Transcript

SymposiumonDirectWrite,Optical,IonandElectronBeamLithography

July14th,2017

StanfordUniversity

PaulG.Allen101AuditoriumThissymposiumfeaturestechnicalexpertsfromHeidelbergInstruments,Nanoscribe,ZeissandRaithwhowilldescribethespectrumoflatest,state-of-the-artdirect-writecapabilities.SNFandSNSFarepartofNSF’sNNCI@StanfordandmakemodernnanofabricationcapabilitiesavailabletoStanford’scommunity;wealsowelcomeresearchersfromindustryandotheruniversities.

9:00 9:15

WelcomeandIntroductions

StanfordUniversity,Prof.RogerHowe

9:15 9:45

WriteStrategiesforOpticalDirectwriteLithography

HeidelbergInstruments,NielsWijnaendtsvanResandt

9:45 10:15

GalliumFocusedIonBeamApplications

CarlZeissMicroscopy,KDDerr

10:15 10:45

LatestadvancesinElectronanIonBeamLithography

RaithAmerica,AndreLinden

10:45 11:00

CoffeeBreak

11:00 11:30

3Dprintingbytwo-photonpolymerizationsetsnewstandardsinmicro-andnanofabrication

Nanoscribe,Dr.BenjaminRichter

11:30 12:00

ReversingEBLtechnologyforlargeareaimagingandnanometrology

RaithAmerica,AndreLinden

12:00 12:30

Direct-WriteNanofabricationusingInertIons

CarlZeissMicroscopy,SoerenEyhusen

12:30 13:30

LunchBreak

13:30 14:00

Light-inducedquantitativepatterningofbiomolecules

Alvéole,HélèneDelobel

14:00 14:30

HighprecisionandHighresolution:RequirementsandSolutionsforhighendopticallithographyapplications

HeidelbergInstruments,SteffenDiez

14:30 15:00

Functionalresinsfor3Dprinting–mechanism,applicationandoutlook

Nanoscribe,Dr.BenjaminRichter

15:00 16:30

ProcessClinic(opendiscussionaboutprocessrelatedchallenges)Lunchwillbeprovided.DuringtheProcessClinicwewillservefreebeerandarelookingforwardtohavefruitfuldiscussionswithyouaboutyouractualchallenges.Pleasepreregisterathttp://bit.ly/2sXaSD2.

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