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Trademarks are owned by Mallinckrodt Baker, Inc. unless otherwise noted. ©2006 Mallinckrodt Baker, Inc. All rights reserved.
New J.T.Baker® photoresist stripper and residue remover can make a big difference in your game plan.
Developing a next-generation photoresist stripper and residue remover doesn’t comeeasy. It comes from a lot of hard work and a commitment to create a chemistry thatmeets the needs of technologies at or below the 90 nanometer node.
Our newest chemistry is effective for removing bulk photoresist, ash residue andanti-reflective coatings in a single step on low-κ dielectrics. It’s also 100% water soluble making it a more environmentally friendly solution.
Collaborating with our customers to solve problems is a priority for us. So whether you’re looking to improve the performance of your current process, meet environmental initiatives, or find a chemistry that’s compatible with the latest low-κdielectrics, our research and application engineers stand ready to support you.
Make our CLκ-222 photoresist stripper and residue remover part of your winning strategy today. For access to technical information, visitwww.mallbaker.com/fab or call 1-800-494-7051.
Introducing CLκ™-222 photoresist stripper and residue remover. Teaming up with customers, we created another winning solution.
MBI-2371 CLK222 210x297mm 8/22/06 9:44 AM Page 1
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FT31_Jap lady_contents.qxp 9/7/2006 5:01 PM Page 1
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FT31_EKC.qxp 9/7/2006 9:18 AM Page 1
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FT31_epion.qxp 8/31/2006 9:46 AM Page 1
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FT31_SSEC.qxp 9/4/2006 11:29 AM Page 1
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