) Surface-plasmon waveguides for biosensor applications(07/21) Efficient light emission from LED, OLED, and nanolasers by surface-plasmon resonance
R0 T0
GMR grating
Micros
Dcore SPP mode
metal strip
core
cladding
metal slab
core
cladding
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Final comments
Summary of the five lectures
Now, let’s get back to Macros with Nanos and Micros.