Facilities Include:Facilities Include:• 2 MV Tandem accelerator
• Rapid elemental depth profile techniques include RBS, EBS, ERD, PIXE and NRD
• Sub-micro size microbeam with full scanning capability
• Advanced sample goniometer for channelling spectroscopy
• Automatic data analysis system
• External (in air) microbeam for vacuum sensitive samples
Future Developments:Future Developments:
• Just installed state-of-the-art accelerator
• Developing routine, accurate, cheap characterisation
• Plan to extend capabilities by installing:
• Nano ion beam for nano analysis and proton beam lithography
• Vertical ion beam for liquid and biological applications
• Continue and expand interaction with both University and Industrial groups
• Light from silicon – LEDs at room temperature (patent)
• Spin-out company formed: Si-Light Technologies
• Ion beam synthesis of superconducting MgB2 (patent)
• Elevated temperature implants, for increased thermal stability and larger process window, for the production of high resistivity layers in GaAs
• Control of transient enhanced diffusion of boron in silicon (2 patents)
• Room temperature formation of ultra-thin (2nm) conducting silicides
• DataFurnace for ion beam analysis (sold under license)
• Centre supported £48M of grants over 4 years
• Queens Anniversary Prize for Further and Higher Education
• Si, SiGe, SOI for CMOS, modelling, TCAD (Philips, Applied Materials, Silvaco, ISE)
• Modeling & Simulation - energetic molecule & cluster surface interactions
• Ultra-thin silicides for displays and CMOS (Philips/LG)
• Virtual substrates: ion beam synthesis, layer transfer
• Photonics for silicon laser (and LED), integrated optics, III-V compounds (LEDs and lasers)
• Development of ion beam analysis techniques and applications for Cultural Heritage and the Environment
• Proton beam lithography for high aspect ratio and buried structures
• Application of Ion Beams to biomedical applications
SuccessesSuccesses New ProjectsNew Projects
Industrial Users of the IBC include:Industrial Users of the IBC include:• QinetiQ• Applied Materials • Filtronic• e2v Technologies• PRP Optoelectronics• Bookham Technology• Philips Research Labs• Canberra• FOM-AMOLF NL• CRP - Belgium• MATS UK• Coherent - Germany• Cascade Scientific• Mesaphotonics• LG/Philips• ABB – Switzerland• Zetec• EIF • Gresham Scientific• Aonex Technologies - USA
Academic Users of the IBC include:Academic Users of the IBC include:• KCL• Leeds• Glasgow• ICSTM• Cambridge• Warwick• Sheffield• Southampton• Oxford• UEA• Nottingham• QUB• Bristol• South Bank• Durham• Salford• UMIST• Swansea
• Manchester• Newcastle• Royal Holloway• Hull• Liverpool• Heriot Watt• UCL• Aston• De Monfort• QMWC• Northumbria• Bath• Exeter• Edinburgh• Birmingham• Surrey - Physics,
Elec. Eng. Bio Sciences Materials Science
ImplantationImplantation AnalysisAnalysisFacilities Include:Facilities Include:
• 2MV High Energy Implanter• 200kV High Current implanter• Implantation 2 keV 6 MeV• Sample sizes up to 40cm x 40cm• Hot (1000 oC) or cold (~LN)
implants• In situ measurements can be made• Sample Chambers in clean room
(class 100)• Up to 10mA beam currents
available
Future Developments:Future Developments:• Precision implantation of novel
devices and modification of a wide range of materials
• Have state-of-the-art facilities (keV-MeV) - (long lifetime)
• Developing ultra-low energy capability - for nanotechnology, ion beam deposition, ion beam synthesis
• Developing ultra-low-dose capability
• Continue close interaction with both University and Industrial groups
Surrey Ion Beam CentreSurrey Ion Beam Centre