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TOPIC 1 INTRODUCTION TO INTEGRATED CIRCUIT (IC) CLO1 EE603 CMOS Integrated Circuit Design Prepared by: Mohd Noralimi

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Page 1: EE603 Topic 1

TOPIC 1

INTRODUCTION TO

INTEGRATED CIRCUIT (IC) CLO1

EE603

CMOS Integrated Circuit Design

Prepared by: Mohd Noralimi

Page 2: EE603 Topic 1

1.1

The Evolution in Integrated Circuit

Page 3: EE603 Topic 1

Transistor Revolution Circuit

Integration

Year of

Technology

Components

per chip

Examples

Discrete

Components

(no integration)

Prior to 1960 1 -

Small Scale

Integration (SSI)

Early 1960s 2 to 50 NAND, NOR logic

gates

Medium Scale

Integration (MSI)

1960s to early

1970s

50 to 5,000 Adders, multiplexers,

decoders, counters

Large Scale

Integration (LSI)

Early 1970s to

Late 1970s

5,000 to 100,000

Memories,

microprocessors Very Large Scale

Integration (VLSI)

Late 1970s to

Late 1980s

100,000 to

1,000,000

Ultra Large Scale

Integration (ULSI)

1990s to

present

> 1,000,000

Page 4: EE603 Topic 1

MOSFET Technology The MOSFET is the dominant device used in

ULSI circuits.

The dominant technology MOSFET is CMOS (complementary MOSFET) technology, in which both n-channel (NMOS) and p-channel (PMOS) are provided on the same chip.

They’re 5 type: 1. Pmos

2. Nmos

3. Cmos

4. Vmos

5. BiCmos.

Page 5: EE603 Topic 1

Moore’s Law in predicting IC integration and

device feature size.

Gordon Moore (INTEL), 1964

prediction that the number of transistors on a chip

would double every 18 months (Moore’s Law).

Page 6: EE603 Topic 1

Moore’s Law in predicting IC integration and

device feature size.

A key contributor to Moore's law is the ability to

fabricate wafers with a reduction in the device

feature size and an increase in the number of

transistors on a chip with the introduction of each

new product generation.

Moore’s Law important because it leads to smaller

microchip packaging and in which leads to smaller

commercial products (Ex. portable electronic

products such as the smartphones and tablet

computers).

Page 7: EE603 Topic 1

Evolution in DRAM chip capacity

Page 8: EE603 Topic 1

Die Size Growth

4004 8008

8080 8085

8086 286

386 486 Pentium ® proc

P6

1

10

100

1970 1980 1990 2000 2010 Year

Die

siz

e (

mm

)

~7% growth per year

~2X growth in 10 years

Die size grows by 14% to satisfy Moore’s Law

Page 9: EE603 Topic 1

Power Density

4004 8008

8080 8085

8086

286 386

486 Pentium® proc

P6

1

10

100

1000

10000

1970 1980 1990 2000 2010 Year

Po

we

r D

en

sit

y (

W/c

m2)

Hot Plate

Nuclear

Reactor

Rocket

Nozzle

Power density too high to keep junctions at low temp

Page 10: EE603 Topic 1

1.2

The issues in digital integrated

circuit design

Page 11: EE603 Topic 1

The issues in digital integrated

circuit design

“Microscopic Problems”

• Ultra-high speed design

• Interconnect

• Noise, Crosstalk

• Reliability, Manufacturability

• Power Dissipation

• Clock distribution.

Everything Looks a Little Different

“Macroscopic Issues” • Time-to-Market

• Millions of Gates

• High-Level Abstractions

• Reuse & IP: Portability

• Predictability

• etc.

…and There’s a Lot of Them!

Page 12: EE603 Topic 1

1.3

The Quality Design Metrics of a

Digital Design

Page 13: EE603 Topic 1

The cost of an integrated circuit

Page 14: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 14

Cost of Integrated Circuits

NRE (non-recurrent engineering) costs

design time and effort, mask generation

one-time cost factor

Recurrent costs

silicon processing, packaging, test

proportional to volume

proportional to chip area

Page 15: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 15

NRE Cost is Increasing

Page 16: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 16

Die Cost

Single die

Wafer

From http://www.amd.com

Going up to 12” (30cm)

Page 17: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 17

Cost per Transistor

0.0000001

0.000001

0.00001

0.0001

0.001

0.01

0.1

1

1982 1985 1988 1991 1994 1997 2000 2003 2006 2009 2012

cost: ¢-per-transistor

Fabrication capital cost per transistor (Moore’s law)

Page 18: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 18

Yield

%100per wafer chips ofnumber Total

per wafer chips good of No.Y

yield Dieper wafer Dies

costWafer cost Die

area die2

diameterwafer

area die

diameter/2wafer per wafer Dies

2

Page 19: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 19

Defects

area dieareaunit per defects1yield die

is approximately 3

4area) (die cost die f

Page 20: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 20

Some Examples (1994)

Chip Metal

layers

Line

width

Wafer

cost

Def./

cm2

Area

mm2

Dies/

wafer

Yield Die

cost

386DX 2 0.90 $900 1.0 43 360 71% $4

486 DX2 3 0.80 $1200 1.0 81 181 54% $12

Power PC

601 4 0.80 $1700 1.3 121 115 28% $53

HP PA 7100 3 0.80 $1300 1.0 196 66 27% $73

DEC Alpha 3 0.70 $1500 1.2 234 53 19% $149

Super Sparc 3 0.70 $1700 1.6 256 48 13% $272

Pentium 3 0.80 $1500 1.5 296 40 9% $417

Page 21: EE603 Topic 1

The functionality and robustness

including the specification

below: Noise sources in digital circuits

Voltage transfer characteristic

Noise margins

Regenerative properties

Noise immunity

Directivity

Fan out and fan in

The ideal digital gate

Page 22: EE603 Topic 1

Noise sources in digital circuits

i ( t )

Inductive coupling Capacitive coupling Power and ground noise

v ( t ) V DD

Page 23: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 23

DC Operation

Voltage Transfer Characteristic

V(x)

V(y)

V OH

V OL

V M

V OH

V OL

f

V(y)=V(x)

Switching Threshold

Nominal Voltage Levels

VOH = f(VOL)

VOL = f(VOH)

VM = f(VM)

Page 24: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 24

Mapping between analog and digital signals

V IL

V IH

V in

Slope = -1

Slope = -1

V OL

V OH

V out

“ 0 ” V OL

V IL

V IH

V OH

Undefined

Region

“ 1 ”

Page 25: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 25

Definition of Noise Margins

Noise margin high

Noise margin low

V IH

V IL

Undefined

Region

"1"

"0"

V OH

V OL

NM H

NM L

Gate Output Gate Input

Page 26: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 26

Noise Budget

Allocates gross noise margin to

expected sources of noise

Sources: supply noise, cross talk,

interference, offset

Differentiate between fixed and

proportional noise sources

Page 27: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 27

Key Reliability Properties

Absolute noise margin values are deceptive

a floating node is more easily disturbed than a

node driven by a low impedance (in terms of

voltage)

Noise immunity is the more important metric –

the capability to suppress noise sources

Key metrics: Noise transfer functions, Output

impedance of the driver and input impedance of the

receiver;

Page 28: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 28

Regenerative Property

Regenerative Non-Regenerative

Page 29: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 29

Regenerative Property

A chain of inverters

v 0 v 1 v 2 v 3 v 4 v 5 v 6

Simulated response

Page 30: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 30

Fan-in and Fan-out

N

Fan-out N Fan-in M

M

Page 31: EE603 Topic 1

EE141 © Digital Integrated Circuits2nd Introduction 31

The Ideal Gate

R i =

R o = 0

Fanout =

NMH = NML = VDD/2 g =

V in

V out

Page 32: EE603 Topic 1

Performance issues of a digital

design

Page 33: EE603 Topic 1

Propagation Delays, Rise and Fall time.

Page 34: EE603 Topic 1
Page 35: EE603 Topic 1

Define the power and energy

consumption