SymposiumonDirectWrite,Optical,IonandElectronBeamLithography
July14th,2017
StanfordUniversity
PaulG.Allen101AuditoriumThissymposiumfeaturestechnicalexpertsfromHeidelbergInstruments,Nanoscribe,ZeissandRaithwhowilldescribethespectrumoflatest,state-of-the-artdirect-writecapabilities.SNFandSNSFarepartofNSF’sNNCI@StanfordandmakemodernnanofabricationcapabilitiesavailabletoStanford’scommunity;wealsowelcomeresearchersfromindustryandotheruniversities.
9:00 9:15
WelcomeandIntroductions
StanfordUniversity,Prof.RogerHowe
9:15 9:45
WriteStrategiesforOpticalDirectwriteLithography
HeidelbergInstruments,NielsWijnaendtsvanResandt
9:45 10:15
GalliumFocusedIonBeamApplications
CarlZeissMicroscopy,KDDerr
10:15 10:45
LatestadvancesinElectronanIonBeamLithography
RaithAmerica,AndreLinden
10:45 11:00
CoffeeBreak
11:00 11:30
3Dprintingbytwo-photonpolymerizationsetsnewstandardsinmicro-andnanofabrication
Nanoscribe,Dr.BenjaminRichter
11:30 12:00
ReversingEBLtechnologyforlargeareaimagingandnanometrology
RaithAmerica,AndreLinden
12:00 12:30
Direct-WriteNanofabricationusingInertIons
CarlZeissMicroscopy,SoerenEyhusen
12:30 13:30
LunchBreak
13:30 14:00
Light-inducedquantitativepatterningofbiomolecules
Alvéole,HélèneDelobel
14:00 14:30
HighprecisionandHighresolution:RequirementsandSolutionsforhighendopticallithographyapplications
HeidelbergInstruments,SteffenDiez
14:30 15:00
Functionalresinsfor3Dprinting–mechanism,applicationandoutlook
Nanoscribe,Dr.BenjaminRichter
15:00 16:30
ProcessClinic(opendiscussionaboutprocessrelatedchallenges)Lunchwillbeprovided.DuringtheProcessClinicwewillservefreebeerandarelookingforwardtohavefruitfuldiscussionswithyouaboutyouractualchallenges.Pleasepreregisterathttp://bit.ly/2sXaSD2.
